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1. 发明申请

US20100261815A1 PHOTOACTIVE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE SAME 有权
标题翻译：光泽化合物和包含它们的光敏树脂组合物
公开(公告)号：US20100261815A1
公开(公告)日：2010-10-14
申请号：US12743373
申请日：2009-04-01
申请人： Chang Ho Cho , Sung-Hyun Kim , Raisa Kharbash , Keon Woo Lee , Sang Kyu Kwak , Dong Kung Oh , Chang Soon Lee , Kyoung Hoon Min
发明人： Chang Ho Cho , Sung-Hyun Kim , Raisa Kharbash , Keon Woo Lee , Sang Kyu Kwak , Dong Kung Oh , Chang Soon Lee , Kyoung Hoon Min
IPC分类号： C08K5/3417 , C07D405/12
CPC分类号： C07D405/12 , G03F7/031
摘要： A novel photoactive compound is provided. The photoactive compound has a structure represented by Formula 1: wherein R1, R2, R3, A, X, Y, n and m are as defined in the specification. The photoactive compound efficiently absorbs UV light. Accordingly, the photoactive compound has an improved ability to generate radicals and is efficiently photopolymerized with unsaturated bonds. Further provided is a photosensitive resin composition comprising the photoactive compound. The photosensitive resin composition has good sensitivity because it efficiently absorbs UV light. In addition, the photosensitive resin composition has excellent characteristics in terms of residual film ratio, mechanical strength and resistance to heat, chemicals and development. Therefore, the photosensitive resin composition is advantageously used in curing materials for column spacers, overcoats and passivation films of liquid crystal display devices. In addition, the photosensitive resin composition has excellent thermal processing characteristics.
摘要翻译：提供了一种新的光敏化合物。光活性化合物具有由式1表示的结构：其中R1，R2，R3，A，X，Y，n和m如说明书中所定义。光敏化合物有效吸收紫外光。因此，光活性化合物具有改善的产生自由基的能力，并且有效地用不饱和键光聚合。还提供了包含光敏化合物的感光性树脂组合物。感光性树脂组合物具有良好的灵敏度，因为它有效地吸收紫外光。此外，感光性树脂组合物在残留膜比，机械强度和耐热性，化学品和显影方面具有优异的特性。因此，感光性树脂组合物有利地用于液晶显示装置的柱间隔物，外涂层和钝化膜的固化材料中。此外，感光性树脂组合物具有优异的热加工特性。

2. 发明授权

US08252507B2 Photoactive compound and photosensitive resin composition comprising the same 有权
标题翻译：光敏化合物和包含其的感光性树脂组合物
公开(公告)号：US08252507B2
公开(公告)日：2012-08-28
申请号：US12743373
申请日：2009-04-01
申请人： Chang Ho Cho , Sung Hyun Kim , Raisa Kharbash , Keon Woo Lee , Sang Kyu Kwak , Dong Kung Oh , Chang Soon Lee , Kyoung Hoon Min
发明人： Chang Ho Cho , Sung Hyun Kim , Raisa Kharbash , Keon Woo Lee , Sang Kyu Kwak , Dong Kung Oh , Chang Soon Lee , Kyoung Hoon Min
IPC分类号： C07D209/82 , C08F2/48 , G03F7/028 , G03F7/033
CPC分类号： C07D405/12 , G03F7/031
摘要： A novel photoactive compound is provided. The photoactive compound has a structure represented by Formula 1: wherein R1, R2, R3, A, X, Y, n and m are as defined in the specification. The photoactive compound efficiently absorbs UV light. Accordingly, the photoactive compound has an improved ability to generate radicals and is efficiently photopolymerized with unsaturated bonds. Further provided is a photosensitive resin composition comprising the photoactive compound. The photosensitive resin composition has good sensitivity because it efficiently absorbs UV light. In addition, the photosensitive resin composition has excellent characteristics in terms of residual film ratio, mechanical strength and resistance to heat, chemicals and development. Therefore, the photosensitive resin composition is advantageously used in curing materials for column spacers, overcoats and passivation films of liquid crystal display devices. In addition, the photosensitive resin composition has excellent thermal processing characteristics.
摘要翻译：提供了一种新的光敏化合物。光活性化合物具有由式1表示的结构：其中R1，R2，R3，A，X，Y，n和m如说明书中所定义。光敏化合物有效吸收紫外光。因此，光活性化合物具有改善的产生自由基的能力，并且有效地用不饱和键光聚合。还提供了包含光敏化合物的感光性树脂组合物。感光性树脂组合物具有良好的灵敏度，因为它有效地吸收紫外光。此外，感光性树脂组合物在残留膜比，机械强度和耐热性，化学品和显影方面具有优异的特性。因此，感光性树脂组合物有利地用于液晶显示装置的柱间隔物，外涂层和钝化膜的固化材料中。此外，感光性树脂组合物具有优异的热加工特性。

