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1. 发明授权

US08569157B2 Stepped masking for patterned implantation 有权
标题翻译：步进屏蔽图案植入
公开(公告)号：US08569157B2
公开(公告)日：2013-10-29
申请号：US13442571
申请日：2012-04-09
申请人： Benjamin B. Riordon , Nicholas P. T. Bateman , Charles T. Carlson
发明人： Benjamin B. Riordon , Nicholas P. T. Bateman , Charles T. Carlson
IPC分类号： H01L21/425
CPC分类号： H01L21/266 , H01J37/3172 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： An improved method of moving a mask to perform a pattern implant of a substrate is disclosed. The mask has a plurality of apertures, and is placed between the ion source and the substrate. After the substrate is exposed to the ion beam, the mask is indexed to a new position relative to the substrate and a subsequent implant step is performed. Through the selection of the aperture size and shape, the index distance and the number of implant steps, a variety of implant patterns may be created. In some embodiments, the implant pattern includes heavily doped horizontal stripes with lighter doped regions between the stripes. In some embodiments, the implant pattern includes a grid of heavily doped regions. In other embodiments, the implant pattern is suitable for use with a bus-bar structure.
摘要翻译：公开了一种移动掩模以执行衬底的图案植入的改进方法。掩模具有多个孔，并且被放置在离子源和基底之间。在将衬底暴露于离子束之后，掩模被引导到相对于衬底的新位置，并且执行随后的注入步骤。通过选择孔径尺寸和形状，指数距离和植入步骤的数量，可以产生各种种植体图案。在一些实施例中，注入图案包括在条纹之间具有较轻掺杂区域的重掺杂水平条纹。在一些实施例中，植入模式包括重掺杂区域格栅。在其它实施例中，植入图案适用于汇流条结构。

2. 发明授权

US08173527B2 Stepped masking for patterned implantation 失效
标题翻译：步进屏蔽图案植入
公开(公告)号：US08173527B2
公开(公告)日：2012-05-08
申请号：US12906369
申请日：2010-10-18
申请人： Benjamin B. Riordon , Nicholas P. T. Bateman , Charles T. Carlson
发明人： Benjamin B. Riordon , Nicholas P. T. Bateman , Charles T. Carlson
IPC分类号： H01L21/425
CPC分类号： H01L21/266 , H01J37/3172 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： An improved method of moving a mask to perform a pattern implant of a substrate is disclosed. The mask has a plurality of apertures, and is placed between the ion source and the substrate. After the substrate is exposed to the ion beam, the mask is indexed to a new position relative to the substrate and a subsequent implant step is performed. Through the selection of the aperture size and shape, the index distance and the number of implant steps, a variety of implant patterns may be created. In some embodiments, the implant pattern includes heavily doped horizontal stripes with lighter doped regions between the stripes. In some embodiments, the implant pattern includes a grid of heavily doped regions. In other embodiments, the implant pattern is suitable for use with a bus-bar structure.
摘要翻译：公开了一种移动掩模以执行衬底的图案植入的改进方法。掩模具有多个孔，并且被放置在离子源和基底之间。在将衬底暴露于离子束之后，掩模被引导到相对于衬底的新位置，并且执行随后的注入步骤。通过选择孔径尺寸和形状，指数距离和植入步骤的数量，可以产生各种种植体图案。在一些实施例中，注入图案包括在条纹之间具有较轻掺杂区域的重掺杂水平条纹。在一些实施例中，植入模式包括重掺杂区域格栅。在其它实施例中，植入图案适用于汇流条结构。

