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1. 发明授权

US09223202B2 Method of automatic fluid dispensing for imprint lithography processes 有权
标题翻译：压印光刻工艺的自动流体分配方法
公开(公告)号：US09223202B2
公开(公告)日：2015-12-29
申请号：US11774710
申请日：2007-07-09
申请人： Byung-Jin Choi , Sidlgata V. Sreenivasan , Carlton Grant Willson , Mattherw E. Colburn , Todd C. Bailey , John G. Ekerdt
发明人： Byung-Jin Choi , Sidlgata V. Sreenivasan , Carlton Grant Willson , Mattherw E. Colburn , Todd C. Bailey , John G. Ekerdt
IPC分类号： G03F7/00 , B82Y10/00 , B82Y40/00 , G03F7/16
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/16 , G03F7/164 , H01L2224/29012 , H01L2224/3003 , H01L2224/3016 , H01L2924/01067 , H01L2924/1461 , H01L2924/00
摘要： Disclosed herein is an automatic fluid dispensing method and system for dispensing fluid on the surface of a plate-like material, or substrate, including a semiconductor wafer for imprint lithography processes. The dispensing method uses fluid dispenser and a substrate stage that may generate relative lateral motions between a fluid dispenser tip a substrate. Also described herein are methods and devices for creating a planar surface on a substrate using a substantially unpatterned planar template.
摘要翻译：本文公开了一种用于在板状材料或基板的表面上分配流体的自动流体分配方法和系统，其包括用于压印光刻工艺的半导体晶片。分配方法使用流体分配器和可在流体分配器尖端基底之间产生相对侧向运动的基底台。本文还描述了使用基本上未图案化的平面模板在衬底上创建平面表面的方法和装置。

2. 发明授权

US08865046B2 Imprinting of partial fields at the edge of the wafer 有权
标题翻译：在晶片边缘印刷局部场
公开(公告)号：US08865046B2
公开(公告)日：2014-10-21
申请号：US13098959
申请日：2011-05-02
申请人： Sidlgata V. Sreenivasan , Byung-Jin Choi
发明人： Sidlgata V. Sreenivasan , Byung-Jin Choi
IPC分类号： B29C43/58 , B29C59/00 , B82Y40/00 , G03F7/00 , B29C43/00 , B82Y10/00 , B29C43/02
CPC分类号： B29C43/58 , B29C43/003 , B29C43/021 , B29C2043/025 , B29C2043/5808 , B29C2043/5825 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： Edge field patterning of a substrate having full fields and partial fields may include patterning using a template having multiple mesas with each mesa corresponding to a field on the substrate. Polymerizable material may be deposited solely between the template and the full fields of the substrate. A non-reactive material may be deposited between the template and partial fields of the substrate.
摘要翻译：具有全场和部分场的衬底的边缘场图案化可以包括使用具有多个台面的模板进行图案化，每个台面与每个台面对应于衬底上的场。可聚合材料可以仅沉积在模板和基底的整个场之间。非反应性材料可以沉积在基板的模板和部分场之间。

3. 发明申请

US20110260361A1 SAFE DEPARATION FOR NANO IMPRINTING 有权
标题翻译： NANO IMPRINTING的安全拨款
公开(公告)号：US20110260361A1
公开(公告)日：2011-10-27
申请号：US13095514
申请日：2011-04-27
申请人： Se-Hyuk Im , Mahadevan GanapathiSubramanian , Edward Brian Fletcher , Niyaz Khusnatdinov , Gerard M. Schmid , Mario Johannes Meissl , Anshuman Cherala , Frank Y. Xu , Byung-Jin Choi , Sidlgata V. Sreenivasan
发明人： Se-Hyuk Im , Mahadevan GanapathiSubramanian , Edward Brian Fletcher , Niyaz Khusnatdinov , Gerard M. Schmid , Mario Johannes Meissl , Anshuman Cherala , Frank Y. Xu , Byung-Jin Choi , Sidlgata V. Sreenivasan
IPC分类号： B29C59/02 , B82Y30/00
CPC分类号： B29C59/02 , B29C45/76 , B29L2007/001 , B82Y10/00 , B82Y40/00 , G03F7/0002 , Y10S977/877
摘要： Control of lateral strain and lateral strain ratio (dt/db) between template and substrate through the selection of template and/or substrate thicknesses (Tt and/or Tb), control of template and/or substrate back pressure (Pt and/or Pb), and/or selection of material stiffness are described.
摘要翻译：通过选择模板和/或衬底厚度（Tt和/或Tb），模板和/或衬底背压（Pt和/或Pb）的控制来控制模板和衬底之间的横向应变和横向应变比（dt / db））和/或材料刚度的选择。

