专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明专利

JP2006117526A Complex oxide sol and film-coated base material 有权
标题翻译：复合氧化物溶胶和薄膜基材料
公开(公告)号：JP2006117526A
公开(公告)日：2006-05-11
申请号：JP2005344810
申请日：2005-11-30
申请人： Catalysts & Chem Ind Co Ltd , 触媒化成工業株式会社
发明人： HIYOUHAKU YUJI , NISHIDA HIROYASU , KOMATSU MICHIO , YOSHITOME HIROO
IPC分类号： C01B33/12 , C01B33/14 , C01F7/00 , C03C17/25
摘要： PROBLEM TO BE SOLVED: To provide a sol in which complex oxide particulates of low refractive index are dispersed and to provide a base material for low reflection using the particulates of low refractive index to a coating film.
SOLUTION: In the complex oxide sol in which complex oxide colloidal particles consisting of silica and an inorganic oxide other than the silica and having 5-300 nm average particle size are dispersed in water and/or an organic solvent, the colloidal particles have fine pores in which a part of an element constituting the inorganic oxide is removed and its specific surface area is increased and also the particle surface are covered with a film and the refractive index is in a range of 1.36-1.44. The film is composed of silica.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种其中分散有低折射率的复合氧化物微粒的溶胶，并提供使用低折射率的微粒对涂膜的低反射率的基材。解决方案：在由二氧化硅和二氧化硅以外的平均粒径为5-300nm的二氧化硅组成的复合氧化物胶体粒子分散在水和/或有机溶剂中的复合氧化物溶胶中，胶体粒子具有除去构成无机氧化物的元素的一部分并且其比表面积增加并且颗粒表面被膜覆盖并且折射率在1.36-1.44的范围内的细孔。该膜由二氧化硅组成。版权所有（C）2006，JPO＆NCIPI

IPRDB

热门服务

关于我们

友情链接

联系方式