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1. 发明申请

WO2009014577A1 METHOD OF MAKING GLASS INCLUDING SURFACE TREATMENT WITH ALUMINUM CHLORIDE AT OR JUST PRIOR TO ANNEALING LEHR 审中-公开
标题翻译：包括氯化铝在表面处理的玻璃的方法或者在退火LEHR之前
公开(公告)号：WO2009014577A1
公开(公告)日：2009-01-29
申请号：PCT/US2008/006753
申请日：2008-05-29
申请人： CENTRE LUXEMBOURGEOIS DE RECHERCHES POUR LE VERRE ET LA CERAMIQUE S.A. (C.R.V.C.) , GUARDIAN INDUSTRIES CORP. , DISTELDORF, Bernd , DEN BOER, Willem
发明人： DISTELDORF, Bernd , DEN BOER, Willem
IPC分类号： C03C17/22 , C03C21/00 , C03C23/00
CPC分类号： C03C23/00 , C03C3/087 , C03C17/22 , C03C21/00 , C03C21/005 , C03C23/0095 , C03C2217/214
摘要： This invention relates to a method of making glass. A major surface (s) of the glass is treated with aluminum chloride (e.g., A1C13) at or just prior to the annealing lehr. The aluminum chloride treatment at or just prior to the annealing lehr, in either a float or patterned line glass making process, is advantageous in that it allows the treatment to be performed at a desirable glass temperature and permits exhaust functions in or proximate the annealing lehr to remove byproducts of the treatment in an efficient manner. In certain example embodiments, the glass may be polished for thinning after the treatment, with the polishing being performed on a major surface of the glass opposite to a major surface which has been treated with aluminum chloride.
摘要翻译：本发明涉及制造玻璃的方法。玻璃的主要表面在退火退火炉之前或之前用氯化铝（例如AlC13）处理。退火退火之前或之前的氯化铝处理在浮法或图案化线玻璃制造工艺中是有利的，因为其允许在期望的玻璃温度下进行处理，并允许退火退火炉中或其附近的废气功能以有效的方式去除治疗的副产物。在某些示例性实施例中，可以在处理之后对玻璃进行抛光以进行减薄，在与用氯化铝处理的主表面相对的玻璃的主表面上进行抛光。

2. 发明申请

WO2009145864A1 EMI FILTER FOR PLASMA DISPLAY PANEL 审中-公开
标题翻译：等离子显示面板的EMI滤波器
公开(公告)号：WO2009145864A1
公开(公告)日：2009-12-03
申请号：PCT/US2009/002559
申请日：2009-04-27
申请人： GUARDIAN INDUSTRIES CORP. , CENTRE LUXEMBOURGEOIS DE RECHERCHES POUR LE VERRE ET LA CERAMIQUE S.A. (C.R.V.C.) , LINGLE, Philip, J. , DIETRICH, Anton , LU, Yiwei , DEN BOER, Willem , VANDERPLOEG, John, A. , WANG, Yei-Ping, (Mimi), H.
发明人： LINGLE, Philip, J. , DIETRICH, Anton , LU, Yiwei , DEN BOER, Willem , VANDERPLOEG, John, A. , WANG, Yei-Ping, (Mimi), H.
IPC分类号： H05K9/00 , G02B1/11 , C03C17/36
CPC分类号： G02B1/00 , C03C17/36 , C03C17/3618 , C03C17/3626 , C03C17/3639 , C03C17/3652 , C03C17/3676 , G02B1/11 , G02B1/116 , G02B5/28 , H01J11/44 , H05K9/0096 , Y10T428/12549 , Y10T428/2495
摘要： A plasma display panel (PDP) includes an EMI filter at a front portion thereof for blocking/shielding substantial amounts of electromagnetic waves. The filters has high visible transmission, and is capable of blocking/shielding electromagnetic waves. In certain example embodiments, a silver based coating of the EMI filter reduces damage from EMI radiation through highly conductive Ag layers, blocks significant amounts of NIR and IR radiation from outdoor sunlight to reduce PDP panel temperature, and enhances contrast ratio through reduced reflection, while maintaining high visible transmission, hi certain example embodiments, at least one layer of or including silicon nitride may be Si-rich, and/or at least one layer including an oxide of Ni and/or Cr may be a suboxide, in order to improve heat treatability of the coated article.
摘要翻译：等离子体显示面板（PDP）在其前部包括用于阻挡/屏蔽大量电磁波的EMI滤波器。滤光片具有高可见透光率，能够阻挡/屏蔽电磁波。在某些示例性实施例中，EMI滤波器的基于银的涂层减少了通过高导电性Ag层的EMI辐射的损伤，阻挡了来自户外太阳光的大量NIR和IR辐射以降低PDP面板温度，并且通过减少的反射增强了对比度，同时在某些示例性实施例中，至少一层或包含氮化硅的层可以是富Si的，和/或包含Ni和/或Cr的氧化物的至少一层可以是低氧化物，以便改善涂层制品的热处理性。

