专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US06272936B1 Pressure sensor 失效
标题翻译：压力传感器
公开(公告)号：US06272936B1
公开(公告)日：2001-08-14
申请号：US09027129
申请日：1998-02-20
申请人： Boris Oreper , John Brenneman
发明人： Boris Oreper , John Brenneman
IPC分类号： G01L104
CPC分类号： A63B71/0622 , A61B5/1036 , A61B5/225 , A61B5/228 , A63B60/06 , A63B60/08 , A63B60/10 , A63B2060/464 , A63B2071/0625 , A63B2220/51 , A63B2220/56 , A63B2220/58 , A63B2220/80 , A63B2220/833 , G01L1/20 , G01L1/225 , G01L5/0085
摘要： A novel pressure sensor mechanism is provided which includes both a novel pressure sensor assembly and a novel handle for use therewith. The pressure sensor assembly has at least one pressure sensor at its distal end, the pressure sensor having electrodes which are connected through spaced leads to output terminals at a proximal end of the assembly. Even though sensor electrodes and leads may be on facing substrate sections of the assembly, the assembly is designed so as to permit all output terminals to be electrically accessed from the same side of the sensor assembly. An additional output terminal may be provided for preferred embodiments, which terminal is accessible from the same side of the sensor assembly as the other two output terminals, is substantially smaller than the other two output terminals and is connected to one of the other two output terminals by a sensor-ok lead or trace. The handle has a circuit board with a terminal corresponding to each output terminal on the sensor assembly, and a slot for receiving the proximal end of the sensor assembly and for aligning such assembly with each of its output terminals adjacent the corresponding terminal on the circuit board. The handle also includes a member for applying pressure to the side of the sensor assembly opposite the output terminals and a mechanism for permitting such pressure to be released so as to facilitate insertion and removal of the sensor assembly from the handle. The handle also includes controls which operate in conjunction with the sensor-ok trace on a sensor assembly to detect when good electrical contact is being made between the terminals of the sensor assembly and the corresponding terminals of the handle circuit board, and for receiving and suitably outputting pressure measurements from the sensor.
摘要翻译：提供了一种新颖的压力传感器机构，其包括新颖的压力传感器组件和与其一起使用的新型手柄。压力传感器组件在其远端具有至少一个压力传感器，压力传感器具有通过间隔开的引线连接到组件近端处的输出端子的电极。即使传感器电极和引线可能在组件的面对的基板部分上，组件被设计成允许所有输出端子从传感器组件的同一侧被电接触。可以为优选实施例提供另外的输出端子，该端子可从传感器组件的同一侧接近，而另外两个输出端子实质上小于其它两个输出端子，并且连接到另外两个输出端子之一通过传感器确定铅或痕迹。手柄具有电路板，其具有对应于传感器组件上的每个输出端子的端子，以及用于接收传感器组件的近端并用于将这种组件与其邻近电路板上的相应端子的每个输出端对准的槽。手柄还包括用于向与输出端子相对的传感器组件的侧面施加压力的构件和用于允许释放这种压力的机构，以便于将传感器组件从手柄上的插入和移除。手柄还包括与传感器组件上的传感器 - 轨迹一起工作的控制器，以检测传感器组件的端子与手柄电路板的相应端子之间何时发生良好的电接触，并且用于接收和适当地从传感器输出压力测量值。