3. 发明申请

US20110027463A1 WORKPIECE HANDLING SYSTEM 审中-公开
标题翻译：工作处理系统
公开(公告)号：US20110027463A1
公开(公告)日：2011-02-03
申请号：US12814748
申请日：2010-06-14
申请人： Benjamin B. Riordon , Kevin M. Daniels , William T. Weaver , Charles T. Carlson
发明人： Benjamin B. Riordon , Kevin M. Daniels , William T. Weaver , Charles T. Carlson
IPC分类号： B05D5/00 , B05C13/00 , B05D1/32
CPC分类号： H01L21/67213 , C23C14/48 , H01J37/20 , H01J37/3171 , H01J2237/2001 , H01J2237/2007 , H01J2237/20292 , H01J2237/204 , H01J2237/31711 , H01L21/266 , H01L21/67769 , H01L31/022425 , H01L31/022441 , H01L31/068 , H01L31/0682 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： A workpiece handling system includes a process chamber configured to support a workpiece for ion implantation, a first mask stored outside the process chamber in a mask station, and a robot system configured to retrieve the first mask from the mask station, and position the first mask upstream of the workpiece so the workpiece receives a first selective implant through the first mask. A method includes storing a first mask outside a process chamber in a mask station, retrieving the first mask from the mask station, positioning the first mask upstream of a workpiece positioned in the process chamber for ion implantation, and performing a first selective implant through the first mask.
摘要翻译：工件处理系统包括被配置为支撑用于离子注入的工件的处理室，存储在掩模工位中的处理室外部的第一掩模以及被配置为从掩模工位取回第一掩模的机器人系统，并且将第一掩模在工件的上游，使得工件通过第一掩模接收第一选择性植入物。一种方法包括将处理室外的第一掩模存储在掩模站中，从掩模站取回第一掩模，将第一掩模定位在位于处理室中的用于离子注入的工件的上游，以及通过第第一个面具

4. 发明申请

US20110256698A1 STEPPED MASKING FOR PATTERNED IMPLANTATION 失效
标题翻译：用于图案植入的步进掩蔽
公开(公告)号：US20110256698A1
公开(公告)日：2011-10-20
申请号：US12906369
申请日：2010-10-18
申请人： Benjamin B. Riordon , Nicholas P.T. Bateman , Charles T. Carlson
发明人： Benjamin B. Riordon , Nicholas P.T. Bateman , Charles T. Carlson
IPC分类号： H01L21/266
CPC分类号： H01L21/266 , H01J37/3172 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： An improved method of moving a mask to perform a pattern implant of a substrate is disclosed. The mask has a plurality of apertures, and is placed between the ion source and the substrate. After the substrate is exposed to the ion beam, the mask is indexed to a new position relative to the substrate and a subsequent implant step is performed. Through the selection of the aperture size and shape, the index distance and the number of implant steps, a variety of implant patterns may be created. In some embodiments, the implant pattern includes heavily doped horizontal stripes with lighter doped regions between the stripes. In some embodiments, the implant pattern includes a grid of heavily doped regions. In other embodiments, the implant pattern is suitable for use with a bus-bar structure.
摘要翻译：公开了一种移动掩模以执行衬底的图案植入的改进方法。掩模具有多个孔，并且被放置在离子源和基底之间。在将衬底暴露于离子束之后，掩模被引导到相对于衬底的新位置，并且执行随后的注入步骤。通过选择孔径尺寸和形状，指数距离和植入步骤的数量，可以产生各种种植体图案。在一些实施例中，注入图案包括在条纹之间具有较轻掺杂区域的重掺杂水平条纹。在一些实施例中，植入模式包括重掺杂区域格栅。在其它实施例中，植入图案适用于汇流条结构。

5. 发明申请

US20110108742A1 SYSTEM AND METHOD FOR HANDLING MULTIPLE WORKPIECES FOR MATRIX CONFIGURATION PROCESSING 失效
标题翻译：用于处理矩阵配置处理的多个工件的系统和方法
公开(公告)号：US20110108742A1
公开(公告)日：2011-05-12
申请号：US12941656
申请日：2010-11-08
申请人： William T. Weaver , Jaime A. Carrera , Robert B. Vopat , Aaron Webb , Charles T. Carlson
发明人： William T. Weaver , Jaime A. Carrera , Robert B. Vopat , Aaron Webb , Charles T. Carlson
IPC分类号： H01L21/677 , B25J11/00 , B65G1/10 , B65G1/04 , B65G65/00 , G21K5/10
CPC分类号： H01L21/67739 , G21K5/10 , H01L21/67742 , H01L21/67766 , H01L21/68707
摘要： A system for loading workpieces into a process chamber for processing in a matrix configuration includes a conveyor configured to transport multiple workpieces in a linear fashion. A workpiece hotel is configured to receive the multiple workpieces from the conveyor. The workpiece hotel comprises a matrix of cells arranged in N columns and M floors. A pick blade is configured to insert into the hotel and retract from the hotel in order to unload a plurality of substrates from a first floor into a single row of the pick blade, and to repeat the unloading operation to form a matrix comprising a plurality of rows of substrates disposed on the pick blade. In one example, the workpiece hotel has a staggered configuration that provides individual accessibility of each hotel cell.
摘要翻译：用于将工件加载到用于以矩阵构造处理的处理室中的系统包括被构造成以线性方式输送多个工件的传送器。工件酒店被配置为从输送机接收多个工件。工件酒店包括排列在N列和M层的单元矩阵。拾取刀片被配置成插入酒店并从酒店退回，以便将多个基板从第一层卸载到单行拾取刀片中，并且重复卸载操作以形成矩阵，其包括多个设置在拾取刀片上的一排衬底。在一个例子中，工件酒店具有交错的配置，可以提供每个酒店单元的个人可访问性。

