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1. 发明专利

DE69634072T2 未知
公开(公告)号：DE69634072T2
公开(公告)日：2005-12-08
申请号：DE69634072
申请日：1996-10-25
申请人： CANON KK
发明人： FUJII AKIRA , SUZUKI HIDETOSHI , YAMAGUCHI EIJI
IPC分类号： G06F3/00 , G09G3/22 , H01J9/02 , H01J9/44
摘要： It is an object of this invention to provide an electron generating apparatus which is hardly influenced by variations in driving voltage, an image forming apparatus using the electron generating apparatus, and a method of manufacturing and adjusting the same. The row wiring layers of a multi-electron-beam source (300) are sequentially selectively switched by a control circuit (302) and applied with a pulse voltage having a value about 1.05 to 1.5 times the maximum value of a normal driving voltage from a DC voltage source (301). The characteristics of all surface conduction electron-emitting devices of the multi-electron-beam source (300) are shifted to the high potential side. With this process, even when the driving voltage becomes high due to superposition of noise and the driving voltage, variations in electron-emitting characteristics caused by the voltage shift characteristics of the surface conduction electron-emitting devices can be prevented.

2. 发明专利

CA2189391A1 ELECTRON GENERATING APPARATUS, IMAGE FORMING APPARATUS, AND METHOD OF MANUFACTURING AND ADJUSTING THE SAME 未知
公开(公告)号：CA2189391A1
公开(公告)日：1997-07-17
申请号：CA2189391
申请日：1996-11-01
申请人： CANON KK
发明人： FUJII AKIRA , SUZUKI HIDETOSHI , YAMAGUCHI EIJI
IPC分类号： G06F3/00 , G09G3/22 , H01J9/02 , H01J9/44 , H01J1/30
摘要： It is an object of this invention to provide an electron generating apparatus which is hardly influenced by variations in driving voltage, an image forming apparatus using the electron generating apparatus, and a method of manufacturing and adjusting the same. The row wiring layers of a multi-electron-beam source (300) are sequentially selectively switched by a control circuit (302) and applied with a pulse voltage having a value about 1.05 to 1.5 times the maximum value of a normal driving voltage from a DC voltage source (301). The characteristics of all surface conduction electronemitting devices of the multi-electron-beam source (300) are shifted to the high potential side. With this process, even when the driving voltage becomes high due to superposition of noise and the driving voltage, variations in electron-emitting characteristics caused by the voltage shift characteristics of the surface conduction electron-emitting devices can be prevented.

3. 发明专利

DE69634072D1 未知
公开(公告)号：DE69634072D1
公开(公告)日：2005-01-27
申请号：DE69634072
申请日：1996-10-25
申请人： CANON KK
发明人： FUJII AKIRA , SUZUKI HIDETOSHI , YAMAGUCHI EIJI
IPC分类号： G06F3/00 , G09G3/22 , H01J9/02 , H01J9/44
摘要： It is an object of this invention to provide an electron generating apparatus which is hardly influenced by variations in driving voltage, an image forming apparatus using the electron generating apparatus, and a method of manufacturing and adjusting the same. The row wiring layers of a multi-electron-beam source (300) are sequentially selectively switched by a control circuit (302) and applied with a pulse voltage having a value about 1.05 to 1.5 times the maximum value of a normal driving voltage from a DC voltage source (301). The characteristics of all surface conduction electron-emitting devices of the multi-electron-beam source (300) are shifted to the high potential side. With this process, even when the driving voltage becomes high due to superposition of noise and the driving voltage, variations in electron-emitting characteristics caused by the voltage shift characteristics of the surface conduction electron-emitting devices can be prevented.

