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1. 发明申请

WO2011019523A3 ROLL MECHANICS FOR ENABLING PRINTED ELECTRONICS 审中-公开
标题翻译：滚动打印电子的机械
公开(公告)号：WO2011019523A3
公开(公告)日：2011-06-23
申请号：PCT/US2010043904
申请日：2010-07-30
申请人： CORNING INC , GLAESEMANN GREGORY S , PRICE JAMES J , SABIA ROBERT , SHASHIDHAR NAGARAJA
发明人： GLAESEMANN GREGORY S , PRICE JAMES J , SABIA ROBERT , SHASHIDHAR NAGARAJA
IPC分类号： B41F17/14 , H01L21/60 , H05K3/12
CPC分类号： B41F9/003 , B41C1/04 , B41C1/05 , B41F13/21 , B41F13/22 , B41P2227/70
摘要： A print press system and a method are described herein that print an electronic circuit onto a material (e.g., glass substrate, plastic film, plastic film-glass substrate laminate). In exemplary applications, the print press system can print an electronic circuit onto a material to form, for instance, a flexible Liquid Crystal Display, a retail point of purchase sign and an e-book.
摘要翻译：本文描述了将电子电路打印到材料（例如，玻璃基板，塑料膜，塑料膜 - 玻璃基板层压板）上的印刷机系统和方法。在示例性应用中，印刷机系统可以将电子电路打印到材料上以形成例如柔性液晶显示器，购买标志的零售点和电子书。

2. 发明申请

WO2006060592A2 DEVICE COMPRISING LOW OUTGASSING PHOTO OR ELECTRON BEAM CURED RUBBERY POLYMER MATERIAL 审中-公开
标题翻译：包含低通量照相或电子束固化橡胶聚合物材料的装置
公开(公告)号：WO2006060592A2
公开(公告)日：2006-06-08
申请号：PCT/US2005043501
申请日：2005-11-29
申请人： CORNING INC , SHUSTACK PAUL J , COYKENDALL KELSEE L , DEWA PAUL G , SABIA ROBERT , SAUER DAVID C , SONI KAMAL K
发明人： SHUSTACK PAUL J , COYKENDALL KELSEE L , DEWA PAUL G , SABIA ROBERT , SAUER DAVID C , SONI KAMAL K
IPC分类号： H01L21/4763 , C08F255/02 , C08F279/02 , C08K3/00 , C08K5/00
CPC分类号： C08L15/00 , C08C19/02 , C08F255/00 , C08F255/02 , C08F279/02 , C08F290/06 , C08K3/013 , C08K5/0025 , C08L2666/02 , C09J4/06 , C09J123/02 , Y10T428/1059 , Y10T428/1082 , Y10T428/28 , Y10T428/2809 , Y10T428/2852 , Y10T428/287 , Y10T428/2878 , Y10T428/2883 , Y10T428/2891 , Y10T428/31855 , Y10T428/31938
摘要： Disclosed are photo or electron beam curable polymerizable compositions, and preparation thereof and devices containing such cured material. The composition contains completely or substantially completely hydrogenated hydrocarbon-based material completely free or substantially free of carbon-carbon double and triple bonds containing photo or electron beam curable terminal or pendant groups, low-outgassing photoinitiators, an optional viscosity adjustment component and an optional filler. The composition is visible light, UV or electron beam curable. It cures into a low-modulus, low outgassing polymer material. The composition can be used as an adhesive, sealant or lens potting material. It is ideal for use in lithographic tools and other optical devices involving deep or vacuum ultraviolet radiations, in particular, as lens potting materials for 248 nm, 193 nm and 157 nm lithographic tools, as well as other optical devices involving using high fluence irradiation.
摘要翻译：公开了光或可电子束固化的可聚合组合物及其制备方法和包含这种固化材料的装置。该组合物包含完全或基本上完全氢化的烃基材料，其完全自由或基本上不含含有光或电子束可固化末端或侧基的碳 - 碳双键和三键，低脱气光引发剂，任选的粘度调节组分和任选的填料。组合物是可见光，UV或电子束可固化。它固化成低模量，低脱气聚合物材料。该组合物可用作粘合剂，密封剂或透镜灌封材料。它非常适用于涉及深度或真空紫外线辐射的光刻工具和其他光学器件，特别是248 nm，193 nm和157 nm光刻工具的透镜灌封材料，以及涉及使用高能量照射的其他光学器件。

