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1. 发明授权

US07929117B2 Apparatus for real-time contamination, environmental, or physical monitoring of a photomask 有权
标题翻译：用于光掩模的实时污染，环境或物理监测的装置
公开(公告)号：US07929117B2
公开(公告)日：2011-04-19
申请号：US12056047
申请日：2008-03-26
申请人： Brent A. Anderson , Robert K. Leidy , Jed H. Rankin
发明人： Brent A. Anderson , Robert K. Leidy , Jed H. Rankin
IPC分类号： G03B27/62 , G03B27/52
CPC分类号： G03F1/84 , G03F7/7085 , G03F7/70875 , G03F7/709 , G03F7/70916 , G03F7/70983
摘要： An apparatus for real-time contamination, environmental, or physical monitoring of a photomask. The apparatus includes a photomask having a patterned region configured to correspond to features of an integrated circuit and a sensor physically coupled with the photomask. The sensor is configured to monitor an attribute related to the photomask. Attributes monitored by the sensor may include chemical contamination, temperature changes, humidity changes, acceleration, shock, vibration, optical flux through the photomask, electrostatic discharge environment of the photomask, particulates, and pressure.
摘要翻译：一种用于光掩模的实时污染，环境或物理监测的设备。该装置包括光掩模，其具有被配置为对应于集成电路的特征的图案区域和与光掩模物理耦合的传感器。传感器被配置为监视与光掩模相关的属性。由传感器监测的属性可能包括化学污染，温度变化，湿度变化，加速度，冲击，振动，通过光掩模的光通量，光掩模的静电放电环境，微粒和压力。

2. 发明申请

US20100031223A1 SYSTEMS FOR REAL-TIME CONTAMINATION, ENVIRONMENTAL, OR PHYSICAL MONITORING OF A PHOTOMASK 有权
标题翻译：用于实时污染，环境或物理监测的系统
公开(公告)号：US20100031223A1
公开(公告)日：2010-02-04
申请号：US12182672
申请日：2008-07-30
申请人： Brent A. Anderson , Robert K. Leidy , Jed H. Rankin
发明人： Brent A. Anderson , Robert K. Leidy , Jed H. Rankin
IPC分类号： G06F17/50
CPC分类号： G03F7/70916 , G03F7/70525 , G03F7/70741 , G03F7/7085 , G03F7/70991
摘要： Systems for real-time contamination, environmental, or physical monitoring of a photomask. The system includes an electronics package physically mounted to the photomask and a processing device in communication with the electronics package. The electronics package includes a sensor configured to monitor the attribute and generate sensor data. The processing device is configured to analyze the sensor data communicated from the electronics package to the processing device.
摘要翻译：用于光掩模的实时污染，环境或物理监测的系统。该系统包括物理地安装到光掩模的电子封装以及与电子封装通信的处理装置。电子组件包括配置成监视属性并生成传感器数据的传感器。处理装置被配置为分析从电子包装传送到处理装置的传感器数据。

3. 发明授权

US08136055B2 Systems for real-time contamination, environmental, or physical monitoring of a photomask 有权
标题翻译：用于光掩模的实时污染，环境或物理监测的系统
公开(公告)号：US08136055B2
公开(公告)日：2012-03-13
申请号：US12182672
申请日：2008-07-30
申请人： Brent A. Anderson , Robert K. Leidy , Jed H. Rankin
发明人： Brent A. Anderson , Robert K. Leidy , Jed H. Rankin
IPC分类号： G06F17/50
CPC分类号： G03F7/70916 , G03F7/70525 , G03F7/70741 , G03F7/7085 , G03F7/70991
摘要： Systems for real-time contamination, environmental, or physical monitoring of a photomask. The system includes an electronics package physically mounted to the photomask and a processing device in communication with the electronics package. The electronics package includes a sensor configured to monitor the attribute and generate sensor data. The processing device is configured to analyze the sensor data communicated from the electronics package to the processing device.
摘要翻译：用于光掩模的实时污染，环境或物理监测的系统。该系统包括物理地安装到光掩模的电子封装以及与电子封装通信的处理装置。电子组件包括配置成监视属性并生成传感器数据的传感器。处理装置被配置为分析从电子包装传送到处理装置的传感器数据。

