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1. 发明申请

WO2007053586A3 REACTIVE SPUTTER DEPOSITION PROCESSES AND EQUIPMENT 审中-公开
公开(公告)号：WO2007053586A3
公开(公告)日：2007-05-10
申请号：PCT/US2006/042391
申请日：2006-10-31
申请人： CARDINAL CG COMPANY , HARTIG, Klaus , BERG, Soren , NYBERG, Tomas
发明人： HARTIG, Klaus , BERG, Soren , NYBERG, Tomas
IPC分类号： C23C14/00 , C23C14/34
摘要： The invention is a method for obtaining a reactive sputtering process with a reduced or eliminated hysteresis behavior. This is achieved by employing a target made from a mixture of metal and compound materials. In the method according to the present invention, the fraction of compound material is large enough to eliminate or significantly reduce the hysteresis behavior of the reactive sputtering process and enable a stable deposition of compound films at a rate significantly higher than what is possible from a target completely made from compound material.

2. 发明申请

WO2007044720A1 HIGH INFRARED REFLECTION COATINGS, THIN FILM COATING DEPOSITION METHODS 审中-公开
标题翻译：高红外反射涂层，薄膜涂层沉积方法
公开(公告)号：WO2007044720A1
公开(公告)日：2007-04-19
申请号：PCT/US2006/039564
申请日：2006-10-10
申请人： CARDINAL CG COMPANY , HARTIG, Klaus
发明人： HARTIG, Klaus
IPC分类号： C03C17/36
CPC分类号： E06B3/6715 , C03C17/36 , C03C17/3613 , C03C17/3626 , C03C17/3639 , C03C17/3644 , C03C17/3652 , C03C17/366 , C03C17/3681 , C03C2217/211 , C03C2217/216 , C03C2217/78 , C03C2218/153 , C03C2218/154 , C23C14/568 , E06B9/24 , E06B2009/2417 , Y10T428/24612 , Y10T428/24942 , Y10T428/2495 , Y10T428/24975 , Y10T428/31504
摘要： The invention provides low-emissivity coatings that are highly reflective of infrared radiation. The coating includes three infrared-reflection film regions, which may each comprise silver.
摘要翻译：本发明提供高反射红外辐射的低发射率涂层。该涂层包括三个红外反射膜区域，其可以各自包含银。

3. 发明申请

WO2007044344A2 METHOD AND APPARATUS FOR CYLINDRICAL MAGNETRON SPUTTERING USING MULTIPLE ELECTRON DRIFT PATHS 审中-公开
标题翻译：使用多个电子干燥器进行圆柱磁珠溅射的方法和装置
公开(公告)号：WO2007044344A2
公开(公告)日：2007-04-19
申请号：PCT/US2006/038662
申请日：2006-10-04
申请人： CARDINAL CG COMPANY , GERMAN, John, R. , HARTIG, Klaus
发明人： GERMAN, John, R. , HARTIG, Klaus
IPC分类号： C23C14/34 , C23C14/35 , H01J37/34
CPC分类号： C23C14/3407 , C23C14/35 , H01J37/3405 , H01J37/342 , H01J37/3461
摘要： A cylindrical cathode target assembly for use in sputtering target material onto a substrate comprises a generally cylindrical target, means for rotating the target about its axis during a sputtering operation, a magnetic array carried within the target for generation of a plasma-containing field including a plurality of electron drift paths adjacent an outer surface of the target, and a device for supporting the magnetic array independently of rotation of the target. In certain embodiments of the invention, the magnetic array may include a plurality of magnetic elements arranged to form a plurality of electron drift paths spaced along a substantial length of the target to promote generally uniform film deposition and uniform target utilization along its length.
摘要翻译：用于将目标材料溅射到衬底上的圆柱形阴极靶组件包括大致圆柱形的靶，用于在溅射操作期间使靶围绕其轴旋转的装置，用于产生包含等离子体的场的靶内的磁阵列与靶的外表面相邻的多个电子漂移路径，以及用于独立于靶的旋转而支撑磁阵列的装置。在本发明的某些实施例中，磁性阵列可以包括多个磁性元件，其被布置成形成沿靶的相当长度间隔开的多个电子漂移路径，以促进大体均匀的膜沉积并沿着其长度均匀的靶材利用。