3. 发明申请

WO2009017634A3 CLEANING METHOD FOR DUV OPTICAL ELEMENTS TO EXTEND THEIR LIFETIME 审中-公开
标题翻译：用于DUV光学元件的清洁方法来延长寿命
公开(公告)号：WO2009017634A3
公开(公告)日：2010-03-04
申请号：PCT/US2008008934
申请日：2008-07-23
申请人： CORNING INC , CANGEMI MICHAEL J , FENG JIANGWEI , HAYDEN CINDY J , SABIA ROBERT , SCHREIBER HORST , WANG JUE
发明人： CANGEMI MICHAEL J , FENG JIANGWEI , HAYDEN CINDY J , SABIA ROBERT , SCHREIBER HORST , WANG JUE
IPC分类号： B08B3/12 , B08B7/00 , C30B33/00
CPC分类号： B08B3/12 , B08B7/0035 , B08B7/028 , B08B2203/005 , G02B1/02 , G02B1/105 , G02B1/14
摘要： The present invention" is directed to a process for coating at least one geometrically defined surface of an optical article's substrate, without generating optical defects, said surface forming a Fresnel lens (2) comprising: providing a removable plastic carrier (4) having a specific thickness and a specific base curvature, depositing a curable coating composition (3) onto either the at least one surface forming a Fresnel lens or the internal surface of the carrier, moving the carrier and the optical article relatively to each other to bring the deposited curable coating composition into contact with either the al least one surface forming a Fresnel lens or the internal surface of the carrier, applying a specific pressure onto the external surface of the carrier to spread out the curable coating composition so as to cover said at least one surface forming a Fresnel lens, curing the layer of curable coating composition and withdrawing the removalbe carrier
摘要翻译：本发明涉及一种用于涂覆光学制品基底的至少一个几何限定的表面而不产生光学缺陷的方法，所述表面形成菲涅耳透镜（2），包括：提供具有特定的光学制品的可移除的塑料载体（4）将可固化涂料组合物（3）沉积在形成菲涅尔透镜或载体内表面的至少一个表面上，使载体和光学制品彼此相对移动以使沉积的可固化涂层组合物与形成菲涅尔透镜的至少一个表面或载体的内表面接触，向载体的外表面施加特定压力以展开可固化涂料组合物，以覆盖所述至少一个表面形成菲涅尔透镜，固化可固化涂料组合物层并取出去除载体

4. 发明专利

JP2004176053A Low-outgassing photo- or electron beam-curing rubbery polymeric material and preparation and use of the same 有权
公开(公告)号：JP2004176053A
公开(公告)日：2004-06-24
申请号：JP2003378133
申请日：2003-11-07
申请人： Corning Inc , コーニングインコーポレイテッド
发明人： SHUSTACK PAUL J , SABIA ROBERT , DEWA PAUL G , KELSEE L COYKENDALL , SAUER DAVID CHARLES , SONI KAMAL KISHORE
IPC分类号： G02B1/04 , C08F255/02 , C08F279/02 , C08F290/04 , C08F299/00 , C08G85/00 , C08J3/28 , C08K3/00 , C08K5/00 , C09D115/00 , C09D151/04 , C09J4/00 , C09J11/04 , C09J11/06 , C09J163/00 , C09K3/10
CPC分类号： C08J3/28 , C08C19/02 , C08F255/02 , C08F279/02 , C08F290/048 , C08K3/013 , C08K5/0025 , C08L83/04 , C08L15/00
摘要： PROBLEM TO BE SOLVED: To provide an adhesive material capable of forming a material having a low outgassing ratio, a low modulus of elasticity, and a low Tg.
SOLUTION: A composition substantially comprises a mixture, a blend or a reaction product formed out of a photo- or electron beam-curing material component, a photoinitiator/photosensitizer component, and, if necessary, a viscosity controlling component, and further, if necessary, an inert filler, wherein the photo- or electron beam-curing material component contains a hydrocarbon-based rubbery material which has completely or substantially completely no carbon-carbon double bond nor triple bond and is completely or substantially completely hydrogenated as a base material, the photoinitiator/photosensitizer component has substantially no volatility at room temperature and forms a photoreaction product having the volatility at the minimum level or not at all at the room temperature after exposed to chemical rays, the viscosity controlling component is solely polymerizable or copolymerizable with the photo- or electron beam-curing material component.
COPYRIGHT: (C)2004,JPO

