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1. 发明专利

JP2006023303A Image-forming system for emulating large-diameter scanner system 审中-公开
标题翻译：用于模拟大直径扫描仪系统的图像形成系统
公开(公告)号：JP2006023303A
公开(公告)日：2006-01-26
申请号：JP2005196588
申请日：2005-07-05
申请人： Carl Zeiss Sms Gmbh , カールツアイスエスエムエスゲゼルシャフトミットベシュレンクテルハフツング
发明人： GREIF-WUESTENBECKER JOERN , TOTZECK MICHAEL , STROESSNER ULRICH
IPC分类号： G01N21/956 , G03F1/08
CPC分类号： G03F7/70566 , G02B21/002 , G02B27/286 , G03F7/70666
摘要： PROBLEM TO BE SOLVED: To provide an optical image-forming system for test microscopes in which a lithography mask can inspect defects by the help of an inspection microscope having a large magnification although the lithography mask is in a structure that continues to shrink and at an image formation side NA of an image-forming system that continues to expand, and the real image of the scanner system can test errors by the emulation of especially a large-diameter scanner system for creating emulation having an appearing vector effect. SOLUTION: The image-forming system for emulating the large-diameter scanner system comprises an image-forming optical system, a detector, and an evaluation unit. An optical component having at least one polarization effect is arranged according to a selection for picking out diversified polarization components x, y, z for image formation radiation in an image formation optical path. The optical components having an intensity attenuation function can be brought into the image formation optical path. An image is captured by a detector for radiation components in which mask and/or sample images are polarized diversely for further guiding for further processing to the evaluation unit. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：为了提供用于测试显微镜的光学成像系统，其中光刻掩模可以借助具有大放大率的检查显微镜来检测缺陷，尽管光刻掩模处于继续收缩的结构并且在图像形成系统的图像形成侧NA继续扩展，并且扫描仪系统的真实图像可以通过特别是用于创建具有出现的矢量效应的仿真的大直径扫描器系统的仿真来测试误差。解决方案：用于模拟大直径扫描器系统的图像形成系统包括成像光学系统，检测器和评估单元。具有至少一种偏振效应的光学部件根据用于选择图像形成光路中的图像形成用射线的多种偏振分量x，y，z的选择来配置。具有强度衰减功能的光学部件可以被带入图像形成光路。由用于辐射成分的检测器捕获图像，其中掩模和/或样品图像被不同地偏振，以进一步引导以进一步处理到评估单元。版权所有（C）2006，JPO＆NCIPI

2. 发明专利

JP2006023307A Microscope focusing system, and method especially for inspecting mask for emulating high-aperture focusing system 有权
标题翻译：微观聚焦系统，特别是用于检测面罩模拟高光聚焦系统的方法
公开(公告)号：JP2006023307A
公开(公告)日：2006-01-26
申请号：JP2005199482
申请日：2005-07-08
申请人： Carl Zeiss Sms Gmbh , カールツアイスエスエムエスゲゼルシャフトミットベシュレンクテルハフツング
发明人： HARNISCH WOLFGANG , SCHERUEBL THOMAS , ROSENKRANZ NORBERT , SCHUSTER KARL-HEINZ , GREIF-WUESTENBECKER JOERN , TOTZECK MICHAEL , STROESSNER ULRICH , GRUNER TORALF , FELDMANN HEIKO
IPC分类号： G01N21/956 , G02B21/36
CPC分类号： G03F7/70566 , G02B5/3025 , G02B21/0016 , G03F7/70666 , Y10S359/90
摘要： PROBLEM TO BE SOLVED: To provide a method for especially inspecting a mask for emulating a microscope focusing system and a high-aperture focusing system, and to provide an optical focusing system for inspecting the defects of a lithography mask especially by the emulation of the high-aperture scanner system.
SOLUTION: The optical focusing system comprises a focusing optical system, a detector, and an evaluation unit. A polarization optical component is arranged in a focusing optical path for selecting diversified polarization components in focusing rays in the optical path for generating a diversified polarization state in illumination light, can be installed in the focusing optical path of an optical element having A polarization-dependent intensity attenuation function, and is recorded for each polarization ray component in which the focusing of masks or samples differs for each detector for sending to the evaluation unit. The defects of the lithography mask can be inspected, by utilizing an inspection microscope based on a proposed solution method. The actual image of the scanner system can be formed by emulating a vector effect that manifests itself.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种用于特别检查用于模拟显微镜聚焦系统和高孔径聚焦系统的掩模的方法，并且提供用于检查光刻掩模的缺陷的光学聚焦系统，特别是通过仿真的高光圈扫描仪系统。解决方案：光学聚焦系统包括聚焦光学系统，检测器和评估单元。偏振光学部件被布置在聚焦光路中，用于选择用于在照明光中产生多种偏振状态的光路中的聚焦光线中的多种偏振分量，可以安装在具有偏振相关性的光学元件的聚焦光路中强度衰减功能，并且针对每个用于发送给评估单元的每个检测器的掩模或样本的聚焦不同的每个偏振光分量被记录。可以通过使用基于提出的解决方法的检查显微镜来检查光刻掩模的缺陷。扫描仪系统的实际图像可以通过模拟自身显示的矢量效果来形成。版权所有（C）2006，JPO＆NCIPI

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