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1. 发明申请

WO2007070249A3 SPUTTERING AND METHODS FOR DEPOSITING A FILM CONTAINING TIN AND NIOBIUM 审中-公开
标题翻译：用于沉积含有金属和铌的薄膜的溅射和方法
公开(公告)号：WO2007070249A3
公开(公告)日：2007-08-30
申请号：PCT/US2006045689
申请日：2006-11-29
申请人： CARDINAL CG CO , HARTIG KLAUS
发明人： HARTIG KLAUS
IPC分类号： H01J37/34 , C03C17/06 , C03C17/09 , C03C17/22 , C03C17/245 , C03C17/34 , C03C17/36 , C03C17/40 , C23C4/12 , C23C14/34 , C23C14/35 , E06B3/67
CPC分类号： C23C4/08 , C03C17/09 , C03C17/245 , C03C17/36 , C03C17/366 , C03C17/3681 , C03C17/40 , C03C2217/211 , C03C2217/218 , C03C2217/23 , C03C2217/24 , C03C2218/154 , C23C4/06 , C23C4/134 , C23C14/3414 , C23C14/3457
摘要： Sputtering targets and sputtering methods for depositing a film that includes tin and niobium. Substrates bearing coatings comprising tin and niobium, for example, low-emissivity coatings including blocker films comprising tin and niobium, or solar control coatings (e.g., conductive oxide coatings) including tin and niobium methods of manufacturing sputtering targets comprising tin and niobium.
摘要翻译：用于沉积包括锡和铌的膜的溅射靶和溅射方法。包含锡和铌的衬底承载涂层，例如低辐射涂层，包括包含锡和铌的阻挡膜，或包括锡和铌的太阳能控制涂层（例如，导电氧化物涂层）的方法，其制造包含锡和铌的溅射靶。

2. 发明申请

WO2007053586A2 REACTIVE SPUTTER DEPOSITION PROCESSES AND EQUIPMENT 审中-公开
标题翻译：反应性溅射沉积工艺和设备
公开(公告)号：WO2007053586A2
公开(公告)日：2007-05-10
申请号：PCT/US2006042391
申请日：2006-10-31
申请人： CARDINAL CG CO , HARTIG KLAUS , BERG SOREN , NYBERG TOMAS
发明人： HARTIG KLAUS , BERG SOREN , NYBERG TOMAS
IPC分类号： C23C14/00 , C23C14/34
CPC分类号： C23C14/3414 , C23C14/0036 , C23C14/0068 , C23C14/35 , H01J37/3426
摘要： The invention is a method for obtaining a reactive sputtering process with a reduced or eliminated hysteresis behavior. This is achieved by employing a target made from a mixture of metal and compound materials. In the method according to the present invention, the fraction of compound material is large enough to eliminate or significantly reduce the hysteresis behavior of the reactive sputtering process and enable a stable deposition of compound films at a rate significantly higher than what is possible from a target completely made from compound material.
摘要翻译：本发明是用于获得具有降低或消除的滞后行为的反应溅射工艺的方法。这是通过使用由金属和复合材料的混合物制成的靶而实现的。在根据本发明的方法中，化合物材料的分数足够大以消除或显着降低反应性溅射工艺的滞后行为，并且能够以明显高于来自靶的可能的速率稳定地沉积化合物膜完全由复合材料制成。

3. 发明申请

WO2007044344A3 METHOD AND APPARATUS FOR CYLINDRICAL MAGNETRON SPUTTERING USING MULTIPLE ELECTRON DRIFT PATHS 审中-公开
标题翻译：使用多个电子干燥器进行圆柱磁珠溅射的方法和装置
公开(公告)号：WO2007044344A3
公开(公告)日：2007-06-28
申请号：PCT/US2006038662
申请日：2006-10-04
申请人： CARDINAL CG CO , GERMAN JOHN R , HARTIG KLAUS
发明人： GERMAN JOHN R , HARTIG KLAUS
IPC分类号： C23C14/34 , C23C14/35 , H01J37/34
CPC分类号： C23C14/3407 , C23C14/35 , H01J37/3405 , H01J37/342 , H01J37/3461
摘要： A cylindrical cathode target assembly for use in sputtering target material onto a substrate comprises a generally cylindrical target (30) , means for rotating the target about its axis during a sputtering operation, a magnetic array (80) carried within the target for generation of a plasma-containing field including a plurality of electron drift paths adjacent an outer surface of the target, and a device for supporting the magnetic array (80) independently of rotation of the target . In certain embodiments of the invention, the magnetic array may include a plurality of magnetic elements (540) arranged to form a plurality of electron drift paths spaced along a substantial length of the target to promote generally uniform film deposition and uniform target utilization along its length.
摘要翻译：用于将目标材料溅射到衬底上的圆柱形阴极靶组件包括大致圆柱形的靶（30），用于在溅射操作期间使靶围绕其轴线旋转的装置，在靶内承载的磁阵列（80），用于产生包括与靶的外表面相邻的多个电子漂移路径的等离子体场，以及用于独立于靶的旋转而支撑磁阵列（80）的装置。在本发明的某些实施例中，磁性阵列可以包括多个磁性元件（540），其被布置成形成沿着靶的相当长度间隔开的多个电子漂移路径，以促进大体上均匀的膜沉积并沿其长度均匀的靶材利用。

