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1. 发明授权

US09329491B2 Method of adjusting speed and/or routing of a table movement plan and a lithographic apparatus 有权
标题翻译：调整台面移动平面图和光刻设备的速度和/或路线的方法
公开(公告)号：US09329491B2
公开(公告)日：2016-05-03
申请号：US13168177
申请日：2011-06-24
申请人： Cédric Désiré Grouwstra , Nicolaas Rudolf Kemper , Norbertus Josephus Martinus Van Den Nieuwelaar , Dirk De Vries , Hua Li , Marinus Jochemsen
发明人： Cédric Désiré Grouwstra , Nicolaas Rudolf Kemper , Norbertus Josephus Martinus Van Den Nieuwelaar , Dirk De Vries , Hua Li , Marinus Jochemsen
IPC分类号： G03B27/52 , G03F7/20
CPC分类号： G03F7/70775 , G03F7/70341 , G03F7/70725
摘要： A method of adjusting speed and/or routing of a part of a movement plan of a table under an immersion fluid supply system of a lithographic apparatus. The method includes splitting the movement plan of the table into a plurality of discrete movements; determining a risk of a bubble of a size greater than a certain size being present in immersion fluid through which a patterned beam of the lithographic apparatus will pass during a certain discrete movement by determining whether the immersion fluid supply system passes over a position at which immersion fluid leaked from the immersion fluid supply system is present; and adjusting the speed and/or routing of a part of the movement plan corresponding to (i) a discrete movement earlier than a discrete movement for which the risk of a bubble is determined, and/or (ii) a discrete movement for which the risk of a bubble is determined.
摘要翻译：一种在光刻设备的浸没液体供应系统下调整桌子的运动计划的一部分的速度和/或路线的方法。该方法包括将表的运动计划分成多个离散运动; 确定存在于浸没流体中的尺寸大于一定尺寸的气泡的风险，通过该浸入流体中的光刻设备的图案化束将在特定离散运动期间通过该气泡通过确定浸没流体供应系统是否经过浸没的位置存在从浸没液体供应系统泄漏的液体; 以及调整所述运动计划的一部分的速度和/或路线，其对应于（i）比确定气泡风险的离散运动更早的离散运动，和/或（ii）离散运动，确定泡沫的风险。

2. 发明授权

US08129097B2 Immersion lithography 失效
标题翻译：浸没光刻
公开(公告)号：US08129097B2
公开(公告)日：2012-03-06
申请号：US12318033
申请日：2008-12-19
申请人： Dirk De Vries , Richard Moerman , Cédric Désiré Grouwstra , Michel Franciscus Johannes Van Rooy
发明人： Dirk De Vries , Richard Moerman , Cédric Désiré Grouwstra , Michel Franciscus Johannes Van Rooy
IPC分类号： G03F7/26
CPC分类号： G03F7/70916 , G03F7/70341 , G03F7/70608
摘要： A method of obtaining information related to a defect present in the irradiation of a substrate coated with a layer of radiation sensitive material using immersion lithography is disclosed. The method includes irradiating an area of the radiation sensitive material with a non-patterned radiation beam, the area being irradiated with a dose which is sufficient for the radiation sensitive material to be substantially removed during subsequent development of the radiation sensitive material if the radiation sensitive material is a positive radiation sensitive material, or with a dose which is sufficient for the radiation sensitive material to be substantially insoluble during subsequent development of the radiation sensitive material if the radiation sensitive material is a negative radiation sensitive material. The method further includes developing the radiation sensitive material and obtaining information at least indicative of the topography of radiation sensitive material remaining on the substrate after the radiation sensitive material has been developed in order to obtain information related to the defect.
摘要翻译：公开了一种使用浸没式光刻法获得与涂覆有辐射敏感材料层的基板的照射中存在的缺陷有关的信息的方法。该方法包括用未图案化的辐射束照射辐射敏感材料的区域，如果辐射敏感材料的辐射敏感材料的后续显影期间，该辐射敏感材料的辐射敏感材料的辐射敏感材料的辐照敏感材料的辐射敏感材料的辐照敏感材料材料是正的辐射敏感材料，或者如果辐射敏感材料是负辐射敏感材料，则辐射敏感材料在辐射敏感材料的后续显影期间足以使辐射敏感材料基本上不溶的剂量。该方法还包括开发辐射敏感材料并获得至少指示辐射敏感材料已被开发之后剩余在基底上的辐射敏感材料的形貌的信息，以获得与该缺陷有关的信息。

