专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08147072B2 Cooling module for use with a projection apparatus 有权
标题翻译：用于投影设备的冷却模块
公开(公告)号：US08147072B2
公开(公告)日：2012-04-03
申请号：US11626133
申请日：2007-01-23
申请人： Chia-Jui Lin , Kuo-Ching Chang , Hui-Chih Lin
发明人： Chia-Jui Lin , Kuo-Ching Chang , Hui-Chih Lin
IPC分类号： G03B21/16 , H05K7/20
CPC分类号： G03B21/16
摘要： A cooling module for use with a DMD module of a projection apparatus is provided. The cooling module includes a heat conduction device, at least one heat pipe, and at least one fin. Heat accumulating on the DMD module can be released from the heat conduction device to the fins through the heat pipe. Meanwhile, the fins partially overlap along the direction of the light coming from the light source. Thus, the fins can also prevent the unused light in the casing of the projection apparatus from leakage.
摘要翻译：提供了一种与投影装置的DMD模块一起使用的冷却模块。冷却模块包括热传导装置，至少一个热管和至少一个翅片。在DMD模块上积聚的热量可以通过热管从热传导装置释放到散热片。同时，翅片沿着来自光源的光的方向部分地重叠。因此，散热片也可以防止投影装置的壳体中的未使用的光泄漏。

2. 发明授权

US07862181B2 Projection apparatus 有权
标题翻译：投影仪
公开(公告)号：US07862181B2
公开(公告)日：2011-01-04
申请号：US11734922
申请日：2007-04-13
申请人： Chia-Jui Lin , Hsiu-Ming Chang , Kuo-Ching Chang , Hui-Chih Lin , Yu-Ho Tsao
发明人： Chia-Jui Lin , Hsiu-Ming Chang , Kuo-Ching Chang , Hui-Chih Lin , Yu-Ho Tsao
IPC分类号： G03B21/26 , F25B21/02 , F25D23/12
CPC分类号： G03B21/16 , H04N5/7441 , H04N9/3144
摘要： A projection apparatus having a temperature controlling system is provided. The projection apparatus comprises at least a heat generating element, while the temperature controlling system comprises a liquid flow system, a heat generating device, and a heat transferring device. The liquid flow system is disposed along the heat generating element. The heat generating device produces heat with a positive value (endothermic) or a negative value (exothermic) in response to an environment dependent on the location of the projection apparatus. The heat transferring device transfers the heat generated by the heat generating device along the liquid flow system. The present invention maintains the operation of the projection apparatus under the desired working temperature and enables a thermal equilibrium of the projection apparatus without being influenced by the over-temperature or under-temperature of the external environment.
摘要翻译：提供具有温度控制系统的投影装置。投影装置至少包括发热元件，而温度控制系统包括液体流动系统，发热装置和传热装置。液体流动系统沿着发热元件设置。响应于取决于投影装置的位置的环境，发热装置产生具有正值（吸热）或负值（放热）的热量。传热装置沿着液体流动系统传递由发热装置产生的热量。本发明将投影装置的操作保持在期望的工作温度下，并且能够在不受外部环境的过温或过温的影响的情况下使投影装置的热平衡。

3. 发明申请

US20070247592A1 PROJECTION APPARATUS 有权
标题翻译：投影设备
公开(公告)号：US20070247592A1
公开(公告)日：2007-10-25
申请号：US11734922
申请日：2007-04-13
申请人： Chia-Jui Lin , Hsiu-Ming Chang , Kuo-Ching Chang , Hui-Chih Lin , Yu-Ho Tsao
发明人： Chia-Jui Lin , Hsiu-Ming Chang , Kuo-Ching Chang , Hui-Chih Lin , Yu-Ho Tsao
IPC分类号： G03B21/26
CPC分类号： G03B21/16 , H04N5/7441 , H04N9/3144
摘要： A projection apparatus having a temperature controlling system is provided. The projection apparatus comprises at least a heat generating element, while the temperature controlling system comprises a liquid flow system, a heat generating device, and a heat transferring device. The liquid flow system is disposed along the heat generating element. The heat generating device produces heat with a positive value (endothermic) or a negative value (exothermic) in response to an environment dependent on the location of the projection apparatus. The heat transferring device transfers the heat generated by the heat generating device along the liquid flow system. The present invention maintains the operation of the projection apparatus under the desired working temperature and enables a thermal equilibrium of the projection apparatus without being influenced by the over-temperature or under-temperature of the external environment.
摘要翻译：提供具有温度控制系统的投影装置。投影装置至少包括发热元件，而温度控制系统包括液体流动系统，发热装置和传热装置。液体流动系统沿着发热元件设置。响应于取决于投影装置的位置的环境，发热装置产生具有正值（吸热）或负值（放热）的热量。传热装置沿着液体流动系统传递由发热装置产生的热量。本发明将投影装置的操作保持在期望的工作温度下，并且能够在不受外部环境的过温或过温的影响的情况下使投影装置的热平衡。

