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1. 发明授权

US09977050B2 Wear-less operation of a material surface with a scanning probe microscope 有权
公开(公告)号：US09977050B2
公开(公告)日：2018-05-22
申请号：US12940079
申请日：2010-11-05
申请人： Urs T. Duerig , Bernd W. Gotsmann , Armin W. Knoll , Mark Alfred Lantz
发明人： Urs T. Duerig , Bernd W. Gotsmann , Armin W. Knoll , Mark Alfred Lantz
IPC分类号： G01Q70/08 , G01Q60/36 , B82Y35/00 , G01Q70/10
CPC分类号： G01Q60/363 , B82Y35/00 , G01Q70/10
摘要： A method and a scanning probe microscope (SPM) for scanning a surface of a material. The method and SPM have a cantilever sensor configured to exhibit both a first spring behavior and a second, stiffer spring behavior. While operating the SPM in contact mode, the sensor is scanned on the material surface and a first spring behavior of the sensor (e.g. a fundamental mode of flexure thereof) is excited by deflection of the sensor by the material surface. Also while operating the SPM in contact mode, excitation means are used to excite a second spring behavior of the sensor at a resonance frequency thereof (e.g. one or more higher-order resonant modes) of the cantilever sensor to modulate an interaction of the sensor and the material surface and thereby reduce the wearing of the material surface.

2. 发明授权

US08374071B2 Data storage device 有权
标题翻译：数据存储设备
公开(公告)号：US08374071B2
公开(公告)日：2013-02-12
申请号：US12130283
申请日：2008-05-30
申请人： Bernd W. Gotsmann , Armin W. Knoll , Urs T. Duerig
发明人： Bernd W. Gotsmann , Armin W. Knoll , Urs T. Duerig
IPC分类号： G11B7/00
CPC分类号： G11B9/149 , G01Q80/00 , G11B5/743 , G11B9/14 , G11B11/007 , Y10T428/24802
摘要： The present invention relates to a data storage device comprising: a polymer layer for storing data in the form of topographic features; a substrate comprising a conductor, a first surface of the polymer layer being provided on the substrate; and at least one probe which, when the device is in use, interacts with a second surface of the polymer layer, wherein, when in use, the data storage device is operable to apply a first electrical potential to the at least one probe relative to the substrate, thereby to cause a protrusion to be formed on the second surface of the polymer layer.
摘要翻译：数据存储装置技术领域本发明涉及一种数据存储装置，包括：用于以地形特征的形式存储数据的聚合物层; 包括导体的衬底，所述聚合物层的第一表面设置在所述衬底上; 以及当所述装置在使用时与所述聚合物层的第二表面相互作用的至少一个探针，其中当使用时，所述数据存储装置可操作以相对于所述至少一个探针施加第一电位从而在聚合物层的第二表面上形成突起。

3. 发明申请

US20100026332A1 DEVICE AND METHOD FOR SENSING A POSITION OF A PROBE 有权
标题翻译：用于感测探头位置的装置和方法
公开(公告)号：US20100026332A1
公开(公告)日：2010-02-04
申请号：US12544246
申请日：2009-08-20
申请人： Urs T. Duerig , Bernd W. Gotsmann , Armin W. Knoll
发明人： Urs T. Duerig , Bernd W. Gotsmann , Armin W. Knoll
IPC分类号： G01R31/02
CPC分类号： G11B9/1409 , B82Y10/00 , G01Q80/00
摘要： A device for sensing a position of a probe relative to a reference medium, the probe comprising a heater element with a temperature dependent electrical resistance and being adapted to determine probe position by measuring a parameter associated to a thermal relaxation time of the heater element.
摘要翻译：一种用于感测探针相对于参考介质的位置的装置，所述探针包括具有温度依赖性电阻的加热器元件，并且适于通过测量与所述加热器元件的热松弛时间相关联的参数来确定探针位置。