3. 发明申请

WO2013002985A1 PLANAR PATTERNED TRANSPARENT CONTACT, DEVICES WITH PLANAR PATTERNED TRANSPARENT CONTACTS, AND/OR METHODS OF MAKING THE SAME 审中-公开
标题翻译：平面图形透明触点，具有平面图形透明触点的器件，和/或制造它们的方法
公开(公告)号：WO2013002985A1
公开(公告)日：2013-01-03
申请号：PCT/US2012/041208
申请日：2012-06-07
申请人： GUARDIAN INDUSTRIES CORP. , KRASNOV, Alexey , IMRAN, Muhammad , DEN BOER, Willem
发明人： KRASNOV, Alexey , IMRAN, Muhammad , DEN BOER, Willem
IPC分类号： H01L51/44 , H01L51/52 , G02F1/1343 , H05B33/28 , G06F3/045 , H01L33/40 , B32B17/10 , H01L31/0224 , C03C17/36
CPC分类号： H01L51/442 , C03C17/36 , C03C17/3644 , C03C17/3655 , C03C2218/322 , G06F3/044 , G06F3/045 , G06F2203/04103 , H01L31/1884 , H01L33/405 , H01L51/5215 , H01L51/5231 , H05B33/22 , Y02E10/549 , Y02P70/521
摘要： Certain examples relate to improved methods for making patterned substantially transparent contact films, and contact films made by such methods. In certain cases, the contact films may be patterned and substantially planar. Thus, the contact films may be patterned without intentionally removing any material from the layers and/or film, such as may be required by photolithography. In certain example embodiments, an oxygen exchanging system comprising at least two layers (13', 15, 17'), may be deposited on a substrate, and the layers may be selectively exposed to heat and/or energy (23)to facilitate the transfer of oxygen ions or atoms from the layer with a higher enthalpy of formation (17') to a layer with a lower enthalpy of formation (13'). In certain cases, the oxygen transfer may permit the conductivity of selective portions of the film (13') to be changed. This advantageously may result in a planar contact film that is patterned with respect to conductivity and/or resistivity.
摘要翻译：某些实例涉及用于制备图案化的基本上透明的接触膜的改进方法以及通过这些方法制备的接触膜。在某些情况下，接触膜可以被图案化并且基本上是平面的。因此，可以对接触膜进行图案化，而无需有意地从层和/或膜去除任何材料，例如通过光刻可能需要。在某些示例性实施例中，包括至少两个层（13'，15,17'）的氧交换系统可以沉积在衬底上，并且这些层可以选择性地暴露于热和/或能量（23）以便于将具有较高焓形成（17'）的层的氧离子或原子转移到具有较低的形成焓（13'）的层。在某些情况下，氧转移可以允许改变膜（13'）的选择性部分的导电性。这有利地导致相对于导电性和/或电阻率图案化的平面接触膜。

4. 发明申请

WO2012067639A2 PLASMA DISPLAY PANEL INCLUDING EMI FILTER, AND/OR METHOD OF MAKING THE SAME 审中-公开
标题翻译：包括EMI滤波器的等离子体显示面板和/或制造它们的方法
公开(公告)号：WO2012067639A2
公开(公告)日：2012-05-24
申请号：PCT/US2011/001865
申请日：2011-11-07
申请人： GUARDIAN INDUSTRIES CORP. , LINGLE, Philip, J. , DEN BOER, Willem
发明人： LINGLE, Philip, J. , DEN BOER, Willem
IPC分类号： H05K9/00
CPC分类号： H05K9/0096 , H05K9/0088
摘要： A plasma display panel (PDP) includes a frameless EMI filter supported by a glass substrate for blocking/shielding substantial amounts of electromagnetic waves, with the filter being supported by a side of the substrate opposite a viewer. In certain example embodiments, the PDP filter includes a transparent conductive coating (TCC) for electromagnetic interference (EMI) and near infrared (NIR) blocking without the need for a conductive, peripheral buss bar. Additionally, in certain example embodiments, the need for a conductive frame is reduced or eliminated. The filter has high visible transmission, and is capable of blocking/shielding electromagnetic waves.
摘要翻译：等离子体显示面板（PDP）包括由玻璃基板支撑的无框架EMI滤光器，用于阻挡/屏蔽大量的电磁波，滤光器由与观察者相对的基板的一侧支撑。在某些示例性实施例中，PDP滤波器包括用于电磁干扰（EMI）和近红外（NIR）阻挡的透明导电涂层（TCC），而不需要导电的外围总线。另外，在某些示例性实施例中，减少或消除对导电框架的需要。滤光片具有高可见透光率，能够阻挡/屏蔽电磁波。

