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1. 发明专利

JP2004176053A Low-outgassing photo- or electron beam-curing rubbery polymeric material and preparation and use of the same 有权
公开(公告)号：JP2004176053A
公开(公告)日：2004-06-24
申请号：JP2003378133
申请日：2003-11-07
申请人： Corning Inc , コーニングインコーポレイテッド
发明人： SHUSTACK PAUL J , SABIA ROBERT , DEWA PAUL G , KELSEE L COYKENDALL , SAUER DAVID CHARLES , SONI KAMAL KISHORE
IPC分类号： G02B1/04 , C08F255/02 , C08F279/02 , C08F290/04 , C08F299/00 , C08G85/00 , C08J3/28 , C08K3/00 , C08K5/00 , C09D115/00 , C09D151/04 , C09J4/00 , C09J11/04 , C09J11/06 , C09J163/00 , C09K3/10
CPC分类号： C08J3/28 , C08C19/02 , C08F255/02 , C08F279/02 , C08F290/048 , C08K3/013 , C08K5/0025 , C08L83/04 , C08L15/00
摘要： PROBLEM TO BE SOLVED: To provide an adhesive material capable of forming a material having a low outgassing ratio, a low modulus of elasticity, and a low Tg.
SOLUTION: A composition substantially comprises a mixture, a blend or a reaction product formed out of a photo- or electron beam-curing material component, a photoinitiator/photosensitizer component, and, if necessary, a viscosity controlling component, and further, if necessary, an inert filler, wherein the photo- or electron beam-curing material component contains a hydrocarbon-based rubbery material which has completely or substantially completely no carbon-carbon double bond nor triple bond and is completely or substantially completely hydrogenated as a base material, the photoinitiator/photosensitizer component has substantially no volatility at room temperature and forms a photoreaction product having the volatility at the minimum level or not at all at the room temperature after exposed to chemical rays, the viscosity controlling component is solely polymerizable or copolymerizable with the photo- or electron beam-curing material component.
COPYRIGHT: (C)2004,JPO

2. 发明专利

DE102011086068A1 Messtechnik für eine Oberflächenverunreinigung 未知
公开(公告)号：DE102011086068A1
公开(公告)日：2012-05-10
申请号：DE102011086068
申请日：2011-11-10
申请人： CORNING INC
发明人： DEWA PAUL G
IPC分类号： G01N21/64 , G01M11/02
摘要： Die vorliegende Anmeldung ist gerichtet auf ein Verfahren zum Bestimmen der Beschaffenheit der Reinheit eines optischen Bauelements bevor eine Beschichtung auf der Oberfläche aufgebracht wird. Das Verfahren ist insbesondere für optische Bauteile und Bauelemente anwendbar, die für Verwendungen in den DUV-(tiefen Ultraviolett – deep ultraviolet) und EUV-(extremen Ultraviolett – extreme ultraviolet) Wellenlängenbereichen vorgesehen sind. Die Anmeldung kombiniert ein Reinigungsverfahren mit einer Verunreinigungs-Messtechnik unter Verwendung eines Spektrometers, um ein Verfahren bereitzustellen, das die Beschaffenheit der Reinheit der Bauelementoberfläche durch Messen des Fluoreszenzspektrums der Optik und Vergleichen des gemessenen Werts mit einer Standard- oder Referenz-Optik einer bekannten akzeptablen Reinheit bestimmt. Die Anmeldung ist ferner gerichtet auf eine Optik mit einer ausgewählten Beschichtung drauf, die gemäß dem hierin beschriebenen Verfahren gebildet ist.

