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1. 发明申请

WO2008040650A3 PHOTOCURABLE COMPOSITIONS COMPRISING A PHOTOINITIATOR OF THE PHENYLGLYOXYLATE TYPE 审中-公开
标题翻译：含有苯甲酸酯类型的光敏剂的可光性组合物
公开(公告)号：WO2008040650A3
公开(公告)日：2009-01-08
申请号：PCT/EP2007060093
申请日：2007-09-24
申请人： CIBA HOLDING INC , ROGERS JONATHAN , BENKHOFF JOHANNES , POWELL KARIN , JUNG TUNJA , DIETLIKER KURT , HAYOZ PASCAL , BIRBAUM JEAN-LUC , VOGEL THOMAS , HUESLER RINALDO
发明人： ROGERS JONATHAN , BENKHOFF JOHANNES , POWELL KARIN , JUNG TUNJA , DIETLIKER KURT , HAYOZ PASCAL , BIRBAUM JEAN-LUC , VOGEL THOMAS , HUESLER RINALDO
IPC分类号： G03F7/031 , C07C59/205 , C08F2/50 , G03F7/00 , G03F7/004 , G03F7/038
CPC分类号： G03F7/031 , C07C59/90 , C07C69/738 , C07C2601/10 , C07C2601/14 , C08F2/50 , G03F7/0045 , G03F7/038
摘要： The invention provides a uv-curable colored composition, comprising (a) at least one selected ethylenically unsaturated photopolymerizable compound; (b) at least one selected curing agent of the phenylglyoxylate type; and (c) at least one selected colorant.
摘要翻译：本发明提供了一种紫外线固化着色组合物，其包含（a）至少一种选择的烯属不饱和光聚合化合物; （b）至少一种选择的苯乙醛酸酯类固化剂; 和（c）至少一种选择的着色剂。

2. 发明申请

WO2006008251A3 PROCESS FOR THE PHOTOACTIVATION AND USE OF A CATALYST BY AN INVERTED TWO-STAGE PROCEDURE 审中-公开
标题翻译：通过反转的两阶段程序进行摄影和使用催化剂的方法
公开(公告)号：WO2006008251A3
公开(公告)日：2006-04-13
申请号：PCT/EP2005053299
申请日：2005-07-11
申请人： CIBA SC HOLDING AG , BENKHOFF JOHANNES , JUNG TUNJA , VALET ANDREAS , DIETLIKER KURT , SITZMANN EUGENE VALENTINE
发明人： BENKHOFF JOHANNES , JUNG TUNJA , VALET ANDREAS , DIETLIKER KURT , SITZMANN EUGENE VALENTINE
IPC分类号： B01J35/00 , B01J31/02 , B01J31/06 , C07D487/00 , C07D519/00 , G03F7/00
CPC分类号： B01J31/0239 , B01J31/0205 , B01J31/0217 , B01J31/0234 , B01J31/0268 , B01J31/06 , C08G18/10 , C08G18/2018 , C08G18/2063 , C08G18/4812 , C08G18/62 , C08G18/792 , C08G59/4064 , C08G59/686 , C08G2101/0008 , C08G2101/0083 , C09D11/101 , C09D163/00 , C09D175/04 , C09J163/00 , C09J175/04 , G03F7/0045 , C08G18/48
摘要： The invention pertains to a process for the application of a specific photolatent catalyst (a) wherein a composition of matter, comprising said catalyst, is subjected to irradiation before being further processed.
摘要翻译：本发明涉及应用特定光催化剂催化剂（a）的方法，其中包含所述催化剂的物质组合物在进一步加工之前经受照射。

