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1. 发明申请

WO2018075247A1 WAFER-BASED LIGHT SOURCE PARAMETER CONTROL 审中-公开
标题翻译：基于晶圆的光源参数控制
公开(公告)号：WO2018075247A1
公开(公告)日：2018-04-26
申请号：PCT/US2017/055181
申请日：2017-10-04
申请人： CYMER, LLC
发明人： MASON, Eric Anders , ZURITA, Omar , RECHTSTEINER, Gregory Allen , CONLEY, Willard Earl
IPC分类号： G03F7/20
摘要： A photolithography method includes producing, from an optical source, a pulsed light beam; and scanning the pulsed light beam across a substrate of a lithography exposure apparatus to expose the substrate with the pulsed light beam including exposing each sub-area of the substrate with the pulsed light beam. A sub-area is a portion of a total area of the substrate. For each sub-area of the substrate, a lithography performance parameter associated with the sub-area of the substrate is received; the received lithography performance parameter is analyzed, and, based on the analysis, a first spectral feature of the pulsed light beam is modified and a second spectral feature of the pulsed light beam is maintained.
摘要翻译：光刻方法包括从光源产生脉冲光束; 以及在光刻曝光装置的衬底上扫描脉冲光束以用脉冲光束曝光衬底，包括用脉冲光束曝光衬底的每个子区域。子区域是基板总面积的一部分。对于衬底的每个子区域，接收与衬底的子区域相关联的光刻性能参数; 分析所接收的光刻性能参数，并且基于该分析，修改脉冲光束的第一光谱特征并保持脉冲光束的第二光谱特征。

2. 发明申请

WO2018075248A1 CONTROL OF A SPECTRAL FEATURE OF A PULSED LIGHT BEAM 审中-公开
标题翻译：脉冲光束的光谱特性控制
公开(公告)号：WO2018075248A1
公开(公告)日：2018-04-26
申请号：PCT/US2017/055182
申请日：2017-10-04
申请人： CYMER, LLC
发明人： CONLEY, Willard Earl , MASON, Eric Anders , THORNES, Joshua Jon
IPC分类号： H01S3/136 , H01S3/11 , H01S3/00 , H01S3/08 , H01S3/106 , H01L21/3065 , H01L21/66 , G03F7/20
CPC分类号： H01S3/136 , G03F7/70041 , G03F7/70141 , G03F7/70191 , G03F7/70575 , G03F7/7085 , H01L21/3065 , H01L22/20 , H01S3/0071 , H01S3/08004 , H01S3/08009 , H01S3/10046 , H01S3/106 , H01S3/11 , H01S3/137 , H01S3/225 , H01S3/2366
摘要： A spectral feature of a pulsed light beam produced by an optical source is controlled by a method. The method includes producing a pulsed light beam at a pulse repetition rate; directing the pulsed light beam toward a substrate received in a lithography exposure apparatus to expose the substrate to the pulsed light beam; modifying a pulse repetition rate of the pulsed light beam as it is exposing the substrate. The method includes determining an amount of adjustment to a spectral feature of the pulsed light beam, the adjustment amount compensating for a variation in the spectral feature of the pulsed light beam that correlates to the modification of the pulse repetition rate of the pulsed light beam. The method includes changing the spectral feature of the poised light beam by the determined adjustment amount as the substrate is exposed to thereby compensate for the variation in the spectral feature.
摘要翻译：由光源产生的脉冲光束的光谱特征由方法控制。该方法包括以脉冲重复率产生脉冲光束; 朝向在光刻曝光设备中接收的衬底引导脉冲光束以将衬底暴露于脉冲光束; 修改脉冲光束在曝光衬底时的脉冲重复率。该方法包括确定对脉冲光束的光谱特征的调整量，该调整量补偿与脉冲光束的脉冲重复率的修改相关的脉冲光束的光谱特征的变化。该方法包括在曝光衬底时将稳定光束的光谱特征改变确定的调整量，从而补偿光谱特征的变化。

3. 发明申请

WO2018075244A1 CONTROLLING FOR WAFER STAGE VIBRATION 审中-公开
标题翻译：控制晶片级振动
公开(公告)号：WO2018075244A1
公开(公告)日：2018-04-26
申请号：PCT/US2017/055141
申请日：2017-10-04
申请人： CYMER, LLC
发明人： VAN ADRICHEM, Paulus Jacobus Maria , CONLEY, Willard Earl , MASON, Eric Anders
IPC分类号： G03F7/20
摘要： A method includes producing a pulsed light beam; directing the pulsed light beam toward a substrate mounted to a stage of a lithography exposure apparatus; scanning a pulsed light beam and the substrate relative to each other, including projecting the pulsed light beam onto each sub- area of the substrate and moving one or more of the pulsed light beam and the substrate relative to each other; determining a value of a vibration of the stage for each sub-area of a substrate; for each sub-area of the substrate, determining an amount of adjustment to a bandwidth of die pulsed light beam, the adjustment amount compensating for a variation in the stage vibration so as to maintain a focus blur within a predetermined range of values across the substrate; and changing the bandwidth of the pulsed light beam by the determined adjustment amount to thereby compensate for the stage vibration variations.
摘要翻译：一种方法包括产生脉冲光束; 将脉冲光束导向安装到光刻曝光设备的台上的衬底; 相对于彼此扫描脉冲光束和衬底，包括将脉冲光束投射到衬底的每个子区域上并且使脉冲光束和衬底中的一个或多个相对于彼此移动; 确定基板的每个子区域的台架的振动值; 对于衬底的每个子区域，确定对脉冲光束的带宽的调整量，该调整量补偿台阶振动的变化，以便将聚焦模糊保持在整个衬底上的预定数值范围内 ; 并且将脉冲光束的带宽改变所确定的调整量，从而补偿台阶振动变化。

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