6. 发明授权

US08813338B2 Workpiece alignment device 有权
标题翻译：工件对准装置
公开(公告)号：US08813338B2
公开(公告)日：2014-08-26
申请号：US13415411
申请日：2012-03-08
申请人： Malcolm N. Daniel , Charles T. Carlson , William T. Weaver
发明人： Malcolm N. Daniel , Charles T. Carlson , William T. Weaver
IPC分类号： B23P21/00 , B65G65/00
CPC分类号： H01L21/68 , B65G49/07 , H01L21/67769 , H01L21/67775 , H01L21/67781 , H01L21/681 , Y10T29/49764 , Y10T29/49829 , Y10T29/53022 , Y10T29/53539
摘要： An alignment device has a carriage, two rails on the carriage that are configured for a workpiece to pass therebetween, and a finger that protrudes a distance from the carriage. The finger is configured to be disposed on a carrier for the workpieces. The workpieces may be solar cells and may pass through the rails on a conveyor belt. The alignment device may move in order to align the workpieces as the workpieces are loaded into a carrier.
摘要翻译：对准装置具有滑架，滑架上的两个轨道，其构造成用于工件通过它们;以及从滑架突出一定距离的手指。手指被配置为设置在用于工件的载体上。工件可以是太阳能电池，并且可以通过传送带上的轨道。当工件装载到载体中时，对准装置可以移动以便对齐工件。

7. 发明授权

US08698104B2 System and method for handling multiple workpieces for matrix configuration processing 失效
标题翻译：用于处理多个工件以进行矩阵配置处理的系统和方法
公开(公告)号：US08698104B2
公开(公告)日：2014-04-15
申请号：US12941656
申请日：2010-11-08
申请人： William T. Weaver , Jaime A. Carrera , Robert B. Vopat , Aaron Webb , Charles T. Carlson
发明人： William T. Weaver , Jaime A. Carrera , Robert B. Vopat , Aaron Webb , Charles T. Carlson
IPC分类号： G01J1/00
CPC分类号： H01L21/67739 , G21K5/10 , H01L21/67742 , H01L21/67766 , H01L21/68707
摘要： A system for loading workpieces into a process chamber for processing in a matrix configuration includes a conveyor configured to transport multiple workpieces in a linear fashion. A workpiece hotel is configured to receive the multiple workpieces from the conveyor. The workpiece hotel comprises a matrix of cells arranged in N columns and M floors. A pick blade is configured to insert into the hotel and retract from the hotel in order to unload a plurality of substrates from a first floor into a single row of the pick blade, and to repeat the unloading operation to form a matrix comprising a plurality of rows of substrates disposed on the pick blade. In one example, the workpiece hotel has a staggered configuration that provides individual accessibility of each hotel cell.
摘要翻译：用于将工件加载到用于以矩阵构造处理的处理室中的系统包括被构造成以线性方式输送多个工件的传送器。工件酒店被配置为从输送机接收多个工件。工件酒店包括排列在N列和M层的单元矩阵。拾取刀片被配置成插入酒店并从酒店退回，以便将多个基板从第一层卸载到单行拾取刀片中，并且重复卸载操作以形成矩阵，其包括多个设置在拾取刀片上的一排衬底。在一个例子中，工件酒店具有交错的配置，可以提供每个酒店单元的个人可访问性。

