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1. 发明申请

US20080121892A1 Low temperature poly silicon liquid crystal display 审中-公开
标题翻译：低温多晶硅液晶显示屏
公开(公告)号：US20080121892A1
公开(公告)日：2008-05-29
申请号：US11606841
申请日：2006-11-29
申请人： Chang-Ho Tseng , Shih-Pin Wang , Chun-Yen Liu , Kuo-Bin Hsu
发明人： Chang-Ho Tseng , Shih-Pin Wang , Chun-Yen Liu , Kuo-Bin Hsu
IPC分类号： H01L29/04 , H01L21/336
CPC分类号： H01L27/1296 , H01L27/1214 , H01L27/127 , H01L29/42384 , H01L29/4908
摘要： The invention discloses an LTPS LCD comprising a plurality of NMOS elements and PMOS elements on a substrate. Each element comprises a SiNx layer underlying or capping a gate electrode. The SiNx layer features an appropriate length extending from the bottom edge of the gate electrode. The SiNx layer can be replaced with a SiOxNy layer.
摘要翻译：本发明公开了一种在衬底上包括多个NMOS元件和PMOS元件的LTPS LCD。每个元件包括在栅极电极下面或覆盖栅电极的SiN x层。 SiN x层具有从栅电极的底部边缘延伸的适当长度。 SiN x层可以用SiO x N N y层替代。

2. 发明申请

US20080032431A1 Method for fabricating a system for displaying images 审中-公开
标题翻译：制造用于显示图像的系统的方法
公开(公告)号：US20080032431A1
公开(公告)日：2008-02-07
申请号：US11499118
申请日：2006-08-03
申请人： Kuo-Bin Hsu , Chun-Yen Liu , Yi-Fan Shih , Chang-Ho Tseng , Shih-Chang Chang
发明人： Kuo-Bin Hsu , Chun-Yen Liu , Yi-Fan Shih , Chang-Ho Tseng , Shih-Chang Chang
IPC分类号： H01L21/00
CPC分类号： H01L27/124 , H01L27/322 , H01L27/3244 , H01L29/0657 , H01L29/42384
摘要： The invention provides a method for manufacturing systems for displaying images. A representative system incorporates electroluminescent devices, comprising the following steps. A substrate having an active region and a pad region is provided. A thin film transistor is formed on the active region and a pad electrode is formed on the pad region, wherein the thin film transistor comprise a source electrode, a gate electrode, a drain electrode, and a gate insulator. A protective layer is formed on the active region and pad region. A planarization layer is formed on the active region and pad region, after forming color filter patterns on the protective layer on the active region. A first contact hole is formed to pass through the planarization layer of the active region, exposing the surface of the protective layer directly on the drain electrode. A drain via hole is formed to pass through the protective layer of the active region after the formation of the color filter patterns and the planarization layer, exposing the drain electrode. A pad via hole is formed to pass through the protective layer of the pad region after the formation of planarization layer, exposing the pad electrode.
摘要翻译：本发明提供一种用于制造用于显示图像的系统的方法。代表性的系统包括电致发光器件，包括以下步骤。提供具有有源区和衬垫区的衬底。在有源区上形成薄膜晶体管，在焊盘区上形成焊盘电极，其中薄膜晶体管包括源电极，栅电极，漏电极和栅极绝缘体。在有源区域和焊盘区域上形成保护层。在活性区域上的保护层上形成滤色器图案之后，在有源区域和焊盘区域上形成平坦化层。形成第一接触孔以通过有源区的平坦化层，直接在漏极上暴露保护层的表面。在形成滤色器图案和平坦化层之后，形成漏极通孔以通过有源区的保护层，使漏电极露出。在形成平坦化层之后，形成焊盘通孔以通过焊盘区域的保护层，暴露焊盘电极。

3. 发明授权

US07456432B2 System having electrostatic discharge protection structure and method for manufacturing the same 有权
标题翻译：具有静电放电保护结构的系统及其制造方法
公开(公告)号：US07456432B2
公开(公告)日：2008-11-25
申请号：US11561593
申请日：2006-11-20
申请人： Yi-Fan Shih , Chun-Yen Liu , Kuo-Bin Hsu , Chang-Ho Tseng , Shih-Chang Chang
发明人： Yi-Fan Shih , Chun-Yen Liu , Kuo-Bin Hsu , Chang-Ho Tseng , Shih-Chang Chang
IPC分类号： H01L27/12
CPC分类号： H01L27/0248 , G02F1/136204 , H01L27/124 , Y10T29/49204
摘要： A system having an electrostatic discharge protection structure and a method for manufacturing the structure are provided. The structure comprises a conducting layer, a material layer and a bridging layer wherein the conducting layer is divided into a first conducting portion and a second conducting portion to form a gap therebetween. The material layer is disposed onto the conducting layer, forming a first via hole to expose a part of the first conducting portion and a second via hole to expose a part of the second conducting portion. Finally, the bridging layer disposed onto the material layer electrically connects the first conducting portion to the second conducting portion within the first and second via holes, whereby the electrostatic produced during the manufacturing process would be prevented from damaging the driver circuits.
摘要翻译：提供一种具有静电放电保护结构的系统和用于制造该结构的方法。该结构包括导电层，材料层和桥接层，其中导电层被分成第一导电部分和第二导电部分，以在它们之间形成间隙。材料层设置在导电层上，形成第一通孔以暴露第一导电部分的一部分和第二通孔，以露出第二导电部分的一部分。最后，布置在材料层上的桥接层将第一和第二通孔内的第一导电部分电连接到第二导电部分，从而防止在制造过程中产生的静电损坏驱动电路。

4. 发明申请

US20080117558A1 SYSTEM HAVING ELECTROSTATIC DISCHARGE PROTECTION STRUCTURE AND METHOD FOR MANUFACTURING THE SAME 有权
标题翻译：具有静电放电保护结构的系统及其制造方法
公开(公告)号：US20080117558A1
公开(公告)日：2008-05-22
申请号：US11561593
申请日：2006-11-20
申请人： Yi-Fan Shih , Chun-Yen Liu , Kuo-Bin Hsu , Chang-Ho Tseng , Shih-Chang Chang
发明人： Yi-Fan Shih , Chun-Yen Liu , Kuo-Bin Hsu , Chang-Ho Tseng , Shih-Chang Chang
IPC分类号： H02H9/00 , H01R43/16
CPC分类号： H01L27/0248 , G02F1/136204 , H01L27/124 , Y10T29/49204
摘要： A system having an electrostatic discharge protection structure and a method for manufacturing the structure are provided. The structure comprises a conducting layer, a material layer and a bridging layer wherein the conducting layer is divided into a first conducting portion and a second conducting portion to form a gap therebetween. The material layer is disposed onto the conducting layer, forming a first via hole to expose a part of the first conducting portion and a second via hole to expose a part of the second conducting portion. Finally, the bridging layer disposed onto the material layer electrically connects the first conducting portion to the second conducting portion within the first and second via holes, whereby the electrostatic produced during the manufacturing process would be prevented from damaging the driver circuits.
摘要翻译：提供一种具有静电放电保护结构的系统和用于制造该结构的方法。该结构包括导电层，材料层和桥接层，其中导电层被分成第一导电部分和第二导电部分，以在它们之间形成间隙。材料层设置在导电层上，形成第一通孔以暴露第一导电部分的一部分和第二通孔，以露出第二导电部分的一部分。最后，布置在材料层上的桥接层将第一和第二通孔内的第一导电部分电连接到第二导电部分，从而防止在制造过程中产生的静电损坏驱动电路。

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