3. 发明申请

WO2009095282A3 PHOTOLATENT AMIDINE BASES FOR REDOX CURING OF RADICALLY CURABLE FORMULATIONS 审中-公开
标题翻译：用于氧化固化的光固化胺基
公开(公告)号：WO2009095282A3
公开(公告)日：2009-11-12
申请号：PCT/EP2009050066
申请日：2009-01-06
申请人： BASF SE , STUDER KATIA , DIETLIKER KURT , JUNG TUNJA
发明人： STUDER KATIA , DIETLIKER KURT , JUNG TUNJA
IPC分类号： C08F2/50 , C07D487/04 , G03F7/031
CPC分类号： C08F2/50 , G03F7/031
摘要： The invention pertains to photolatent amidine bases for redox curing of radically curable formulations, that is a composition comprising (a1) a photolatent amidine base; or (a2) a photolatent amine base; or (a3) a mixture of (a1) and (a2); and (b) a radically polymerizable compound; and (c) a free radical initiator capable to be reduced by amines and/or amidines, in particular a peroxide.
摘要翻译：本发明涉及用于自由基可固化制剂的氧化还原固化的照相脒基，即包含（a1）光引发脒基的组合物; 或（a2）光致胺基; 或（a3）（a1）和（a2）的混合物; 和（b）自由基聚合性化合物; 和（c）能够被胺和/或脒，特别是过氧化物还原的自由基引发剂。

4. 发明申请

WO2008009575A3 METHOD OF BONDING 审中-公开
标题翻译：结合方法
公开(公告)号：WO2008009575A3
公开(公告)日：2008-03-27
申请号：PCT/EP2007056917
申请日：2007-07-09
申请人： CIBA SC HOLDING AG , STUDER KATJA , JUNG TUNJA , DIETLIKER KURT
发明人： STUDER KATJA , JUNG TUNJA , DIETLIKER KURT
IPC分类号： C08K5/34 , C09J5/00 , C09J175/04
CPC分类号： C08G18/3876 , C08G18/10 , C08G18/1841 , C08G18/2063 , C09J5/00 , C09J175/04 , C09J2475/00 , C08G18/40 , C08G18/6618
摘要： The invention relates to a first method of bonding a first substrate to a second substrate, comprising the steps of a) applying an UV-curable adhesive resin composition comprising a photolatent base to at least one transparent surface of at least one of said first and second substrates, b) bringing said first and second substrates together with said adhesive composition there between, c) exposing said adhesive composition to actinic radiation to effect curing or alternatively to a second method of bonding a first substrate to a second substrate, comprising the steps of a) applying a UV-curable adhesive resin composition comprising a photolatent base to one surface, b) exposing said adhesive composition to actinic radiation to effect curing, c) bringing said first and second substrates together with said adhesive composition there between.
摘要翻译：本发明涉及将第一衬底粘合到第二衬底的第一种方法，包括以下步骤：a）将包含光致变色基底的UV可固化粘合剂树脂组合物施加到所述第一和第二衬底中的至少一个的至少一个透明表面上衬底，b）将所述第一和第二衬底与其间的所述粘合剂组合物一起，c）将所述粘合剂组合物暴露于光化辐射以实现固化，或者替代地将第一衬底结合到第二衬底的第二种方法，包括以下步骤： a）将包含光致变色基底的UV可固化粘合剂树脂组合物施加到一个表面上，b）将所述粘合剂组合物暴露于光化辐射以进行固化，c）将所述第一和第二基底与其间的所述粘合剂组合物一起使用。

