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1. 发明申请

US20110262860A1 NOVEL DUAL-TONE RESIST FORMULATIONS AND METHODS 审中-公开
标题翻译：新型双音抑制剂制剂和方法
公开(公告)号：US20110262860A1
公开(公告)日：2011-10-27
申请号：US13090502
申请日：2011-04-20
申请人： C. Grant Willson , Wei-Lun Kane Jen , Brandon Mark Rawlings , Jeffrey Ryan Strahan
发明人： C. Grant Willson , Wei-Lun Kane Jen , Brandon Mark Rawlings , Jeffrey Ryan Strahan
IPC分类号： G03F7/20 , G03F7/004
CPC分类号： G03F7/213 , G03F7/004 , G03F7/0236 , G03F7/0382 , G03F7/095 , G03F7/40 , H01L21/0274 , H01L21/31116 , H01L21/31144
摘要： Dual tone photoresist formulations comprising a photoacid generator are described and employed in fabrication techniques, including methods of making structures on substrates, and more particularly, methods of making electronic devices (e.g. transistors and the like) on flexible substrates wherein two patterns are formed simultaneously in one layer of photoresist.
摘要翻译：包括光致酸发生器的双色光致抗蚀剂制剂在制造技术中被描述和采用，包括在衬底上制造结构的方法，更具体地，涉及在柔性衬底上制造电子器件（例如晶体管等）的方法，其中两个图案同时形成一层光刻胶。

2. 发明授权

US09120947B2 Surface treatments for alignment of block copolymers 有权
标题翻译：用于嵌段共聚物取向的表面处理
公开(公告)号：US09120947B2
公开(公告)日：2015-09-01
申请号：US13583518
申请日：2011-03-17
申请人： C. Grant Willson , Christopher M. Bates , Jeffrey Strahan , Christopher John Ellison
发明人： C. Grant Willson , Christopher M. Bates , Jeffrey Strahan , Christopher John Ellison
IPC分类号： B05D3/12 , C09D153/00 , B81C1/00 , G03F7/00 , G03F7/26 , B05D1/00
CPC分类号： C09D153/00 , B05D1/005 , B81C1/00031 , B81C2201/0149 , G03F7/0002 , G03F7/265 , Y10T428/24355 , Y10T428/265 , Y10T428/31935 , Y10T428/31938
摘要： The present invention relates to a method the synthesis and utilization of random, cross-linked, substituted polystyrene copolymers as polymeric cross-linked surface treatments (PXSTs) to control the orientation of physical features of a block copolymer deposited over the first copolymer. Such methods have many uses including multiple applications in the semiconductor industry including production of templates for nanoimprint lithography.
摘要翻译：本发明涉及合成和利用随机交联的取代的聚苯乙烯共聚物作为聚合交联表面处理（PXST）的方法，以控制沉积在第一共聚物上的嵌段共聚物的物理特征的取向。这种方法具有许多用途，包括半导体工业中的多种应用，包括生产纳米压印光刻用模板。