4. 发明申请

WO2007044781A2 MULTIPLE CAVITY LOW-EMISSIVITY COATINGS 审中-公开
标题翻译：多孔低电感涂层
公开(公告)号：WO2007044781A2
公开(公告)日：2007-04-19
申请号：PCT/US2006039670
申请日：2006-10-10
申请人： CARDINAL CG CO , HARTIG KLAUS
发明人： HARTIG KLAUS
IPC分类号： C03C17/36
CPC分类号： E06B3/6715 , C03C17/36 , C03C17/3613 , C03C17/3626 , C03C17/3639 , C03C17/3644 , C03C17/3652 , C03C17/366 , C03C17/3681 , C03C2217/211 , C03C2217/216 , C03C2217/78 , C03C2218/153 , C03C2218/154 , C23C14/568 , E06B9/24 , E06B2009/2417 , Y10T428/24612 , Y10T428/24942 , Y10T428/2495 , Y10T428/24975 , Y10T428/31504
摘要： The invention provides multiple cavity low-emissivity coatings. The coating includes three infrared-reflection film regions, which may each comprise silver.
摘要翻译：本发明提供多腔低发射涂层。该涂层包括三个红外反射膜区域，其可以各自包含银。

5. 发明申请

WO2006060597A9 HYDROPHILIC COATINGS, METHODS FOR DEPOSITING HYDROPHILIC COATINGS, AND IMPROVED DEPOSITION TECHNOLOGY FOR THIN FILMS 审中-公开
标题翻译：亲水性涂料，亲水性涂料的沉积方法以及改进的薄膜沉积技术
公开(公告)号：WO2006060597A9
公开(公告)日：2006-09-21
申请号：PCT/US2005043508
申请日：2005-12-02
申请人： CARDINAL CG CO , MYLI KARI , PFAFF GARY , BROWNLEE JAMES , GERMAN JOHN , KRISKO ANNETTE , HARTIG KLAUS
发明人： MYLI KARI , PFAFF GARY , BROWNLEE JAMES , GERMAN JOHN , KRISKO ANNETTE , HARTIG KLAUS
IPC分类号： C03C17/34 , C03C17/36 , C23C14/34
CPC分类号： C23C14/568 , C03C17/002 , C03C17/22 , C03C17/34 , C03C2217/71 , C03C2218/154 , C03C2218/36 , C03C2218/365 , C23C14/352
摘要： The invention provides certain embodiments that involve sputtering techniques for applying a mixed oxide film comprising silica and titania. In these embodiments, the techniques involve sputtering at least two targets in a common chamber (e.g., in a shared gaseous atmosphere). A first of these targets includes silicon, while a second of the targets includes titanium. Further, the invention provides embodiments involving a substrate bearing a hydrophilic coating, which can be deposited by sputtering or any other suitable thin film deposition technique. The invention also provides techniques and apparatuses useful for depositing a wide variety of coating types. For example, the invention provides thin film deposition technologies in which sputtering apparatuses or other thin film deposition apparatuses are employed.
摘要翻译：本发明提供涉及用于施加包含二氧化硅和二氧化钛的混合氧化物膜的溅射技术的某些实施例。在这些实施例中，这些技术涉及在公共室中（例如，在共享的气体环境中）溅射至少两个靶。这些目标中的第一个包括硅，而另一个目标包括钛。此外，本发明提供涉及带有亲水涂层的基底的实施方案，其可以通过溅射或任何其他合适的薄膜沉积技术来沉积。本发明还提供了用于沉积多种涂层类型的技术和设备。例如，本发明提供了其中采用溅射设备或其他薄膜沉积设备的薄膜沉积技术。