4. 发明申请

WO2006121846A1 WINDOW ASSEMBLY MASKING BAG 审中-公开
标题翻译： WINDOW组装掩码袋
公开(公告)号：WO2006121846A1
公开(公告)日：2006-11-16
申请号：PCT/US2006/017389
申请日：2006-05-05
申请人： CARDINAL CG COMPANY , HARTIG, Klaus
发明人： HARTIG, Klaus
IPC分类号： E04G21/30
CPC分类号： E04G21/30 , B65D85/64 , B65D2585/649 , E06B7/28
摘要： The invention provides methods and equipment for storing and protecting window assemblies (16) . In certain embodiments, there is provided a bag (26,42,56,68,74) configured to hold a window assembly therein following the assembly's manufacture up until after the installation of the assembly (16) . The bag is configured to be sealed and to be form-fitted to the window assembly. As such, the likelihood of the bag allowing contaminants therein or catching on something and tearing is reduced. Following the installation of the window assembly (16) , a portion of the bag (26,42,56,68,74) is configured for removal from the exposed surfaces of the window assembly. A portion of the bag not removed is subsequently utilized as a protective barrier for the non-exposed surfaces of the window assembly. There is also provided a method for storing and protecting a window assembly using a bag of the described nature .
摘要翻译：本发明提供了用于存储和保护窗组件（16）的方法和设备。在某些实施例中，提供了一种配置成在组件的制造之后将窗户组件保持在其中直到安装组件（16）之后的袋（26,42,56,68,74）。该袋被配置为密封并与窗组件成形。因此，袋子允许其中的污染物或捕获物质和撕裂的可能性降低。在安装窗户组件（16）之后，袋（26,42,56,68,74）的一部分被配置为从窗组件的暴露表面移除。随后将未拆卸的袋的一部分用作窗组件的未暴露表面的保护屏障。还提供了一种使用所述性质的袋存储和保护窗户组件的方法。

5. 发明申请

WO2006028774A2 COATER HAVING INTERRUPTED CONVEYOR SYSTEM 审中-公开
标题翻译：具有中断输送机系统的涂料
公开(公告)号：WO2006028774A2
公开(公告)日：2006-03-16
申请号：PCT/US2005/030667
申请日：2005-08-29
申请人： CARDINAL CG COMPANY , HARTIG, Klaus
发明人： HARTIG, Klaus
IPC分类号： C23C14/56 , C03C25/12 , C03C25/22
CPC分类号： C23C14/0652 , C03C17/002 , C03C2218/365 , C23C14/086 , C23C14/10 , C23C14/185 , C23C14/56 , C23C14/568
摘要： Methods and coaters for applying films onto a substrate (e.g., a large-area glass substrate) are disclosed. Certain embodiments involve a coater for applying thin films onto a sheet-like substrate. The coater in some embodiments has a transport system adapted for conveying the substrate along a path of substrate travel extending through the coater. The substrate transport system in certain embodiments includes an upward coating deposition gap. The coater preferably has a source of coating material adapted for delivering coating material upwardly through such gap and onto a bottom major surface of the substrate as the substrate is conveyed along a desired portion of the path of substrate travel, which portion of the path of substrate travel extends over the upward coating deposition gap.
摘要翻译：公开了将膜施加到基板（例如，大面积玻璃基板）上的方法和涂布机。某些实施方案涉及用于将薄膜施加到片状基底上的涂布机。一些实施例中的涂布机具有适于沿着延伸穿过涂布机的基板行程的路径输送基板的输送系统。在某些实施方案中，基底输送系统包括向上的涂层沉积间隙。涂布机优选地具有涂层材料源，其适于将涂层材料向上输送通过这样的间隙并且在衬底沿衬底移动路径的期望部分输送衬底的底部主表面上，衬底的路径的哪个部分行进延伸超过向上的涂层沉积间隙。

6. 发明申请

WO2007047139A1 HIGH INFRARED REFLECTION COATINGS 审中-公开
标题翻译：高红外反射涂料
公开(公告)号：WO2007047139A1
公开(公告)日：2007-04-26
申请号：PCT/US2006/039032
申请日：2006-10-10
申请人： CARDINAL CG COMPANY , HARTIG, Klaus
发明人： HARTIG, Klaus
IPC分类号： C03C17/36
CPC分类号： E06B3/6715 , C03C17/36 , C03C17/3613 , C03C17/3626 , C03C17/3639 , C03C17/3644 , C03C17/3652 , C03C17/366 , C03C17/3681 , C03C2217/211 , C03C2217/216 , C03C2217/78 , C03C2218/153 , C03C2218/154 , C23C14/568 , E06B9/24 , E06B2009/2417 , Y10T428/24612 , Y10T428/24942 , Y10T428/2495 , Y10T428/24975 , Y10T428/31504
摘要： The invention provides low-emissivity coatings that are highly reflective of infrared radiation. The coating includes three infrared-reflection film regions, which may each comprise silver.
摘要翻译：本发明提供高反射红外辐射的低发射率涂层。该涂层包括三个红外反射膜区域，其可以各自包含银。