4. 发明授权

US08389205B2 Patterning nano-scale patterns on a film comprising unzipping polymer chains 失效
标题翻译：在包含解链聚合物链的膜上形成纳米尺度图案
公开(公告)号：US08389205B2
公开(公告)日：2013-03-05
申请号：US12482500
申请日：2009-06-11
申请人： Urs T. Duerig , Jane E. Frommer , Bernd W. Gotsmann , James L. Hedrick , Armin W. Knoll , Robert D. Miller , David Pires , Charles G. Wade
发明人： Urs T. Duerig , Jane E. Frommer , Bernd W. Gotsmann , James L. Hedrick , Armin W. Knoll , Robert D. Miller , David Pires , Charles G. Wade
IPC分类号： G03F7/26
CPC分类号： C08G2/06 , C08G2/14 , G01Q80/00 , G03F7/0002 , G03F7/0392 , G03F7/16 , G03F7/2049
摘要： The invention concerns a method for patterning a surface of a material. A substrate having a polymer film thereon is provided. The polymer is a selectively reactive polymer (e.g. thermodynamically unstable): it is able to unzip upon suitable stimulation. A probe is used to create patterns on the film. During the patterning, the film is locally stimulated for unzipping polymer chains. Hence, a basic idea is to provide a stimulus to the polymeric material, which in turn spontaneously decomposes e.g. into volatile constituents. For example, the film is thermally stimulated in order to break a single bond in a polymer chain, which is sufficient to trigger the decomposition of the entire polymer chain.
摘要翻译：本发明涉及用于图案化材料表面的方法。提供其上具有聚合物膜的基板。聚合物是选择性反应性聚合物（例如热力学不稳定的）：它能够在合适的刺激下解压缩。探针用于在电影上创建图案。在图案化期间，膜被局部刺激用于解链聚合物链。因此，基本思想是向聚合物材料提供刺激，其又自发分解，例如，变成挥发性成分。例如，为了破坏聚合物链中的单键，该膜被热刺激，这足以引发整个聚合物链的分解。

5. 发明授权

US07952369B2 Device and method for sensing a position of a probe 有权
标题翻译：用于感测探针位置的装置和方法
公开(公告)号：US07952369B2
公开(公告)日：2011-05-31
申请号：US12544246
申请日：2009-08-20
申请人： Urs T. Duerig , Bernd W. Gotsmann , Armin W. Knoll
发明人： Urs T. Duerig , Bernd W. Gotsmann , Armin W. Knoll
IPC分类号： G01R31/02
CPC分类号： G11B9/1409 , B82Y10/00 , G01Q80/00
摘要： A device for sensing a position of a probe relative to a reference medium, the probe comprising a heater element with a temperature dependent electrical resistance and being adapted to determine probe position by measuring a parameter associated to a thermal relaxation time of the heater element.
摘要翻译：一种用于感测探针相对于参考介质的位置的装置，所述探针包括具有温度依赖性电阻的加热器元件，并且适于通过测量与所述加热器元件的热松弛时间相关联的参数来确定探针位置。

6. 发明申请

US20110113517A1 WEAR-LESS OPERATION OF A MATERIAL SURFACE WITH A SCANNING PROBE MICROSCOPE 有权
标题翻译：使用扫描探针显微镜对材料表面进行无磨损操作
公开(公告)号：US20110113517A1
公开(公告)日：2011-05-12
申请号：US12940079
申请日：2010-11-05
申请人： Urs T. Duerig , Bernd W. Gotsmann , Armin W. Knoll , Mark Alfred Lantz
发明人： Urs T. Duerig , Bernd W. Gotsmann , Armin W. Knoll , Mark Alfred Lantz
IPC分类号： G01Q70/08
CPC分类号： G01Q60/363 , B82Y35/00 , G01Q70/10
摘要： A method and a scanning probe microscope (SPM) for scanning a surface of a material. The method and SPM have a cantilever sensor configured to exhibit both a first spring behavior and a second, stiffer spring behavior. While operating the SPM in contact mode, the sensor is scanned on the material surface and a first spring behavior of the sensor (e.g. a fundamental mode of flexure thereof) is excited by deflection of the sensor by the material surface. Also while operating the SPM in contact mode, excitation means are used to excite a second spring behavior of the sensor at a resonance frequency thereof (e.g. one or more higher-order resonant modes) of the cantilever sensor to modulate an interaction of the sensor and the material surface and thereby reduce the wearing of the material surface.
摘要翻译：用于扫描材料表面的方法和扫描探针显微镜（SPM）。该方法和SPM具有构造成展现第一弹簧性能和第二较硬弹簧特性的悬臂传感器。当在接触模式下操作SPM时，传感器被扫描在材料表面上，传感器的第一弹簧特性（例如其基本弯曲模式）被材料表面的传感器偏转所激发。同时在接触模式下操作SPM时，激励装置用于在悬臂传感器的共振频率（例如一个或多个高次谐振模式）下激发传感器的第二弹簧特性，以调制传感器和材料表面，从而减少材料表面的磨损。