4. 发明申请

US20070240429A1 TEMPERATURE CONTROLLING SYSTEM ADAPTED FOR A PROJECTION APPARATUS 审中-公开
标题翻译：适用于投影设备的温度控制系统
公开(公告)号：US20070240429A1
公开(公告)日：2007-10-18
申请号：US11531520
申请日：2006-09-13
申请人： Chia-Jui Lin , Hsiu-Ming Chang , Kuo-Ching Chang , Hui-Chih Lin , Yu-Ho Tsao
发明人： Chia-Jui Lin , Hsiu-Ming Chang , Kuo-Ching Chang , Hui-Chih Lin , Yu-Ho Tsao
IPC分类号： F25B21/02 , F25D23/12
CPC分类号： F25B21/04 , H04N9/3144
摘要： A temperature controlling system adapted for a projection apparatus is provided. The projection apparatus comprises at least a heat generating element, while the temperature controlling system comprises a liquid flow system, a heat generating device, and a heat transferring device. The liquid flow system is disposed along the heat generating element. The heat generating device produces heat with a positive value (endothermic) or a negative value (exothermic) in response to an environment dependent on the location of the projection apparatus. The heat transferring device transfers the heat generated by the heat generating device along the liquid flow system. The present invention maintains the operation of the projection apparatus under the desired working temperature and enables a thermal equilibrium of the projection apparatus without being influenced by the over-temperature or under-temperature of the external environment.
摘要翻译：提供一种适用于投影装置的温度控制系统。投影装置至少包括发热元件，而温度控制系统包括液体流动系统，发热装置和传热装置。液体流动系统沿着发热元件设置。响应于取决于投影装置的位置的环境，发热装置产生具有正值（吸热）或负值（放热）的热量。传热装置沿着液体流动系统传递由发热装置产生的热量。本发明将投影装置的操作保持在期望的工作温度下，并且能够在不受外部环境的过温或过温的情况下影响投影装置的热平衡。

5. 发明申请

US20080043439A1 COOLING MODULE FOR USE WITH A PROJECTION APPARATUS 有权
标题翻译：冷却模块与投影设备一起使用
公开(公告)号：US20080043439A1
公开(公告)日：2008-02-21
申请号：US11626133
申请日：2007-01-23
申请人： Chia-Jui Lin , Kuo-Ching Chang , Hui-Chih Lin
发明人： Chia-Jui Lin , Kuo-Ching Chang , Hui-Chih Lin
IPC分类号： H05K7/20
CPC分类号： G03B21/16
摘要： A cooling module for use with a DMD module of a projection apparatus is provided. The cooling module comprises a heat conduction device, at least one heat pipe, and at least one fin. Heat accumulating on the DMD module can be released from the heat conduction device to the fins through the heat pipe. Meanwhile, the fins partially overlap along the direction of the light coming from the light source. Thus, the fins can also prevent the unused light in the casing of the projection apparatus from leakage.
摘要翻译：提供了一种与投影装置的DMD模块一起使用的冷却模块。冷却模块包括热传导装置，至少一个热管和至少一个翅片。在DMD模块上积聚的热量可以通过热管从热传导装置释放到散热片。同时，翅片沿着来自光源的光的方向部分地重叠。因此，散热片也可以防止投影装置的壳体中的未使用的光泄漏。