4. 发明申请

US20110212263A1 Imprinting of Partial Fields at the Edge of the Wafer 有权
标题翻译：在晶片边缘打印局部场
公开(公告)号：US20110212263A1
公开(公告)日：2011-09-01
申请号：US13098959
申请日：2011-05-02
申请人： Sidlgata V. Sreenivasan , Byung-Jin Choi
发明人： Sidlgata V. Sreenivasan , Byung-Jin Choi
IPC分类号： B05D3/12 , B05D5/00 , B05D1/36
CPC分类号： B29C43/58 , B29C43/003 , B29C43/021 , B29C2043/025 , B29C2043/5808 , B29C2043/5825 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： Edge field patterning of a substrate having full fields and partial fields may include patterning using a template having multiple mesas with each mesa corresponding to a field on the substrate. Polymerizable material may be deposited solely between the template and the full fields of the substrate. A non-reactive material may be deposited between the template and partial fields of the substrate.
摘要翻译：具有全场和部分场的衬底的边缘场图案化可以包括使用具有多个台面的模板进行图案化，每个台面与每个台面对应于衬底上的场。可聚合材料可以仅沉积在模板和基底的整个场之间。非反应性材料可以沉积在基板的模板和部分场之间。

5. 发明申请

US20110171340A1 Template Having a Varying Thickness to Facilitate Expelling a Gas Positioned Between a Substrate and the Template 有权
标题翻译：具有不同厚度的模板以便于排出位于基板和模板之间的气体
公开(公告)号：US20110171340A1
公开(公告)日：2011-07-14
申请号：US13073533
申请日：2011-03-28
申请人： Douglas J. Resnick , Mario J. Meissl , Byung-Jin Choi , Sidlgata V. Sreenivasan
发明人： Douglas J. Resnick , Mario J. Meissl , Byung-Jin Choi , Sidlgata V. Sreenivasan
IPC分类号： B29C59/02
CPC分类号： H01L21/67126 , B82Y10/00 , B82Y40/00 , G03F7/0002 , H01L21/6715
摘要： A nanoimprint lithography template including, inter alia, a body having first and second opposed sides with a first surface disposed on the first side, the second side having a recess disposed therein, the body having first and second regions with the second region surrounding the first region and the recess in superimposition with the first region, with a portion of the first surface in superimposition with the first region being spaced-apart from the second side a first distance and a portion of the first surface in superimposition with the second region being spaced-apart from the second side a second distance, with the second distance being greater than the first distance; and a mold disposed on the first side of the body in superimposition a portion of the first region.
摘要翻译：一种纳米压印光刻模板，其特别包括具有第一和第二相对侧的主体，第一表面设置在第一侧上，第二侧具有设置在其中的凹部，该主体具有第一和第二区域，第二区域围绕第一所述凹部与所述第一区域叠加，所述第一表面的与所述第一区域重叠的部分与所述第二侧面间隔开第一距离，并且所述第一表面的与所述第二区域重叠的部分间隔开从第二侧排出第二距离，第二距离大于第一距离; 以及模具，其设置在所述主体的第一侧上，以叠加所述第一区域的一部分。

