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1. 发明申请

WO2005119368A2 SYSTEM FOR MEASURING THE IMAGE QUALITY OF AN OPTICAL IMAGING SYSTEM 审中-公开
标题翻译：用于测量光学成像系统的图像质量的系统
公开(公告)号：WO2005119368A2
公开(公告)日：2005-12-15
申请号：PCT/EP2005/005918
申请日：2005-06-02
申请人： CARL ZEISS SMT AG , MENGEL, Markus , WEGMANN, Ulrich , EHRMANN, Albrecht , EMER, Wolfgang , CLEMENT, Reiner , MATHIJSSEN, Ludo
发明人： MENGEL, Markus , WEGMANN, Ulrich , EHRMANN, Albrecht , EMER, Wolfgang , CLEMENT, Reiner , MATHIJSSEN, Ludo
IPC分类号： G03F7/20
CPC分类号： G01M11/0257 , G01M11/0214 , G01M11/0271 , G03F7/70341 , G03F7/70591 , G03F7/70716 , G03F7/70958 , Y10T428/31
摘要： A measuring system for the optical measurement of an optical imaging system, which is provided to image a pattern arranged in an object surface of the imaging system in an image surface of the imaging system, comprises an object-side structure carrier having an object-side measuring structure, to be arranged on the object side of the imaging system; an image-side structure carrier having an image-side measuring structure, to be arranged on the image side of the imaging system; the object-side measuring structure and the image-side measuring structure being matched to each other in such a way that, when the object-side measuring structure is imaged onto the image-side measuring structure with the aid of the imaging system, a superposition pattern is produced; and a detector for the locally resolving acquisition of the superposition pattern. The imaging system is designed as an immersion system for imaging with the aid of an immersion liquid. A structure carrier to be arranged in the region of the immersion liquid is assigned a protective system in order to increase the resistance of the measuring structure to degradation caused by the immersion liquid. A measurement of immersion systems under immersion conditions is thereby possible without detrimental influence of the immersion liquid on the measuring accuracy.
摘要翻译：一种用于光学成像系统的光学测量的测量系统，其被设置为对成像系统的图像表面中布置在成像系统的物体表面中的图案进行成像，包括：物体侧结构载体，其具有物体侧测量结构，被布置在成像系统的物体侧; 具有图像侧测量结构的图像侧结构载体，被布置在成像系统的图像侧; 物体侧测量结构和图像侧测量结构彼此匹配，使得当物体侧测量结构借助于成像系统成像到图像侧测量结构上时，叠加图案生产; 以及用于局部求解叠加图案的检测器。成像系统被设计为用于借助于浸没液体进行成像的浸没系统。布置在浸没液体区域中的结构载体被分配保护系统，以便增加测量结构对浸入液体引起的降解的阻力。因此，在浸没条件下的浸渍系统的测量可以在浸没液体对测量精度的不利影响的情况下进行。

2. 发明公开

EP1774405A2 SYSTEM FOR MEASURING THE IMAGE QUALITY OF AN OPTICAL IMAGING SYSTEM 有权
标题翻译：测量系统的光学成像系统的图像质量
公开(公告)号：EP1774405A2
公开(公告)日：2007-04-18
申请号：EP05754724.2
申请日：2005-06-02
申请人： Carl Zeiss SMT AG
发明人： MENGEL, Markus , WEGMANN, Ulrich , EHRMANN, Albrecht , EMER, Wolfgang , CLEMENT, Reiner , MATHIJSSEN, Ludo
IPC分类号： G03F7/20
CPC分类号： G01M11/0257 , G01M11/0214 , G01M11/0271 , G03F7/70341 , G03F7/70591 , G03F7/70716 , G03F7/70958 , Y10T428/31
摘要： A measuring system (100) for the optical measurement of an optical imaging system (150), which is provided to image a pattern arranged in an object surface (155) of the imaging system in an image surface (156) of the imaging system, comprises an object-side structure carrier (110) having an object-side measuring structure (111), to be arranged on the object side of the imaging system; an image-side structure carrier (120) having an image-side measuring structure (121), to be arranged on the image side of the imaging system; the object-side measuring structure and the image-side measuring structure being matched to each other in such a way that, when the object-side measuring structure is imaged onto the image-side measuring structure with the aid of the imaging system, a superposition pattern is produced; and a detector (130) for the locally resolving acquisition of the superposition pattern. The imaging system is designed as an immersion system for imaging with the aid of an immersion liquid (171). A structure carrier to be arranged in the region of the immersion liquid is assigned a protective system (125) in order to increase the resistance of the measuring structure to degradation caused by the immersion liquid. A measurement of immersion systems under immersion conditions is thereby possible without detrimental influence of the immersion liquid on the measuring accuracy.

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