2. 发明申请

US20140198899A1 DUAL ENERGY IMAGING SYSTEM 审中-公开
标题翻译：双能量成像系统
公开(公告)号：US20140198899A1
公开(公告)日：2014-07-17
申请号：US13739871
申请日：2013-01-11
申请人： Vitaliy Ziskin , Boris Oreper
发明人： Vitaliy Ziskin , Boris Oreper
IPC分类号： G01N23/04
CPC分类号： G01N23/04 , G01T1/2985 , G01V5/0041 , G01V5/005
摘要： An inspection system that makes dual energy measurements with a detector array that has selective placement of filter elements adjacent a subset of detectors in the array to provide at least two subsets of detector elements sensitive to X-rays of different energies. Dual energy measurements may be made on objects of interest within an item under inspection by forming a volumetric image using measurements from detectors in a first of the subsets and synthetic readings computed from measurements made with detectors in the array, including those that are filtered. The volumetric image may be used to identify the objects of interest to and source points that, for each object of interest, provide a low interference path to one of the detectors in the second of the subsets. Measurements made with radiation emanating from those source points are used for dual energy analysis of the objects of interest.
摘要翻译：一种检测系统，其利用检测器阵列进行双能量测量，所述检测器阵列具有与阵列中的检测器子集相邻的滤波器元件的选择性放置，以提供对不同能量的X射线敏感的检测器元件的至少两个子集。可以通过使用来自第一子集中的检测器的测量形成体积图像，并且通过阵列中的检测器（包括被过滤的检测器）进行的测量计算的合成读数来形成体积图像，来对被检查物品内的感兴趣对象进行双能量测量。体积图像可以用于识别感兴趣的对象和源点，对于每个感兴趣对象，在第二个子集中的一个检测器提供低干扰路径。使用从这些源点发出的辐射进行的测量用于感兴趣对象的双能量分析。

3. 发明申请

US20120008746A1 IRRADIATION SYSTEM INCLUDING AN ELECTRON-BEAM SCANNER 审中-公开
标题翻译：包括电子束扫描仪的辐射系统
公开(公告)号：US20120008746A1
公开(公告)日：2012-01-12
申请号：US13236011
申请日：2011-09-19
申请人： Boris Oreper , Douglas P. Boyd , Nikolay Rolshud
发明人： Boris Oreper , Douglas P. Boyd , Nikolay Rolshud
IPC分类号： A61N5/10
CPC分类号： A61N5/1049 , A61B6/032 , A61B6/4007 , A61B6/4028 , A61B6/466 , A61B6/508 , A61N5/1067 , A61N2005/1061
摘要： A property of a treatment beam is controlled during a scanning period. A portion of a region is exposed to an imaging x-ray beam during a scanning period, the imaging x-ray beam being generated by an electron-beam scanner. X-ray radiation from the region is detected, the x-ray radiation representing an attenuation of the imaging x-ray beam caused by the portion of the region. A first image of the portion of the region is generated based on the detected x-ray radiation. A characteristic of the portion of the region is determined from the generated first image. An input derived from the characteristic is generated, the input configured to cause a source of a treatment beam to modify a property of the treatment beam. The source of the treatment beam modifies a property of the treatment beam during the scanning period by providing the input to the source of the treatment beam.
摘要翻译：处理光束的特性在扫描期间被控制。在扫描期间，区域的一部分暴露于成像x射线束，成像x射线束由电子束扫描器产生。检测到来自该区域的X射线辐射，X射线辐射代表由该区域的该部分引起的成像x射线束的衰减。基于检测到的x射线辐射产生区域的该部分的第一图像。从所生成的第一图像确定区域的该部分的特征。产生从该特征得到的输入，该输入被配置为使治疗束的源改变治疗束的特性。治疗束的源通过向治疗束的源提供输入来在扫描期间改变治疗束的特性。