3. 发明授权

US07691275B2 Use of step and flash imprint lithography for direct imprinting of dielectric materials for dual damascene processing 失效
标题翻译：使用步进和闪光压印光刻技术直接刻印用于双镶嵌加工的介质材料
公开(公告)号：US07691275B2
公开(公告)日：2010-04-06
申请号：US11363071
申请日：2006-02-27
申请人： C. Grant Willson , Frank Palmieri , Yukio Nishimura , Stephen C. Johnson , Michael D. Stewart
发明人： C. Grant Willson , Frank Palmieri , Yukio Nishimura , Stephen C. Johnson , Michael D. Stewart
IPC分类号： H01L21/302
CPC分类号： H01L21/76817 , B82Y10/00 , B82Y40/00 , G03F7/0002 , H01L21/76807 , H01L21/76828
摘要： In some embodiments, the present invention is directed to methods that involve the combination of step-and-flash imprint lithography (SFIL) with a multi-tier template to simultaneously pattern multiple levels of, for example, an integrated circuit device. In such embodiments, the imprinted material generally does not serve or act as a simple etch mask or photoresist, but rather serves as the insulation between levels and lines, i.e., as a functional dielectric material. After imprinting and a multiple step curing process, the imprinted pattern is filled with metal, as in dual damascene processing. Typically, the two printed levels will comprise a “via level,” which is used to make electrical contact with the previously patterned under-level, and a “wiring level.” The present invention provides for the direct patterning of functional materials, which represents a significant departure from the traditional approach to microelectronics manufacturing.
摘要翻译：在一些实施例中，本发明涉及涉及步进和快速压印光刻（SFIL）与多层模板的组合以同时对例如集成电路器件的多个级别进行图案化的方法。在这样的实施例中，压印材料通常不起到或用作简单的蚀刻掩模或光致抗蚀剂的作用，而是用作层和线之间的绝缘，即功能介电材料。在印迹和多步固化过程之后，印刷图案充满金属，如在双镶嵌加工中。通常，两个印刷层将包括用于与先前图案化的底层电接触的“通孔层”和“布线层”。本发明提供了功能材料的直接图案化，其代表显着地偏离了传统的微电子制造方法。

4. 发明授权

US07365103B2 Compositions for dark-field polymerization and method of using the same for imprint lithography processes 有权
标题翻译：用于暗场聚合的组合物及其用于压印光刻工艺的方法
公开(公告)号：US07365103B2
公开(公告)日：2008-04-29
申请号：US10318273
申请日：2002-12-12
申请人： C. Grant Willson , Nicholas A. Stacey
发明人： C. Grant Willson , Nicholas A. Stacey
IPC分类号： C08F220/18 , C08F230/08 , C08F2/48
CPC分类号： B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/0045 , G03F7/0757
摘要： A composition is provided and a method of using the same to form a pattern on a substrate using imprint lithography employing dark-field polymerization is disclosed. The composition includes a polymerizable bisvinylether and an initiator that produces an acid in response to radiation.
摘要翻译：提供了一种组合物，并且公开了使用其使用使用暗视野聚合的压印光刻在基板上形成图案的方法。组合物包括可聚合的双乙烯基醚和引发剂，其响应于辐射而产生酸。

5. 发明申请

US20130045361A1 SURFACE TREATMENTS FOR ALIGNMENT OF BLOCK COPOLYMERS 有权
标题翻译：表面处理嵌段共聚物的配位
公开(公告)号：US20130045361A1
公开(公告)日：2013-02-21
申请号：US13583518
申请日：2011-03-17
申请人： C. Grant Willson , Christopher M. Bates , Jeffrey Strahan , Christopher John Ellison
发明人： C. Grant Willson , Christopher M. Bates , Jeffrey Strahan , Christopher John Ellison
IPC分类号： B32B27/32 , B32B33/00 , B05D1/38 , B05D3/12 , B82Y30/00 , B82Y40/00
CPC分类号： C09D153/00 , B05D1/005 , B81C1/00031 , B81C2201/0149 , G03F7/0002 , G03F7/265 , Y10T428/24355 , Y10T428/265 , Y10T428/31935 , Y10T428/31938
摘要： The present invention relates to a method the synthesis and utilization of random, cross-linked, substituted polystyrene copolymers as polymeric cross-linked surface treatments (PXSTs) to control the orientation of physical features of a block copolymer deposited over the first copolymer. Such methods have many uses including multiple applications in the semi-conductor industry including production of templates for nanoimprint lithography.
摘要翻译：本发明涉及合成和利用随机交联的取代的聚苯乙烯共聚物作为聚合交联表面处理（PXST）的方法，以控制沉积在第一共聚物上的嵌段共聚物的物理特征的取向。这种方法具有许多用途，包括半导体工业中的多种应用，包括生产纳米压印光刻的模板。