5. 发明申请

WO03033500B1 PHOTOACTIVABLE NITROGEN BASES 审中-公开
标题翻译：可摄氮
公开(公告)号：WO03033500B1
公开(公告)日：2003-12-11
申请号：PCT/EP0211238
申请日：2002-10-08
申请人： CIBA SC HOLDING AG , BAUDIN GISELE , DIETLIKER KURT , JUNG TUNJA
发明人： BAUDIN GISELE , DIETLIKER KURT , JUNG TUNJA
IPC分类号： C07D487/04 , C07D519/00 , C08F2/50 , C08G18/18 , C08G59/68 , C09D139/04 , G03F7/004 , G03F7/029 , G03F7/031
CPC分类号： C07D487/04 , B33Y70/00 , G03F7/0045 , G03F7/0295 , G03F7/031
摘要： Compounds of the formula I R7"N-R6 RS-C,N-R4 H C, R'/ I R, 3 R 2 (I) in which R, is an aromatic or heteroaromatic radical which is capable of absorbing light in the wave-length range from 200 nm to 650 nm and which is unsubstituted or substituted one or more times by C,-C,8alkyl, C2-C,ealkenyl, C2-C,8alkynyl, C,-C,ehaloalkyl, N02, NR,OR , CN, OR,2, SR,2, C(O)R,3, C(O)OR,4, halogen or a radical of the formula II R~-N' R6 1 R5-C,N.R4 H I C - R3 I R2 (II) and which on absorption brings about a photoelimination which leads to the generation of an amidine group, R2 and R3 independently of one another are hydrogen, C,-C,ealkyl or phenyl which is unsubstituted or is substituted one or more times by C,-C,8alkyl, CN, OR,2, SR,2, halogen or C,-C,ehaloalkyl; R5 is C,-C,ealkyl or NR8R9; R4, R6, R, R8, R9, R,o and R inde-pendently of one another are hydrogen or C,-C,8alkyl; or R4 and R6 together form a C2-C,2alkylene bridge which is unsubstituted or is substituted by one or more C1-C4alkyl radicals; or R5 and R,, independently of R4 and R6, together form a C2-C,2alkylene bridge which is unsubstituted or is substituted by one or more C1-C4alkyl radicals; or, if R5 is a radi-cal NR8R9, R, and R9 together form a C2-C,2alkylene bridge which is unsubstituted or is sub-stituted by one or more C1-C4alkyl radicals; and R,2, R,3 and R,4 independently of one another are hydrogen or C,-C,ealkyl; are suitable as photoinitiators for compounds which react under base catalysis.
摘要翻译：式I R7“N-R6RS-C，N-R4H HC，R'/ IR，3R2（I）的化合物，其中R 1是能够吸收波浪中的光的芳族或杂芳族基团，长度范围为200nm至650nm，其未被取代或被C 1 -C 8烷基，C 2 -C 6烯基，C 2 -C 8炔基，C 1 -C 8卤代烷基，N 2 NR，OR ，CN，OR，2，SR，2，C（O）R，3，C（O）OR 4，卤素或式II的基团R 1 -N'R 6 1 R 5 -C，N.R 4 HIC - R3 I R2（II），其吸收引起导致脒基的生成的光致游离，R 2和R 3彼此独立地是氢，C 1 -C 6烷基或未取代或被取代的苯基 C 1 -C 8烷基，CN，OR 2，SR 2，卤素或C 1 -C 8卤代烷基; R 5是C 1 -C 6烷基或NR 8 R 9; R 4，R 6，R 8，R 8，R 9 R，O和R彼此独立地是氢或C 1 -C 8烷基;或者R 4和R 6一起形成未被取代或被一个或多个C 1 -C 4烷基取代的C 2 -C 2亚烷基桥 ; 或R 5和R 7独立于R 4和R 6一起形成未被取代或被一个或多个C 1 -C 4烷基取代的C 2 -C 2亚烷基桥; 或者如果R 5是辐射级NR 8 R 9，则R 3和R 9一起形成未被取代或由一个或多个C 1 -C 4烷基取代的C 2 -C 2亚烷基桥; 和R，2，R 3和R 4彼此独立地是氢或C 1 -C 6烷基; 适用于在碱催化下反应的化合物的光引发剂。

6. 发明申请

WO2009095282A4 PHOTOLATENT AMIDINE BASES FOR REDOX CURING OF RADICALLY CURABLE FORMULATIONS 审中-公开
标题翻译：用于氧化固化的光固化胺基
公开(公告)号：WO2009095282A4
公开(公告)日：2010-01-14
申请号：PCT/EP2009050066
申请日：2009-01-06
申请人： BASF SE , STUDER KATIA , DIETLIKER KURT , JUNG TUNJA
发明人： STUDER KATIA , DIETLIKER KURT , JUNG TUNJA
IPC分类号： C08F2/50 , C07D487/04 , G03F7/031
CPC分类号： C08F2/50 , G03F7/031
摘要： The invention pertains to photolatent amidine bases for redox curing of radically curable formulations, that is a composition comprising (a1) a photolatent amidine base; or (a2) a photolatent amine base; or (a3) a mixture of (a1) and (a2); and (b) a radically polymerizable compound; and (c) a free radical initiator capable to be reduced by amines and/or amidines, in particular a peroxide.
摘要翻译：本发明涉及用于自由基可固化制剂的氧化还原固化的光潜脒碱，即包含（a1）光致脒基的组合物; 或（a2）光致胺基; 或（a3）（a1）和（a2）的混合物; 和（b）自由基聚合性化合物; 和（c）能够被胺和/或脒，特别是过氧化物还原的自由基引发剂。