4. 发明申请

US20100329423A1 IRRADIATION SYSTEM INCLUDING AN ELECTRON-BEAM SCANNER 失效
标题翻译：包括电子束扫描仪的辐射系统
公开(公告)号：US20100329423A1
公开(公告)日：2010-12-30
申请号：US12871981
申请日：2010-08-31
申请人： Boris Oreper , Douglas P. Boyd , Nikolay Rolshud
发明人： Boris Oreper , Douglas P. Boyd , Nikolay Rolshud
IPC分类号： A61N5/10
CPC分类号： A61N5/1049 , A61B6/032 , A61B6/4007 , A61B6/4028 , A61B6/466 , A61B6/508 , A61N5/1067 , A61N2005/1061
摘要： A property of a treatment beam is controlled during a scanning period. A portion of a region is exposed to an imaging x-ray beam during a scanning period, the imaging x-ray beam being generated by an electron-beam scanner. X-ray radiation from the region is detected, the x-ray radiation representing an attenuation of the imaging x-ray beam caused by the portion of the region. A first image of the portion of the region is generated based on the detected x-ray radiation. A characteristic of the portion of the region is determined from the generated first image. An input derived from the characteristic is generated, the input configured to cause a source of a treatment beam to modify a property of the treatment beam. The source of the treatment beam modifies a property of the treatment beam during the scanning period by providing the input to the source of the treatment beam.
摘要翻译：处理光束的特性在扫描期间被控制。在扫描期间，区域的一部分暴露于成像x射线束，成像x射线束由电子束扫描器产生。检测到来自该区域的X射线辐射，X射线辐射代表由该区域的该部分引起的成像x射线束的衰减。基于检测到的x射线辐射产生区域的该部分的第一图像。从所生成的第一图像确定区域的该部分的特征。产生从该特征得到的输入，该输入被配置为使治疗束的源改变治疗束的特性。治疗束的源通过向治疗束的源提供输入来在扫描期间改变治疗束的特性。

5. 发明申请

US20080075230A1 Compact e-beam source for generating X-rays 失效
标题翻译：用于产生X射线的紧凑型电子束源
公开(公告)号：US20080075230A1
公开(公告)日：2008-03-27
申请号：US11903035
申请日：2007-09-20
申请人： Boris Oreper , Richard Eilbert
发明人： Boris Oreper , Richard Eilbert
IPC分类号： H01J35/20
CPC分类号： H01J35/14 , A61B6/032 , A61B6/4028 , A61B6/482 , H01J35/30 , H01J2235/086
摘要： Various novel apparatuses and methods for generating X-rays are disclosed. In some embodiments, for example, an apparatus may be configured and arranged so that, for at least one interception point on a particular portion of a scan path on a surface of a target along which a steering element steers an accelerated electron beam (e-beam), both an angle and its complement between a line corresponding to a direction in which the accelerated e-beam is traveling at the interception point and a line oriented normal to the surface of the target at such interception point are greater than forty five degrees.
摘要翻译：公开了用于产生X射线的各种新颖的装置和方法。在一些实施例中，例如，可以对装置进行配置和布置，使得对于目标表面上的扫描路径的特定部分上的至少一个截取点，操纵元件沿着该截取点转向加速的电子束（e- 光束），在与截取点处的加速电子束行进的方向对应的线和在该截取点处与靶的表面垂直的线之间的角度及其补码都大于四十五度。

6. 发明授权

US06225814B1 Contact width sensors 有权
公开(公告)号：US06225814B1
公开(公告)日：2001-05-01
申请号：US09290288
申请日：1999-04-13
申请人： Boris Oreper , Mark Lowe , Charles McWilliams , Charles Malacaria , Anthony Coviello , Jay Winters
发明人： Boris Oreper , Mark Lowe , Charles McWilliams , Charles Malacaria , Anthony Coviello , Jay Winters
IPC分类号： G01R2708
CPC分类号： G01L5/0085
摘要： This invention relates to apparatus for detecting the contact or nip width between two contacting surfaces. The apparatus includes first and second insulating substrates each of which has a pattern of conductive material formed on a facing inner surface thereof, which substrates are adapted to be fitted between the contacting surfaces. For a first embodiment, the pattern of conductive material on one substrate includes a pair of conductive terminals spaced by a distance greater than the contact width to be measured and the conductive pattern on the other substrate includes a conductor which extends over at least a distance greater than the maximum width W to be measured. A resistance path is provided between the conductive terminals having a resistance R0 which is higher than that of the conductor and material is provided in the space between the conductor and the resistance path which material substantially permits current flow therethrough between the conductor and the resistance path in areas where the contacting surfaces are not in contact and which has a resistance less than R0 permitting current flow therethrough in areas where the contact surfaces are in contact. Circuitry is also provided for applying current to one of the terminals and for utilizing the difference in current flow between the terminals to determine contact width. For a second embodiment, the conductive pattern on one substrate includes N substantially parallel and evenly spaced conductive columns and the pattern on the other substrate is a plurality of substantially parallel and evenly spaced rows. The columns are divided into M groups, where M is an integer which is at least 2, and each of the rows is at an angle &thgr; to a line perpendicular to the columns when extending across alternate ones of the groups and at an angle −&thgr; when extending across the remaining groups. The number of columns in each group is selected to achieve a desired resolution, and &thgr; is selected so that the distance in the direction of the columns between the ends of a row for each group is substantially equal to the spacing between adjacent rows.