3. 发明授权

US08168369B2 Photoactive compound and photosensitive resin composition containing the same 有权
标题翻译：光敏化合物和含有它的感光性树脂组合物
公开(公告)号：US08168369B2
公开(公告)日：2012-05-01
申请号：US13147342
申请日：2010-02-12
申请人： Chang Ho Cho , Sung Hyun Kim , Raisa Kharbash , Keon Woo Lee , Dong Kung Oh , Won Jin Chung , Sang Kyu Kwak , Chang Soon Lee
发明人： Chang Ho Cho , Sung Hyun Kim , Raisa Kharbash , Keon Woo Lee , Dong Kung Oh , Won Jin Chung , Sang Kyu Kwak , Chang Soon Lee
IPC分类号： G03F7/00 , G03F7/004 , G03F7/028 , C07D209/82
CPC分类号： C07F9/5728 , C07D209/88 , C08F2/50 , G03F7/031 , Y10S430/106 , Y10S430/127
摘要： The present invention relates to a photoactive compound of a novel structure represented by Chemical Formula 1 below In Chemical Formula 1, R1 and R2, R3, and A are as defined in the specification, and a photosensitive resin composition comprising the same. The photoactive compound of the present invention comprises a nitro group and a phosphonate structure and thus exhibits excellent sensitivity through efficient absorption for UV light, excellent compatibility between the photoactive compound and the alkali-soluble binder resin, and an improved solubility of the photosensitive resin composition. Furthermore, the photosensitive resin composition of the present invention has excellent residual film thickness and mechanical strength characteristics and heat-resistant, chemical-resistant, and development-resistant properties. Accordingly, the photosensitive resin composition of the present invention is advantageous in hardening the column spacers of liquid crystal displays, an overcoat, and passivation materials and also advantageous in a high-temperature process characteristic.
摘要翻译：本发明涉及由化学式1化学式1表示的新结构的光敏化合物，其中R1，R2，R3，A如说明书中所定义，和含有该化合物的感光性树脂组合物。本发明的光活性化合物包括硝基和膦酸酯结构，因此通过有效吸收UV光，光活性化合物和碱溶性粘合剂树脂之间的相容性优异，并且改善了感光性树脂组合物的溶解性而显示出极好的灵敏度。此外，本发明的感光性树脂组合物具有优异的残留膜厚度和机械强度特性以及耐热，耐化学腐蚀和耐开发性能。因此，本发明的感光性树脂组合物有利于硬化液晶显示器的列间隔物，外涂层和钝化材料，并且在高温工艺特性中也是有利的。