7. 发明申请

WO2006007504A1 CYLINDRICAL TARGET WITH OSCILLATING MAGNET FROM MAGNETRON SPUTTERING 审中-公开
标题翻译：从MAGNETRON SPUTTERING振荡磁铁的圆柱体目标
公开(公告)号：WO2006007504A1
公开(公告)日：2006-01-19
申请号：PCT/US2005/023059
申请日：2005-06-30
申请人： CARDINAL CG COMPANY , GENERAL PLASMA, INC. , HARTIG, Klaus , SMITH, Steve, E. , MADOCKS, John, E.
发明人： HARTIG, Klaus , SMITH, Steve, E. , MADOCKS, John, E.
IPC分类号： H01J37/34
CPC分类号： H01J37/3455 , H01J37/3405 , H01J37/3423 , H01J37/3497
摘要： In some embodiments, the invention includes a cylindrical cathode target assembly for use in sputtering target material onto a substrate that comprises a generally cylindrical target, mean for rotating the target about its axis during a sputtering operation, an elongated magnet carried within the target for generation of a plasma-containing magnetic field exterior to but adjacent the target, a framework for supporting the magnet against rotation within the target, and a power train for causing the magnet to oscillate within and axially of the target in a substantially asynchronous manner to promote generally uniform target utilization along its length, as well as its method of use. In some embodiments, the magnet is oscillated in response to rotation of the target.
摘要翻译：在一些实施例中，本发明包括用于将目标材料溅射到基板上的圆柱形阴极靶组件，其包括大致圆柱形的靶，意味着在溅射操作期间使靶绕其轴线旋转，在靶内携带的细长磁体产生位于目标外部但邻近目标的等离子体磁场，用于支撑磁体以防止目标内的旋转的框架和用于使磁体以基本上异步的方式在目标内部和轴向振荡的传动系，以促进一般沿其长度的均匀目标利用率及其使用方法。在一些实施例中，磁体响应于目标的旋转而振荡。

8. 发明申请

WO2004110947A1 CORROSION-RESISTANT LOW-EMISSIVITY COATINGS 审中-公开
标题翻译：耐腐蚀低电感涂层
公开(公告)号：WO2004110947A1
公开(公告)日：2004-12-23
申请号：PCT/US2004/018193
申请日：2004-06-08
申请人： CARDINAL CG COMPANY , HARTIG, Klaus
发明人： HARTIG, Klaus
IPC分类号： C03C17/36
CPC分类号： C03C17/3613 , C03C17/36 , C03C17/3618 , C03C17/3626 , C03C17/3639 , C03C17/3644 , C03C17/366 , C03C17/3681 , C03C2217/78 , Y10T428/24 , Y10T428/265
摘要： A corrosion-resistant low-emissivity coating is provided. The low-emissivity coating comprises, in sequence outwardly, a corrosion-resistant inner infrared-reflective layer, a transparent dielectric middle coat, and an outer infrared-reflective layer. The outer infrared-reflective layer consists essentially of silver and the corrosion-resistant inner infrared-reflective layer has a different composition than the outer infrared-reflective layer. Also provided are methods for depositing coatings of this nature, as well as substrates bearing these coatings.
摘要翻译：提供耐腐蚀的低辐射涂层。低辐射涂层依次向外包括耐腐蚀的内部红外反射层，透明电介质中间涂层和外部红外反射层。外部红外反射层基本上由银组成，耐腐蚀的内部红外反射层具有与外部红外反射层不同的组成。还提供了用于沉积这种性质的涂层以及承载这些涂层的基材的方法。