7. 发明专利

JP2013136778A Additive composition improving storage stability of ethylenically unsaturated resin 审中-公开
标题翻译：添加剂组合物改善乙烯不饱和树脂的储存稳定性
公开(公告)号：JP2013136778A
公开(公告)日：2013-07-11
申请号：JP2013037296
申请日：2013-02-27
申请人： Ciba Holding Inc , チバホールディングインコーポレーテッドCiba Holding Inc.
发明人： JUNG TUNJA , VALET ANDREAS
IPC分类号： C08F2/40 , C08F290/06 , C08F2/38 , C08F2/50 , C08F4/00 , C08F283/00 , C08F290/00 , C08F291/00 , C08K5/1535 , C08L51/00 , C09D151/00 , C09D175/16 , G03F7/027
CPC分类号： C08L51/003 , C08F2/38 , C08F2/50 , C08F4/00 , C08F283/00 , C08F290/00 , C08F291/00 , C08K5/1535 , C09D151/003 , C09D175/16 , G03F7/027
摘要： PROBLEM TO BE SOLVED: To provide a stabilizer improving storage stability of an unsaturated polymer, oligomer and monomer to yellowing due to a UV ray effect.SOLUTION: The composition includes: (a1) at least one oligomer, co-oligomer, polymer or copolymer or a mixture thereof each having at least one ethylenically unsaturated bond; or (a2) a mixture of at least one ethylenically unsaturated monomer and at least one oligomer, co-oligomer, polymer or copolymer each having at least one ethylenically unsaturated bond; and (b) at least one stable sterically hindered nitroxyl free radical or at least one benzofuran-2-one type compound or a mixture of the two compounds.
摘要翻译：要解决的问题：提供一种改善不饱和聚合物，低聚物和单体的储存稳定性的稳定剂，由于紫外线效应而变黄。组合物包括：（a1）至少一种低聚物，共聚物，聚合物或共聚物或它们各自具有至少一个烯属不饱和键的混合物; 或（a2）至少一种烯键式不饱和单体和至少一种低聚物，共低聚物，聚合物或共聚物的混合物，它们各自具有至少一个烯属不饱和键; 和（b）至少一种稳定的空间位阻硝酰自由基或至少一种苯并呋喃-2-酮型化合物或两种化合物的混合物。

