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    • 6. 发明授权
    • Nonvolatile memory devices and methods of fabricating the same
    • 非易失性存储器件及其制造方法
    • US07553725B2
    • 2009-06-30
    • US11488911
    • 2006-07-18
    • Hee-Seog JeonJeong-Uk HanChang-Hun LeeSung-Taeg KangBo-Young SeoHyok-Ki Kwon
    • Hee-Seog JeonJeong-Uk HanChang-Hun LeeSung-Taeg KangBo-Young SeoHyok-Ki Kwon
    • H01L21/336
    • H01L27/11524G11C16/0433H01L21/28273H01L27/115H01L27/11521H01L29/66825
    • A nonvolatile memory cell includes a source region and a drain region which are disposed in a semiconductor substrate and spaced apart from each other, a source selection line and a drain selection line disposed over the semiconductor substrate between the source region and the drain region. The source selection line and the drain selection line are disposed adjacent to the source region and the drain region, respectively. The nonvolatile memory cell further includes a cell gate pattern disposed over the semiconductor substrate between the source selection line and the drain selection line, a first floating impurity region provided in the semiconductor substrate under a gap region between the source selection line and the cell gate pattern and a second floating impurity region provided in the semiconductor substrate under a gap region between the drain selection line and the cell gate pattern. Distances between the cell gate pattern and the selection lines are less than widths of the selection lines.
    • 非易失性存储单元包括设置在半导体衬底中并彼此间隔开的源极区和漏极区,设置在源极区和漏极区之间的半导体衬底上的源极选择线和漏极选择线。 源极选择线和漏极选择线分别设置在源极区域和漏极区域附近。 非易失性存储单元还包括设置在源极选择线和漏极选择线之间的半导体衬底之上的单元栅极图案,设置在源极选择线和单元栅极图案之间的间隙区域的半导体衬底中的第一浮动杂质区域 以及在所述漏极选择线和所述单元栅极图案之间的间隙区域处设置在所述半导体衬底中的第二浮置杂质区域。 单元栅极图案和选择线之间的距离小于选择线的宽度。