5. 发明申请

WO2012044342A1 TRANSPARENT CONDUCTOR FILM STACK WITH CADMIUM STANNATE, CORRESPONDING PHOTOVOLTAIC DEVICE, AND METHOD OF MAKING THE SAME 审中-公开
标题翻译：具有CADMIUM STANNATE，相应的光伏器件的透明导体膜片及其制造方法
公开(公告)号：WO2012044342A1
公开(公告)日：2012-04-05
申请号：PCT/US2011/001053
申请日：2011-06-09
申请人： GUARDIAN INDUSTRIES CORP. , THOMSEN, Scott, V. , DEN BOER, Willem , LU, Yiwei
发明人： THOMSEN, Scott, V. , DEN BOER, Willem , LU, Yiwei
IPC分类号： H01L31/18 , H01L31/078 , H01L31/0224
CPC分类号： H01L31/0392 , H01L31/022466 , H01L31/03925 , H01L31/073 , Y02E10/543 , Y02P70/521
摘要： Certain example embodiments relate to a transparent conductor film stack with cadmium stannate used as a front contact layer and/or a buffer layer in a photovoltaic device or the like. The cadmium stannate-based layers may be provided between the front glass substrate and the semiconductor absorber film in a photovoltaic device (e.g., a CdS and/or CdTe based photovoltaic device). In certain example embodiments, the buffer layer based on cadmium stannate may have a higher resistivity than the transparent conductive oxide layer based on cadmium stannate. In certain example embodiments, one or more index matching layer(s) may be provided between the glass substrate and the layer(s) comprising cadmium stannate, e.g., to help overcome the optical mismatch between the glass substrate and the CdSnOx.
摘要翻译：某些示例性实施例涉及在光伏器件等中用作前接触层和/或缓冲层的锡酸镉的透明导体膜叠层。在光电器件（例如CdS和/或CdTe基光电器件）中，可以在前玻璃基板和半导体吸收膜之间设置锡酸镉基层。在某些示例性实施例中，基于锡酸镉的缓冲层可以具有比基于锡酸镉的透明导电氧化物层更高的电阻率。在某些示例性实施例中，可以在玻璃基板和包含锡酸镉的层之间提供一个或多个折射率匹配层，例如以帮助克服玻璃基板和CdSnOx之间的光学失配。

6. 发明申请

WO2010039341A2 FRONT ELECTRODE HAVING ETCHED SURFACE FOR USE IN PHOTOVOLTAIC DEVICE AND METHOD OF MAKING SAME 审中-公开
标题翻译：具有用于光伏器件的蚀刻表面的前电极及其制造方法
公开(公告)号：WO2010039341A2
公开(公告)日：2010-04-08
申请号：PCT/US2009/053978
申请日：2009-08-17
申请人： GUARDIAN INDUSTRIES CORP. , DEN BOER, Willem , KRASNOV, Alexey , VANDERPLOEG, John, A.
发明人： DEN BOER, Willem , KRASNOV, Alexey , VANDERPLOEG, John, A.
IPC分类号： H01L31/18 , H01L31/0224
CPC分类号： H01L31/1884 , H01L31/022466 , H01L31/0236 , Y02E10/50
摘要： Certain example embodiments of this invention relate to a photovoltaic (PV) device including an electrode such as a front electrode/contact, and a method of making the same. In certain example embodiments, the front electrode has a textured (e.g.. etched) surface that faces the photovoltaic semiconductor film of the PV device. In certain example embodiments, the front electrode is formed on a flat or substantially flat ( non- textured) surface of a glass substrate (e.g., via sputtering), and the surface of the front electrode is textured (e.g., via etching). In certain example embodiments, a combination of two or more different etchants can be used in order to provide the front electrode with a textured surface having at least two different feature sizes. In completing manufacture of the PV device, the etched surface of the front electrode faces the active semiconductor film of the PV device.
摘要翻译：本发明的某些示例性实施例涉及包括诸如前电极/触点的电极的光伏（PV）装置及其制造方法。在某些示例性实施例中，前电极具有面向PV器件的光电半导体膜的纹理（例如蚀刻）表面。在某些示例性实施例中，前电极形成在玻璃基板（例如，通过溅射）的平坦或基本上平坦（非纹理化的）表面上，并且前电极的表面是纹理化的（例如通过蚀刻）。在某些示例性实施例中，可以使用两种或更多种不同蚀刻剂的组合，以便为前电极提供具有至少两种不同特征尺寸的纹理表面。在完成PV器件的制造中，前电极的蚀刻表面面对PV器件的有源半导体膜。

