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1. 发明申请

WO2014077413A1 OCT APPARATUS, SS-OCT APPARATUS, AND METHOD OF ACQUIRING SS-OCT IMAGE 审中-公开
标题翻译： OCT装置，SS-OCT装置和获取SS-OCT图像的方法
公开(公告)号：WO2014077413A1
公开(公告)日：2014-05-22
申请号：PCT/JP2013/081334
申请日：2013-11-14
申请人： CANON KABUSHIKI KAISHA
发明人： YAMADA, Tomohiro , OTA, Takefumi , KURODA, Ryo
IPC分类号： G01N21/17 , A61B3/10
CPC分类号： G01B9/02007 , A61B3/102 , A61B5/0066 , G01B9/02004 , G01B9/02069 , G01B9/02091 , G01N21/4795 , G06T1/0007 , G06T11/005 , G06T2211/40
摘要： The OCT apparatus includes a first light source unit changing an optical wavelength, a second light source unit changing an optical wavelength over a wavelength range different from and partially overlapping with that of the first light source unit, a signal generating unit receiving light from the light source units to generate signals at an equal wave number interval, an interference optical system splitting the light from the first and second light source units into illumination light illuminating an object and reference light, to generate first and second interference light, a light detecting unit receiving interference light, and an information acquiring unit acquiring a tomographic image of the object by linking temporal waveforms of intensities of the first and second interference light. The information acquiring unit links the temporal waveforms of the intensities of the first and second interference light based on the signal generated from the signal generating unit.
摘要翻译： OCT装置包括改变光波长的第一光源单元，在与第一光源单元不同的部分重叠的波长范围上改变光波长的第二光源单元，从光接收光的信号发生单元源单元，以相等的波数间隔产生信号;干涉光学系统，将来自第一和第二光源单元的光分解为照射物体和参考光的照明光，产生第一和第二干涉光;光检测单元，干涉光，以及信息获取单元，通过链接第一和第二干涉光的强度的时间波形来获取对象的断层图像。信息获取单元基于从信号生成单元生成的信号来连接第一干涉光和第二干涉光的强度的时间波形。

2. 发明申请

WO2008126666A1 SENSING APPARATUS 审中-公开
标题翻译：感应装置
公开(公告)号：WO2008126666A1
公开(公告)日：2008-10-23
申请号：PCT/JP2008/055609
申请日：2008-03-17
申请人： CANON KABUSHIKI KAISHA , FURUSAWA, Kentaro , MIZUTANI, Natsuhiko , KURODA, Ryo
发明人： FURUSAWA, Kentaro , MIZUTANI, Natsuhiko , KURODA, Ryo
IPC分类号： G01N21/55
CPC分类号： G01N21/553 , G01N21/7743
摘要： A sensing apparatus comprises a sensing element having a metal member of a periodic structure formed on a substrate, a light source for projecting a light beam to the sensing element, and a photosensor for sensing the light beam from the sensing element, wherein the sensing element has an optical waveguide layer between the substrate and the metal member, and the light beam illuminated from the light source and propagating in the optical waveguide layer and the light of a Rayleigh mode formed by the metal member are phase-matched.
摘要翻译：感测装置包括具有形成在基板上的周期性结构的金属构件的感测元件，用于将光束投射到感测元件的光源和用于感测来自感测元件的光束的光电传感器，其中感测元件在基板和金属构件之间具有光波导层，并且从光源照射并在光波导层中传播的光束和由金属构件形成的瑞利模式的光相位匹配。

3. 发明申请

WO2005022129A1 SENSOR FOR DETECTING A TARGET SUBSTANCE IN A FLUID 审中-公开
标题翻译：用于检测流体中目标物质的传感器
公开(公告)号：WO2005022129A1
公开(公告)日：2005-03-10
申请号：PCT/JP2004/012790
申请日：2004-08-27
申请人： CANON KABUSHIKI KAISHA , YANO, Koji , OKAMOTO, Kohei , YAMAZAKI, Takeo , SHIOTSUKA, Hidenori , SUGITA, Mitsuro , IMAMURA, Takeshi , OUCHI, Toshihiko , KURODA, Ryo
发明人： YANO, Koji , OKAMOTO, Kohei , YAMAZAKI, Takeo , SHIOTSUKA, Hidenori , SUGITA, Mitsuro , IMAMURA, Takeshi , OUCHI, Toshihiko , KURODA, Ryo
IPC分类号： G01N21/35
CPC分类号： G02B6/02385 , B82Y20/00 , G01N21/21 , G01N21/253 , G01N21/39 , G01N21/774 , G01N33/54373 , G02B6/02347 , G02B6/0239 , G02B6/1225
摘要： A device for detecting a target substance in a fluid is provided. This device comprises a periodic structure having a vacant portion for passing the fluid containing the target substance and a solid portion arranged regularly and capable of transmitting an electromagnetic wave, an electromagnetic wave-projecting means for projecting the electromagnetic wave to the periodic structure, and a detecting means for measuring the magnetic wave emitted from the periodic structure to detect a change in periodic distribution of a refractive index. This sensor is highly sensitive in a small size.
摘要翻译：提供了一种用于检测流体中的目标物质的装置。该装置包括周期性结构，其具有用于使含有目标物质的流体通过的空白部分和规则地排列并能够传输电磁波的固体部分，用于将电磁波投射到周期性结构的电磁波投影装置，以及用于测量从周期性结构发射的磁波以检测折射率的周期性分布的变化的检测装置。该传感器在小尺寸下非常灵敏。

