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1. 发明申请

US20060176466A1 Chucking system for modulating shapes of substrates 有权
公开(公告)号：US20060176466A1
公开(公告)日：2006-08-10
申请号：US11389731
申请日：2006-03-27
申请人： Byung Choi , Ronald Voisin , Sidlgata Sreenivasan , Michael Watts , Daniel Babbs , Mario Meissl , Hillman Bailey , Norman Schumaker
发明人： Byung Choi , Ronald Voisin , Sidlgata Sreenivasan , Michael Watts , Daniel Babbs , Mario Meissl , Hillman Bailey , Norman Schumaker
IPC分类号： G03B27/58
CPC分类号： G03F7/70875 , B29C33/20 , B29C43/003 , B29C43/021 , B29C43/36 , B29C43/58 , B29C2043/025 , B29C2043/3233 , B29C2043/3488 , B29C2043/5841 , B29D11/00365 , G03B27/62 , G03F7/707
摘要： The present invention is directed to a chucking system to modulate substrates so as to properly shape and position the same with respect to a wafer upon which a pattern is to be formed with the substrate. The chucking system includes a chuck body having first and second opposed sides. A side surface extends therebetween. The first side includes first and second spaced-apart recesses defining first and second spaced-apart support regions. The first support region cinctures the second support region and the first and second recesses. The second support region cinctures the second recess, with a portion of the body in superimposition with the second recess being transparent to radiation having a predetermined wavelength. The second side and the side surface define exterior surfaces. The body includes throughways placing the first and second recesses in fluid communication with one of the exterior surfaces.

2. 发明申请

US20060077374A1 Step and repeat imprint lithography systems 审中-公开
标题翻译：步骤和重复刻印光刻系统
公开(公告)号：US20060077374A1
公开(公告)日：2006-04-13
申请号：US11127060
申请日：2005-05-11
申请人： Sidlgata Sreenivasan , Michael Watts , Byung Choi , Mario Meissl , Norman Schumaker , Ronald Voisin
发明人： Sidlgata Sreenivasan , Michael Watts , Byung Choi , Mario Meissl , Norman Schumaker , Ronald Voisin
IPC分类号： G03B27/58
CPC分类号： B82Y10/00 , B29C35/0888 , B29C59/022 , B29C2035/0827 , B29C2059/023 , B81C1/0046 , B82Y40/00 , G03F7/0002 , H01L21/0271
摘要： Described are systems for patterning a substrate by imprint lithography. Imprint lithography systems include an imprint head configured to hold a template in a spaced relation to a substrate. The imprint lithography system is configured to dispense an activating light curable liquid onto a substrate or template. The system includes a light source that applies activating light to cure the activating light curable liquid.
摘要翻译：描述的是通过压印光刻来图案化衬底的系统。压印光刻系统包括压印头，其被配置为将模板保持为与衬底间隔开的关系。压印光刻系统被配置为将激活光可固化液体分配到基底或模板上。该系统包括施加激活光以固化活化光可固化液体的光源。

3. 发明申请

US20060076717A1 Step and repeat imprint lithography processes 有权
公开(公告)号：US20060076717A1
公开(公告)日：2006-04-13
申请号：US11127041
申请日：2005-05-11
申请人： Sidlgata Sreenivasan , Byung Choi , Norman Schumaker , Ronald Voisin , Michael Watts , Mario Meissl
发明人： Sidlgata Sreenivasan , Byung Choi , Norman Schumaker , Ronald Voisin , Michael Watts , Mario Meissl
IPC分类号： B29C35/08 , B29C41/02 , B29C41/12
CPC分类号： B81C1/0046 , B82Y10/00 , B82Y30/00 , B82Y40/00 , G03F7/0002
摘要： The present invention is directed to methods for patterning a substrate by imprint lithography. Imprint lithography is a process in which a liquid is dispensed onto a substrate. A template is brought into contact with the liquid and the liquid is cured. The cured liquid includes an imprint of any patterns formed in the template. In one embodiment, the imprint process is designed to imprint only a portion of the substrate. The remainder of the substrate is imprinted by moving the template to a different portion of the template and repeating the imprint lithography process.

