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    • 1. 发明申请
    • ION BEAM SAMPLE PREPARATION APPARATUS AND METHODS
    • 离子束样品制备装置和方法
    • WO2011130097A2
    • 2011-10-20
    • PCT/US2011/031649
    • 2011-04-08
    • COYLE, Steven ThomasHUNT, John Andrew
    • COYLE, Steven ThomasHUNT, John Andrew
    • G01N1/28H01J37/20
    • G01N1/32H01J37/31H01J2237/026H01J2237/2007H01J2237/3118
    • Disclosed are embodiments of an ion beam sample preparation apparatus and methods for using the embodiments. The apparatus comprises an ion beam irradiating means in a vacuum chamber that may direct ions toward a sample, a shield blocking a portion of the ions directed toward the sample, and a shield retention stage with shield retention means that replaceably and removably holds the shield in a position. The shield has datum features which abut complementary datum features on the shield retention stage when the shield is held in the shield retention stage. The shield has features which enable the durable adhering of the sample to the shield for processing the sample with the ion beam. The complementary datum features on both shield and shield retention stage enable accurate and repeatable positioning of the sample in the apparatus for sample processing and reprocessing.
    • 公开了用于使用实施例的离子束样品制备装置和方法的实施方案。 该装置包括在真空室中的离子束照射装置,其可以将离子定向到样品,阻挡部分朝向样品的离子的屏蔽件,以及具有屏蔽保持装置的屏蔽保持台,该屏蔽保持装置可替换地和可移除地将屏蔽保持在 一个位置。 当屏蔽保持在屏蔽保持阶段时,屏蔽具有与屏蔽保持平台上的辅助基准特征相交的基准特征。 屏蔽件具有能够将样品耐久地粘附到屏蔽件的特征,以用离子束处理样品。 屏蔽和屏蔽保持阶段的补充基准特征使得样品能够准确和可重复地定位在用于样品处理和再处理的设备中。