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1. 发明授权

US07480015B2 Method for manufacturing array substrate of translucent LCD 有权
标题翻译：制造半透明液晶显示阵列基板的方法
公开(公告)号：US07480015B2
公开(公告)日：2009-01-20
申请号：US11595455
申请日：2006-11-09
申请人： Byung Hoon Kim , Sam Ho Ihm
发明人： Byung Hoon Kim , Sam Ho Ihm
IPC分类号： G02F1/136
CPC分类号： G02F1/133555 , G02F1/134309 , G02F2001/136231
摘要： Disclosed is a method for manufacturing an array substrate of a translucent LCD capable of simultaneously forming source and drain metal layers as reflective electrodes while improving both the contact resistance in a transmissive region and the reflectivity properties in a reflective region. The source and drain metal layers have a triple-layered structure of Mo—Al—Mo and, the top Mo is selectively removed from the reflective region. As a result, the screen quality of products improves. In addition, about 5-6 masks are enough to manufacture an array substrate using half-tone exposure technology, in contrast to the prior art which uses 8-11 masks. As the number of masks and processes is reduced in this manner, the manufacturing cost decreases accordingly and the process is simplified.
摘要翻译：公开了一种半导体LCD的阵列基板的制造方法，其能够同时形成源极和漏极金属层作为反射电极，同时提高透射区域中的接触电阻和反射区域中的反射率特性。源极和漏极金属层具有Mo-Al-Mo的三层结构，并且从反射区域选择性地去除顶部Mo。结果，产品的屏幕质量提高。此外，与使用8-11掩模的现有技术相比，约5-6个掩模足以制造使用半色调曝光技术的阵列基板。由于以这种方式减少了掩模和处理的数量，因此制造成本相应降低，并且简化了处理。

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