6. 发明申请

WO2006080968A2 METHODS AND EQUIPMENT FOR DEPOSITING COATINGS HAVING SEQUENCED STRUCTURES 审中-公开
标题翻译：用于沉积具有顺序结构的涂层的方法和设备
公开(公告)号：WO2006080968A2
公开(公告)日：2006-08-03
申请号：PCT/US2005041351
申请日：2005-11-14
申请人： CARDINAL CG CO , HARTIG KLAUS
发明人： HARTIG KLAUS
IPC分类号： C03C17/00 , C03C17/34 , C23C14/34
CPC分类号： C03C17/002 , C03C17/3417 , C03C17/36 , C03C17/3626 , C03C17/3644 , C03C17/3652 , C03C2217/71 , C03C2218/365 , C23C14/568
摘要： Methods and equipment are provided for processing sheet-like substrates. The methods and equipment are useful for depositing coatings on both major surfaces of a sheet-like substrate. Also provided are substrates with coatings on both major surfaces. Preferably, the coatings on the opposed major surfaces of a substrate have different structures, yet share a common structural sequence of at least two film regions, and in some embodiments at least three films regions.
摘要翻译：提供了用于处理片状基材的方法和设备。所述方法和设备可用于在片状基底的两个主表面上沉积涂层。还提供了在两个主表面上具有涂层的基底。优选地，衬底的相对主表面上的涂层具有不同的结构，但共享至少两个膜区域的共同结构序列，并且在一些实施方案中共享至少三个膜区域。

7. 发明申请

WO0222517A9 HYDROPHILIC SURFACES CARRYING TEMPORARY PROTECTIVE COVERS 审中-公开
标题翻译：承载临时保护套的水泥表面
公开(公告)号：WO0222517A9
公开(公告)日：2003-03-20
申请号：PCT/US0128728
申请日：2001-09-11
申请人： CARDINAL CG CO , O'SHAUGHNESSY ROGER , KRISKO ANNETTE J , HARTIG KLAUS
发明人： O'SHAUGHNESSY ROGER , KRISKO ANNETTE J , HARTIG KLAUS
IPC分类号： B01J35/02 , C03C17/245 , C03C17/34 , C03C17/36 , C03C23/00 , C03C27/06 , C23C14/34
CPC分类号： C03C17/245 , C03C17/3417 , C03C2217/216 , C03C2217/229 , C03C2218/154 , C03C2218/355
摘要： A substrate carrying a temporary protective cover and related methods of producing and processing substrates are described. In one embodiment, a substrate bears a hydrophilic coating carrying a temporary protective cover that protects the hydrophilic coating against contamination but that can readily be readily removed from the hydrophilic coating by washing with a given washing fluid.
摘要翻译：描述了携带临时保护盖的基板和相关的基板的制造和处理方法。在一个实施方案中，基底承载亲水性涂层，其携带临时保护盖，其保护亲水性涂层免受污染，但是通过用给定的洗涤液洗涤可容易地从亲水涂层中除去。

8. 发明申请

WO2011088330A3 HIGH QUALITY EMISSION CONTROL COATINGS, EMISSION CONTROL GLAZINGS, AND PRODUCTION METHODS 审中-公开
标题翻译：高质量的排放控制涂层，排放控制玻璃和生产方法
公开(公告)号：WO2011088330A3
公开(公告)日：2012-05-31
申请号：PCT/US2011021314
申请日：2011-01-14
申请人： CARDINAL CG CO , MYLI KARI B , PFAFF GARY L , VANCE GREG , HARTIG KLAUS
发明人： MYLI KARI B , PFAFF GARY L , VANCE GREG , HARTIG KLAUS
IPC分类号： E06B3/66 , B32B17/10 , C03C17/34
CPC分类号： E06B3/6722 , C03C17/3411 , C03C2217/94 , C03C2217/948 , E06B3/6612 , E06B3/67 , E06B3/6715 , Y02B80/22 , Y02B80/24 , Y10T428/24355
摘要： The invention relates to a method for forming a liquid radiation curable resin capable of curing into a solid upon irradiation comprising at least one thermally sensitive visual effect initiator. The liquid radiation curable resin is capable of curing into three-dimensional articles having selective visual effects. The resulting three-dimensional articles possess excellent color and/or transparency stability and excellent mechanical properties.
摘要翻译：本发明涉及一种用于形成能够在照射时固化成固体的液体可辐射固化树脂的方法，其包括至少一种热敏视觉效果引发剂。液态可辐射固化树脂能够固化成具有选择性视觉效果的三维制品。所得到的三维制品具有优异的颜色和/或透明度稳定性以及优异的机械性能。