4. 发明申请

WO2007100112A1 METHOD FOR DESIGNING LIGHT TRANSMISSION DEVICE, OPTICAL ELEMENT AND SENSOR 审中-公开
标题翻译：用于设计光传输装置，光学元件和传感器的方法
公开(公告)号：WO2007100112A1
公开(公告)日：2007-09-07
申请号：PCT/JP2007/054108
申请日：2007-02-26
申请人： CANON KABUSHIKI KAISHA , OGINO, Masaya , YAMADA, Tomohiro , NISHIUMA, Satoru , MIZUTANI, Natsuhiko , KURODA, Ryo
发明人： OGINO, Masaya , YAMADA, Tomohiro , NISHIUMA, Satoru , MIZUTANI, Natsuhiko , KURODA, Ryo
IPC分类号： G02B5/20 , G02B5/18
CPC分类号： G02B5/008 , G02B5/204
摘要： The present invention provides a method for designing a light transmission device, which adjusts a wavelength region of a spectrum of transmitted light without expanding a width of a transmission spectrum and without lowering the transmittance. The method for designing a light transmission device having a metal thin film, and a rectangular aperture which is formed in a plane of the metal thin film, has a long side and a short side and makes light pass therethrough, wherein the short side has a dimension smaller than a wavelength of incident light, and the long side is determined to have such a dimension that a peak wavelength at which the transmittance of light passing through the rectangular aperture is maximal can be a predetermined value.
摘要翻译：本发明提供了一种用于设计光透射装置的方法，其调节透射光谱的波长区域，而不会扩大透射光谱的宽度并且不降低透射率。用于设计具有金属薄膜的光传输装置和形成在金属薄膜的平面中的矩形孔的方法具有长边和短边，使光通过，其中短边具有尺寸小于入射光的波长，并且长边被确定为具有通过矩形孔径的光的透射率最大的峰值波长的尺寸可以是预定值。

5. 发明申请

WO2004114024A3 EXPOSURE METHOD AND EXPOSURE APPARATUS 审中-公开
公开(公告)号：WO2004114024A3
公开(公告)日：2004-12-29
申请号：PCT/JP2004/009283
申请日：2004-06-24
申请人： CANON KABUSHIKI KAISHA , KURODA, Ryo , MIZUTANI, Natsuhiko , YAMADA, Tomohiro
发明人： KURODA, Ryo , MIZUTANI, Natsuhiko , YAMADA, Tomohiro
IPC分类号： G03F7/20
摘要： Disclosed is an exposure method and apparatus, an exposure mask and a device manufacturing method, wherein a first surface of a light blocking member having a plurality of openings formed in a mutually adjoining relation is placed at an exposure object side, and light is projected to the light blocking member from its second surface side so that exposure of the exposure object is carried out on the basis of near field light leaking from the openings . For exposure, interference is caused between surface plasmon polariton waves passing respectively through adjacent openings and going around to the first surface side, and, on the basis of it, a portion having a decreased light intensity is produced in the exposure object so that the exposure is carried out by use of the decreased light intensity portion.

