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    • 10. 发明授权
    • Copolymer of vinylpyrrolidone and vinylimidazole
    • 乙烯基吡咯烷酮和乙烯基咪唑的共聚物
    • US5990269A
    • 1999-11-23
    • US975684
    • 1997-11-21
    • Karin NeubeckerStefan StienStephan Kothrade
    • Karin NeubeckerStefan StienStephan Kothrade
    • C08F226/06G03F7/00G03F7/012C08G69/00C08F271/02C08F279/00
    • G03F7/012C08F226/06G03F7/0007
    • The improved water-soluble photosensitive resin composition comprises a high-polymer compound represented by the general formula (I): ##STR1## (where X is Na, K or NH.sub.4) and a water-soluble polymer which is either polyvinylpyrrolidone or a copolymer of vinylpyrrolidone and vinylimidazole or both. The composition is applied to a substrate, exposed through a mask pattern and developed to form a photocured pattern and, thereafter, a light absorber is applied to the entire surface of the substrate and dried, followed by stripping away the photocured pattern and the overlying light absorber to form a black matrix pattern. The composition is suitable for use as a photoresist in the manufacture of black matrices as on color CRTs and capable of efficient formation of photocured patterns with high sensitivity by shorter times and lower intensities of exposure. In addition, the composition adheres strongly to glass substrates and is capable of pattern formation as thin film that is faithful to the mask pattern used. A vinylpyrrolidone/vinylimidazole copolymer is also disclosed.
    • 改进的水溶性光敏树脂组合物包含由通式(I)表示的高分子化合物:(其中X为Na,K或NH 4)和水溶性聚合物,其为聚乙烯吡咯烷酮或乙烯基吡咯烷酮和乙烯基咪唑的共聚物 或两者。 将组合物施加到基板上,通过掩模图案曝光并显影以形成光固化图案,然后将光吸收剂施加到基板的整个表面上并干燥,然后剥离光固化图案和上覆光 吸收体形成黑色矩阵图案。 该组合物适用于在彩色CRT上制造黑色矩阵中的光致抗蚀剂,并且能够通过更短的时间和更低的曝光强度有效地形成具有高灵敏度的光固化图案。 此外,组合物强烈地粘附到玻璃基板上,并且能够形成图案,作为忠实于所使用的掩模图案的薄膜。 还公开了乙烯基吡咯烷酮/乙烯基咪唑共聚物。