7. 发明授权

US08059783B2 Irradiation system including an electron-beam scanner 失效
标题翻译：包括电子束扫描仪的照射系统
公开(公告)号：US08059783B2
公开(公告)日：2011-11-15
申请号：US12871981
申请日：2010-08-31
申请人： Boris Oreper , Douglas P. Boyd , Nikolay Rolshud
发明人： Boris Oreper , Douglas P. Boyd , Nikolay Rolshud
IPC分类号： A61N5/10
CPC分类号： A61N5/1049 , A61B6/032 , A61B6/4007 , A61B6/4028 , A61B6/466 , A61B6/508 , A61N5/1067 , A61N2005/1061
摘要： A property of a treatment beam is controlled during a scanning period. A portion of a region is exposed to an imaging x-ray beam during a scanning period, the imaging x-ray beam being generated by an electron-beam scanner. X-ray radiation from the region is detected, the x-ray radiation representing an attenuation of the imaging x-ray beam caused by the portion of the region. A first image of the portion of the region is generated based on the detected x-ray radiation. A characteristic of the portion of the region is determined from the generated first image. An input derived from the characteristic is generated, the input configured to cause a source of a treatment beam to modify a property of the treatment beam. The source of the treatment beam modifies a property of the treatment beam during the scanning period by providing the input to the source of the treatment beam.
摘要翻译：处理光束的特性在扫描期间被控制。在扫描期间，区域的一部分暴露于成像x射线束，成像x射线束由电子束扫描器产生。检测到来自该区域的X射线辐射，X射线辐射代表由该区域的该部分引起的成像x射线束的衰减。基于检测到的x射线辐射产生区域的该部分的第一图像。从所生成的第一图像确定区域的该部分的特征。产生从该特征得到的输入，该输入被配置为使治疗束的源修改治疗束的特性。治疗束的源通过向治疗束的源提供输入来在扫描期间改变治疗束的特性。

8. 发明授权

US07899156B2 Irradiation system including an electron-beam scanner 有权
公开(公告)号：US07899156B2
公开(公告)日：2011-03-01
申请号：US12503560
申请日：2009-07-15
申请人： Boris Oreper , Douglas P. Boyd , Nikolay Rolshud
发明人： Boris Oreper , Douglas P. Boyd , Nikolay Rolshud
IPC分类号： A61N5/10
CPC分类号： A61N5/1049 , A61B6/032 , A61B6/4007 , A61B6/4028 , A61B6/466 , A61B6/508 , A61N5/1067 , A61N2005/1061
摘要： A property of a treatment beam is controlled during a scanning period. A portion of a region is exposed to an imaging x-ray beam during a scanning period, the imaging x-ray beam being generated by an electron-beam scanner. X-ray radiation from the region is detected, the x-ray radiation representing an attenuation of the imaging x-ray beam caused by the portion of the region. A first image of the portion of the region is generated based on the detected x-ray radiation. A characteristic of the portion of the region is determined from the generated first image. An input derived from the characteristic is generated, the input configured to cause a source of a treatment beam to modify a property of the treatment beam. The source of the treatment beam modifies a property of the treatment beam during the scanning period by providing the input to the source of the treatment beam.