5. 发明申请

WO2009029189A3 DEVICE FOR LASER PULSE CONDITIONING BY STRETCHING, DELAYING AND MODULATING 审中-公开
标题翻译：激光脉冲调制装置，通过拉伸，延迟和调制
公开(公告)号：WO2009029189A3
公开(公告)日：2009-07-02
申请号：PCT/US2008009895
申请日：2008-08-20
申请人： CORNING INC , COBB JOSHUA M , DEWA PAUL G
发明人： COBB JOSHUA M , DEWA PAUL G
IPC分类号： H01S3/00 , B23K26/06 , G02B27/09 , G02B27/10 , G02F1/01 , G03F7/20 , H01S3/106 , H01S3/107 , H01S3/225
CPC分类号： G03F7/70583 , G02F1/01 , G03F7/70025 , G03F7/70041 , H01S3/005 , H01S3/0057 , H01S3/0085
摘要： A light pulse conditioning.apparatus (30) has first and second curved reflective surfaces (12a, 12b) that share a common focus and a light-redirecting element (16) disposed between the first and second curved reflective surfaces to redirect a portion of an incident light beam (14) toward the second curved reflective surface (12b) as a delayed beam portion. A beam-shifting compensating element (24) is disposed between the first curved reflective surface (12a) and the light-redirecting element (16), for shifting the optical path of the delayed beam portion as it returns toward the light-redirecting element (16). Furthermore, the light conditioning apparatus (30) may have a measurement device (52) using a sensor (54) to detect the energy level of the light beam (14) from the pulset radiation source (38) and providing a signal to a controller (56) for a modulator element (34) of a modulator assembly (32). When the pulse power exceeds a value, the control loop (50) energizes the modulator element (34) to provide some level of attenuation.
摘要翻译：光脉冲调节装置（30）具有共享共同焦点的第一和第二弯曲反射表面（12a，12b）和设置在第一和第二弯曲反射表面之间的光重定向元件（16），以重定向一部分入射光束（14）作为延迟光束部分朝向第二弯曲反射表面（12b）。光束移动补偿元件（24）设置在第一弯曲反射表面（12a）和光重定向元件（16）之间，用于当延迟光束部分的光路朝向光重定向元件 16）。此外，光调节装置（30）可以具有使用传感器（54）的测量装置（52），以从脉冲辐射源（38）检测光束（14）的能级，并向控制器提供信号（56）用于调制器组件（32）的调制器元件（34）。当脉冲功率超过一个值时，控制回路（50）激励调制器元件（34）以提供一定程度的衰减。

6. 发明申请

WO2008088397A2 OPTICAL POWER MODULATION AT HIGH FREQUENCY 审中-公开
标题翻译：高频光功率调制
公开(公告)号：WO2008088397A2
公开(公告)日：2008-07-24
申请号：PCT/US2007018869
申请日：2007-08-28
申请人： CORNING INC , COBB JOSHUA M , DEWA PAUL G
发明人： COBB JOSHUA M , DEWA PAUL G
IPC分类号： G03B27/00 , G03B27/42 , G03B27/54
CPC分类号： G03B27/42 , G03F7/70041
摘要： An apparatus for providing a pulsed radiation beam has a radiation source providing a pulsed radiation beam at a constant pulse repetition frequency. A beam deflector in the path of the pulsed radiation beam is actuable to redirect the pulsed radiation beam cyclically towards each of a plurality of beam intensity modulators in turn. A beam recombiner combines modulated light from each of the plurality of beam intensity modulators in order to form the modulated pulsed radiation beam at the constant pulse repetition frequency.
摘要翻译：用于提供脉冲辐射束的装置具有以恒定脉冲重复频率提供脉冲辐射束的辐射源。在脉冲辐射束的路径中的光束偏转器可被致动以依次将脉冲辐射束循环地重定向到多个光束强度调制器中的每一个。光束重组器组合来自多个光束强度调制器中的每一个的调制光，以便以恒定脉冲重复频率形成调制的脉冲辐射束。