5. 发明专利

JP2013257571A Duv optical elements 有权
标题翻译： DUV光学元件
公开(公告)号：JP2013257571A
公开(公告)日：2013-12-26
申请号：JP2013143334
申请日：2013-07-09
申请人： Corning Inc , コーニングインコーポレイテッド
发明人： MICHEAL J CANGEMI , JIEN WEI FON , CINDY J HAYDEN , SABIA ROBERT , SCHREIBER HORST , WANG JUE
IPC分类号： G02B1/02 , B08B3/12 , B08B7/00 , G02B1/10
CPC分类号： B08B3/12 , B08B7/0035 , B08B7/028 , B08B2203/005 , G02B1/02 , G02B1/105 , G02B1/14
摘要： PROBLEM TO BE SOLVED: To provide a method of preparing an optical material with improved durability to withstand excimer lasers.SOLUTION: The invention is directed to a method for cleaning surfaces of an optical element made of a single crystal metal fluoride of chemical formula MF, where M is calcium, barium, magnesium, strontium or mixtures thereof, prior to a process of coating the elements with films of protective materials. The method has at least the steps of: (a) immersing the optical element of the single crystal MFin at least one selected liquid, utilizing sonication at megasonic frequencies to remove particulates, and polishing slurry residue and the damaged top layer of the optical element; (b) cleaning in a gas phase cleaning process to remove hydrocarbons from the surface of the optical element using UV/ozone cleaning; and (c) exposing, in a gas phase process, of the surface of the optical element to low-energy plasma containing argon and oxygen in a vacuum environment.
摘要翻译：要解决的问题：提供一种制备具有耐受准分子激光器的耐久性的光学材料的方法。解决方案：本发明涉及一种清洁由化学式MF的单晶金属氟化物制成的光学元件的表面的方法，在用保护材料的膜涂覆元件之前，其中M是钙，钡，镁，锶或其混合物。该方法至少具有以下步骤：（a）使用超声波以超声波频率将单晶MFin的光学元件浸入至少一种选定的液体中以除去微粒，并抛光浆料残留物和损伤的光学元件的顶层; （b）使用UV /臭氧清洗在气相清洗过程中清洗从光学元件的表面除去碳氢化合物; 和（c）在气相工艺中，在真空环境中将光学元件的表面暴露于含有氩和氧的低能量等离子体。

6. 发明专利

JP2001085371A GLAZING ABRASIVE FOR COLLOIDAL SILLICA 失效
公开(公告)号：JP2001085371A
公开(公告)日：2001-03-30
申请号：JP2000228832
申请日：2000-07-28
申请人： CORNING INC
发明人： SABIA ROBERT , STEVENS HARRIE JAMES
IPC分类号： B24B37/00 , C03C19/00 , C09G1/02 , C09K3/14 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To accelerate removing speed by reducing damages on a surface to be polished, in a method for finish polishing a silica substrate. SOLUTION: A method for finish polishing a silica substrate comprises a step of providing the substrate, a step of first polishing the surface of the substrate to a range of surface roughness Ra to 6 to 10 Å by using an aqueous solution containing at least one type of metal oxide abrasive, and a step of further grinding the surface of the substrate to the roughness Ra to about 5 Åor less, by using the aqueous solution containing a colloidal silica soot having a mean particle size of 50 to 500 nm.

7. 发明专利

JP2014102507A Colloidal silica finishing of metal fluoride optical components 审中-公开
标题翻译：金属氟化物光学组件的胶体二氧化硅修饰
公开(公告)号：JP2014102507A
公开(公告)日：2014-06-05
申请号：JP2013256893
申请日：2013-12-12
申请人： Corning Inc , コーニングインコーポレイテッド
发明人： FENG JIANGWEI , PHUNG MAI , SABIA ROBERT
IPC分类号： G02B1/02 , C30B29/12
CPC分类号： B24B13/00 , G02B1/02 , G02B27/0006 , Y10T428/268
摘要： PROBLEM TO BE SOLVED: To provide an optical component that eliminates a degradation problem or greatly enhances the durability to extend the period of service.SOLUTION: An alkaline earth metal fluoride single crystal optic comprises a single crystal optic made of an alkaline earth metal fluoride selected from the group consisting of MgF, CaF, BaFand SrF, and mixtures thereof. The optic has a polished but unetched surface roughness of less than 0.5 nm rms and a polished and etched surface roughness of less than 0.5 nm rms, where the polished but unetched surface is substantially free of a precipitated Bielby layer.
摘要翻译：要解决的问题：提供消除劣化问题的光学部件或大大提高耐久性以延长使用寿命。解决方案：碱土金属氟化物单晶光学器件包括由选择的碱土金属氟化物制成的单晶光学器件由MgF，CaF，BaF和SrF组成的组及其混合物。光学元件具有小于0.5nm均方根的抛光但未蚀刻的表面粗糙度以及小于0.5nm均方根的抛光和蚀刻表面粗糙度，其中抛光但未蚀刻的表面基本上不含沉淀的Bielby层。

