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1. 发明专利

JP2010232633A Substrate supporting device, substrate processing apparatus, substrate supporting method, control program of substrate supporting device, and recording medium 有权
标题翻译：基板支持装置，基板处理装置，基板支持方法，基板支持装置的控制程序和记录介质
公开(公告)号：JP2010232633A
公开(公告)日：2010-10-14
申请号：JP2010007700
申请日：2010-01-18
申请人： Canon Anelva Corp , キヤノンアネルバ株式会社
发明人： MAJIMA KAZUYUKI , GOSHOKUBO GEN
IPC分类号： H01L21/677 , H01L21/683
CPC分类号： H01L21/67748 , H01L21/67712 , H01L21/67715 , H01L21/68707
摘要： PROBLEM TO BE SOLVED: To assure reliability of pallet holding and operation, and to improve productivity.
SOLUTION: A substrate supporting device has a pallet 8 for mounting a substrate 12, a pallet-ends holding mechanism 15 for holding the pallet at its both ends in the radial direction at the vertical situation of the pallet, a pallet-center holding mechanism 13 rotatably holding the pallet center, and a moving mechanism 11 for moving a device body. The pallet-ends holding mechanism holds both ends of the pallet in the radial direction from both ends in the thickness direction. The pallet-ends holding mechanism holds the pallet during moving; and the pallet is held by both the pallet-ends holding mechanism and the pallet-center holding mechanism, when the pallet is passed from the pallet-ends holding mechanism to the pallet-center holding mechanism. The pallet center is rotatably held by the pallet-center holding mechanism on processing the substrate, and the pallet-ends holding mechanism is released from its holding operation.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：确保托盘保持和操作的可靠性，并提高生产率。解决方案：基板支撑装置具有用于安装基板12的托板8，用于在托盘的垂直状态下沿托盘的两端保持托盘的托盘端保持机构15，托盘中心可移动地保持托盘中心的保持机构13和用于移动装置主体的移动机构11。托盘端部保持机构沿厚度方向从两端沿径向保持托盘的两端。托盘端部固定机构在移动过程中保持托盘; 并且当托盘从托盘端部保持机构传递到托盘中心保持机构时，托盘由托盘端部保持机构和托盘中心保持机构保持。在处理基板时，托盘中心由托盘中心保持机构可旋转地保持，并且托盘端部保持机构从其保持操作中解除。版权所有（C）2011，JPO＆INPIT

2. 发明专利

JP2012031504A Cooling apparatus and heating apparatus 有权
标题翻译：冷却装置和加热装置
公开(公告)号：JP2012031504A
公开(公告)日：2012-02-16
申请号：JP2011045872
申请日：2011-03-03
申请人： Canon Anelva Corp , キヤノンアネルバ株式会社
发明人： NISHIMURA HIDEKAZU , MAJIMA KAZUYUKI
IPC分类号： C23C14/34
CPC分类号： G11B5/8404 , F25B21/02 , F28C3/005 , F28F3/12 , H01L21/67109 , H01L21/67173
摘要： PROBLEM TO BE SOLVED: To provide a cooling apparatus capable of improving cooling efficiency and achieving high-speed cooling processing and to provide a heating apparatus capable of improving heating efficiency and achieving high-speed heating processing.SOLUTION: The cooling apparatus includes: a chamber 211; a substrate carrier 2 for holding a substrate 1, which is carried from a carry-out port of the chamber 211 into a stop position in the chamber 211 and carried out from a carry-out port of the chamber 211; a first cooling plate 3a and a second cooling plate 3b which are respectively arranged on both sides of the substrate carrier 2 carried into the stop position in the chamber 211; a gas discharge port 4 formed at least on either one of the first cooling plate 3a and the second cooling plate 3b to discharge gas to the substrate 1; a gas supply means for supplying gas to the gas discharge port 4; and a moving means for moving the first cooling plate 3a and the second cooling plate 3b so as to be close to the substrate carrier 2.
摘要翻译：要解决的问题：提供一种能够提高冷却效率和实现高速冷却处理的冷却装置，并提供能够提高加热效率并实现高速加热处理的加热装置。解决方案：冷却装置包括：室211; 用于保持基板1的基板载体2，其从室211的进出口运送到室211中的停止位置并从室211的进出口进行运送; 第一冷却板3a和第二冷却板3b分别布置在承载在室211中的停止位置的基板载体2的两侧; 至少形成在第一冷却板3a和第二冷却板3b中的任一个上的气体排出口4，以将气体排出到基板1; 用于向气体排出口4供给气体的气体供给装置; 以及用于使第一冷却板3a和第二冷却板3b靠近基板载体2移动的移动装置。（C）2012年，JPO和INPIT

3. 发明专利

JP2011046990A Voltage-applying device and substrate-treating apparatus 审中-公开
标题翻译：电压应用设备和基板处理设备
公开(公告)号：JP2011046990A
公开(公告)日：2011-03-10
申请号：JP2009195110
申请日：2009-08-26
申请人： Canon Anelva Corp , キヤノンアネルバ株式会社
发明人： MAJIMA KAZUYUKI
IPC分类号： C23C14/34 , G11B5/851
摘要： PROBLEM TO BE SOLVED: To provide a voltage-applying device which has an improved efficiency of voltage application to a substrate holder and can be stably used for a long period of time.
SOLUTION: The voltage-applying device includes: a vacuum treatment chamber; the substrate holder 20 provided in the vacuum treatment chamber; a power-feeding member 13 for applying voltage to the substrate holder; a diaphragm type power-feeding part 22 provided at a tip of the power-feeding member; and a movable mechanism 18 which is provided outside the vacuum treatment chamber and moves the power-feeding member so as to bring the diaphragm type power-feeding part into contact with the substrate holder or detach the part from the holder.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供一种电压施加装置，其具有提高的电压施加效率到基板保持器，并且可以长期稳定地使用。电压施加装置包括：真空处理室; 设置在真空处理室中的基板保持件20; 用于向基板保持器施加电压的供电部件13; 设置在供电部件的前端的隔膜式供电部22; 以及可动机构18，其设置在真空处理室的外部并移动供电部件，以使隔膜型供电部与基板保持器接触或将部件与保持件分离。版权所有（C）2011，JPO＆INPIT

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