4. 发明专利

DE69909174D1 未知
公开(公告)号：DE69909174D1
公开(公告)日：2003-08-07
申请号：DE69909174
申请日：1999-04-29
申请人： CANON KK
发明人： FUJII AKIRA , KAWADE HISAAKI , KISHI FUMIO , ANDO YOICHI
IPC分类号： H01J9/02
摘要： A method of fabricating an electron source constituted by a plurality of x-direction wirings arranged on a substrate, a plurality of y-direction wirings crossing the x-direction wirings, an insulating layer for electrically insulating the x- and y-direction wirings, and a plurality of conductive films each of which is electrically connected to the x-and y-direction wirings and has a gap, comprises a conductive film formation step of forming a plurality of conductive films to be connected to the pluralities of x- and y-direction wirings, a grouping step of dividing all the x-direction wirings into a plurality of groups, and a forming step of sequentially performing, for all the groups, a step of simultaneously applying a voltage to all wirings assigned to the same group, thereby forming gaps in the plurality of conductive films. The grouping step includes the steps of assigning a plurality of wirings to each group, and arranging wirings constituting a group between wirings constituting other groups.

5. 发明专利

DE69909174T2 未知
公开(公告)号：DE69909174T2
公开(公告)日：2004-01-29
申请号：DE69909174
申请日：1999-04-29
申请人： CANON KK
发明人： FUJII AKIRA , KAWADE HISAAKI , KISHI FUMIO , ANDO YOICHI
IPC分类号： H01J9/02
摘要： A method of fabricating an electron source constituted by a plurality of x-direction wirings arranged on a substrate, a plurality of y-direction wirings crossing the x-direction wirings, an insulating layer for electrically insulating the x- and y-direction wirings, and a plurality of conductive films each of which is electrically connected to the x-and y-direction wirings and has a gap, comprises a conductive film formation step of forming a plurality of conductive films to be connected to the pluralities of x- and y-direction wirings, a grouping step of dividing all the x-direction wirings into a plurality of groups, and a forming step of sequentially performing, for all the groups, a step of simultaneously applying a voltage to all wirings assigned to the same group, thereby forming gaps in the plurality of conductive films. The grouping step includes the steps of assigning a plurality of wirings to each group, and arranging wirings constituting a group between wirings constituting other groups.

6. 发明专利

CA2189391C ELECTRON GENERATING APPARATUS, IMAGE FORMING APPARATUS, AND METHOD OF MANUFACTURING AND ADJUSTING THE SAME 未知
公开(公告)号：CA2189391C
公开(公告)日：2001-06-05
申请号：CA2189391
申请日：1996-11-01
申请人： CANON KK
发明人： FUJII AKIRA , SUZUKI HIDETOSHI , YAMAGUCHI EIJI
IPC分类号： G06F3/00 , G09G3/22 , H01J9/02 , H01J9/44 , H01J1/30
摘要： It is an object of this invention to provide an electron generating apparatus which is hardly influenced by variations in driving voltage, an image forming apparatus using the electron generating apparatus, and a method of manufacturing and adjusting the same. The row wiring layers of a multi-electron-beam source (300) are sequentially selectively switched by a control circuit (302) and applied with a pulse voltage having a value about 1.05 to 1.5 times the maximum value of a normal driving voltage from a DC voltage source (301). The characteristics of all surface conduction electron- emitting devices of the multi-electron-beam source (300) are shifted to the high potential side. With this process, even when the driving voltage becomes high due to superposition of noise and the driving voltage, variations in electron-emitting characteristics caused by the voltage shift characteristics of the surface conduction electron-emitting devices can be prevented.

7. 发明专利

AU708714B2 Electron generating apparatus, image forming apparatus, and method of manufacturing and adjusting the same 未知
公开(公告)号：AU708714B2
公开(公告)日：1999-08-12
申请号：AU7065396
申请日：1996-11-04
申请人： CANON KK
发明人： FUJII AKIRA , SUZUKI HIDETOSHI , YAMAGUCHI EIJI
IPC分类号： G06F3/00 , G09G3/22 , H01J9/02 , H01J9/44 , H01J1/30 , H01J19/24 , H04N5/70
摘要： It is an object of this invention to provide an electron generating apparatus which is hardly influenced by variations in driving voltage, an image forming apparatus using the electron generating apparatus, and a method of manufacturing and adjusting the same. The row wiring layers of a multi-electron-beam source (300) are sequentially selectively switched by a control circuit (302) and applied with a pulse voltage having a value about 1.05 to 1.5 times the maximum value of a normal driving voltage from a DC voltage source (301). The characteristics of all surface conduction electron-emitting devices of the multi-electron-beam source (300) are shifted to the high potential side. With this process, even when the driving voltage becomes high due to superposition of noise and the driving voltage, variations in electron-emitting characteristics caused by the voltage shift characteristics of the surface conduction electron-emitting devices can be prevented.

