会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 2. 发明授权
    • Composition for barrier ribs of plasma display panel and method of fabricating such barrier ribs using the composition
    • 等离子体显示面板的隔壁的组合物和使用该组合物制造这种阻挡肋的方法
    • US06271161B1
    • 2001-08-07
    • US09385438
    • 1999-08-30
    • Byung-Gil RyuMyeong-Soo Chang
    • Byung-Gil RyuMyeong-Soo Chang
    • C03C3066
    • C03C3/074
    • A composition for barrier ribs of plasma display panels and to a method of fabricating such barrier ribs using the composition is disclosed. The composition for the barrier ribs is SiO2—ZnO—PbO—B2O3 based glass. The SiO2—ZnO—PbO—B2O3 based glass consists of 10˜20 wt % of SiO2, 10˜30 wt % of ZnO, 5˜30 wt % of PbO, 10˜30 wt % of B2O3, 2˜10 wt % of K2O, 0˜5 wt % of Li2O, 1˜5 wt % of CaO, 3˜8 wt % of Na2O, 1˜5 wt % of Al2O3, and 0˜2 wt % of Sb2O3. In the method of forming the barrier ribs, the SiO2—ZnO—PbO—B2O3 based glass powder free from an oxide filler is primarily prepared. Paste or slurry is formed by mixing the SiO2—ZnO—PbO—B2O3 based glass with an organic vehicle. A thick film, having a predetermined thickness, is formed on the top surface of a lower substrate using the paste or slurry. Desired barrier ribs are, thereafter, formed by processing the paste or slurry film. In the barrier rib formation step, a pattern is formed on the top surface of the paste or slurry film before the paste or slurry film is etched or abraded using the pattern as a mask. The barrier ribs may be formed by stamping the paste or slurry film using a mold having a shape opposed to the desired pattern of the barrier ribs. The barrier ribs may be also formed by patterning a photoresist paste or slurry film.
    • 公开了一种用于等离子体显示面板的隔壁的组合物以及使用该组合物制造这种阻挡肋的方法。 隔壁用组合物为SiO2-ZnO-PbO-B2O3系玻璃。 SiO 2-ZnO-PbO-B 2 O 3基玻璃由10-20重量%的SiO 2,10〜30重量%的ZnO,5〜30重量%的PbO,10〜30重量%的B 2 O 3,2〜10重量% K 2 O,0〜5重量%的Li 2 O,1〜5重量%的CaO,3〜8重量%的Na 2 O,1〜5重量%的Al 2 O 3和0〜2重量%的Sb 2 O 3。 在形成隔壁的方法中,主要制备不含氧化物填料的SiO 2 -ZnO-PbO-B 2 O 3基玻璃粉末。 通过将SiO 2 -ZnO-PbO-B 2 O 3基玻璃与有机载体混合来形成浆料或浆料。 使用糊料或浆料,在下基板的顶表面上形成具有预定厚度的厚膜。 之后,通过加工糊状物或淤浆膜形成所需的隔壁。 在障壁形成步骤中,使用图案作为掩模,在糊料或浆料膜被蚀刻或研磨之前,在糊料或浆料膜的顶表面上形成图案。 阻挡肋可以通过使用具有与所需屏障的所需图案相对的形状的模具冲压该糊状物或浆料膜来形成。 阻挡肋也可以通过图案化光致抗蚀剂浆料或浆料膜而形成。
    • 3. 发明授权
    • Composition of dielectric for plasma display panel
    • 等离子体显示面板的电介质组成
    • US06383961B1
    • 2002-05-07
    • US09572777
    • 2000-05-17
    • Byung-Gil Ryu
    • Byung-Gil Ryu
    • C03C316
    • C03C3/17C03C14/004C03C2214/04
    • A composition of a dielectric for a plasma display panel in user for fabricating a dielectric thick film for a front substrate having a low sintering temperature, a low thermal expensive coefficient, a high dielectric constant and a high withstand voltage. The composition of a dielectric is a P2O5—ZnO—PbO glass having composition ratios of 30˜60 wt % of P2O5, 5˜40 wt % of PbO, 0˜5 wt % of MgO, 0˜5 wt % of CaO, 0˜10 wt % of La2O3, 0˜5 wt % of SrO, 1˜5 wt % of Al2O3, 0˜2 wt % of Sb2O3, 0˜2 wt % of As2O3, 5˜25 wt % of BaO, and 0˜5 wt % of TeO2.