4. 发明申请

US20090244501A1 APPARATUS FOR REAL-TIME CONTAMINATION, ENVIRONMENTAL, OR PHYSICAL MONITORING OF A PHOTOMASK 有权
标题翻译：用于实时污染，环境或物理监测的设备
公开(公告)号：US20090244501A1
公开(公告)日：2009-10-01
申请号：US12056047
申请日：2008-03-26
申请人： Brent A. Anderson , Robert K. Leidy , Jed H. Rankin
发明人： Brent A. Anderson , Robert K. Leidy , Jed H. Rankin
IPC分类号： G03B27/52
CPC分类号： G03F1/84 , G03F7/7085 , G03F7/70875 , G03F7/709 , G03F7/70916 , G03F7/70983
摘要： An apparatus for real-time contamination, environmental, or physical monitoring of a photomask. The apparatus includes a photomask having a patterned region configured to correspond to features of an integrated circuit and a sensor physically coupled with the photomask. The sensor is configured to monitor an attribute related to the photomask. Attributes monitored by the sensor may include chemical contamination, temperature changes, humidity changes, acceleration, shock, vibration, optical flux through the photomask, electrostatic discharge environment of the photomask, particulates, and pressure.
摘要翻译：一种用于光掩模的实时污染，环境或物理监测的设备。该装置包括光掩模，其具有被配置为对应于集成电路的特征的图案区域和与光掩模物理耦合的传感器。传感器被配置为监视与光掩模相关的属性。由传感器监测的属性可能包括化学污染，温度变化，湿度变化，加速度，冲击，振动，通过光掩模的光通量，光掩模的静电放电环境，微粒和压力。

5. 发明申请

US20100029021A1 METHODS FOR REAL-TIME CONTAMINATION, ENVIRONMENTAL, OR PHYSICAL MONITORING OF A PHOTOMASK 失效
标题翻译：实时污染，环境或物理监测方法
公开(公告)号：US20100029021A1
公开(公告)日：2010-02-04
申请号：US12182668
申请日：2008-07-30
申请人： Brent A. Anderson , Robert K. Leidy , Jed H. Rankin
发明人： Brent A. Anderson , Robert K. Leidy , Jed H. Rankin
IPC分类号： H01L21/66
CPC分类号： G03F7/70866 , G03F7/7085 , G03F7/70975
摘要： Methods for real-time contamination, environmental, or physical monitoring of a photomask. An attribute of a photomask is monitored using a sensor of an electronics package attached to the photomask. The methods further include generating one or more sensor signals relating to the monitored attribute with the sensor and transmitting the one or more sensor signals from the electronics package to a control system.
摘要翻译：光掩模的实时污染，环境或物理监测的方法。使用附接到光掩模的电子封装的传感器监视光掩模的属性。所述方法还包括利用所述传感器生成与所监视的属性相关的一个或多个传感器信号，并将所述一个或多个传感器信号从所述电子装置封装传送到控制系统。

6. 发明授权

US08456625B2 Methods for real-time contamination, environmental, or physical monitoring of a photomask 失效
标题翻译：光掩模的实时污染，环境或物理监测的方法
公开(公告)号：US08456625B2
公开(公告)日：2013-06-04
申请号：US12182668
申请日：2008-07-30
申请人： Brent A. Anderson , Robert K. Leidy , Jed H. Rankin
发明人： Brent A. Anderson , Robert K. Leidy , Jed H. Rankin
IPC分类号： G01N21/00 , G06F17/50
CPC分类号： G03F7/70866 , G03F7/7085 , G03F7/70975
摘要： Methods for real-time contamination, environmental, or physical monitoring of a photomask. An attribute of a photomask is monitored using a sensor of an electronics package attached to the photomask. The methods further include generating one or more sensor signals relating to the monitored attribute with the sensor and transmitting the one or more sensor signals from the electronics package to a control system.
摘要翻译：光掩模的实时污染，环境或物理监测的方法。使用附接到光掩模的电子封装的传感器监视光掩模的属性。所述方法还包括利用所述传感器生成与所监视的属性相关的一个或多个传感器信号，并将所述一个或多个传感器信号从所述电子装置封装传送到控制系统。

7. 发明授权

US08609453B2 Low cost solar cell manufacture method employing a reusable substrate 失效
标题翻译：低成本太阳能电池制造方法采用可重复使用的基板
公开(公告)号：US08609453B2
公开(公告)日：2013-12-17
申请号：US12951601
申请日：2010-11-22
申请人： Brent A. Anderson , Edward J. Nowak , Jed H. Rankin
发明人： Brent A. Anderson , Edward J. Nowak , Jed H. Rankin
IPC分类号： H01L21/00
CPC分类号： H01L31/186 , H01L31/0248 , H01L31/068 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： A reusable substrate and method for forming single crystal silicon solar cells are described. A method of forming a photovoltaic cell includes forming an intermediate layer on a monocrystalline silicon substrate, forming a monocrystalline silicon layer on the intermediate layer, and forming electrical features in the monocrystalline silicon layer. The method further includes forming openings in the monocrystalline silicon layer, and detaching the monocrystalline silicon layer from the substrate by selectively etching the intermediate layer through the openings.
摘要翻译：描述了可重复使用的基板和用于形成单晶硅太阳能电池的方法。形成光伏电池的方法包括在单晶硅衬底上形成中间层，在中间层上形成单晶硅层，并在单晶硅层中形成电特征。该方法还包括在单晶硅层中形成开口，并且通过选择性地通过开口蚀刻中间层，从而将单晶硅层从衬底上分离出来。