4. 发明申请

US20100112479A1 Photopolymerization initiator containing unsaturated double bond and oxime ester group and photosensitive resin composition comprising the same 有权
标题翻译：含有不饱和双键和肟酯基的光聚合引发剂和包含它们的光敏树脂组合物
公开(公告)号：US20100112479A1
公开(公告)日：2010-05-06
申请号：US12588886
申请日：2009-10-30
申请人： Keon Woo Lee , Raisa Kharbash , Chang Ho Cho , Sung Hyun Kim , Sang Kyu Kwak , Dong Kung Oh , Chang Soon Lee
发明人： Keon Woo Lee , Raisa Kharbash , Chang Ho Cho , Sung Hyun Kim , Sang Kyu Kwak , Dong Kung Oh , Chang Soon Lee
IPC分类号： G03F7/004 , C07D209/82
CPC分类号： C07D209/82 , G03F7/0007 , G03F7/031 , Y10S430/12 , Y10S430/121
摘要： A photopolymerization initiator is provided. The photopolymerization initiator contains at least one unsaturated double bond and at least one oxime ester group in the molecule. The photopolymerization initiator comprises a compound represented by Formula 1 or 2: wherein R1 and R2 are each independently —CH3, —C2H5, —C3H7 or —C6H5; wherein R3, R4 and R5 are each independently —CH3, —C2H5, —C3H7 or —C6H5. Further provided is a photosensitive resin composition comprising the photopolymerization initiator. The use of the photosensitive resin composition in photolithography reduces the formation of volatile residue during post-development baking.
摘要翻译：提供光聚合引发剂。光聚合引发剂在分子中含有至少一个不饱和双键和至少一个肟酯基团。光聚合引发剂包括由式1或2表示的化合物：其中R 1和R 2各自独立地是-CH 3，-C 2 H 5，-C 3 H 7或-C 6 H 5; 其中R3，R4和R5各自独立地是-CH3，-C2H5，-C3H7或-C6H5。还提供了包含光聚合引发剂的感光性树脂组合物。在光刻中使用感光性树脂组合物可减少后期显影烘烤时的挥发性残留物的形成。

5. 发明授权

US08182979B2 Photopolymerization initiator containing unsaturated double bond and oxime ester group and photosensitive resin composition comprising the same 有权
标题翻译：含有不饱和双键和肟酯基的光聚合引发剂和包含它们的光敏树脂组合物
公开(公告)号：US08182979B2
公开(公告)日：2012-05-22
申请号：US12588886
申请日：2009-10-30
申请人： Keon Woo Lee , Raisa Kharbash , Chang Ho Cho , Sung Hyun Kim , Sang Kyu Kwak , Dong Kung Oh , Chang Soon Lee
发明人： Keon Woo Lee , Raisa Kharbash , Chang Ho Cho , Sung Hyun Kim , Sang Kyu Kwak , Dong Kung Oh , Chang Soon Lee
IPC分类号： C07D209/82 , C08F2/48 , G03F7/028 , G03F7/033
CPC分类号： C07D209/82 , G03F7/0007 , G03F7/031 , Y10S430/12 , Y10S430/121
摘要： A photopolymerization initiator is provided. The photopolymerization initiator contains at least one unsaturated double bond and at least one oxime ester group in the molecule. The photopolymerization initiator comprises a compound represented by Formula 1 or 2: wherein R1 and R2 are each independently —CH3, —C2H5, —C3H7 or —C6H5; wherein R3, R4 and R5 are each independently —CH3, —C2H5, —C3H7 or —C6H5. Further provided is a photosensitive resin composition comprising the photopolymerization initiator. The use of the photosensitive resin composition in photolithography reduces the formation of volatile residue during post-development baking.
摘要翻译：提供光聚合引发剂。光聚合引发剂在分子中含有至少一个不饱和双键和至少一个肟酯基团。光聚合引发剂包括由式1或2表示的化合物：其中R 1和R 2各自独立地是-CH 3，-C 2 H 5，-C 3 H 7或-C 6 H 5; 其中R3，R4和R5各自独立地是-CH3，-C2H5，-C3H7或-C6H5。还提供了包含光聚合引发剂的感光性树脂组合物。在光刻中使用感光性树脂组合物可减少后期显影烘烤时的挥发性残留物的形成。