6. 发明授权

US07651850B2 Image and part recognition technology 失效
标题翻译：图像和零件识别技术
公开(公告)号：US07651850B2
公开(公告)日：2010-01-26
申请号：US10847635
申请日：2004-05-17
申请人： Jason E. Meiring , Timothy B. Michaelson , C. Grant Willson
发明人： Jason E. Meiring , Timothy B. Michaelson , C. Grant Willson
IPC分类号： C12M1/36
CPC分类号： G06K7/1456 , G06K7/14 , G06K19/06037 , G06K19/06196
摘要： A system and method for recognition of images may include the use of alignment markers. The image recognized may be a pattern from an array, a character, a number, a shape, and/or irregular shapes. The pattern may be formed by elements in an array such as an identification marking and/or a sensor array. More particularly, the system and method relate to discriminating between images by accounting for the orientation of the image. The size and/or location of alignment markers may provide information about the orientation of an image. Information about the orientation of an image may reduce false recognitions. The system and method of image recognition may be used with identification markings, biosensors, micro-fluidic arrays, and/or optical character recognition systems.
摘要翻译：用于识别图像的系统和方法可以包括使用对准标记。识别的图像可以是来自阵列，字符，数字，形状和/或不规则形状的图案。图案可以由诸如识别标记和/或传感器阵列的阵列中的元件形成。更具体地，该系统和方法涉及通过考虑图像的取向来区分图像。对准标记的尺寸和/或位置可以提供关于图像的取向的信息。有关图像方向的信息可能会减少错误的识别。图像识别的系统和方法可以与识别标记，生物传感器，微流体阵列和/或光学字符识别系统一起使用。

7. 发明申请

US20090017271A1 Densely packed sensor arrays 有权
标题翻译：密集的传感器阵列
公开(公告)号：US20090017271A1
公开(公告)日：2009-01-15
申请号：US11981282
申请日：2007-10-31
申请人： Jason E. Meiring , Timothy B. Michaelson , C. Grant Willson
发明人： Jason E. Meiring , Timothy B. Michaelson , C. Grant Willson
IPC分类号： B32B3/10 , B05D5/00
CPC分类号： G06K7/14 , G06K7/1456 , G06K19/06037 , Y10T428/24802
摘要： A system and method for recognition of images may include the use of alignment markers. The image recognized may be a pattern from an array, a character, a number, a shape, and/or irregular shapes. The pattern may be formed by elements in an array such as an identification marking and/or a sensor array. More particularly, the system and method relate to discriminating between images by accounting for the orientation of the image. The size and/or location of alignment markers may provide information about the orientation of an image. Information about the orientation of an image may reduce false recognitions. The system and method of image recognition may be used with identification markings, biosensors, micro-fluidic arrays, and/or optical character recognition systems.
摘要翻译：用于识别图像的系统和方法可以包括使用对准标记。识别的图像可以是来自阵列，字符，数字，形状和/或不规则形状的图案。图案可以由诸如识别标记和/或传感器阵列的阵列中的元件形成。更具体地，该系统和方法涉及通过考虑图像的取向来区分图像。对准标记的尺寸和/或位置可以提供关于图像的取向的信息。有关图像方向的信息可能会减少错误的识别。图像识别的系统和方法可以与识别标记，生物传感器，微流体阵列和/或光学字符识别系统一起使用。

8. 发明授权

US06399273B1 Water-processable photoresist compositions 失效
标题翻译：可水加工的光致抗蚀剂组合物
公开(公告)号：US06399273B1
公开(公告)日：2002-06-04
申请号：US09639382
申请日：2000-08-14
申请人： Shintaro Yamada , Timo Rager , C. Grant Willson
发明人： Shintaro Yamada , Timo Rager , C. Grant Willson
IPC分类号： G03F7039
CPC分类号： G03F7/0392 , C08F8/12 , C08F212/14 , C08F2800/10 , C08F2800/20 , G03F7/0045 , G03F7/039 , G03F7/168 , Y10S430/106 , Y10S430/111 , Y10S430/12 , C08F122/14
摘要： Water-processable positive-tone photoresists comprising a water-soluble polymer, wherein the polymer contains a heat-labile functional group that renders the polymer insoluble in water or an aqueous base upon heat treatment, and an acid-labile functional group that restores said water or aqueous base solubility to the polymer upon irradiation in the presence of a water-processable photoacid generator, are described. Also described are the methods of making such polymers and photoresists.
摘要翻译：包含水溶性聚合物的可水加工的正色调光致抗蚀剂，其中所述聚合物含有使聚合物不溶于水或热处理时的水性碱的热不稳定官能团，以及还原所述水的酸不稳定官能团或在水可加工的光致酸产生剂的存在下照射时对基体的水溶性。还描述了制备这种聚合物和光致抗蚀剂的方法。