6. 发明申请

US20110048160A1 Method and System to Control Movement of a Body for Nano-Scale Manufacturing 有权
标题翻译：控制纳米级制造机体运动的方法和系统
公开(公告)号：US20110048160A1
公开(公告)日：2011-03-03
申请号：US12942652
申请日：2010-11-09
申请人： Byung-Jin Choi , Sidlgata V. Sreenivasan
发明人： Byung-Jin Choi , Sidlgata V. Sreenivasan
IPC分类号： G03F9/00
CPC分类号： G03F7/0002 , B29C43/021 , B29C2043/025 , B29C2043/5858 , B82Y10/00 , B82Y40/00 , G03F9/00 , Y10T74/20341 , Y10T74/20348 , Y10T74/20354
摘要： Systems to control movement of a template during an imprint lithography process are described. The systems include an orientation stage having an inner frame, and outer frame, and a plurality of actuators coupled between the inner frame and the outer frame to vary translational motion and impart angular motion about a plurality of axes.
摘要翻译：描述了在压印光刻工艺期间控制模板运动的系统。这些系统包括具有内框架和外框架的定向台，以及联接在内框架和外框架之间的多个致动器，以改变平移运动并赋予围绕多个轴线的角运动。

7. 发明申请

US20100278954A1 Method of Concurrently Patterning a Substrate Having a Plurality of Fields and a Plurality of Alignment Marks 审中-公开
标题翻译：同时形成具有多个场和多个对准标记的基板的方法
公开(公告)号：US20100278954A1
公开(公告)日：2010-11-04
申请号：US12835018
申请日：2010-07-13
申请人： Sidlgata V. Sreenivasan , Ian M. McMackin , Christopher Mark Melliar-Smith , Byung-Jin Choi
发明人： Sidlgata V. Sreenivasan , Ian M. McMackin , Christopher Mark Melliar-Smith , Byung-Jin Choi
IPC分类号： B28B11/08
CPC分类号： B29C43/021 , B29C43/003 , B29C43/58 , B29C2043/025 , B29C2043/142 , B29C2043/5825 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/703 , G03F9/7042 , G03F9/7076 , G03F9/708 , G03F9/7084 , Y10S977/887
摘要： Imprint lithography templates for patterning substrates are described. The templates include a section having a mold a first pattern of alignment forming areas and template alignment marks. The additional sections are generally devoid of a mold. One or more of the additional section may include the first pattern of a second pattern of alignment forming areas and template alignment marks. The second pattern may correspond to the first pattern.
摘要翻译：描述用于图案化基板的印刷光刻模板。模板包括具有模具的部分，其具有对准形成区域的第一图案和模板对准标记。附加部分通常没有模具。附加部分中的一个或多个可以包括对准形成区域和模板对准标记的第二图案的第一图案。第二图案可以对应于第一图案。

8. 发明申请

US20100259745A1 METHOD FOR OBTAINING FORCE COMBINATIONS FOR TEMPLATE DEFORMATION USING NULLSPACE AND METHODS OPTIMIZATION TECHNIQUES 审中-公开
标题翻译：使用空位获取模板变形的力组合的方法和方法优化技术
公开(公告)号：US20100259745A1
公开(公告)日：2010-10-14
申请号：US12820542
申请日：2010-06-22
申请人： Anshuman Cherala , Sidlgata V. Sreenivasan , Byung-Jin Choi , Ecron D. Thompson
发明人： Anshuman Cherala , Sidlgata V. Sreenivasan , Byung-Jin Choi , Ecron D. Thompson
IPC分类号： G03B27/32
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/703 , G03F7/70633 , G03F7/70783 , G03F9/7003 , G03F9/7092
摘要： The present invention is directed towards a method for determining deformation parameters that a patterned device would undergo to minimize dimensional variations between a recorded pattern thereon and a reference pattern, the method including, inter alia, comparing spatial variation between features of the recorded pattern with respect to corresponding features of the reference pattern; and determining deformation forces to apply to the patterned device to attenuate the dimensional variations, with the forces having predetermined constraints, wherein a summation of a magnitude of the forces is substantially zero and a summation of moment of the forces is substantially zero.
摘要翻译：本发明涉及一种用于确定图案化装置将经历以使其上的记录图案与参考图案之间的尺寸变化最小化的变形参数的方法，该方法尤其包括将记录图案的特征与相对于参考图案的相应特征; 以及确定施加到所述图案化装置上的变形力以衰减所述尺寸变化，其中所述力具有预定的约束，其中所述力的大小的总和基本上为零，并且所述力的力矩的总和基本上为零。