    • 用于制造具有低烧结温度,低热成本系数,高介电常数和高耐受电压的用于前基板的电介质厚膜的用户中的等离子体显示面板的电介质组合物。 电介质的组成是P 2 O 5,组成比为30〜60重量%的P 2 O 5,5〜40重量%的PbO,0〜5重量%的MgO,0〜5重量%的CaO,0 〜10重量%的La 2 O 3,0〜5重量%的SrO,1〜5重量%的Al 2 O 3,0〜2重量%的Sb 2 O 3,0〜2重量%的As 2 O 3,5〜25重量%的BaO, 5重量%的TeO 2。
    • 7. 发明授权
    • Method of manufacturing microstructure using photosensitive glass substrate
    • 使用感光玻璃基板制造微结构的方法
    • US06511793B1
    • 2003-01-28
    • US09533860
    • 2000-03-24
    • Soo-Je ChoByung-Gil Ryu
    • Soo-Je ChoByung-Gil Ryu
    • G03C556
    • H01J9/242C03C15/00C03C23/002C03C23/007C03C2218/34C03C2218/355H01J2211/36
    • The present invention relates to a method of manufacturing a microstructure such as a barrier lib or a spacer formed at an internal space between two flat panels constructing a flat panel display and, in particular, to a method of manufacturing a microstructure using a photosensitive glass substrate. The method of manufacturing a microstructure in accordance with the present invention includes the steps of preparing a photosensitive glass substrate, forming a mask pattern having a light transmission unit and a shading unit on the photosensitive glass substrate, exposing the photosensitive glass substrate, heat-treating the photosensitive glass substrate, and etching an unexposed portion of the photosensitive glass substrate. In addition, the process of changing the thermal expansive coefficient of the microstructure by heat-treating the photosensitive substrate again can be additionally included after etching and removing the unexposed portion.
    • 本发明涉及在构成平板显示器的两个平板之间的内部空间中形成诸如屏障11b或隔离物的微结构的制造方法,特别涉及使用感光玻璃基板制造微结构的方法 。 根据本发明的制造微结构的方法包括以下步骤:在感光玻璃基板上制备感光玻璃基板,形成具有透光单元和遮光单元的掩模图案,曝光感光玻璃基板,热处理 感光性玻璃基板,蚀刻感光性玻璃基板的未曝光部。 此外,在蚀刻和去除未曝光部分之后,可以另外包括通过再次热处理感光基底来改变微结构的热膨胀系数的过程。
    • 9. 发明授权
    • Composition of dielectric for plasma display panel
    • 等离子体显示面板的电介质组成
    • US06599851B1
    • 2003-07-29
    • US09572778
    • 2000-05-17
    • Byung-Gil Ryu
    • Byung-Gil Ryu
    • C03C810
    • H01J11/12C03C8/10C03C8/14H01J11/38
    • A composition of a dielectric for a plasma display panel in use for fabricating a barrier rib having a low sintering temperature, a low coefficient of thermal expansion, a low dielectric constant and a high withstand voltage. The composition of a dielectric for a plasma display panel comprising a parents glass powder containing 20˜40 wt % of ZnO, 15˜30 wt % of SiO2, 10˜20 wt % of B2O3, 0˜30 wt % of PbO, 0˜20 wt % of MgO, 1˜10 wt % of CaO, 1˜10 wt % of Al2O3, 0˜10 wt % of K2O, 0˜8 wt % of Na2O, 0˜5 wt % of Li2O, 0˜2 wt % of Sb2O3, and 0˜2 wt % of As2O3.
    • 用于制造具有低烧结温度,低热膨胀系数,低介电常数和高耐受电压的隔壁的用于等离子体显示面板的电介质组合物。 用于等离子体显示面板的电介质的组成包括含有20〜40重量%的ZnO,15〜30重量%的SiO 2,10〜20重量%的B 2 O 3,0〜30重量%的PbO,0〜 20重量%的MgO,1〜10重量%的CaO,1〜10重量%的Al 2 O 3,0〜10重量%的K 2 O,0〜8重量%的Na 2 O,0〜5重量%的Li 2 O,0〜 Sb2O3,0〜2重量%的As2O3。