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1. 发明授权

US09268124B2 Microscope and method for characterizing structures on an object 有权
标题翻译：用于表征物体上的结构的显微镜和方法
公开(公告)号：US09268124B2
公开(公告)日：2016-02-23
申请号：US13908192
申请日：2013-06-03
申请人： Carl Zeiss SMS GmbH , Carl Zeiss AG
发明人： Holger Seitz , Thomas Frank , Thomas Trautzsch , Norbert Kerwien
IPC分类号： G02B21/16 , G02B21/00 , G02B21/36 , G02B21/06
CPC分类号： G02B21/0016 , G02B21/06 , G02B21/361 , G02B21/364 , G02B21/365
摘要： A microscope includes an illumination unit for illuminating a mask at a predetermined non-axial illumination angle, an imaging unit for imaging an aerial image of the mask within a predetermined defocus region, and an imaging field stop, in which as a result of the lateral displacement of the aerial image depending on the position within the defocus region and on the non-axial illumination angle, the opening of the imaging field stop is dimensioned such that the aerial image is either completely encompassed or circumferentially cut within the defocus region.A method for characterizing a mask having a structure includes illuminating the mask at at least one illumination angle using monochromatic illumination radiation such that a diffraction image of the structure is created, recording the diffraction image, establishing the intensities of the maxima of the adjacent orders of diffraction, and establishing an intensity ratio of the intensities.
摘要翻译：显微镜包括用于以预定的非轴向照明角度照射掩模的照明单元，用于在预定的散焦区域内对掩模的空间图像进行成像的成像单元和成像场停止，其中作为横向取决于散焦区域内的位置和非轴向照射角度的空间图像的位移，成像场停止件的开口的尺寸被设计成使得空间图像在散焦区域内完全包围或周向切割。用于表征具有结构的掩模的方法包括：使用单色照射辐射以至少一个照明角度照射掩模，使得产生该结构的衍射图像，记录衍射图像，建立相邻阶数的最大值的强度衍射，并建立强度的强度比。

2. 发明申请

US20130321609A1 MICROSCOPE AND METHOD FOR CHARACTERIZING STRUCTURES ON AN OBJECT 有权
标题翻译：用于表征对象结构的微观方法和方法
公开(公告)号：US20130321609A1
公开(公告)日：2013-12-05
申请号：US13908192
申请日：2013-06-03
申请人： Carl Zeiss AG , Carl Zeiss SMS GmbH
发明人： Holger Seitz , Thomas Frank , Thomas Trautzsch , Norbert Kerwien
IPC分类号： G02B21/00 , G02B21/36
CPC分类号： G02B21/0016 , G02B21/06 , G02B21/361 , G02B21/364 , G02B21/365
摘要： A microscope includes an illumination unit for illuminating a mask at a predetermined non-axial illumination angle, an imaging unit for imaging an aerial image of the mask within a predetermined defocus region, and an imaging field stop, in which as a result of the lateral displacement of the aerial image depending on the position within the defocus region and on the non-axial illumination angle, the opening of the imaging field stop is dimensioned such that the aerial image is either completely encompassed or circumferentially cut within the defocus region.A method for characterizing a mask having a structure includes illuminating the mask at at least one illumination angle using monochromatic illumination radiation such that a diffraction image of the structure is created, recording the diffraction image, establishing the intensities of the maxima of the adjacent orders of diffraction, and establishing an intensity ratio of the intensities.
摘要翻译：显微镜包括用于以预定的非轴向照明角度照射掩模的照明单元，用于在预定的散焦区域内对掩模的空间图像进行成像的成像单元和成像场停止，其中作为横向取决于散焦区域内的位置和非轴向照射角度的空间图像的位移，成像场停止件的开口的尺寸被设计成使得空间图像在散焦区域内完全包围或周向切割。用于表征具有结构的掩模的方法包括：使用单色照射辐射以至少一个照明角度照射掩模，使得产生该结构的衍射图像，记录衍射图像，建立相邻阶数的最大值的强度衍射，并建立强度的强度比。