8. 发明专利

JP2013136780A Method of bonding 审中-公开
标题翻译：结合方法
公开(公告)号：JP2013136780A
公开(公告)日：2013-07-11
申请号：JP2013041096
申请日：2013-03-01
申请人： Ciba Holding Inc , チバホールディングインコーポレーテッドCiba Holding Inc.
发明人： STUDER KATJA , JUNG TUNJA , DIETLIKER KURT
IPC分类号： C09J201/00 , C07C225/16 , C09J5/00 , C09J11/06 , C09J175/04
CPC分类号： C08G18/3876 , C08G18/10 , C08G18/1841 , C08G18/2063 , C09J5/00 , C09J175/04 , C09J2475/00 , C08G18/40 , C08G18/6618
摘要： PROBLEM TO BE SOLVED: To provide a method of bonding which brings faster curing by exposure after lamination.SOLUTION: The method of bonding is a first method of bonding a first substrate to a second substrate, comprising the steps of: (a) applying a UV-curable adhesive resin composition comprising a photolatent base to at least one transparent surface of at least one of the first and second substrates; (b) bringing the first and second substrates together with the adhesive composition there between; and (c) exposing the adhesive composition to actinic radiation to effect curing. Alternatively, the method is a second method of bonding a first substrate to a second substrate, comprising the steps of: (a) applying a UV-curable adhesive resin composition comprising a photolatent base to one surface; (b) exposing the adhesive composition to actinic radiation to effect curing; and (c) bringing the first and second substrates together with the adhesive composition there between. The UV-curable adhesive is preferably of an OH/NCO or SH/NCO system.
摘要翻译：要解决的问题：提供一种接合方法，其在层压后通过曝光带来更快的固化。解决方案：接合方法是将第一基板结合到第二基板的第一种方法，包括以下步骤：（a）紫外线固化型粘合剂树脂组合物，其包含至少一个第一和第二基材中的一个的至少一个透明表面的光致变色基底; （b）将第一和第二基底与其间的粘合剂组合物一起; 和（c）将粘合剂组合物暴露于光化辐射以进行固化。或者，该方法是将第一基板粘合到第二基板的第二方法，包括以下步骤：（a）将包含光致变色基底的UV固化粘合剂树脂组合物施加到一个表面; （b）将粘合剂组合物暴露于光化辐射以进行固化; 和（c）使第一和第二基底与其间的粘合剂组合物一起。 UV可固化粘合剂优选为OH / NCO或SH / NCO体系。

9. 发明申请

WO03066687A2 SURFACE-ACTIVE PHOTOINITIATORS 审中-公开
标题翻译：表面活性光敏元件
公开(公告)号：WO03066687A2
公开(公告)日：2003-08-14
申请号：PCT/EP0300819
申请日：2003-01-28
申请人： CIBA SC HOLDING AG , BAUDIN GISELE , JUNG TUNJA
发明人： BAUDIN GISELE , JUNG TUNJA
IPC分类号： C07F7/08 , C08F2/46 , C08F2/48 , C08F12/00 , C08F20/00 , C08G77/14 , C08G77/38 , C08K5/5419 , C08L101/00 , C09D4/00 , C09D5/00 , C09D7/12
CPC分类号： C08F2/46 , C08G77/38 , C08K5/5419
摘要： Compounds of the formula la, Ib and Ic are suitable photoinitiators which accumulate at the surface of the formulation Ic, in which R, R1, and R2a are e.g.phenyl substituted by at least one siloxane group A-X-, Ra and R are e.g. phenylene is a surface-active radical of the formula III A3 is a radical of the formula III in which n is from 2 to 1000 X and X1 are -U-C3-C12cycloalkylene, -U-C6-C12bicycloalkylene, U-C3-C12cyclo-alkylene-Cl-C6alkylene, U-C6- C12bicycloalkylene-C,-C6alkylene- - or a group selected from -CH2a CH-CH2-OH or -CH2a O-CH2b-CH-CH2-OH I I O-CO-CH2b- O-CO-CH2c or -CH2a.-CHOH-CH2-O-CO-CH2b- or -CH2b-O-CH2a CHOH-CH2-O-CO-CH2c and U is e.g. -COO-, -CH2aC00- Y is hydrogen unsubstituted C1-C20alkyl or C1-C20alkyl substituted by A-X-. Y1 is e.g. C1-C12-alkylene.
摘要翻译：式Ia，Ib和Ic的化合物是在制剂Ic的表面积聚的合适的光引发剂，其中R，R 1和R 2a被例如被至少一个硅氧烷基团A-X，R a和R 4取代的苯基取代。亚苯基是式III的表面活性基团A3是式III的基团，其中n为2至1000个X，X 1为-U-C 3 -C 12亚环烷基，-U-C 6 -C 12二环烷基，U-C 3 -C 12环 - 亚烷基-C 1 -C 6亚烷基，U-C 6 -C 12亚环烷基-C 1 -C 6亚烷基 - 或选自-CH 2 CH-CH 2 -OH或-CH 2 O O-CH 2 b -CH-CH 2 -OH的O-CO-CH 2 b- O-CO-CH 2 C或-CH 2·CHOH-CH 2 -O-CO-CH 2 b-或-CH 2 b -O-CH 2 a CHOH-CH 2 -O-CO-CH 2 c，U是例如 -COO-，-CH2aC00-Y是未取代的未取代的C1-C20烷基或被A-X取代的C1-C20烷基。 Y1是例如 C1-C12亚烷基。

