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1. 发明公开

EP1445354A3 Dielectric film structure, piezoelectric actuator using dielectric element film structure and ink jet head 有权
标题翻译：与其压电致动器和喷墨印刷头提供了一种电介质膜的结构
公开(公告)号：EP1445354A3
公开(公告)日：2005-10-19
申请号：EP04002603.1
申请日：2004-02-05
申请人： CANON KABUSHIKI KAISHA
发明人： Aoto, Hiroshi , Takeda, Kenichi , Fukui, Tetsuro , Ifuku, Toshihiro
IPC分类号： C30B23/02 , C30B29/30 , C30B29/32 , H01L41/18 , B41J2/14
CPC分类号： B41J2/14233 , H01L41/0973 , H01L41/316
摘要： The present invention provides a dielectric film structure having a substrate and a dielectric film provided on the substrate and in which the dielectric film has (001) face orientation with respect to the substrate, and in which a value u in the following equation (1) regarding the dielectric film is a real number greater than 2: u = (C c /C a ) × (W a /W c ) where, C c is a count number of a peak of a (001') face of the dielectric film in an Out-of-plane X ray diffraction measurement (here, l' is a natural number selected so that C c becomes maximum); C a is a count number of a peak of a (h'00) face of the dielectric film in an In-plane X ray diffraction measurement (here, h' is a natural number selected so that C c becomes maximum); W c is a half-value width of a peak of the (001') face of the dielectric film in an Out-of-plane rocking curve X ray diffraction measurement; and W a is a half-value width of a peak of the (h'00) face of the dielectric film in an In-plane rocking curve X ray diffraction measurement.

2. 发明授权

EP1445354B1 Dielectric film structure and method for its manufacture, piezoelectric actuator and ink jet head using this structure 有权
标题翻译：的介电膜的结构，以及它们的制备方法，与其压电致动器和喷墨印刷头提供
公开(公告)号：EP1445354B1
公开(公告)日：2009-08-26
申请号：EP04002603.1
申请日：2004-02-05
申请人： CANON KABUSHIKI KAISHA
发明人： Aoto, Hiroshi , Takeda, Kenichi , Fukui, Tetsuro , Ifuku, Toshihiro
IPC分类号： C30B23/02 , C30B29/30 , C30B29/32 , H01L41/18 , B41J2/14
CPC分类号： B41J2/14233 , H01L41/0973 , H01L41/316
摘要： The present invention provides a dielectric film structure having a substrate and a dielectric film provided on the substrate and in which the dielectric film has (001) face orientation with respect to the substrate, and in which a value u in the following equation (1) regarding the dielectric film is a real number greater than 2: u = (Cc/Ca) x (Wa/Wc) where, Cc is a count number of a peak of a (001') face of the dielectric film in an Out-of-plane X ray diffraction measurement (here, l' is a natural number selected so that Cc becomes maximum); Ca is a count number of a peak of a (h'00) face of the dielectric film in an In-plane X ray diffraction measurement (here, h' is a natural number selected so that Cc becomes maximum); Wc is a half-value width of a peak of the (001') face of the dielectric film in an Out-of-plane rocking curve X ray diffraction measurement; and Wa is a half-value width of a peak of the (h'00) face of the dielectric film in an In-plane rocking curve X ray diffraction measurement.

3. 发明公开

EP1445354A2 Dielectric film structure, piezoelectric actuator using dielectric element film structure and ink jet head 有权
标题翻译：的介电膜的结构，以及它们的制备方法，与其压电致动器和喷墨印刷头提供
公开(公告)号：EP1445354A2
公开(公告)日：2004-08-11
申请号：EP04002603.1
申请日：2004-02-05
申请人： CANON KABUSHIKI KAISHA
发明人： Aoto, Hiroshi , Takeda, Kenichi , Fukui, Tetsuro , Ifuku, Toshihiro
IPC分类号： C30B23/02 , C30B29/30 , C30B29/32 , H01L41/18 , B41J2/14
CPC分类号： B41J2/14233 , H01L41/0973 , H01L41/316
摘要： The present invention provides a dielectric film structure having a substrate and a dielectric film provided on the substrate and in which the dielectric film has (001) face orientation with respect to the substrate, and in which a value u in the following equation (1) regarding the dielectric film is a real number greater than 2: u = (C c /C a ) × (W a /W c ) where, C c is a count number of a peak of a (001') face of the dielectric film in an Out-of-plane X ray diffraction measurement (here, l' is a natural number selected so that C c becomes maximum); C a is a count number of a peak of a (h'00) face of the dielectric film in an In-plane X ray diffraction measurement (here, h' is a natural number selected so that C c becomes maximum); W c is a half-value width of a peak of the (001') face of the dielectric film in an Out-of-plane rocking curve X ray diffraction measurement; and W a is a half-value width of a peak of the (h'00) face of the dielectric film in an In-plane rocking curve X ray diffraction measurement.
摘要翻译：本发明提供一种具有基板和介电膜设置在所述基片和在其中一个电介质薄膜结构的介电膜，具有（001）面取向相对于所述基板，且其中在以下等式中的值U（1）关于介电膜是大于2的实数： U =（CC /钙）×（WA / WC）其中，CC是一个峰的计数数（001“）中，以乱平面X射线衍射测定面上的电介质膜（在此，L”是选择所以没有CC变为最大的自然数）; CA是电介质膜中的一个（H'00）面的峰的计数数目到面内X射线衍射测定（这里，h“的是选择为使得没有CC变为最大的自然数）; WC是的峰值的电介质膜中的面的（001“）在外的平面中的半值宽度摇摆曲线中X射线衍射测量; 和Wa是电介质膜中的（H'00）面的峰的半值宽度的面内摇摆曲线中X射线衍射测定。

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