3. 发明申请

US20150198798A1 EMULATION OF REPRODUCTION OF MASKS CORRECTED BY LOCAL DENSITY VARIATIONS 有权
标题翻译：仿真由局部密度变化校正的掩模
公开(公告)号：US20150198798A1
公开(公告)日：2015-07-16
申请号：US14594851
申请日：2015-01-12
申请人： Carl Zeiss SMS GmbH
发明人： Holger Seitz , Thomas Thaler , Ulrich Matejka , Thomas Rademacher
IPC分类号： G02B21/36 , G03F1/70 , G02B21/06 , G03F7/20 , G01N21/956 , G01N21/95 , G03F1/84 , G06T7/00
CPC分类号： G02B21/365 , G03F1/44 , G03F1/70 , G03F1/84
摘要： A method is provided for emulating the imaging of a scanner mask pattern to expose wafers via a mask inspection microscope, in which the mask was corrected by introducing scattering centers. The method includes determining a correlation between the first values of at least one characteristic of aerial images of the mask pattern as produced by a mask inspection microscope and the second values of the at least one characteristic of aerial images of the mask pattern as produced by a scanner, recording a first aerial image of the mask pattern with the mask inspection microscope, determining the first values of the at least one characteristic from the first aerial image, and determining the second values of the at least one characteristic of the first aerial image, using the correlation. A mask inspection microscope is also provided for emulating the imaging of a mask pattern of a scanner to expose wafers, in which the mask was corrected by introducing scattering centers.
摘要翻译：提供了一种用于模拟扫描仪掩模图案的成像以经由掩模检查显微镜曝光晶片的方法，其中通过引入散射中心校正掩模。该方法包括确定由掩模检查显微镜产生的掩模图案的至少一个特征的第一值与掩模图案的至少一个特征的第二值之间的相关性，如由扫描仪，用掩模检查显微镜记录掩模图案的第一空间图像，从第一空间图像确定至少一个特性的第一值，以及确定第一空间图像的至少一个特性的第二值，使用相关性。还提供了掩模检查显微镜，用于模拟扫描仪的掩模图案的成像以暴露晶片，其中通过引入散射中心校正掩模。

4. 发明授权

US10578881B2 Illumination optical unit for a metrology system and metrology system comprising such an illumination optical unit 有权
公开(公告)号：US10578881B2
公开(公告)日：2020-03-03
申请号：US16220212
申请日：2018-12-14
申请人： Carl Zeiss AG , Carl Zeiss SMT GmbH
发明人： Thomas Frank , Dirk Doering , Holger Seitz , Mario Laengle , Ulrich Matejka
IPC分类号： G02B27/09 , G02B26/08 , G03F1/84
摘要： An illumination optical unit serves for illuminating objects to be examined by a metrology system. The illumination optical unit has an optical pupil shaping assembly for generating a defined distribution of illumination angles of illumination light over an object field in which an object to be examined can be arranged. An optical field shaping assembly for generating a defined intensity distribution of the illumination light over the object field is disposed downstream of the pupil shaping assembly in the beam path of the illumination light. The field shaping assembly has at least one optical field shaping element arranged in the region of a pupil plane of the illumination optical unit. This results in an illumination optical unit which ensures an illumination which can be set in a defined manner with regard to an intensity distribution and an illumination angle distribution over the entire object field.

5. 发明授权

US10168539B2 Illumination optical unit for a metrology system and metrology system comprising such an illumination optical unit 有权
公开(公告)号：US10168539B2
公开(公告)日：2019-01-01
申请号：US15895210
申请日：2018-02-13
申请人： Carl Zeiss AG , Carl Zeiss SMT GmbH
发明人： Thomas Frank , Dirk Doering , Holger Seitz , Mario Laengle , Ulrich Matejka
IPC分类号： G02B27/09 , G02B26/08 , G03F1/84
摘要： An illumination optical unit serves for illuminating objects to be examined by a metrology system. The illumination optical unit has an optical pupil shaping assembly for generating a defined distribution of illumination angles of illumination light over an object field in which an object to be examined can be arranged. An optical field shaping assembly for generating a defined intensity distribution of the illumination light over the object field is disposed downstream of the pupil shaping assembly in the beam path of the illumination light. The field shaping assembly has at least one optical field shaping element arranged in the region of a pupil plane of the illumination optical unit. This results in an illumination optical unit which ensures an illumination which can be set in a defined manner with regard to an intensity distribution and an illumination angle distribution over the entire object field.

6. 发明申请

US20180173001A1 ILLUMINATION OPTICAL UNIT FOR A METROLOGY SYSTEM AND METROLOGY SYSTEM COMPRISING SUCH AN ILLUMINATION OPTICAL UNIT 审中-公开
公开(公告)号：US20180173001A1
公开(公告)日：2018-06-21
申请号：US15895210
申请日：2018-02-13
申请人： Carl Zeiss AG , Carl Zeiss SMT GmbH
发明人： Thomas Frank , Dirk Doering , Holger Seitz , Mario Laengle , Ulrich Matejka
IPC分类号： G02B27/09 , G02B26/08 , G03F1/84
CPC分类号： G02B27/0961 , G02B26/0833 , G02B27/0905 , G03F1/84
摘要： An illumination optical unit serves for illuminating objects to be examined by a metrology system. The illumination optical unit has an optical pupil shaping assembly for generating a defined distribution of illumination angles of illumination light over an object field in which an object to be examined can be arranged. An optical field shaping assembly for generating a defined intensity distribution of the illumination light over the object field is disposed downstream of the pupil shaping assembly in the beam path of the illumination light. The field shaping assembly has at least one optical field shaping element arranged in the region of a pupil plane of the illumination optical unit. This results in an illumination optical unit which ensures an illumination which can be set in a defined manner with regard to an intensity distribution and an illumination angle distribution over the entire object field.

