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    • 1. 发明申请
    • Lighting device and method for manufacturing the same
    • 照明装置及其制造方法
    • US20060017372A1
    • 2006-01-26
    • US11105402
    • 2005-04-14
    • Chang-Hsin ChuKuo-Hui YuShi-Ming Chen
    • Chang-Hsin ChuKuo-Hui YuShi-Ming Chen
    • H05B33/00
    • H01L33/38H01L33/20H01L33/44H01L2933/0016
    • A lighting device and a method for manufacturing the same are described. First, a semiconductor layer of a first electrical property, an active layer and a semiconductor layer of a second electrical property are sequentially formed, and part of them are removed to form a mesa. A transparent contact layer is formed thereon, and thus forms a stack. Afterwards, a passivation layer is deposited on the stack and a first part of the semiconductor layer of the first electrical property adjacent to the stack. Part of the passivation layer is removed to expose part of the transparent contact layer. Then, an electrode of the second electrical property is formed on the exposed transparent contact layer. Afterwards, the electrode of the second electrical property is extended to the passivation layer on the first part of the semiconductor layer of the first electrical property to form a guard ring.
    • 对照明装置及其制造方法进行说明。 首先,依次形成具有第一电特性的半导体层,有源层和第二电性质的半导体层,并且去除其中的一部分以形成台面。 在其上形成透明接触层,从而形成叠层。 之后,钝化层沉积在堆叠上,并且与堆叠相邻的第一电性质的半导体层的第一部分被沉积。 去除钝化层的一部分以暴露部分透明接触层。 然后,在露出的透明接触层上形成第二电性质的电极。 之后,第二电性能的电极延伸到第一电性能的半导体层的第一部分上的钝化层以形成保护环。
    • 2. 发明授权
    • Lighting device and method for manufacturing the same
    • 照明装置及其制造方法
    • US07301272B2
    • 2007-11-27
    • US11105402
    • 2005-04-14
    • Chang-Hsin ChuKuo-Hui Yu ChuShi-Ming Chen
    • Chang-Hsin ChuKuo-Hui Yu ChuShi-Ming Chen
    • H01J1/62
    • H01L33/38H01L33/20H01L33/44H01L2933/0016
    • A lighting device and a method for manufacturing the same are described. First, a semiconductor layer of a first electrical property, an active layer and a semiconductor layer of a second electrical property are sequentially formed, and part of them are removed to form a mesa. A transparent contact layer is formed thereon, and thus forms a stack. Afterwards, a passivation layer is deposited on the stack and a first part of the semiconductor layer of the first electrical property adjacent to the stack. Part of the passivation layer is removed to expose part of the transparent contact layer. Then, an electrode of the second electrical property is formed on the exposed transparent contact layer. Afterwards, the electrode of the second electrical property is extended to the passivation layer on the first part of the semiconductor layer of the first electrical property to form a guard ring.
    • 对照明装置及其制造方法进行说明。 首先,依次形成具有第一电特性的半导体层,有源层和第二电性质的半导体层,并且去除其中的一部分以形成台面。 在其上形成透明接触层,从而形成叠层。 之后,钝化层沉积在堆叠上,并且与堆叠相邻的第一电性质的半导体层的第一部分被沉积。 去除钝化层的一部分以暴露部分透明接触层。 然后,在露出的透明接触层上形成第二电性质的电极。 之后,第二电性能的电极延伸到第一电性能的半导体层的第一部分上的钝化层以形成保护环。
    • 3. 发明授权
    • Light-emitting diode structure and method for manufacturing the same
    • 发光二极管结构及其制造方法
    • US08507938B2
    • 2013-08-13
    • US12753106
    • 2010-04-02
    • Kuo-Hui YuTsung-Hung LuChang-Hsin Chu
    • Kuo-Hui YuTsung-Hung LuChang-Hsin Chu
    • H01L33/00
    • H01L33/20H01L33/0079H01L33/382H01L33/44H01L2933/0016
    • A light-emitting diode (LED) structure and a method for manufacturing the same are described. The light-emitting diode structure includes a p-type electrode, a bonding substrate, a p-type semiconductor layer, an active layer, an n-type semiconductor layer, an epitaxial growth substrate and an n-type electrode. The bonding substrate is disposed on the p-type electrode. The p-type semiconductor layer is disposed on the bonding substrate. The active layer is disposed on the p-type semiconductor layer. The n-type semiconductor layer is disposed on the active layer. The epitaxial growth substrate is disposed on the n-type semiconductor layer, wherein the epitaxial growth substrate includes an opening penetrating the epitaxial growth substrate. The n-type electrode is disposed in the opening and is electrically connected to the n-type semiconductor layer.