6. 发明申请

US20110318692A1 PHOTOACTIVE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION CONTAINING THE SAME 有权
标题翻译：光敏化合物和含有它们的光敏树脂组合物
公开(公告)号：US20110318692A1
公开(公告)日：2011-12-29
申请号：US13147342
申请日：2010-02-12
申请人： Chang Ho Cho , Sung Hyun Kim , Raisa Kharbash , Keon Woo Lee , Dong Kung Oh , Won Jin Cung , Sang Kyu Kwak , Chang Soon Lee
发明人： Chang Ho Cho , Sung Hyun Kim , Raisa Kharbash , Keon Woo Lee , Dong Kung Oh , Won Jin Cung , Sang Kyu Kwak , Chang Soon Lee
IPC分类号： G03F7/031 , C07F9/40 , C07D209/86 , G03F7/032
CPC分类号： C07F9/5728 , C07D209/88 , C08F2/50 , G03F7/031 , Y10S430/106 , Y10S430/127
摘要： The present invention relates to a photoactive compound of a novel structure represented by Chemical Formula 1 below In Chemical Formula 1, R1 and R2, R3, and A are as defined in the specification, and a photosensitive resin composition comprising the same. The photoactive compound of the present invention comprises a nitro group and a phosphonate structure and thus exhibits excellent sensitivity through efficient absorption for UV light, excellent compatibility between the photoactive compound and the alkali-soluble binder resin, and an improved solubility of the photosensitive resin composition. Furthermore, the photosensitive resin composition of the present invention has excellent residual film thickness and mechanical strength characteristics and heat-resistant, chemical-resistant, and development-resistant properties. Accordingly, the photosensitive resin composition of the present invention is advantageous in hardening the column spacers of liquid crystal displays, an overcoat, and passivation materials and also advantageous in a high-temperature process characteristic.
摘要翻译：本发明涉及由化学式1化学式1表示的新结构的光敏化合物，其中R1，R2，R3，A如说明书中所定义，和含有该化合物的感光性树脂组合物。本发明的光活性化合物包括硝基和膦酸酯结构，因此通过有效吸收UV光，光活性化合物和碱溶性粘合剂树脂之间的相容性优异，并且改善了感光性树脂组合物的溶解性而显示出极好的灵敏度。此外，本发明的感光性树脂组合物具有优异的残留膜厚度和机械强度特性以及耐热，耐化学腐蚀和耐开发性能。因此，本发明的感光性树脂组合物有利于硬化液晶显示器的列间隔物，外涂层和钝化材料，并且在高温工艺特性中也是有利的。

7. 发明申请

US20100245732A1 COLOR FILTER SUBSTRATE 有权
标题翻译：彩色滤光片
公开(公告)号：US20100245732A1
公开(公告)日：2010-09-30
申请号：US12448879
申请日：2008-11-05
申请人： Keon Woo Lee , Sang Kyu Kwak , Jong Hwi Hwang , Beom Su Park , Chang Ho Cho , Sung Hyun Kim , Seung Hee Lee , Bog Ki Hong , Dong Kung Oh , Chang Soon Lee , Kyoung Hoon Min
发明人： Keon Woo Lee , Sang Kyu Kwak , Jong Hwi Hwang , Beom Su Park , Chang Ho Cho , Sung Hyun Kim , Seung Hee Lee , Bog Ki Hong , Dong Kung Oh , Chang Soon Lee , Kyoung Hoon Min
IPC分类号： G02F1/1335 , H01J1/02 , G02B5/20
CPC分类号： G02B5/223 , G02B5/201
摘要： A color filter substrate is provided. In the color filter substrate, transparent protective films are formed on respective sub-pixels of a color filter. The color filter substrate has improved electric field characteristics without the need for additional optical or circuit compensation to achieve an improvement in contrast and a reduction in color difference.
摘要翻译：提供滤色器基板。在滤色器基板中，在滤色器的各个子像素上形成透明保护膜。滤色器基板具有改善的电场特性，而不需要额外的光学或电路补偿来实现对比度的改善和色差的降低。

8. 发明授权

US08300184B2 Color filter substrate 有权
标题翻译：彩色滤光片基板
公开(公告)号：US08300184B2
公开(公告)日：2012-10-30
申请号：US12448879
申请日：2008-11-05
申请人： Keon Woo Lee , Sang Kyu Kwak , Jong Hwi Hwang , Beom Su Park , Chang Ho Cho , Sung Hyun Kim , Seung Hee Lee , Bog Ki Hong , Dong Kung Oh , Chang Soon Lee , Kyoung Hoon Min
发明人： Keon Woo Lee , Sang Kyu Kwak , Jong Hwi Hwang , Beom Su Park , Chang Ho Cho , Sung Hyun Kim , Seung Hee Lee , Bog Ki Hong , Dong Kung Oh , Chang Soon Lee , Kyoung Hoon Min
IPC分类号： G02F1/1335
CPC分类号： G02B5/223 , G02B5/201
摘要： A color filter substrate is provided. In the color filter substrate, transparent protective films are formed on respective sub-pixels of a color filter. The color filter substrate has improved electric field characteristics without the need for additional optical or circuit compensation to achieve an improvement in contrast and a reduction in color difference.
摘要翻译：提供滤色器基板。在滤色器基板中，在滤色器的各个子像素上形成透明保护膜。滤色器基板具有改善的电场特性，而不需要额外的光学或电路补偿来实现对比度的改善和色差的降低。