7. 发明申请

WO2006060592A2 DEVICE COMPRISING LOW OUTGASSING PHOTO OR ELECTRON BEAM CURED RUBBERY POLYMER MATERIAL 审中-公开
标题翻译：包含低通量照相或电子束固化橡胶聚合物材料的装置
公开(公告)号：WO2006060592A2
公开(公告)日：2006-06-08
申请号：PCT/US2005043501
申请日：2005-11-29
申请人： CORNING INC , SHUSTACK PAUL J , COYKENDALL KELSEE L , DEWA PAUL G , SABIA ROBERT , SAUER DAVID C , SONI KAMAL K
发明人： SHUSTACK PAUL J , COYKENDALL KELSEE L , DEWA PAUL G , SABIA ROBERT , SAUER DAVID C , SONI KAMAL K
IPC分类号： H01L21/4763 , C08F255/02 , C08F279/02 , C08K3/00 , C08K5/00
CPC分类号： C08L15/00 , C08C19/02 , C08F255/00 , C08F255/02 , C08F279/02 , C08F290/06 , C08K3/013 , C08K5/0025 , C08L2666/02 , C09J4/06 , C09J123/02 , Y10T428/1059 , Y10T428/1082 , Y10T428/28 , Y10T428/2809 , Y10T428/2852 , Y10T428/287 , Y10T428/2878 , Y10T428/2883 , Y10T428/2891 , Y10T428/31855 , Y10T428/31938
摘要： Disclosed are photo or electron beam curable polymerizable compositions, and preparation thereof and devices containing such cured material. The composition contains completely or substantially completely hydrogenated hydrocarbon-based material completely free or substantially free of carbon-carbon double and triple bonds containing photo or electron beam curable terminal or pendant groups, low-outgassing photoinitiators, an optional viscosity adjustment component and an optional filler. The composition is visible light, UV or electron beam curable. It cures into a low-modulus, low outgassing polymer material. The composition can be used as an adhesive, sealant or lens potting material. It is ideal for use in lithographic tools and other optical devices involving deep or vacuum ultraviolet radiations, in particular, as lens potting materials for 248 nm, 193 nm and 157 nm lithographic tools, as well as other optical devices involving using high fluence irradiation.
摘要翻译：公开了光或可电子束固化的可聚合组合物及其制备方法和包含这种固化材料的装置。该组合物包含完全或基本上完全氢化的烃基材料，其完全自由或基本上不含含有光或电子束可固化末端或侧基的碳 - 碳双键和三键，低脱气光引发剂，任选的粘度调节组分和任选的填料。组合物是可见光，UV或电子束可固化。它固化成低模量，低脱气聚合物材料。该组合物可用作粘合剂，密封剂或透镜灌封材料。它非常适用于涉及深度或真空紫外线辐射的光刻工具和其他光学器件，特别是248 nm，193 nm和157 nm光刻工具的透镜灌封材料，以及涉及使用高能量照射的其他光学器件。

8. 发明公开

EP1817390A4 DEVICE COMPRISING LOW OUTGASSING PHOTO OR ELECTRON BEAM CURED RUBBERY POLYMER MATERIAL 审中-公开
标题翻译：光或ELEKTRONENSTRAHLGEHÄRTETEM橡胶聚合物材料具有低脱气装置
公开(公告)号：EP1817390A4
公开(公告)日：2010-10-20
申请号：EP05852664
申请日：2005-11-29
申请人： CORNING INC
发明人： SHUSTACK PAUL J , COYKENDALL KELSEE L , DEWA PAUL G , SABIA ROBERT , SAUER DAVID C , SONI KAMAL K
IPC分类号： C09J149/00 , B32B25/00 , B32B25/04 , B32B25/08 , B32B27/00 , B32B27/04 , B32B27/16 , C08F255/02 , C08F279/02 , C08J3/28 , C08K3/00 , C08K5/00 , C09J107/00 , C09J109/00 , C09J113/00 , C09J119/00 , C09J121/00 , G02B1/10 , G02B1/12
CPC分类号： C08L15/00 , C08C19/02 , C08F255/00 , C08F255/02 , C08F279/02 , C08F290/06 , C08K3/013 , C08K5/0025 , C08L2666/02 , C09J4/06 , C09J123/02 , Y10T428/1059 , Y10T428/1082 , Y10T428/28 , Y10T428/2809 , Y10T428/2852 , Y10T428/287 , Y10T428/2878 , Y10T428/2883 , Y10T428/2891 , Y10T428/31855 , Y10T428/31938
摘要： Disclosed are photo or electron beam curable polymerizable compositions, and preparation thereof and devices containing such cured material. The composition contains completely or substantially completely hydrogenated hydrocarbon-based material completely free or substantially free of carbon-carbon double and triple bonds containing photo or electron beam curable terminal or pendant groups, low-outgassing photoinitiators, an optional viscosity adjustment component and an optional filler. The composition is visible light, UV or electron beam curable. It cures into a low-modulus, low outgassing polymer material. The composition can be used as an adhesive, sealant or lens potting material. It is ideal for use in lithographic tools and other optical devices involving deep or vacuum ultraviolet radiations, in particular, as lens potting materials for 248 nm, 193 nm and 157 nm lithographic tools, as well as other optical devices involving using high fluence irradiation.

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