8. 发明授权

US08445965B2 Strained semiconductor devices and methods of fabricating strained semiconductor devices 有权
标题翻译：应变半导体器件和制造应变半导体器件的方法
公开(公告)号：US08445965B2
公开(公告)日：2013-05-21
申请号：US12940115
申请日：2010-11-05
申请人： Brent A. Anderson , Edward J. Nowak , Jed H. Rankin
发明人： Brent A. Anderson , Edward J. Nowak , Jed H. Rankin
IPC分类号： H01L27/12
CPC分类号： H01L21/84 , H01L21/823807 , H01L21/823878 , H01L27/1203
摘要： A structure and method of fabricating the structure. The structure includes a first region of a semiconductor substrate separated from a second region of the semiconductor substrate by trench isolation formed in the substrate; a first stressed layer over the first region; a second stressed layer over second region; the first stressed layer and second stressed layer separated by a gap; and a passivation layer on the first and second stressed layers, the passivation layer extending over and sealing the gap.
摘要翻译：一种制造结构的结构和方法。该结构包括半导体衬底的第一区域，其通过在衬底中形成的沟槽隔离与半导体衬底的第二区域分离; 第一个区域的第一个应力层; 在第二区域的第二个应力层; 第一应力层和第二应力层由间隙分开; 以及在第一和第二应力层上的钝化层，钝化层延伸并密封间隙。

9. 发明申请

US20130065370A1 Method for Fabricating Field Effect Transistor Devices with High-Aspect Ratio Mask 失效
标题翻译：制造具有高比例掩模的场效应晶体管器件的方法
公开(公告)号：US20130065370A1
公开(公告)日：2013-03-14
申请号：US13229154
申请日：2011-09-09
申请人： Brent A. Anderson , Edward J. Nowak , Jed H. Rankin
发明人： Brent A. Anderson , Edward J. Nowak , Jed H. Rankin
IPC分类号： H01L21/336
CPC分类号： H01L29/6653 , H01L21/28273 , H01L29/66825 , H01L29/785
摘要： A method for forming feature on a substrate includes forming at least one layer of a feature material on a substrate, patterning a photolithographic resist material on the at least one layer of the feature material, removing portions of the feature material to define a feature, depositing a masking material layer over the resist material and exposed regions of the substrate, modifying a portion of the substrate, and removing the masking material layer and the resist material.
摘要翻译：在衬底上形成特征的方法包括在衬底上形成至少一层特征材料，在特征材料的至少一层上图案化光刻抗蚀剂材料，去除特征材料的部分以限定特征，沉积在抗蚀剂材料上的掩模材料层和衬底的暴露区域，修改衬底的一部分，以及去除掩模材料层和抗蚀剂材料。

10. 发明授权

US08389183B2 Chromeless phase-shifting photomask with undercut rim-shifting element 有权
标题翻译：无铬相移光掩模与底切轮辋移动元件
公开(公告)号：US08389183B2
公开(公告)日：2013-03-05
申请号：US12702787
申请日：2010-02-09
申请人： Brent A. Anderson , Jed H. Rankin
发明人： Brent A. Anderson , Jed H. Rankin
IPC分类号： G03F1/28 , G03F1/29 , G03F1/34
CPC分类号： G03F1/29 , G03F1/34
摘要： A phase-shifting photomask with a self aligned undercut rim-shifting element and methods for its manufacture are provided. One embodiment of the invention provides a method of manufacturing a phase-shifting photomask having a self aligned rim-shifting element, the method comprising: applying a patterning film to a first portion of a transparent substrate; etching the substrate to a depth to remove a second portion of the substrate not beneath the patterning film; etching the first portion of the substrate to undercut an area beneath the patterning film; and removing the patterning film, wherein the etched substrate forms a self-aligned undercut rim-shifting element.
摘要翻译：提供了具有自对准底切边缘移动元件的相移光掩模及其制造方法。本发明的一个实施例提供了一种制造具有自对准边缘移位元件的相移光掩模的方法，所述方法包括：将图案化膜施加到透明基板的第一部分; 将衬底蚀刻到深度以去除衬底的第二部分而不在图案化膜下方; 蚀刻基板的第一部分以削去图案化膜下方的区域; 并且去除所述图案化膜，其中所述蚀刻的衬底形成自对准底切轮辋移位元件。

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