9. 发明申请

US20100284509A1 DUAL ENERGY IMAGING SYSTEM 有权
标题翻译：双能量成像系统
公开(公告)号：US20100284509A1
公开(公告)日：2010-11-11
申请号：US12776042
申请日：2010-05-07
申请人： Boris Oreper
发明人： Boris Oreper
IPC分类号： A61B6/03 , G01N23/04 , G01N23/06
CPC分类号： G03B42/02 , A61B6/03 , A61B6/4028 , A61B6/4266 , A61B6/4488 , A61B6/482 , G01V5/0041 , G01V5/0058
摘要： A dual energy inspection system that generates X-rays with an electron beam scanned over targets. A switchable voltage source that can be change its voltage output may cause X-rays to be generated at different energies. This X-ray generation subsystem is controlled by a sequencer that provides beam steering and shaping control inputs that may be dependent on the voltage provided by the voltage source. In another aspect, the dual energy inspection system may use multiple types of detectors, each sensitive to X-rays of a different energy. A relatively small number of detectors sensitive to one energy level is provided. Nonetheless, dual energy measurements may be made on objects within an item under inspection by identifying points that, for each object of interest, provide a low interference path to one of those detectors. Measurements made with radiation emanating from those points are used for dual energy analysis of those objects.
摘要翻译：一种双能量检测系统，可以在目标上扫描电子束产生X射线。可以改变其电压输出的可切换电压源可能导致在不同能量下产生X射线。该X射线发生子系统由定序器控制，该定序器提供可能取决于电压源提供的电压的波束导向和整形控制输入。在另一方面，双能量检查系统可以使用多种类型的检测器，每种检测器对不同能量的X射线敏感。提供了对一个能量级别敏感的相对较少数量的检测器。然而，可以通过识别对于每个感兴趣对象提供到这些检测器中的一个的低干扰路径的点来对被检查项目内的对象进行双能量测量。使用从这些点发出的辐射进行的测量用于这些物体的双能量分析。

10. 发明授权

US07606349B2 Selective generation of radiation at multiple energy levels 有权
标题翻译：选择性地在多种能级产生辐射
公开(公告)号：US07606349B2
公开(公告)日：2009-10-20
申请号：US11704894
申请日：2007-02-09
申请人： Boris Oreper , Richard F. Eilbert , Andrew Dean Foland , Kenneth E. Prather , Thomas David Plamondon
发明人： Boris Oreper , Richard F. Eilbert , Andrew Dean Foland , Kenneth E. Prather , Thomas David Plamondon
IPC分类号： H01J35/02
CPC分类号： G01V5/0025 , G01V5/005
摘要： A system may comprise a cathode, a target, one or more switches, and a conductive element. The cathode may be configured and arranged to generate an electron beam, and the target may be configured and arranged to emit radiation when electrons in the electron beam impact the target after being accelerated by an energy source. The one or more switches may be configured and arranged to apply either a first voltage or a second voltage from a power supply between the cathode and the target. The conductive element may be disposed between the cathode and the target so as to inhibit the electron beam generated by the cathode from reaching the target when a signal is applied to the conductive element.
摘要翻译：系统可以包括阴极，靶，一个或多个开关和导电元件。阴极可以被配置和布置成产生电子束，并且靶可以被配置和布置成当电子束中的电子在被能量源加速之后撞击靶时发射辐射。一个或多个开关可以被配置和布置成施加来自阴极和靶之间的电源的第一电压或第二电压。导电元件可以设置在阴极和靶之间，以便当信号被施加到导电元件时，抑制由阴极产生的电子束到达目标。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式