6. 发明授权

US08684534B2 Cooling system for cooling a heat source and projection apparatus having the same 有权
标题翻译：用于冷却热源的冷却系统和具有该冷却系统的投影装置
公开(公告)号：US08684534B2
公开(公告)日：2014-04-01
申请号：US13115514
申请日：2011-05-25
申请人： Chia-Jui Lin , Kuo-Ching Chang
发明人： Chia-Jui Lin , Kuo-Ching Chang
IPC分类号： G02B21/16 , F25B21/02
CPC分类号： G03B21/16
摘要： A cooling system for cooling a heat source and a projection apparatus having the same are disclosed. The cooling system includes a heat dissipating device and a thermoelectric cooler (TEC). The heat source is disposed on the side of the heat dissipating device. The TEC is disposed on the other side of the heat dissipating device corresponding to the heat source. The TEC is initiated as the temperature of the heat source is greater than the first value, while the TEC is shut off as the temperature of the heat source is lower than the second value. Therefore, the cooling system economizes the energy by controlling the operation of the TEC according to the temperature of the heat source.
摘要翻译：公开了一种用于冷却热源的冷却系统和具有该冷却系统的投影设备。冷却系统包括散热装置和热电冷却器（TEC）。热源设置在散热装置的一侧。 TEC设置在与热源对应的散热装置的另一侧。当热源的温度大于第一值时，启动TEC，而当热源的温度低于第二值时TEC关闭。因此，冷却系统通过根据热源的温度控制TEC的运行来节约能源。

7. 发明申请

US20050052846A1 Electronic apparatus having heat dissipation device incorporated therein 审中-公开
标题翻译：具有并入其中的散热装置的电子设备
公开(公告)号：US20050052846A1
公开(公告)日：2005-03-10
申请号：US10932060
申请日：2004-09-02
申请人： Chia-jui Lin , Kuo-Ching Chang , Hsiu-Ming Chang , Ke-Nam Wang
发明人： Chia-jui Lin , Kuo-Ching Chang , Hsiu-Ming Chang , Ke-Nam Wang
IPC分类号： F21V29/02 , G03B21/16 , G03B21/20 , H05K7/20
CPC分类号： G03B21/16 , F21V29/677
摘要： An electronic apparatus includes a casing, a light source housed in the casing, and a heat dissipation device positioned between the casing and the light source. The casing is formed with a lead angle on its corner to create an inclined surface. The heat dissipation device has a first and a second end surfaces opposite to each other and a sidewall connected between them. The sidewall of the fan frame neighbors the inclined surface and has a slanting direction substantially paralleled to the inclined surface.
摘要翻译：电子设备包括壳体，容纳在壳体中的光源和位于壳体和光源之间的散热装置。外壳在其拐角处形成一个引导角以产生一个倾斜的表面。散热装置具有彼此相对的第一和第二端面以及连接在它们之间的侧壁。风扇框架的侧壁与倾斜表面相邻并且具有与倾斜表面基本平行的倾斜方向。

8. 发明授权

US08502257B2 Light-emitting diode package 有权
标题翻译：发光二极管封装
公开(公告)号：US08502257B2
公开(公告)日：2013-08-06
申请号：US12613003
申请日：2009-11-05
申请人： Kuo-Ching Chang , Wu-Cheng Kuo , Tzu-Han Lin
发明人： Kuo-Ching Chang , Wu-Cheng Kuo , Tzu-Han Lin
IPC分类号： H01L27/15 , H01L29/267 , H01L31/12 , H01L33/00 , H01L31/0203
CPC分类号： H01L33/62 , H01L24/32 , H01L24/48 , H01L24/49 , H01L24/83 , H01L24/85 , H01L33/486 , H01L2224/05554 , H01L2224/29111 , H01L2224/32225 , H01L2224/48091 , H01L2224/48227 , H01L2224/49113 , H01L2224/73265 , H01L2224/83815 , H01L2224/85439 , H01L2224/85444 , H01L2224/92247 , H01L2924/00014 , H01L2924/01004 , H01L2924/01006 , H01L2924/01013 , H01L2924/01024 , H01L2924/01029 , H01L2924/01033 , H01L2924/01042 , H01L2924/01047 , H01L2924/01049 , H01L2924/0105 , H01L2924/01073 , H01L2924/01074 , H01L2924/01075 , H01L2924/01078 , H01L2924/01079 , H01L2924/01082 , H01L2924/0132 , H01L2924/01322 , H01L2924/014 , H01L2924/12041 , H01L2924/15153 , H01L2924/157 , H01L2924/15747 , H01L2924/15787 , H01L2924/1579 , H01L2924/00 , H01L2924/00012 , H01L2924/00015 , H01L2224/45099 , H01L2224/45015 , H01L2924/207
摘要： A light-emitting diode package is provided. The light-emitting diode package comprises a substrate and a first metal layer disposed over the substrate. A solder layer is disposed on the first metal layer and a light-emitting diode chip is disposed on the solder layer, wherein the light-emitting diode chip comprises a conductive substrate and a multilayered epitaxial structure formed on the conductive substrate, and wherein the conductive substrate is adjacent to the solder layer.
摘要翻译：提供了一种发光二极管封装。发光二极管封装包括衬底和设置在衬底上的第一金属层。焊料层设置在第一金属层上，并且发光二极管芯片设置在焊料层上，其中发光二极管芯片包括形成在导电衬底上的导电衬底和多层外延结构，并且其中导电衬底与焊料层相邻。