    • 描述了一种发光二极管(LED)结构及其制造方法。 发光二极管结构包括p型电极,接合衬底,p型半导体层,有源层,n型半导体层,外延生长衬底和n型电极。 接合基板设置在p型电极上。 p型半导体层设置在接合基板上。 有源层设置在p型半导体层上。 n型半导体层设置在有源层上。 外延生长衬底设置在n型半导体层上,其中外延生长衬底包括穿透外延生长衬底的开口。 n型电极设置在开口中并与n型半导体层电连接。
    • 4. 发明申请
    • LIGHT-EMITTING DIODE DEVICE AND MANUFACTURING METHOD THEREOF
    • 发光二极管器件及其制造方法
    • US20120085988A1
    • 2012-04-12
    • US13037737
    • 2011-03-01
    • Kuo-Hui YuJing-Hong LiChang-Hsin Chu
    • Kuo-Hui YuJing-Hong LiChang-Hsin Chu
    • H01L33/06H01L33/46
    • H01L33/38H01L33/20H01L2933/0016
    • A light-emitting diode (LED) device includes a substrate, an epitaxial layer, a first electrode and a second electrode. The epitaxial layer is disposed on the substrate. The first electrode is disposed to the epitaxial layer and the second electrode is disposed on the epitaxial layer, and a first conductive finger of the second electrode and a first conductive finger of the first electrode are overlapped. Because the first conductive finger of the second electrode and the first conductive finger of the first electrode are overlapped, the light-emitting area of the LED device can be increased and the light shielded by the electrodes can be decreased significantly. Besides, overlapped electrodes can form a capacitor which can store electric charges to enhance the antistatic ability of the LED device.
    • 发光二极管(LED)装置包括衬底,外延层,第一电极和第二电极。 外延层设置在基板上。 第一电极设置在外延层上,第二电极设置在外延层上,第二电极的第一导电指状物和第一电极的第一导电指状物重叠。 因为第二电极的第一导电指状物和第一电极的第一导电指状物重叠,所以可以增加LED器件的发光面积,并且可以显着降低由电极屏蔽的光。 此外,重叠的电极可以形成可以存储电荷的电容器,以提高LED器件的抗静电能力。
    • 5. 发明申请
    • LIGHT-EMITTING DIODE STRUCTURE AND METHOD FOR MANUFACTURING THE SAME
    • 发光二极管结构及其制造方法
    • US20130049060A1
    • 2013-02-28
    • US13397929
    • 2012-02-16
    • Kuo-Hui YuChang-Hsin Chu
    • Kuo-Hui YuChang-Hsin Chu
    • H01L33/42
    • H01L33/38H01L33/20
    • A light-emitting diode structure. In one embodiment, the light-emitting diode structure includes an insulation substrate, a light-emitting structure having a first electrical semiconductor layer, a light-emitting layer, and a second electrical semiconductor layer successively stacked on the insulating substrate and containing a first electrode pad region, a second electrode pad region, and a light-emitting region, a first and second electrical electrode pad respectively disposed on the first and second electrode pad region, a second electrical conducting finger disposed on the light-emitting structure and connected to the second electrical electrode pad and the second electrical semiconductor layer, and a first insulating layer for insulating the second electrical conducting finger from the first electrical semiconductor layer and the light-emitting layer. A bottom surface of the second electrical electrode pad is located below an upper surface of the second electrical semiconductor layer.
    • 发光二极管结构。 在一个实施例中,发光二极管结构包括绝缘基板,具有第一电半导体层,发光层和连续层叠在绝缘基板上并包含第一电极的第二电半导体层的发光结构 焊盘区域,第二电极焊盘区域和发光区域,分别设置在第一和第二电极焊盘区域上的第一和第二电极焊盘,设置在发光结构上并连接到发光结构的第二导电指状物 第二电极焊盘和第二电半导体层,以及用于将第二导电指状物与第一电半导体层和发光层绝缘的第一绝缘层。 第二电极焊盘的底表面位于第二电半导体层的上表面的下方。