3. 发明授权

US08435593B2 Method of inspecting a substrate and method of preparing a substrate for lithography 有权
标题翻译：检查基板的方法和制备光刻用基板的方法
公开(公告)号：US08435593B2
公开(公告)日：2013-05-07
申请号：US11802422
申请日：2007-05-22
申请人： Rik Teodoor Vangheluwe , Youri Johannes Laurentius Maria Van Dommelen , Johannes Anna Quaedackers , Cédric Désiré Grouwstra , Thijs Egidius Johannes Knaapen , Ralf Martinus Marinus Daverveld , Jeroen Hubert Rommers
发明人： Rik Teodoor Vangheluwe , Youri Johannes Laurentius Maria Van Dommelen , Johannes Anna Quaedackers , Cédric Désiré Grouwstra , Thijs Egidius Johannes Knaapen , Ralf Martinus Marinus Daverveld , Jeroen Hubert Rommers
IPC分类号： C23C16/52
CPC分类号： G03F7/70608
摘要： A method of inspecting a substrate with first and second layers thereon is disclosed. The method includes directing a beam of electromagnetic radiation at an acute angle towards an edge of the layers, detecting scattered and/or reflected electromagnetic radiation, and establishing, from results of the detecting, whether an edge of the second layer overlaps an edge of the first layer.
摘要翻译：公开了一种在其上具有第一和第二层的衬底的检查方法。所述方法包括将电磁辐射束以锐角朝向所述层的边缘引导，检测散射和/或反射的电磁辐射，以及从所述检测结果建立所述第二层的边缘是否与所述第二层的边缘重叠第一层

4. 发明授权

US08330936B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US08330936B2
公开(公告)日：2012-12-11
申请号：US11523743
申请日：2006-09-20
申请人： Bob Streefkerk , Youri Johannes Laurentius Maria Van Dommelen , Richard Moerman , Cédric Désiré Grouwstra
发明人： Bob Streefkerk , Youri Johannes Laurentius Maria Van Dommelen , Richard Moerman , Cédric Désiré Grouwstra
IPC分类号： G03B27/42 , G03B27/32
CPC分类号： G03F7/70341 , G03F7/70425
摘要： A path which a substrate should take under the projection system during immersion lithography imaging of a plurality of dies on the top surface of the substrate is disclosed.
摘要翻译：公开了一种在衬底的顶表面上的多个管芯的浸没光刻成像期间衬底应该在投影系统下面的路径。

5. 发明授权

US09036127B2 Lithographic apparatus 有权
标题翻译：平版印刷设备
公开(公告)号：US09036127B2
公开(公告)日：2015-05-19
申请号：US12423528
申请日：2009-04-14
申请人： Clemens Johannes Gerardus Van den Dungen , Nicolaas Franciscus Koppelaars , Martinus Hendrikus Antonius Leenders , Paulus Martinus Maria Liebregts , Johannes Catharinus Hubertus Mulkens , Erik Henricus Egidius Catharina Eummelen , Marcel Beckers , Richard Moerman , Cédric Désiré Grouwstra , Danny Maria Hubertus Philips , Remko Jan Peter Verhees , Pieter Mulder , Evert Van Vliet
发明人： Clemens Johannes Gerardus Van den Dungen , Nicolaas Franciscus Koppelaars , Martinus Hendrikus Antonius Leenders , Paulus Martinus Maria Liebregts , Johannes Catharinus Hubertus Mulkens , Erik Henricus Egidius Catharina Eummelen , Marcel Beckers , Richard Moerman , Cédric Désiré Grouwstra , Danny Maria Hubertus Philips , Remko Jan Peter Verhees , Pieter Mulder , Evert Van Vliet
IPC分类号： G03F7/20
CPC分类号： G03F7/70866 , G03F7/70341
摘要： An immersion lithographic apparatus is disclosed that includes a fluid supply system configured to supply a fluid, the fluid supply system having a chamber with a plurality of inlet holes in a first side wall and a plurality of outlet holes in a second side wall, the first side wall facing the second side wall, wherein the inlet holes direct fluid entering the chamber in a direction towards areas of the second side wall between the plurality of outlet holes.
摘要翻译：公开了一种浸没式光刻设备，其包括被配置为供应流体的流体供应系统，所述流体供应系统具有在第一侧壁中具有多个入口孔的腔室和在第二侧壁中的多个出口孔，所述第一面向第二侧壁的侧壁，其中入口孔引导流体沿朝向多个出口孔之间的第二侧壁的区域的方向进入腔室。

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