7. 发明申请

US20190121145A1 ILLUMINATION OPTICAL UNIT FOR A METROLOGY SYSTEM AND METROLOGY SYSTEM COMPRISING SUCH AN ILLUMINATION OPTICAL UNIT 审中-公开
公开(公告)号：US20190121145A1
公开(公告)日：2019-04-25
申请号：US16220212
申请日：2018-12-14
申请人： Carl Zeiss AG , Carl Zeiss SMT GmbH
发明人： Thomas Frank , Dirk Doering , Holger Seitz , Mario Laengle , Ulrich Matejka
IPC分类号： G02B27/09 , G02B26/08
摘要： An illumination optical unit serves for illuminating objects to be examined by a metrology system. The illumination optical unit has an optical pupil shaping assembly for generating a defined distribution of illumination angles of illumination light over an object field in which an object to be examined can be arranged. An optical field shaping assembly for generating a defined intensity distribution of the illumination light over the object field is disposed downstream of the pupil shaping assembly in the beam path of the illumination light. The field shaping assembly has at least one optical field shaping element arranged in the region of a pupil plane of the illumination optical unit. This results in an illumination optical unit which ensures an illumination which can be set in a defined manner with regard to an intensity distribution and an illumination angle distribution over the entire object field.

8. 发明授权

US09904060B2 Illumination optical unit for a metrology system and metrology system comprising such an illumination optical unit 有权
公开(公告)号：US09904060B2
公开(公告)日：2018-02-27
申请号：US14311420
申请日：2014-06-23
申请人： Carl Zeiss AG , Carl Zeiss SMT GmbH
发明人： Thomas Frank , Dirk Doering , Holger Seitz , Mario Laengle , Ulrich Matejka
IPC分类号： G01J1/08 , G01J1/04 , G02B27/09 , G02B26/08 , G03F1/84
CPC分类号： G02B27/0961 , G02B26/0833 , G02B27/0905 , G03F1/84
摘要： An illumination optical unit serves for illuminating objects to be examined by a metrology system. The illumination optical unit has an optical pupil shaping assembly for generating a defined distribution of illumination angles of illumination light over an object field in which an object to be examined can be arranged. An optical field shaping assembly for generating a defined intensity distribution of the illumination light over the object field is disposed downstream of the pupil shaping assembly in the beam path of the illumination light. The field shaping assembly has at least one optical field shaping element arranged in the region of a pupil plane of the illumination optical unit. This results in an illumination optical unit which ensures an illumination which can be set in a defined manner with regard to an intensity distribution and an illumination angle distribution over the entire object field.

9. 发明申请

US20150001408A1 ILLUMINATION OPTICAL UNIT FOR A METROLOGY SYSTEM AND METROLOGY SYSTEM COMPRISING SUCH AN ILLUMINATION OPTICAL UNIT 有权
标题翻译：用于包含这样的照明光学单元的计量系统和计量系统的照明光学单元
公开(公告)号：US20150001408A1
公开(公告)日：2015-01-01
申请号：US14311420
申请日：2014-06-23
申请人： Carl-Zeiss AG
发明人： Thomas Frank , Dirk Doering , Holger Seitz , Mario Laengle , Ulrich Matejka
IPC分类号： G01J1/08 , G01J1/04
CPC分类号： G02B27/0961 , G02B26/0833 , G02B27/0905 , G03F1/84
摘要： An illumination optical unit serves for illuminating objects to be examined by a metrology system. The illumination optical unit has an optical pupil shaping assembly for generating a defined distribution of illumination angles of illumination light over an object field in which an object to be examined can be arranged. An optical field shaping assembly for generating a defined intensity distribution of the illumination light over the object field is disposed downstream of the pupil shaping assembly in the beam path of the illumination light. The field shaping assembly has at least one optical field shaping element arranged in the region of a pupil plane of the illumination optical unit. This results in an illumination optical unit which ensures an illumination which can be set in a defined manner with regard to an intensity distribution and an illumination angle distribution over the entire object field.
摘要翻译：照明光学单元用于通过计量系统照亮要检查的物体。照明光学单元具有光学瞳孔成形组件，用于在可以布置被检查物体的物场上产生照明光的照明角度的确定分布。用于产生在物场上的照明光的确定的强度分布的光场成形组件设置在照明光束的光束路径中的瞳孔成形组件的下游。场成形组件具有布置在照明光学单元的光瞳面的区域中的至少一个光场成形元件。这导致照明光学单元，其确保可以关于在整个物场上的强度分布和照射角度分布以规定的方式设置的照明。

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