9. 发明授权

US08409782B2 Photoresist composition comprising photoinitiators, and transparent thin film and liquid crystal display device using the composition 有权
标题翻译：包含光引发剂的光致抗蚀剂组合物和使用该组合物的透明薄膜和液晶显示装置
公开(公告)号：US08409782B2
公开(公告)日：2013-04-02
申请号：US12674408
申请日：2009-06-22
申请人： Keon Woo Lee , Sung Hyun Kim , Sang Kyu Kwak , Dong Kung Oh , Chang Soon Lee , Chang Ho Cho , Kyoung Hoon Min
发明人： Keon Woo Lee , Sung Hyun Kim , Sang Kyu Kwak , Dong Kung Oh , Chang Soon Lee , Chang Ho Cho , Kyoung Hoon Min
IPC分类号： G03F7/00 , G03F7/004 , G03F7/027 , G03F7/028
CPC分类号： C08F4/38 , G02F1/13394 , G02F2001/133519 , G02F2001/13398 , G03F7/0007 , G03F7/0045 , G03F7/029 , G03F7/031
摘要： A photoresist composition is provided. The photoresist composition comprises two or more kinds of photoinitiators having different activation wavelengths whose difference is at least 20 nm. The photoresist composition has high sensitivity and forms a pattern whose thickness is easy to control depending on the exposure intensity through a slit or transflective mask. Further provided are a transparent thin film formed using the photoresist composition and a liquid crystal display device comprising the thin film.
摘要翻译：提供光致抗蚀剂组合物。光致抗蚀剂组合物包含具有不同激活波长的两种或更多种光引发剂，其差异为至少20nm。光致抗蚀剂组合物具有高灵敏度，并且根据通过狭缝或透反掩模的曝光强度形成其厚度易于控制的图案。还提供了使用光致抗蚀剂组合物形成的透明薄膜和包括该薄膜的液晶显示装置。

10. 发明申请

US20110287366A1 PHOTORESIST COMPOSITION COMPRISING PHOTOINITIATORS, AND TRANSPARENT THIN FILM AND LIQUID CRYSTAL DISPLAY DEVICE USING THE COMPOSITION 有权
标题翻译：包含光敏元件的光电组合物，透明薄膜和使用组合物的液晶显示装置
公开(公告)号：US20110287366A1
公开(公告)日：2011-11-24
申请号：US12674408
申请日：2009-06-22
申请人： Keon Woo Lee , Sung Hyun Kim , Sang Kyu Kwak , Dong Kung Oh , Chang Soon Lee , Chang Ho Cho , Kyoung Hoon Min
发明人： Keon Woo Lee , Sung Hyun Kim , Sang Kyu Kwak , Dong Kung Oh , Chang Soon Lee , Chang Ho Cho , Kyoung Hoon Min
IPC分类号： G03F7/028 , G03F7/038 , G03F7/004
CPC分类号： C08F4/38 , G02F1/13394 , G02F2001/133519 , G02F2001/13398 , G03F7/0007 , G03F7/0045 , G03F7/029 , G03F7/031
摘要： A photoresist composition is provided. The photoresist composition comprises two or more kinds of photoinitiators having different activation wavelengths whose difference is at least 20 nm. The photoresist composition has high sensitivity and forms a pattern whose thickness is easy to control depending on the exposure intensity through a slit or transflective mask. Further provided are a transparent thin film formed using the photoresist composition and a liquid crystal display device comprising the thin film.
摘要翻译：提供光致抗蚀剂组合物。光致抗蚀剂组合物包含具有不同激活波长的两种或更多种光引发剂，其差异为至少20nm。光致抗蚀剂组合物具有高灵敏度，并且根据通过狭缝或透反掩模的曝光强度形成其厚度易于控制的图案。还提供了使用光致抗蚀剂组合物形成的透明薄膜和包括该薄膜的液晶显示装置。

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