9. 发明申请

WO2009036263A3 LOW-MAINTENANCE COATING TECHNOLOGY 审中-公开
标题翻译：低维护涂料技术
公开(公告)号：WO2009036263A3
公开(公告)日：2009-06-04
申请号：PCT/US2008076157
申请日：2008-09-12
申请人： CARDINAL CG CO , MYLI KARI , KRISKO ANNETTE , GERMAN JOHN , HARTIG KLAUS
发明人： MYLI KARI , KRISKO ANNETTE , GERMAN JOHN , HARTIG KLAUS
IPC分类号： C03C17/245 , C03C17/34 , C23C14/08 , C23C14/34
CPC分类号： C03C17/2456 , C03C17/002 , C03C17/3411 , C03C2217/212 , C03C2217/219 , C03C2217/23 , C03C2217/71 , C03C2217/91 , C03C2218/154 , C23C14/024 , C23C14/083 , C23C14/3464 , C23C14/352 , Y10T428/261 , Y10T428/265 , Y10T428/31678
摘要： The invention provides a substrate bearing a low-maintenance coating. In some embodiments, the coating includes a low-maintenance film that includes a thickness of film comprising titania, wherein only part of that thickness includes tungsten. The thickness includes an inner portion and an outer portion, the outer portion being the part that includes tungsten. The invention also provides methods and equipment for depositing such coatings.
摘要翻译：本发明提供一种具有低维护性涂层的基材。在一些实施方案中，涂层包括低维护性膜，其包括包含二氧化钛的膜的厚度，其中仅一部分厚度包括钨。厚度包括内部部分和外部部分，外部部分是包括钨的部分。本发明还提供了沉积这种涂层的方法和设备。

10. 发明申请

WO2006076345A3 REDUCED MAINTENANCE SPUTTERING CHAMBERS 审中-公开
标题翻译：减少维护喷雾器
公开(公告)号：WO2006076345A3
公开(公告)日：2006-12-21
申请号：PCT/US2006000795
申请日：2006-01-11
申请人： CARDINAL CG CO , HARTIG KLAUS
发明人： HARTIG KLAUS
IPC分类号： H01J37/34
CPC分类号： H01J37/32871 , C23C14/352 , C23C14/564 , H01J37/32477 , H01J37/3405 , H01J37/3455
摘要： Improved sputtering chambers (100,200) for sputtering thin coatings onto substrates. One sputtering chamber includes spall shields (212) which are disposed inwardly and upwardly toward the chamber interior and toward the sputtering targets, and which can aid in the retention of overcoated sputtering material which may otherwise fall onto substrates to be coated. Another sputtering chamber includes targets (102, 103) having magnets (104, 105) which are turned inwardly relative to vertical and toward each other. The inward rotation of the magnets can serve to deposit more material toward the open bottom center of the chamber, and less toward the side walls of the chamber. Yet another sputtering chamber (300) includes a third target (314) disposed between and upward of the lower two targets (310, 312) so as to shield a portion of the sputtering chamber interior from material sputtered from the first and second targets . Some chambers have the three targets forming a triangle, for example, an isosceles or equilateral triangle, hi one chamber having such a triangular configuration of sputtering targets, the first and second targets form the base of an isosceles triangle and have their magnets oriented inwardly relative to vertical and towards each other. The sputtering chambers provided can either reduce the amount of overcoat sputtering material deposited onto the interior of the chamber and/or aid in retention of overcoat sputtering material which would otherwise fall onto substrates to be coated.
摘要翻译：改进的溅射室（100,200），用于将薄涂层溅射到基板上。一个溅射室包括防护罩（212），它们向内并向上设置朝向室内部并且朝向溅射靶，并且其可以有助于保留另外可能落在待涂覆的基板上的外涂溅射材料。另一个溅射室包括具有磁体（104,105）的靶（102,103），磁体（104,105）相对于垂直方向和彼此朝向内侧转动。磁体的向内旋转可用于将更多的材料沉积到腔室的敞开的底部中心，并且朝向腔室的侧壁较少。又一个溅射室（300）包括设置在下两个靶（310,312）之间和之上的第三靶（314），以便将溅射室内部的一部分与第一和第二靶溅射的材料进行屏蔽。一些室具有形成三角形的三个目标，例如等腰或等边三角形。在具有这种溅射靶的三角形构造的一个室中，第一和第二靶构成等腰三角形的基部并使其磁体向内相对相互垂直。所提供的溅射室可以减少沉积在室内部的外涂层溅射材料的量和/或辅助保留外涂层溅射材料，否则这些溅射材料将落在待涂覆的基板上。

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