9. 发明申请

WO2004061153A2 MAGNETRON SPUTTERING SYSTEMS INCLUDING ANODIC GAS DISTRIBUTION SYSTEMS 审中-公开
标题翻译： MAGNETRON喷射系统，包括阳极气体分配系统
公开(公告)号：WO2004061153A2
公开(公告)日：2004-07-22
申请号：PCT/US2003/039433
申请日：2003-12-11
申请人： CARDINAL CG COMPANY , HARTIG, Klaus
发明人： HARTIG, Klaus
IPC分类号： C23C14/34
CPC分类号： H01J37/3244 , C23C14/35 , C23C14/56 , H01J37/3408
摘要： The present invention provides a megnetron sputtering system using a gas distribution system which also serves as a source of anodic charge to generate plasma field. The sputtering system is comprised of a vacuum chamber, a cathode target of sputterable material, a power source which supplies positive and negative charge, and a gas distribution system. The gas distribution system may comprise a simple perforated gas delivery member, or it may comprise a perforated gas delivery member with an attached conductive anodic surface. The gas delivery member may also contain an inner conduit with further perforations which serves to baffle flow of the sputtering gas. Gas flow may be regulated within discrete portions of the gas distribution system. The anodic surfaces of the gas distribution system are cleaned through the action of plasma and gas flow, creating a more stable plasma and reducing the need for maintenance.
摘要翻译：本发明提供了一种使用也用作阳极电荷源以产生等离子体场的气体分配系统的巨电子轰击系统。溅射系统包括真空室，可溅射材料的阴极靶，供给正电荷和负电荷的电源以及气体分配系统。气体分配系统可以包括简单的穿孔气体输送构件，或者其可以包括具有附接的导电阳极表面的穿孔气体输送构件。气体输送构件还可以包含具有进一步穿孔的内部管道，其用于阻挡溅射气体的流动。可以在气体分配系统的离散部分内调节气流。气体分配系统的阳极表面通过等离子体和气体流动的作用被清除，产生更稳定的等离子体并减少维护的需要。

10. 发明申请

WO2002062716A1 EDGE TREATMENTS FOR COATED SUBSTRATES 审中-公开
标题翻译：涂层基材的边缘处理
公开(公告)号：WO2002062716A1
公开(公告)日：2002-08-15
申请号：PCT/US2002/003704
申请日：2002-02-08
申请人： CARDINAL CG COMPANY , HARTIG, Klaus , O'SHAUGHNESSY, Roger
发明人： HARTIG, Klaus , O'SHAUGHNESSY, Roger
IPC分类号： C03C17/00
CPC分类号： C03C17/366 , B24B7/17 , B24B7/242 , B24B7/26 , B24B9/102 , C03C17/00 , C03C17/002 , C03C17/256 , C03C17/3417 , C03C17/36 , C03C19/00 , C03C2217/71 , C03C2217/78 , C03C2218/328 , C03C2218/365 , E06B3/5427 , E06B3/56 , E06B3/6621 , E06B3/66342 , E06B3/6715
摘要： The invention provides a substrate (e.g., a glass pane) having generally opposed first and second major surfaces. At least one of these major surfaces bears a functional coating and has a peripheral region that is substantially free of the funcitonal coating. Another embodiment provides a multiple-pane insulating galss unit comprising two spaced-apart panes and a spacer joining confronting, inner peripheral surfaces of the panes. At least on of the panes has a coated outer surface. the coated outer surface has a peripheral region that is substantially free of the coating. The invention also provides methods for treating a coated substrate that has generally opposed first and second major surfaces each bearing a functional coating. The coating is substantially removed from a peripheral region of the first major surface. Likewise, the coating is substantially removed from a peripheral region of the secon major surface. A further embodiment provides a barrier layer that prevents cotact between glazing compound and an exterior coating. Durable compounds are provided in yet another embodiment.
摘要翻译：本发明提供了具有大致相对的第一和第二主表面的基底（例如，玻璃窗）。这些主表面中的至少一个具有功能性涂层，并且具有基本上没有功能涂层的周边区域。另一实施例提供了一种多窗格绝缘板，其包括两个间隔开的窗格和连接窗格的相对的内周表面的间隔件。至少在窗格上有一个涂层的外表面。涂覆的外表面具有基本上没有涂层的周边区域。本发明还提供了一种用于处理涂覆的基材的方法，该基材具有大致相对的第一和第二主表面，每个主表面均具有功能性涂层。涂层基本上从第一主表面的周边区域去除。同样地，涂层基本上从第二主表面的周边区域除去。另一实施例提供了防止玻璃化合物和外部涂层之间的共同作用的阻挡层。在另一个实施方案中提供耐久化合物。

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