10. 发明申请

WO0214439A3 PROCESS FOR PRODUCING COATINGS USING SURFACE-ACTIVE PHOTOINITIATORS 审中-公开
标题翻译：使用表面活性光敏剂生产涂料的方法
公开(公告)号：WO0214439A3
公开(公告)日：2002-06-13
申请号：PCT/EP0109123
申请日：2001-08-07
申请人： CIBA SC HOLDING AG , BAUDIN GISELE , JUNG TUNJA
发明人： BAUDIN GISELE , JUNG TUNJA
IPC分类号： C07F7/18 , C07C69/738 , C07F7/08 , C08F2/48 , C08F2/50 , C08G77/14 , C08G77/38 , C09D4/00 , C09D4/06 , C09D5/00 , C09D7/06 , C09D7/12 , C09D183/10 , G03F7/029 , G03F7/031 , G03F7/075
CPC分类号： G03F7/0757 , B33Y70/00 , C07C69/738 , C08F2/50 , C09D4/06 , G03F7/029 , C08F290/067
摘要： Compounds of formula (I) in which r is a number 1 or 2; s is a number from 1 to 1000; R is radical of formula (II); or R is, for example, unsubstituted or substituted naphthyl, anthracyl, phenanthryl or a heterocyclic radical; R1, R2, R3, R4 and R5 independently of one another are, for example hydrogen; unsubstituted or substituted phenyl or C1-C12alkyl; A, if s is 1, is a surface-active radical of formula (III); or A, if s is 1, is a surface-active radical A0; or A, if s is a number greater than 1, is a radical of the formula (III) in which n corresponds to the number s, or A, if s is 2, is a radical A1; A0 is, for example, in each case unsubstituted or substituted C6-C30alkyl, C6-C30alkenyl, C6-C30alkynyl or C6-C30aralkyl; A1 is, for example, in each case unsubstituted or substituted C6-C30alkylene, C6-C30alkenylene, C6-C30alkynylene or C6-C30aralkylene; n is, for example, a number from 1 to 1000; m is a number from 0 to 100; p is a number 0-10000; x is a number from 1 to 10; Y, if r is 1, is a divalent group and Y, if r is 2, is a trivalent group, and Y, if A has the definition A0, is a single bond; G1, G2, R13, R14, R15, R16, R17, R18, R19, R20, R21 and R22 are, for exmple, C1-C18alkyl; are particularly suitable as photoinitiators which accumulate at the surface in a process for curing coatings.
摘要翻译：式（I）化合物，其中r为数1或2; s是从1到1000的数字; R是式（II）的基团; 或R为例如未取代或取代的萘基，蒽基，菲基或杂环基; R 1，R 2，R 3，R 4和R 5彼此独立地是例如氢; 未取代或取代的苯基或C 1 -C 12烷基; A，如果s为1，则为式（III）的表面活性基团; 或A，如果s为1，则为表面活性基团A0; 或A，如果s是大于1的数字，则是式（III）的基团，其中n对应于数字s，或者A如果s是2，则为基团A1; A0例如在每种情况下为未取代或取代的C 6 -C 30烷基，C 6 -C 30烯基，C 6 -C 30炔基或C 6 -C 30芳烷基; 例如，A1是未取代或取代的C 6 -C 30亚烷基，C 6 -C 30亚烯基，C 6 -C 30亚炔基或C 6 -C 30亚烷基; n例如为1〜1000的数; m是从0到100的数字; p是数字0-10000; x是从1到10的数字; Y如果r为1，则为二价基团，如果r为2，Y为三价基团，Y如果A为定义A0，则为单键; G1，G2，R13，R14，R15，R16，R17，R18，R19，R20，R21和R22优选为C1-C18烷基; 特别适用于在固化涂层的工艺中在表面积聚的光引发剂。

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