8. 发明专利

JP2004131373A Method of manufacturing silica and titania extreme ultraviolet ray optical element 审中-公开
标题翻译：制造二氧化硅和钛金刚石超紫外线光学元件的方法
公开(公告)号：JP2004131373A
公开(公告)日：2004-04-30
申请号：JP2003311023
申请日：2003-09-03
申请人： Corning Inc , コーニング・インコーポレーテッド
发明人： HRDINA KENNETH E , SABIA ROBERT
IPC分类号： G02B1/00 , C03B8/02 , C03B19/10 , C03B19/12 , C03B20/00 , C03C3/06
CPC分类号： C03C3/06 , C03B19/106 , C03B19/12 , C03B2201/42
摘要： PROBLEM TO BE SOLVED: To provide a method for manufacturing an ultra-low thermal expansion extreme ultraviolet ray element formed from glass containing silica and titania. SOLUTION: The ultra-low thermal expansion extreme ultraviolet ray element is manufactured by a step for providing water-soluble sol containing a silica powder containing titania, a step for forming gel-like silica body containing titania from the sol, in which titania is uniformly distributed, a step for obtaining a dry silica body containing titania by drying the gel, and a step for forming a glass material by heating the dry silica body containing titania to a sufficient temperature. COPYRIGHT: (C)2004,JPO
摘要翻译：解决的问题：提供一种由含有二氧化硅和二氧化钛的玻璃制成的超低热膨胀极紫外线元件的制造方法。解决方案：超低热膨胀极紫外线元件是通过提供含有二氧化钛的二氧化硅粉末的水溶性溶胶的步骤制造的，用于从溶胶中形成含有二氧化钛的凝胶状二氧化硅体的步骤，其中二氧化钛均匀分布，通过干燥凝胶获得含有二氧化钛的干燥二氧化硅体的步骤，以及通过将含有二氧化钛的干燥二氧化硅体加热到足够的温度来形成玻璃材料的步骤。版权所有（C）2004，JPO

9. 发明专利

JP2001077065A POLISHING OF MOLTEN SILICA USING COLLOID 失效
公开(公告)号：JP2001077065A
公开(公告)日：2001-03-23
申请号：JP2000228833
申请日：2000-07-28
申请人： CORNING INC
发明人： DARCANGELO CHARLES M , SABIA ROBERT , STEVENS HARRIE JAMES
IPC分类号： B24B37/00 , C09K3/14 , H01L21/302 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To make smooth the surface of a silica substrate in a method to finally polish the silica substrate. SOLUTION: The method to finally polish a silica substrate comprises a process to provide the silica substrate, a process wherein first the surface of the substrate is polished using an aqueous solution containing at least one kind of a metallic oxide polishing agent and the surface roughness Ra of the substrate is set in the range of about 6 to 10 Å, and moreover, a process wherein the surface of the substrate is polished using an alkailne aqueous solution containing a colloidal silica of a particle diameter of 500 nm or shorter to set the surface roughness Ra in the range of 5 Å or shorter.

10. 发明专利

JP2010089251A Colloidal silica finishing for metal fluoride optical component 有权
标题翻译：金属氟化物光学部件的胶体二氧化硅涂层
公开(公告)号：JP2010089251A
公开(公告)日：2010-04-22
申请号：JP2009196686
申请日：2009-08-27
申请人： Corning Inc , コーニングインコーポレイテッド
发明人： FENG JIANGWEI , PHUNG MAI , SABIA ROBERT
IPC分类号： B24B37/00 , B08B3/08 , B08B3/12 , G02B1/02 , G02B3/00
CPC分类号： B24B13/00 , G02B1/02 , G02B27/0006 , Y10T428/268
摘要： PROBLEM TO BE SOLVED: To considerably improve durability of an optical component so as to solve a deterioration problem of an optical component or to extend its use period. SOLUTION: A finishing method for an optical component made of alkaline earth metal fluoride and the optical component made of alkaline earth manufactured by using the finishing method are provided. The finishing method used for the last polishing process uses polishing slurry made of colloidal silica including silica particles with a particle size of 500 nm or below in particular. Further, this finishing method can remove the whole silica residue on the polished optical component by using a megasonic cleaning process using a high PH-detergent cleaning solution after colloidal silica polishing. Surface roughness of the optical component polished by using the finishing method but is not etched yet is less than 0.5 nm, the surface roughness after polishing and etching is less than 0.6 nm, and step height of the surface roughness is less than 6 nm. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：为了显着提高光学部件的耐久性，以解决光学部件的劣化问题或延长其使用周期。解决方案：提供了一种由碱土金属氟化物制成的光学部件的精加工方法和通过使用精加工方法制造的由碱土制成的光学部件。用于最后抛光工艺的精加工方法使用由胶体二氧化硅制成的抛光浆料，其特别包括粒度为500nm以下的二氧化硅颗粒。此外，这种整理方法可以通过使用在胶体二氧化硅抛光后使用高PH洗涤剂清洁溶液的超声波清洗方法来除去抛光的光学部件上的全部二氧化硅残留物。使用精加工方法抛光但未被蚀刻的光学部件的表面粗糙度小于0.5nm，抛光和蚀刻后的表面粗糙度小于0.6nm，表面粗糙度的台阶高度小于6nm。版权所有（C）2010，JPO＆INPIT

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