7. 发明申请

US20100059383A1 DEVICE AND METHOD FOR PATTERNING A SURFACE OF A POLYMER LAYER 审中-公开
标题翻译：用于绘制聚合物层表面的装置和方法
公开(公告)号：US20100059383A1
公开(公告)日：2010-03-11
申请号：US12375417
申请日：2007-07-18
申请人： Urs T. Duerig , Bernd W. Gotsmann , Armin W. Knoll
发明人： Urs T. Duerig , Bernd W. Gotsmann , Armin W. Knoll
IPC分类号： C25D1/00
CPC分类号： G11B9/1472 , B82Y10/00 , G11B9/14 , G11B11/007
摘要： The present invention relates to a device for forming topographic features on a surface of a polymer layer comprising: a polymer layer (1); a substrate (2) comprising a conductor, a first surface (1a) of the polymer layer (1) being provided on the substrate (2); and at least one electrode (3) which, when the device is in use, interacts with a second surface (1b) of the polymer layer (1), wherein, when in use, the device is operable to apply a first electrical potential (P1) to the at least one electrode (3) relative to the substrate (2), thereby to cause a protrusion (4) to be formed on the second surface (1b) of the polymer layer (1).
摘要翻译：本发明涉及一种用于在聚合物层的表面上形成地形特征的装置，包括：聚合物层（1）; 包括导体的基板（2），所述聚合物层（1）的第一表面（1a）设置在所述基板（2）上; 以及至少一个电极（3），当所述装置在使用中时，所述电极（3）与所述聚合物层（1）的第二表面（1b）相互作用，其中当使用时所述装置可操作以施加第一电位 P1）相对于基板（2）至少一个电极（3），从而在聚合物层（1）的第二表面（1b）上形成突起（4）。

8. 发明申请

US20090255462A1 DEVICE FORMED BY PROBE-BASED LITHOGRAPHY UTILIZING THERMOMECHANICALLY ACTIVATED POLYMERS 审中-公开
标题翻译：通过基于探针的LITHOGRAPHY使用热机械活化聚合物形成的装置
公开(公告)号：US20090255462A1
公开(公告)日：2009-10-15
申请号：US12272756
申请日：2008-11-17
申请人： Rachel Cannara , Bernd W. Gotsmann , Urs T. Duerig , Harish Bhaskaran , Armin W. Knoll
发明人： Rachel Cannara , Bernd W. Gotsmann , Urs T. Duerig , Harish Bhaskaran , Armin W. Knoll
IPC分类号： B05C11/02
CPC分类号： G03F7/0002 , G01Q80/00
摘要： Device having features formed utilizing probe-based lithography, including: depositing a preceramic polymer on a substrate; writing nanoscale features in the polymer by locally transforming the preceramic polymer via a chemical reaction causing it to undergo a permanent phase change into hardened, ceramic material, the chemical reaction activated with a prescribed activation energy supplied by heat and/or pressure applied by a probe tip; depositing new layers and continuing according to a desired three-dimensional pattern; by cross-linking unactivated preceramic polymer to act as a support medium that isolates a formed ceramic structure mechanically and/or electrically; and where the ceramic pattern is made electrically conductive by (a) incorporating dopant elements into or onto the preceramic polymer, or (b) performing the write step in a chemically-active environment that supplies dopant atoms during the chemical reaction.
摘要翻译：具有利用基于探针的光刻形成的特征的器件包括：在衬底上沉积预陶瓷聚合物; 通过化学反应局部转化预陶瓷聚合物，使其经历永久相变成硬化的陶瓷材料，从而在聚合物中形成纳米尺度特征，用由探针提供的加热和/或压力提供的规定的活化能激活化学反应小费; 沉积新层并根据期望的三维图案继续; 通过将未活化的前陶瓷聚合物交联以作为机械和/或电隔离形成的陶瓷结构的载体介质; 并且其中陶瓷图案通过（a）将掺杂剂元素结合到预陶瓷聚合物中或其上而导致导电，或（b）在化学反应期间提供掺杂剂原子的化学活性环境中进行写入步骤。