8. 发明授权

US08330128B2 Implant mask with moveable hinged mask segments 失效
标题翻译：植入式面膜与可移动铰链的面膜段
公开(公告)号：US08330128B2
公开(公告)日：2012-12-11
申请号：US12757616
申请日：2010-04-09
申请人： Robert B. Vopat , William T. Weaver , Charles T. Carlson
发明人： Robert B. Vopat , William T. Weaver , Charles T. Carlson
IPC分类号： G21K5/10 , H01J37/08 , H01L21/425
CPC分类号： H01L21/266 , H01J37/3171 , H01J2237/31711
摘要： This apparatus has two mask segments. Each mask segment has apertures that an ion beam may pass through. These mask segments can move between a first and second position using hinges. One or more workpieces are disposed behind the mask segments when these mask segments are in a second position. The two mask segments are configured to cover the one or more workpieces in one instance. Ions are implanted into the one or more workpieces through the apertures in the mask segments.
摘要翻译：该装置具有两个掩模段。每个掩模段具有离子束可能通过的孔。这些掩模段可以使用铰链在第一和第二位置之间移动。当这些掩模段处于第二位置时，一个或多个工件设置在掩模段后面。两个掩模段被配置为在一个实例中覆盖一个或多个工件。离子通过掩模段中的孔注入到一个或多个工件中。

9. 发明授权

US08101927B2 Masking apparatus for an ion implanter 有权
标题翻译：用于离子注入机的掩蔽装置
公开(公告)号：US08101927B2
公开(公告)日：2012-01-24
申请号：US12775728
申请日：2010-05-07
申请人： Charles T. Carlson , William T. Weaver
发明人： Charles T. Carlson , William T. Weaver
IPC分类号： H01J37/317 , H01J1/54 , A61N5/00
CPC分类号： H01L21/266 , H01J37/3171 , H01J37/32412 , H01J2237/024 , H01J2237/20214 , H01J2237/31711
摘要： A masking apparatus includes a mask positioned upstream of a target positioned for treatment with ions. The mask is sized relative to the target to cause a first half of the target to be treated with a selective treatment of ions through the mask and a second half of the target to be treated with a blanket treatment of ions unimpeded by the mask during a first time interval. The masking apparatus also includes a positioning mechanism to change a relative position of the mask and the target so that the second half of the target is treated with the selective treatment of ions and the first half of the target is treated with the blanket implant during a second time interval. An ion implanter having the masking apparatus is also provided.
摘要翻译：掩模装置包括位于被定位用于用离子处理的靶的上游的掩模。掩模的尺寸相对于目标，以使靶的第一半被选择性地处理离子通过掩模和待处理的靶的第二半被处理，在一个第一时间间隔。掩蔽装置还包括定位机构，以改变掩模和靶的相对位置，以便通过选择性处理离子来处理靶的后半部分，并且在第二时间间隔。还提供了具有掩蔽装置的离子注入机。

10. 发明申请

US20100308236A1 MASKING APPARATUS FOR AN ION IMPLANTER 有权
标题翻译：用于离子植入物的掩蔽装置
公开(公告)号：US20100308236A1
公开(公告)日：2010-12-09
申请号：US12775728
申请日：2010-05-07
申请人： Charles T. Carlson , William T. Weaver
发明人： Charles T. Carlson , William T. Weaver
IPC分类号： H01J37/317 , H01J1/54
CPC分类号： H01L21/266 , H01J37/3171 , H01J37/32412 , H01J2237/024 , H01J2237/20214 , H01J2237/31711
摘要： A masking apparatus includes a mask positioned upstream of a target positioned for treatment with ions. The mask is sized relative to the target to cause a first half of the target to be treated with a selective treatment of ions through the mask and a second half of the target to be treated with a blanket treatment of ions unimpeded by the mask during a first time interval. The masking apparatus also includes a positioning mechanism to change a relative position of the mask and the target so that the second half of the target is treated with the selective treatment of ions and the first half of the target is treated with the blanket implant during a second time interval. An ion implanter having the masking apparatus is also provided.
摘要翻译：掩模装置包括位于被定位用于用离子处理的靶的上游的掩模。掩模的尺寸相对于目标，以使靶的第一半被选择性地处理离子通过掩模和待处理的靶的第二半被处理，在一个第一时间间隔。掩蔽装置还包括定位机构，以改变掩模和靶的相对位置，以便通过选择性处理离子来处理靶的后半部分，并且在第二时间间隔。还提供了具有掩蔽装置的离子注入机。

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