7. 发明申请

WO2009073058A2 FRONT ELECTRODE INCLUDING TRANSPARENT CONDUCTIVE COATING ON PATTERNED GLASS SUBSTRATE FOR USE IN PHOTOVOLTAIC DEVICE AND METHOD OF MAKING SAME 审中-公开
标题翻译：在电光装置中使用的图案玻璃基板上的透明导电涂层的前电极及其制造方法
公开(公告)号：WO2009073058A2
公开(公告)日：2009-06-11
申请号：PCT/US2008/011093
申请日：2008-09-25
申请人： GUARDIAN INDUSTRIES CORP. , DEN BOER, Willem , LU, Yiwei
发明人： DEN BOER, Willem , LU, Yiwei
IPC分类号： H01L31/0224
CPC分类号： H01L31/022466 , H01L31/022483 , H01L31/0236 , H01L31/02366 , H01L31/048 , H01L31/1884 , Y02E10/50
摘要： This invention relates to a photovoltaic device including an electrode such as a front electrode/contact. In certain example embodiments, the front electrode of the photovoltaic device includes a multi-layered transparent conductive coating which is sputter-deposited on a textured surface of a patterned glass substrate. In certain example embodiments, a maximum transmission area of the substantially transparent conductive front electrode is located under a peak area of a quantum efficiency (QE) and/or QEx (photon flux of solar radiation) curve of the photovoltaic device and a light source spectrum used to power the photovoltaic device. In certain example embodiments, the front electrode includes a transparent conductive layer of or including one or more of (i) titanium zinc oxide doped with aluminum and/or niobium, and/or (ii) titanium niobium oxide.
摘要翻译：本发明涉及包括诸如前电极/触点的电极的光伏器件。在某些示例性实施例中，光伏器件的前电极包括多层透明导电涂层，其被溅射沉积在图案化玻璃衬底的纹理表面上。在某些示例性实施例中，基本上透明的导电前电极的最大透射面积位于光电器件的量子效率（QE）和/或QEx（太阳辐射的光子通量）曲线的峰面积和光源光谱用于为光伏器件供电。在某些示例性实施例中，前电极包括（i）掺杂有铝和/或铌的钛氧化锌和/或（ⅱ）铌氧化物中的一种或多种的透明导电层。

8. 发明申请

WO2008063255A1 FRONT ELECTRODE FOR USE IN PHOTOVOLTAIC DEVICE AND METHOD OF MAKING SAME 审中-公开
标题翻译：用于光伏器件的前电极及其制造方法
公开(公告)号：WO2008063255A1
公开(公告)日：2008-05-29
申请号：PCT/US2007/018361
申请日：2007-08-20
申请人： GUARDIAN INDUSTRIES CORP. , LU, Yiwei , DEN BOER, Willem
发明人： LU, Yiwei , DEN BOER, Willem
IPC分类号： H01L31/0224 , H01L31/18
CPC分类号： H01L31/022466 , H01L31/022483
摘要： This invention relates to a front electrode/contact for use in an electronic device such as a photovoltaic device. In certain example embodiments, the front electrode of a photovoltaic device or the like includes a multilayer coating including at least one transparent conductive oxide (TCO) layer (e.g., of or including a material such as tin oxide, zinc oxide, or the like) and/or at least one conductive substantially metallic IR reflecting layer (e.g., based on silver, gold, or the like). In certain example instances, the multilayer front electrode coating may include a plurality of metal(s) oxide layers and/or a plurality of conductive substantially metallic IR reflecting layers arranged in an alternating manner in order to provide for reduced visible light reflection, increased conductivity, and/or increased infrared (IR) reflection capability.
摘要翻译：本发明涉及用于诸如光伏器件的电子设备中的前电极/触点。在某些示例性实施例中，光伏器件等的前电极包括多层涂层，其包括至少一种透明导电氧化物（TCO）层（例如，由氧化锡，氧化锌等材料构成或包括诸如氧化锡，氧化锌等）和/或至少一个导电的基本上金属的IR反射层（例如，基于银，金等）。在某些示例中，多层前电极涂层可以包括多个金属氧化物层和/或以交替方式布置的多个导电的基本金属的IR反射层，以便提供减少的可见光反射，增加的导电性，和/或增加的红外（IR）反射能力。