8. 发明专利

AU7065396A Electron generating apparatus, image forming apparatus, and method of manufacturing and adjusting the same 未知
公开(公告)号：AU7065396A
公开(公告)日：1997-07-24
申请号：AU7065396
申请日：1996-11-04
申请人： CANON KK
发明人： FUJII AKIRA , SUZUKI HIDETOSHI , YAMAGUCHI EIJI
IPC分类号： G06F3/00 , G09G3/22 , H01J9/02 , H01J9/44 , H01J1/30 , H01J19/24 , H04N5/70
摘要： It is an object of this invention to provide an electron generating apparatus which is hardly influenced by variations in driving voltage, an image forming apparatus using the electron generating apparatus, and a method of manufacturing and adjusting the same. The row wiring layers of a multi-electron-beam source (300) are sequentially selectively switched by a control circuit (302) and applied with a pulse voltage having a value about 1.05 to 1.5 times the maximum value of a normal driving voltage from a DC voltage source (301). The characteristics of all surface conduction electron-emitting devices of the multi-electron-beam source (300) are shifted to the high potential side. With this process, even when the driving voltage becomes high due to superposition of noise and the driving voltage, variations in electron-emitting characteristics caused by the voltage shift characteristics of the surface conduction electron-emitting devices can be prevented.

9. 发明专利

JP2002203478A ELECTRON SOURCE, ADJUSTMENT METHOD AND MANUFACTURING METHOD THEREFOR, IMAGE FORMATION DEVICE, ADJUSTMENT METHOD THEREFOR AND STORAGE MEDIUM 失效
公开(公告)号：JP2002203478A
公开(公告)日：2002-07-19
申请号：JP2000399326
申请日：2000-12-27
申请人： CANON KK
发明人： FUJII AKIRA
IPC分类号： H01J9/02 , H01J9/44
摘要： PROBLEM TO BE SOLVED: To prevent the electron emission amount from each electron element from easily dispersing by the influence of voltage drop in driving and to simplify the structure of a driving circuit. SOLUTION: Substantially uniform electron emission is realized in actual driving by adjusting a voltage-emission current characteristic of each electron emission element so as to eliminate the influence of voltage drop due to wiring resistance.

10. 发明专利

JP2000311592A MANUFACTURE OF ELECTRON SOURCE AND IMAGE FORMING DEVICE 失效
公开(公告)号：JP2000311592A
公开(公告)日：2000-11-07
申请号：JP12020699
申请日：1999-04-27
申请人： CANON KK
发明人： FUJII AKIRA , ANDO YOICHI , KISHI FUMIO , KAWADE ISAAKI
IPC分类号： H01J9/02
摘要： PROBLEM TO BE SOLVED: To form an electron emitting part of an electron source having a plurality of X-direction wirings in short time and to prevent a substrate from being deformed and destroyed when formed. SOLUTION: In this electron source, Y-direction wirings 13 are connected to a common ground and X-direction wirings 12 are connected to a wiring switching device 14. The X-direction wirings 12 are grouped; ten wirigns make one group, for example, a group 1 is named by Dx1, Dx103, Dx205, so on, and a group 2 is Dx2, Dx104, Dx206, so on. One pulse is applied on the Dx1 and then one pulse is on the Dx103, further on the Dx205 to change connection. After every wiring in the group 1 is applied on one pulse, the connection is again changed to the Dx1 and the same process is repeated. When the forming treatment of the group 1 is completed by repeating the pulse impression, the group 2 is similarly treated. By repeating this, the forming treatment of the entire electron emitting elements is completed.

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