4. 发明申请

US20070122942A1 Conforming Template for Patterning Liquids Disposed on Substrates 有权
标题翻译：符合基板上图案化液体的模板
公开(公告)号：US20070122942A1
公开(公告)日：2007-05-31
申请号：US11669569
申请日：2007-01-31
申请人： Sidlgata Sreenivasan , Byung Choi , Ronald Voisin
发明人： Sidlgata Sreenivasan , Byung Choi , Ronald Voisin
IPC分类号： H01L21/00 , B28B11/08
CPC分类号： B29C43/003 , B29C2043/025 , B82Y10/00 , B82Y40/00 , G03F7/0002 , Y10S977/887
摘要： The present invention includes a conforming template for patterning liquids disposed on substrates. The template includes a body having opposed first and second surfaces. The first surface includes a plurality of recessed regions with a patterning region being disposed between adjacent recessed regions. Specifically, the recessed regions define flexure regions about which each patterning region may move independent of the remaining patterning regions of the template. In one embodiment the template is mounted to a fluid chamber having an inlet and a throughway. The template is connected to the throughway and the inlet is connected to a fluid source to facilitate deformation of the template to conform to a profile of a surface adjacent thereto.
摘要翻译：本发明包括用于图案化液体配置在基板上的一致性模板。模板包括具有相对的第一和第二表面的主体。第一表面包括多个凹陷区域，其中图案化区域设置在相邻的凹陷区域之间。具体地，凹陷区域限定挠曲区域，每个图案化区域围绕该弯曲区域可独立于模板的剩余图案形成区域移动。在一个实施例中，模板安装到具有入口和通道的流体室。模板连接到通道，并且入口连接到流体源以便于模板的变形以符合与其相邻的表面的轮廓。

5. 发明申请

US20050051698A1 Conforming template for patterning liquids disposed on substrates 有权
标题翻译：符合设置在基板上的图案化液体的模板
公开(公告)号：US20050051698A1
公开(公告)日：2005-03-10
申请号：US10614716
申请日：2003-07-07
申请人： Sidlgata Sreenivasan , Byung Choi , Ronald Voisin
发明人： Sidlgata Sreenivasan , Byung Choi , Ronald Voisin
IPC分类号： B29C33/42 , G03F7/00
CPC分类号： B29C43/003 , B29C2043/025 , B82Y10/00 , B82Y40/00 , G03F7/0002 , Y10S977/887
摘要： The present invention includes a conforming template for patterning liquids disposed on substrates. The template includes a body having opposed first and second surfaces. The first surface includes a plurality of recessed regions with a patterning region being disposed between adjacent recessed regions. Specifically, the recessed regions define flexure regions about which each patterning region may move independent of the remaining patterning regions of the template. In one embodiment the template is mounted to a fluid chamber having an inlet and a throughway. The template is connected to the throughway and the inlet is connected to a fluid source to facilitate deformation of the template to conform to a profile of a surface adjacent thereto.
摘要翻译：本发明包括用于图案化液体配置在基板上的一致性模板。模板包括具有相对的第一和第二表面的主体。第一表面包括多个凹陷区域，其中图案化区域设置在相邻的凹陷区域之间。具体地，凹陷区域限定挠曲区域，每个图案化区域围绕该弯曲区域可独立于模板的剩余图案形成区域移动。在一个实施例中，模板安装到具有入口和通道的流体室。模板连接到通道，并且入口连接到流体源以便于模板的变形以符合与其相邻的表面的轮廓。