9. 发明授权

US07708542B2 Device for holding a template for use in imprint lithography 有权
标题翻译：用于保存用于压印光刻的模板的装置
公开(公告)号：US07708542B2
公开(公告)日：2010-05-04
申请号：US10747737
申请日：2003-12-29
申请人： Todd C. Bailey , Byung-Jin Choi , Matthew E. Colburn , Sidlgata V. Sreenivasan , Carlton G. Willson , John G. Ekerdt
发明人： Todd C. Bailey , Byung-Jin Choi , Matthew E. Colburn , Sidlgata V. Sreenivasan , Carlton G. Willson , John G. Ekerdt
IPC分类号： B29C59/02
CPC分类号： G11B5/855 , B29C35/0888 , B29C37/0053 , B29C43/003 , B29C2035/0827 , B29C2043/025 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/00 , Y10S977/887
摘要： Described are imprint lithography templates, methods of forming and using the templates, and a template holder device. An imprint lithography template may include a body with a plurality of recesses on a surface of the body. The body may be of a material that is substantially transparent to activating light. At least a portion of the plurality of recesses may define features having a feature size less than about 250 nm. A template may be formed by obtaining a material that is substantially transparent to activating light and forming a plurality or recesses on a surface of the template. In some embodiments, a template may further include at least one alignment mark. In some embodiments, a template may further include a gap sensing area. An imprint lithography template may be used to form an imprinted layer in a light curable liquid disposed on a substrate. During use, the template may be disposed within a template holder. The template holder may include a body with an opening configured to receive the template, a support plate, and at least one piezo actuator coupled to the body. The piezo actuator may be configured to alter a physical dimension of the template during use.
摘要翻译：描述了压印光刻模板，形成和使用模板的方法以及模板保持装置。压印光刻模板可以包括在主体的表面上具有多个凹部的主体。身体可以是对于激活光是基本上透明的材料。多个凹部的至少一部分可以限定具有小于约250nm的特征尺寸的特征。可以通过获得对于激活光而基本上透明并在模板的表面上形成多个或多个凹陷的材料来形成模板。在一些实施例中，模板还可以包括至少一个对准标记。在一些实施例中，模板还可以包括间隙感测区域。可以使用压印光刻模板来在设置在基板上的可光固化液体中形成印刷层。在使用期间，模板可以设置在模板保持器内。模板保持器可以包括具有构造成接收模板的开口的主体，支撑板和耦合到主体的至少一个压电致动器。压电致动器可以被配置为在使用期间改变模板的物理尺寸。

10. 发明授权

US07699598B2 Conforming template for patterning liquids disposed on substrates 有权
标题翻译：符合设置在基板上的图案化液体的模板
公开(公告)号：US07699598B2
公开(公告)日：2010-04-20
申请号：US11669569
申请日：2007-01-31
申请人： Sidlgata V. Sreenivasan , Byung-Jin Choi , Ronald D. Voisin
发明人： Sidlgata V. Sreenivasan , Byung-Jin Choi , Ronald D. Voisin
IPC分类号： B29C59/02
CPC分类号： B29C43/003 , B29C2043/025 , B82Y10/00 , B82Y40/00 , G03F7/0002 , Y10S977/887
摘要： The present invention includes a conforming template for patterning liquids disposed on substrates. The template includes a body having opposed first and second surfaces. The first surface includes a plurality of recessed regions with a patterning region being disposed between adjacent recessed regions. Specifically, the recessed regions define flexure regions about which each patterning region may move independent of the remaining patterning regions of the template. In one embodiment the template is mounted to a fluid chamber having an inlet and a throughway. The template is connected to the throughway and the inlet is connected to a fluid source to facilitate deformation of the template to conform to a profile of a surface adjacent thereto.
摘要翻译：本发明包括用于图案化液体配置在基板上的一致性模板。模板包括具有相对的第一和第二表面的主体。第一表面包括多个凹陷区域，其中图案化区域设置在相邻的凹陷区域之间。具体地，凹陷区域限定挠曲区域，每个图案化区域围绕该弯曲区域可独立于模板的剩余图案形成区域移动。在一个实施例中，模板安装到具有入口和通道的流体室。模板连接到通道，并且入口连接到流体源以便于模板的变形以符合与其相邻的表面的轮廓。

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