9. 发明申请

US20130022785A1 OLIGOSACCHARIDE/SILICON-CONTAINING BLOCK COPOLYMERS FOR LITHOGRAPHY APPLICATIONS 审中-公开
标题翻译：低分子量/硅含量嵌段共聚物
公开(公告)号：US20130022785A1
公开(公告)日：2013-01-24
申请号：US13528314
申请日：2012-06-20
申请人： Christopher John Ellison , Julia Cushen , Issei Otsuka , C. Grant Willson , Christopher M. Bates , Jeffery Alan Easley , Redouane Borsali , Sebastien Fort , Sami Halila
发明人： Christopher John Ellison , Julia Cushen , Issei Otsuka , C. Grant Willson , Christopher M. Bates , Jeffery Alan Easley , Redouane Borsali , Sebastien Fort , Sami Halila
IPC分类号： C08F283/06 , B44C1/22 , B32B33/00 , B05D3/00 , B05D3/12 , B82Y30/00
CPC分类号： C08F293/005 , B82Y10/00 , B82Y40/00 , C07H23/00 , C08B37/0006 , C08B37/0012 , C08G81/024 , G03F7/0002 , Y10T428/24355
摘要： The present invention discloses diblock copolymer systems that self-assemble to produce very small structures. These co-polymers consist of one block that contains silicon and another block comprised of an oligosaccharide that are coupled by azide-alkyne cycloaddition.
摘要翻译：本发明公开了自组装以产生非常小的结构的二嵌段共聚物体系。这些共聚物由含有硅的一个嵌段和由通过叠氮炔 - 环加成偶联的寡糖组成的另一嵌段组成。

10. 发明授权

US07901945B2 Image and part recognition technology 有权
标题翻译：图像和零件识别技术
公开(公告)号：US07901945B2
公开(公告)日：2011-03-08
申请号：US12174245
申请日：2008-07-16
申请人： Jason E. Meiring , Timothy B. Michaelson , C. Grant Willson
发明人： Jason E. Meiring , Timothy B. Michaelson , C. Grant Willson
IPC分类号： G01N21/00
CPC分类号： G06K7/1456 , G06K7/14 , G06K19/06037 , G06K19/06196
摘要： A system and method for recognition of images may include the use of alignment markers. The image recognized may be a pattern from an array, a character, a number, a shape, and/or irregular shapes. The pattern may be formed by elements in an array such as an identification marking and/or a sensor array. More particularly, the system and method relate to discriminating between images by accounting for the orientation of the image. The size and/or location of alignment markers may provide information about the orientation of an image. Information about the orientation of an image may reduce false recognitions. The system and method of image recognition may be used with identification markings, biosensors, micro-fluidic arrays, and/or optical character recognition systems.
摘要翻译：用于识别图像的系统和方法可以包括使用对准标记。识别的图像可以是来自阵列，字符，数字，形状和/或不规则形状的图案。图案可以由诸如识别标记和/或传感器阵列的阵列中的元件形成。更具体地，该系统和方法涉及通过考虑图像的取向来区分图像。对准标记的尺寸和/或位置可以提供关于图像的取向的信息。有关图像方向的信息可能会减少错误的识别。图像识别的系统和方法可以与识别标记，生物传感器，微流体阵列和/或光学字符识别系统一起使用。

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