6. 发明申请

US20060096949A1 Method of forming a compliant template for UV imprinting 有权
标题翻译：形成用于UV印记的兼容模板的方法
公开(公告)号：US20060096949A1
公开(公告)日：2006-05-11
申请号：US11298244
申请日：2005-12-09
申请人： Michael Watts , Ronald Voisin , Sidlgata Sreenivasan
发明人： Michael Watts , Ronald Voisin , Sidlgata Sreenivasan
IPC分类号： C23F1/00 , B44C1/22 , G03C5/00
CPC分类号： G03F7/0002 , B29C43/003 , B29C2043/025 , B82Y10/00 , B82Y40/00 , G03F7/0017
摘要： In an embodiment of the present invention, the template is formed by forming a masking layer on a substrate; forming a pattern in the masking layer such that a portion of the substrate is exposed; etching one or more of the exposed portions of the substrate such that a relief image is formed in the substrate; removing the masking layer; coating the relief image with a release agent; depositing a conformal layer upon the substrate such that a portion of the conformal layer is arranged within the relief image formed in the substrate; arranging an elastomer layer on the conformal layer; arranging a substrate such that the elastomer layer is bonded between the conformal layer and the rigid substrate; and removing from the substrate the lithography template, where the lithography template includes the elastomer layer bonded between the rigid substrate and the conformal layer. In an exemplary embodiment, the template is formed by sequentially forming at least one elastomer layer on a substrate; forming an imprinting layer on the elastomer layer; forming a sacrificial layer on the imprinting layer; forming a masking layer on the sacrificial layer such that a portion of the sacrificial layer is exposed through the masking layer; etching one or more of the exposed portions of the sacrificial layer such that a portion of the imprinting layer is exposed through the masking layer; etching one or more of the exposed portions of the imprinting layer such that a relief image is formed; and removing the entire masking and sacrificial layers.
摘要翻译：在本发明的实施例中，通过在基板上形成掩模层来形成模板; 在所述掩蔽层中形成图案，使得所述基板的一部分露出; 蚀刻衬底的一个或多个暴露部分，使得在衬底中形成浮雕图像; 去除掩蔽层; 用脱模剂涂覆浮雕图像; 在所述基板上沉积共形层，使得所述共形层的一部分布置在形成在所述基板中的所述浮雕图像内; 在保形层上布置弹性体层; 布置基板，使得弹性体层结合在共形层和刚性基板之间; 以及从基板去除光刻模板，其中光刻模板包括结合在刚性基板和保形层之间的弹性体层。在一个示例性实施例中，模板通过在衬底上顺序地形成至少一个弹性体层而形成; 在弹性体层上形成压印层; 在压印层上形成牺牲层; 在所述牺牲层上形成掩模层，使得所述牺牲层的一部分通过所述掩模层露出; 蚀刻牺牲层的一个或多个暴露部分，使得压印层的一部分通过掩模层曝光; 蚀刻压印层的一个或多个曝光部分，使得形成浮雕图像; 并去除整个掩蔽层和牺牲层。

7. 发明申请

US20050236360A1 Compliant hard template for UV imprinting 有权
标题翻译：适用于UV印记的硬模板
公开(公告)号：US20050236360A1
公开(公告)日：2005-10-27
申请号：US10833240
申请日：2004-04-27
申请人： Michael Watts , Ronald Voisin , Sidlgata Sreenivasan
发明人： Michael Watts , Ronald Voisin , Sidlgata Sreenivasan
IPC分类号： B44C1/22
CPC分类号： G03F7/0002 , B29C43/003 , B29C2043/025 , B82Y10/00 , B82Y40/00 , G03F7/0017
摘要： A compliant UV imprint lithography template, which may also act as a thermal implant template, and methods for manufacturing it. The template essentially comprises a relief image and an elastomer adapted to adjust the relief image. In an embodiment, the relief image is arranged in a compliant imprinting layer where the elastomer is arranged between the imprinting layer and a rigid transparent substrate. In an embodiment, the template is compliant to a wafer surface. In an embodiment, layering an elastomer and an imprinting layer on a substrate and patterning a relief image into the imprinting layer, form the template.
摘要翻译：还可以充当热植入模板的兼容UV压印光刻模板及其制造方法。模板基本上包括浮雕图像和适于调整浮雕图像的弹性体。在一个实施例中，浮雕图像被布置在柔性压印层中，其中弹性体布置在压印层和刚性透明衬底之间。在一个实施例中，模板符合晶片表面。在一个实施例中，在基底上层叠弹性体和压印层并将浮雕图案图案化成压印层，形成模板。

