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    • 2. 发明申请
    • A METHOD OF FABRICATING A NANOSTRUCTURE ON A PRE-ETCHED SUBSTRATE.
    • 在预蚀刻基板上制备纳米结构的方法。
    • WO2008012684A1
    • 2008-01-31
    • PCT/IB2007/002912
    • 2007-06-06
    • COMMISSARIAT A L'ENERGIE ATOMIQUEEBELS, UrsulaDIENY, BernardLESTELLE, DominiqueGAUTIER, Eric
    • EBELS, UrsulaDIENY, BernardLESTELLE, DominiqueGAUTIER, Eric
    • H01L23/528
    • B81C99/0085
    • The present invention relates to a method of fabricating a nanostructure, comprising the following steps: prestructuring a substrate (1) adapted to receive the nanostructure to form a nanorelief (2) on the substrate, the nanorelief having flanks (4) extending from a bottom (1a) of the substrate and a top face (3) extending from said flanks, and then depositing on the substrate prestructured in this way a single layer or multilayer coating intended to form the nanostructure; and further comprising: adding to the prestructured substrate or to the coating a separation layer adapted to enable separation of the coating and the substrate by external action of mechanical, thermomechanical or vibratory type; and exerting this external action on the substrate and/or the coating to recover selectively a top portion of the coating by separating it from the top face of the nanorelief so that this top portion constitutes some or all of the nanostructure.
    • 本发明涉及一种制造纳米结构的方法,包括以下步骤:预先构建适于接收纳米结构以在基底上形成纳米疏液(2)的基底(1),所述纳米凹槽具有从底部延伸的侧面(4) (1a)和从所述侧面延伸的顶面(3),然后沉积在预先结构化的基底上用于形成纳米结构的单层或多层涂层; 并且还包括:向预结构化基底或涂层施加适于通过机械,热机械或振动类型的外部作用分离涂层和基底的分离层; 并且在衬底和/或涂层上施加这种外部作用以通过将其从纳米壁的顶面分离而选择性回收涂层的顶部,使得该顶部构成一部分或全部纳米结构。