6. 发明申请

WO2009139486A1 OPTICAL TOMOGRAPH 审中-公开
标题翻译：光学TOMOGRAPH
公开(公告)号：WO2009139486A1
公开(公告)日：2009-11-19
申请号：PCT/JP2009/059107
申请日：2009-05-12
申请人： CANON KABUSHIKI KAISHA , FURUSAWA, Kentaro , MIZUTANI, Natsuhiko , KURODA, Ryo
发明人： FURUSAWA, Kentaro , MIZUTANI, Natsuhiko , KURODA, Ryo
IPC分类号： G01B9/02
CPC分类号： G01B9/02014 , G01B9/02004 , G01B9/02069 , G01B9/02091
摘要： An optical tomography imaging a tomogram by using a coherent light by a backscattering light of a measured object and a reflected light of a reference mirror, which has supercontinuum light sources, an optical system having group velocity dispersion connected to the supercontinuum light source, an optical detection element detecting a coherent light by a backscattering light of the measured object and a reflected light of the reference mirror, a timing detection element detecting a timing of each wavelength component in an output light from the optical system having the group velocity dispersion, and a unit sampling a signal from the optical detector by using a timing signal from the timing detection element with a signal from the supercontinuum light source as a trigger, and detecting an optical tomogram signal imaging a tomogram, thereby acquiring an optical tomogram at a higher speed than a conventional SS-OCT.
摘要翻译：光学断层摄影通过使用具有超连续光源的测量对象的反向散射光和参考反射镜的反射光使用相干光来成像断层图像，具有连接到超连续光源的组速度色散的光学系统，光学检测元件通过测量对象的后向散射光和参考反射镜的反射光来检测相干光，定时检测元件，检测来自具有组速度色散的光学系统的输出光中的每个波长分量的定时，以及通过使用来自定时检测元件的来自超连续光源的信号的定时信号作为触发来对来自光学检测器的信号进行采样，并且检测成像断层图像的光学层析图像信号，从而以更高的速度获取光学层析图像常规的SS-OCT。

7. 发明申请

WO2006001520A1 EXPOSURE APPARATUS, EXPOSURE METHOD, AND EXPOSURE MASK 审中-公开
标题翻译：曝光装置，曝光方法和曝光掩模
公开(公告)号：WO2006001520A1
公开(公告)日：2006-01-05
申请号：PCT/JP2005/012166
申请日：2005-06-24
申请人： CANON KABUSHIKI KAISHA , INAO, Yasuhisa , KURODA, Ryo , MIZUTANI, Natsuhiko
发明人： INAO, Yasuhisa , KURODA, Ryo , MIZUTANI, Natsuhiko
IPC分类号： H01L21/027
CPC分类号： G03F7/7035 , B82Y10/00 , G03F1/50 , G03F1/60 , G03F7/2014 , G03F7/70325 , G03F7/70433 , G03F7/70691 , G03F9/703 , G03F9/7053 , G03F9/7088
摘要： Disclosed is an exposure apparatus, an exposure method and an exposure mask, for improved optical lithography. Specifically, in accordance with one preferred form of the invention, the exposure apparatus is arranged to be used with an exposure mask having an elastically deformable holding member and a light blocking film provided on the holding member and being formed with an opening pattern, wherein for exposure the exposure mask is flexed to be brought into contact with an object to be exposed. The exposure apparatus includes a distance detecting system for detecting a distance between the exposure mask before being flexed and the object to be exposed, and a distance controlling system for controlling the distance between the exposure mask before being flexed and the object to be exposed, on the basis of a signal from the distance detecting system.
摘要翻译：公开了一种用于改进的光刻技术的曝光装置，曝光方法和曝光掩模。具体地，根据本发明的一个优选形式，曝光装置被布置成与具有可弹性变形的保持构件和设置在保持构件上并形成有开口图案的遮光膜的曝光掩模一起使用，其中，暴露曝光掩模被弯曲以与待曝光的物体接触。曝光装置包括用于检测在弯曲之前的曝光掩模与待曝光的物体之间的距离的距离检测系统，以及用于控制在弯曲之前的曝光掩模与待曝光的物体之间的距离的距离控制系统，来自距离检测系统的信号的基础。

8. 发明申请

WO2004113880A2 CHEMICAL SENSOR AND CHEMICALSENSOR APPARATUS 审中-公开
标题翻译：化学传感器和化学传感器装置
公开(公告)号：WO2004113880A2
公开(公告)日：2004-12-29
申请号：PCT/JP2004/009239
申请日：2004-06-23
申请人： CANON KABUSHIKI KAISHA , KURODA, Ryo , YAMADA, Tomohiro,
发明人： KURODA, Ryo , YAMADA, Tomohiro,
IPC分类号： G01N21/00
CPC分类号： G01N21/553 , G01N21/554
摘要： A chemical sensor for detecting a reaction of a sensor material with a specimen on the basis of an intensity of a surface plasmon polariton wave propagated along a surface of a sensor medium including the sensor material is principally constituted by the sensor medium. The sensor medium includes a periodic structure and the sensor material disposed on the periodic structure. The periodic structure has a pitch substantially equal to an integral multiple of a wavelength of the surface plasma polariton wave generated by irradiating an interface between the periodic structure and the sensor material with light.
摘要翻译：基于传感器材料的传感器介质的表面传播的表面等离子体激元波的强度，检测传感器材料与试样的反应的化学传感器主要由传感器介质构成。传感器介质包括周期性结构和设置在周期性结构上的传感器材料。周期性结构具有基本上等于通过用光照射周期性结构和传感器材料之间的界面而产生的表面等离子体极化子波的波长的整数倍的间距。