8. 发明申请

US20050074512A1 System for creating a turbulent flow of fluid between a mold and a substrate 有权
标题翻译：用于在模具和基底之间产生紊流流体的系统
公开(公告)号：US20050074512A1
公开(公告)日：2005-04-07
申请号：US10898037
申请日：2004-07-23
申请人： Ian McMackin , Nicholas Stacey , Daniel Babbs , Duane Voth , Michael Watts , Van Truskett , Frank Xu , Ronald Voisin , Pankaj Lad
发明人： Ian McMackin , Nicholas Stacey , Daniel Babbs , Duane Voth , Michael Watts , Van Truskett , Frank Xu , Ronald Voisin , Pankaj Lad
IPC分类号： B01D19/00 , B29C59/02 , C23F1/00 , G03F20060101 , G03F7/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10S425/06 , Y10S425/815 , Y10S438/909
摘要： The present invention is directed toward a system for introducing a flow of a fluid between a mold, disposed on a template, and a substrate, the system including, a fluid supply system; and a chuck body having a baffle and first and second apertures, the first and second apertures disposed between the baffle and the template, with the first and second apertures in fluid communication with the fluid supply system to produce a turbulent flow of the fluid between the mold and said substrate.
摘要翻译：本发明涉及一种用于在设置在模板上的模具和基板之间引入流体流的系统，该系统包括：流体供应系统; 以及具有挡板和第一和第二孔的卡盘体，所述第一和第二孔设置在挡板和模板之间，其中第一和第二孔与流体供应系统流体连通，以在流体供应系统之间产生紊流模具和所述基板。

9. 发明申请

US20050072757A1 Method of creating a turbulent flow of fluid between a mold and a substrate 失效
标题翻译：在模具和基材之间产生流体紊流的方法
公开(公告)号：US20050072757A1
公开(公告)日：2005-04-07
申请号：US10898034
申请日：2004-07-23
申请人： Ian McMackin , Nicholas Stacey , Daniel Babbs , Duane Voth , Michael Watts , Van Truskett , Frank Xu , Ronald Voisin , Pankaj Lad
发明人： Ian McMackin , Nicholas Stacey , Daniel Babbs , Duane Voth , Michael Watts , Van Truskett , Frank Xu , Ronald Voisin , Pankaj Lad
IPC分类号： B01D19/00 , B29C59/02 , C23F1/00 , G03F20060101 , G03F7/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10S425/06 , Y10S425/815 , Y10S438/909
摘要： The present invention is directed toward a method of controlling a turbulent flow of a fluid between a substrate and a template, and more specifically, controlling a turbulent flow of a fluid between droplets disposed on a substrate and a template. To that end, the method further comprises the ingression and egression of the fluid through a first and second aperture, and in a further embodiment, a plurality of apertures, to create such a turbulent flow of the fluid.
摘要翻译：本发明涉及一种控制衬底和模板之间的流体的紊流的方法，更具体地说，控制流体在设置在衬底和模板上的液滴之间的紊流。为此，该方法还包括流体通过第一和第二孔的进入和流出，并且在另一实施例中，多个孔，以产生流体的这种湍流。

10. 发明申请

US20050072755A1 Single phase fluid imprint lithography method 有权
标题翻译：单相流体压印光刻法
公开(公告)号：US20050072755A1
公开(公告)日：2005-04-07
申请号：US10677639
申请日：2003-10-02
申请人： Ian McMackin , Nicholas Stacey , Daniel Babbs , Duane Voth , Michael Watts , Van Truskett , Frank Xu , Ronald Voisin , Pankaj Lad
发明人： Ian McMackin , Nicholas Stacey , Daniel Babbs , Duane Voth , Michael Watts , Van Truskett , Frank Xu , Ronald Voisin , Pankaj Lad
IPC分类号： B01D19/00 , B29C59/02 , C23F1/00 , G03F20060101 , G03F7/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10S425/06 , Y10S425/815 , Y10S438/909
摘要： The present invention is directed toward a method for reducing pattern distortions in imprinting layers by reducing gas pockets present in a layer of viscous liquid deposited on a substrate. To that end, the method includes varying a transport of the gases disposed proximate to the viscous liquid. Specifically, the atmosphere proximate to the substrate wherein a pattern is to be recorded is saturated with gases that are either highly soluble, highly diffusive, or both with respect to the viscous liquid being deposited. Additionally, or in lieu of saturating the atmosphere, the pressure of the atmosphere may be reduced.
摘要翻译：本发明涉及通过减少存在于沉积在基底上的粘性液体层中的气穴来减少压印层中的图案失真的方法。为此，该方法包括改变靠近粘性液体设置的气体的输送。具体地，其中待记录图案的基板附近的气氛相对于被沉积的粘性液体是高度可溶的，高度扩散的或者两者都被饱和。另外，或者代替饱和气氛，可以降低气氛的压力。

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