9. 发明授权

US07876912B2 Dual mode headset device 失效
标题翻译：双模耳机设备
公开(公告)号：US07876912B2
公开(公告)日：2011-01-25
申请号：US11564853
申请日：2006-11-30
申请人： Chun-Hsin Liu , Meng-Yuan Liu , Shih-Wei Fang , Kuo-Ching Chang , Jui-Chi Liao , Chi-Hsiang Chen
发明人： Chun-Hsin Liu , Meng-Yuan Liu , Shih-Wei Fang , Kuo-Ching Chang , Jui-Chi Liao , Chi-Hsiang Chen
IPC分类号： H04R1/10 , H04R25/00 , H04M1/00
CPC分类号： H04R1/1033 , H04R1/1041 , H04R5/033
摘要： The invention provides a headset device. The headset device includes a first headset, a second headset, and a transmission line. The first headset includes a first housing; an interface module for receiving an audio signal; a signal processing module for separating the audio signal into a first channel signal and a second channel signal; an amplifying circuit for respectively amplifying the first channel signal and the second channel signal to generate a first amplified signal and a second amplified signal; and a first speaker for outputting audio according to the first amplified signal. The second headset includes a second housing, and a second speaker for outputting audio according to the second amplified signal. The transmission line is for transmitting the second amplified signal to the second headset.
摘要翻译：本发明提供一种耳机装置。耳机设备包括第一耳机，第二耳机和传输线。第一耳机包括第一壳体; 用于接收音频信号的接口模块; 信号处理模块，用于将音频信号分离成第一信道信号和第二信道信号; 放大电路，用于分别放大第一通道信号和第二通道信号以产生第一放大信号和第二放大信号; 以及第一扬声器，用于根据第一放大信号输出音频。第二耳机包括第二壳体和用于根据第二放大信号输出音频的第二扬声器。传输线用于将第二放大信号发送到第二耳机。

10. 发明授权

US5363781A Plasma torch-jet liquid waste treatment device 失效
标题翻译：等离子火炬喷射液体废物处理装置
公开(公告)号：US5363781A
公开(公告)日：1994-11-15
申请号：US052719
申请日：1993-04-26
申请人： Kuo-Ching Chang , Shih-Tsung Tseng , Jain-Sheng Huang
发明人： Kuo-Ching Chang , Shih-Tsung Tseng , Jain-Sheng Huang
IPC分类号： F23G5/00 , F23G5/08 , F23G7/00
CPC分类号： F23G5/006 , F23G5/085 , F23G7/008 , F23G2204/201 , F23G2209/10 , F23G2209/14
摘要： The present invention comprises an apparatus for processing liquid or gas waste. The apparatus includes a high temperature plasma means for generating a high temperature in a plasma torch area. The apparatus further includes a jetting means for transporting and jetting the liquid or gas waste to the high temperature plasma torch area directly wherein a high temperature treatment of the waste is performed.
摘要翻译：本发明包括一种用于处理液体或废气的设备。该装置包括用于在等离子体焰炬区域中产生高温的高温等离子体装置。该装置还包括一个喷射装置，用于将液体或气体废物直接运送和喷射到高温等离子体焰炬区域，其中进行废物的高温处理。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式