9. 发明申请

WO2007072986A1 SUBSTRATE FOR TARGET SUBSTANCE DETECTING DEVICE, TARGET SUBSTANCE DETECTING DEVICE, TARGET SUBSTANCE DETECTING APPARATUS AND METHOD USING THE SAME, AND KIT THEREFOR 审中-公开
标题翻译：目标物质检测装置的基板，目标物质检测装置，目标物质检测装置及使用其的方法及其工具
公开(公告)号：WO2007072986A1
公开(公告)日：2007-06-28
申请号：PCT/JP2006/325994
申请日：2006-12-20
申请人： CANON KABUSHIKI KAISHA , YAMAMICHI, Junta , NISHIUMA, Satoru , YAMADA, Tomohiro , OGINO, Masaya , KURODA, Ryo , SHIOTSUKA, Hidenori
发明人： YAMAMICHI, Junta , NISHIUMA, Satoru , YAMADA, Tomohiro , OGINO, Masaya , KURODA, Ryo , SHIOTSUKA, Hidenori
IPC分类号： G01N21/55
CPC分类号： G01N21/554 , G01N21/648 , G01N21/658 , Y10S436/805
摘要： A substrate for forming a target substance detecting device includes a supporting member (3) , an underlying layer (2) disposed on a surface of the supporting member, and a metal pattern layer (1) , disposed on a surface of the underlying layer, for being bound to a target substance trapping substance capable of trapping a target substance in a specimen solution at least containing water as a liquid medium to detect the target substance by utilizing plasmon resonance. The underlying layer has a refractive index nb satisfying the following relationship: 0.90na
摘要翻译：用于形成目标物质检测装置的基板包括支撑构件（3），设置在支撑构件的表面上的下层（2）和设置在下层的表面上的金属图案层（1）用于将至少含有水作为液体介质的样品溶液中的目标物质捕获的目标物质捕获物质结合，以通过利用等离子体共振来检测目标物质。底层具有满足以下关系的折射率nb：0.90na <= nb <= 1.05na，其中na表示水的折射率。

10. 发明申请

WO2006004177A1 NEAR-FIELD EXPOSURE METHOD AND DEVICE MANUFACTURING METHOD USING THE SAME 审中-公开
标题翻译：近场曝光方法及使用其的装置制造方法
公开(公告)号：WO2006004177A1
公开(公告)日：2006-01-12
申请号：PCT/JP2005/012528
申请日：2005-06-30
申请人： CANON KABUSHIKI KAISHA , MIZUTANI, Natsuhiko , KURODA, Ryo
发明人： MIZUTANI, Natsuhiko , KURODA, Ryo
IPC分类号： H01L21/027
CPC分类号： G03F7/7035 , B82Y10/00 , G03F7/70325
摘要： Disclosed is a near-field exposure method including a process of bringing a light blocking film with a plurality of small openings each having an opening width not greater than a wavelength of exposure light, into close contact with a photoresist layer provided on a surface of a substrate, and a process of projecting exposure light from an exposure light source to the light blocking film to transfer an opening pattern of the light blocking film to the photoresist layer, wherein, on the basis of a correlation between (a) a distance from a node of a standing wave to be produced in the photoresist layer to the light blocking film and (b) a light intensity distribution of near-field light to be produced in the photoresist layer adjacent the light blocking film, the distance from the standing wave node to the light blocking film is determined so as to provide a desired light intensity distribution.
摘要翻译：公开了一种近场曝光方法，包括使具有不大于曝光光的波长的开口宽度的多个小开口的遮光膜与设置在曝光光的表面上的光致抗蚀剂层紧密接触的工艺以及将曝光光源的曝光光投射到遮光膜以将遮光膜的开口图案转印到光致抗蚀剂层的处理，其中，基于（a）距离在光致抗蚀剂层中产生的阻挡膜的驻波的节点和（b）在与阻光膜相邻的光致抗蚀剂层中要产生的近场光的光强度分布，与驻波结点的距离确定遮光膜以提供期望的光强度分布。

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