9. 发明申请

WO2012044344A1 METHOD OF MAKING OXIDE THIN FILM TRANSISTOR ARRAY, AND DEVICE INCORPORATING THE SAME 审中-公开
标题翻译：制造氧化物薄膜晶体管阵列的方法和包括其的装置
公开(公告)号：WO2012044344A1
公开(公告)日：2012-04-05
申请号：PCT/US2011/001583
申请日：2011-09-14
申请人： GUARDIAN INDUSTRIES CORP. , DEN BOER, Willem
发明人： DEN BOER, Willem
IPC分类号： H01L21/336 , H01L29/786
CPC分类号： H01L29/78603 , H01L29/66969 , H01L29/7869
摘要： Certain example embodiments relate to methods of making oxide thin film transistor arrays (e.g., IGZO, amorphous or polycrystalline ZnO, ZnSnO, InZnO, and/or the like), and devices incorporating the same. Blanket layers of an optional barrier layer, semiconductor, gate insulator, and/or gate metal are disposed on a substrate. These and/or other layers may be deposited on a soda lime or borosilicate substrate via low or room temperature sputtering. These layers may be later patterned and/or further processed in making a TFT array according to certain example embodiments. In certain example embodiments, all or substantially all TFT processing may take place at a low temperature, e.g., at or below 150 degrees C, until a post-annealing activation step, and the post-anneal step may take place at a relatively low temperature (e.g., 200-250 degrees C).
摘要翻译：某些示例性实施例涉及制造氧化物薄膜晶体管阵列（例如，IGZO，非晶或多晶ZnO，ZnSnO，InZnO等）的方法以及包含其的器件。可选阻挡层，半导体，栅极绝缘体和/或栅极金属的毯层设置在基板上。这些和/或其它层可以通过低或室温溅射沉积在钠钙或硼硅酸盐衬底上。根据某些示例性实施例，这些层可以稍后被图案化和/或进一步处理以制造TFT阵列。在某些示例性实施例中，所有或基本上所有TFT处理可以在低温（例如，150℃或低于150℃）下进行，直到后退火激活步骤，并且后退火步骤可以在较低温度下进行（例如，200-250摄氏度）。

10. 发明申请

WO2011090468A3 HIGHLY-CONDUCTIVE AND TEXTURED FRONT TRANSPARENT ELECTRODE FOR A-SI THIN-FILM SOLAR CELLS, AND/OR METHOD OF MAKING THE SAME 审中-公开
公开(公告)号：WO2011090468A3
公开(公告)日：2011-07-28
申请号：PCT/US2010/003258
申请日：2010-12-28
申请人： GUARDIAN INDUSTRIES CORP. , KRASNOV, Alexey , DEN BOER, Willem
发明人： KRASNOV, Alexey , DEN BOER, Willem
IPC分类号： H01L31/18 , H01L31/0224 , C03C17/34
摘要： Certain example embodiments incorporate a "hybrid" design for the front electrode of solar cells, which advantageously combines naturally textured pyrolytic tin oxide and highly-conductive sputtered indium tin oxide (ITO). In certain example embodiments of this invention, a method of making a front electrode superstrate for a solar cell is provided. A glass substrate is provided. A layer of tin oxide is pyrolytically deposited on the glass substrate, with the layer of tin oxide being textured as a result of the pyrolytic deposition and with the layer of tin oxide being haze producing. A layer of indium tin oxide (ITO) is sputter-deposited on the layer of tin oxide, with the layer of ITO being generally conformal with respect to the layer of tin oxide. An amorphous silicon (a-Si) thin film layer stack is formed on the layer of ITO in making the front electrode superstrate.

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