9. 发明申请

US20080316904A1 METHOD AND APPARATUS FOR REDUCING TIP-WEAR OF A PROBE 有权
标题翻译：用于减少探针刺伤的方法和装置
公开(公告)号：US20080316904A1
公开(公告)日：2008-12-25
申请号：US12116320
申请日：2008-05-07
申请人： Urs T. Duerig , Bernd W. Gotsmann , Armin W. Knoll , Mark Alfred Lantz
发明人： Urs T. Duerig , Bernd W. Gotsmann , Armin W. Knoll , Mark Alfred Lantz
IPC分类号： G11B9/00 , G01B5/28
CPC分类号： G01Q70/00 , G11B9/14 , G11B9/1436
摘要： The present invention relates to a method of reducing the wear of a tip of a probe when the tip is in contact with a surface of a substrate and when the probe is mounted on a support structure. A method is provided where a load force is applied to the probe, thereby causing the tip to be maintained substantially in contact with the substrate surface and a modulation step where the e magnitude of the load force is modulated at a modulation frequency. The modulation frequency is selected to be greater than a fundamental vibration frequency of the support structure on which the probe is mounted.
摘要翻译：本发明涉及当尖端与衬底的表面接触时以及当探针安装在支撑结构上时减小探针的尖端的磨损的方法。提供了一种方法，其中向探针施加负载力，从而使尖端保持与衬底表面基本接触，并且调制步骤，其中负载力的大小以调制频率被调制。选择调制频率大于安装探针的支撑结构的基本振动频率。

10. 发明申请

US20080220612A1 PROTECTION OF POLYMER SURFACES DURING MICRO-FABRICATION 审中-公开
标题翻译：微米制造过程中聚合物表面的保护
公开(公告)号：US20080220612A1
公开(公告)日：2008-09-11
申请号：US11682347
申请日：2007-03-06
申请人： Ute Drechsler , Urs T. Duerig , Jane Elizabeth Frommer , Bernd W. Gotsmann , James Lupton Hedrick , Armin W. Knoll , Tobias Kraus , Robert Dennis Miller
发明人： Ute Drechsler , Urs T. Duerig , Jane Elizabeth Frommer , Bernd W. Gotsmann , James Lupton Hedrick , Armin W. Knoll , Tobias Kraus , Robert Dennis Miller
IPC分类号： H01L21/311
CPC分类号： G11B9/149 , B82Y10/00 , Y10S438/928
摘要： A method of protecting a polymeric layer from contamination by a photoresist layer. The method includes: (a) forming a polymeric layer over a substrate; (b) forming a non-photoactive protection layer over the polymeric layer; (c) forming a photoresist layer over the protection layer; (d) exposing the photoresist layer to actinic radiation and developing the photoresist layer to form a patterned photoresist layer, thereby exposing regions of the protection layer; (e) etching through the protection layer and the polymeric layer where the protection layer is not protected by the patterned photoresist layer; (f) removing the patterned photoresist layer in a first removal process; and (g) removing the protection layer in a second removal process different from the first removal process.
摘要翻译：保护聚合物层免受光致抗蚀剂层污染的方法。该方法包括：（a）在基底上形成聚合物层; （b）在聚合物层上形成非光敏保护层; （c）在所述保护层上形成光致抗蚀剂层; （d）将光致抗蚀剂层暴露于光化辐射并显影光致抗蚀剂层以形成图案化的光致抗蚀剂层，从而暴露保护层的区域; （e）蚀刻通过保护层和聚合物层，其中保护层不被图案化的光致抗蚀剂层保护; （f）在第一去除过程中去除图案化的光致抗蚀剂层; 和（g）在与第一去除过程不同的第二去除过程中去除保护层。

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