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    • 1. 发明申请
    • GAS DISTRIBUTION PLATE INTENDED FOR USE IN DEVICES FOR TREATING SOLID PARTICLES
    • 气体分配板用于处理固体颗粒的设备中
    • WO2011031244A2
    • 2011-03-17
    • PCT/SI2010000047
    • 2010-08-27
    • BRINOX D O OTESLIC DUSAN
    • TESLIC DUSAN
    • B01J2/16
    • B01J2/16B01J8/1818B01J8/44B01J2208/0084
    • The subject of the invention is a gas distribution plate, intended for use in an improved process device for treating solid particles in a fluidised bed, which falls within the field of chemical and pharmaceutical technology. It represents an improvement on the process equipment for treating solid particles by spraying from above, below or from the side and works on the principle of technology with a controlled circular movement of material in the processing chamber. The distribution plate (3) is composed of several upper plates (7) and lower plates (6) whose floor plan surfaces are ring shaped, for which each upper plate (7) concentrically overlaps part of one or two lower plates (6). Between the upper plates (7) and lower plates (6), barriers (13a, 13b) are placed for directing the flow of the media 9, in such a way, that theses barriers (13a, 13b) together with the plates (6) and plates (7) create numerous openings (16) intended for the passage of the media (9).
    • 本发明的主题是一种气体分配板,其用于处理流化床中的固体颗粒的改进的工艺装置,其处于化学和制药技术领域。 它代表了通过从上方,下方或从侧面喷雾处理固体颗粒的工艺设备的改进,并且以处理室中材料受控的圆周运动的技术原理为基础。 分配板(3)由几个上板(7)和下板(6)组成,其平板表面为环形,每个上板(7)与其一个或两个下板(6)的一部分同心重叠。 在上板(7)和下板(6)之间,放置有用于引导介质9的流动的挡板(13a,13b),使得这些挡板(13a,13b)与板(6) )和板(7)产生旨在使介质(9)通过的多个开口(16)。
    • 2. 发明申请
    • PROCESSING DEVICE FOR GRANULATING AND COATING OF SOLID PARTICLES
    • 加工颗粒和固体颗粒涂层的装置
    • WO2012026890A3
    • 2012-05-10
    • PCT/SI2011000046
    • 2011-08-23
    • BRINOX D O OTESLIC DUSAN
    • TESLIC DUSAN
    • B01J2/00B01J2/16B05B7/06
    • B01J2/16B01J2/006B05B7/067
    • The subject of the invention is a processing device for granulating and coating of solid particles. The present invention refers to a technical field of particle coating, especially to a field of devices for spraying a coating liquid or suspension into a fluidised layer of particles. A processing device for granulating and coating of solid particles, where the device (1) has a processing medium distribution panel (4) arranged inside a wall (2), through which distribution panel (4) at least one nozzle (15) for atomising the liquid for coating or granulating is arranged, wherein under said distribution panel (4) there is a housing (3), which serves to supply a processing medium (5) through the distribution panel (4) into the area above the distribution panel (4), wherein the nozzle (15) for atomisation of the solution is designed in a way that part of the processing medium (5) is taken from the area below the distribution panel (4) and conducted to the area above the distribution panel (4) through a channel (12) that embraces the nozzle (15) concentrically and in the same flow direction with respect to a sprayed solution (7).
    • 本发明的主题是用于造粒和涂覆固体颗粒的处理装置。 本发明涉及颗粒涂层技术领域,尤其涉及一种将涂层液体或悬浮液喷射到颗粒流化层中的装置领域。 一种用于造粒和涂覆固体颗粒的处理装置,其中装置(1)具有布置在壁(2)内的处理介质分配板(4),分配板(4)通过该分配板(4)具有至少一个用于雾化 布置用于涂覆或粒化的液体,其中在所述分配板(4)的下方具有壳体(3),其用于通过分配板(4)将处理介质(5)供应到分配板上方的区域 其中用于雾化溶液的喷嘴(15)被设计成使处理介质(5)的一部分从分配面板(4)下方的区域取出并传导到分配面板上方的区域( 4)通过包围喷嘴(15)的通道(12)同心且相对于喷射溶液(7)沿相同的流动方向。
    • 3. 发明申请
    • GAS DISTRIBUTION PLATE INTENDED FOR USE IN DEVICES FOR TREATING SOLID PARTICLES
    • 气体分配板用于处理固体颗粒的装置中
    • WO2011155905A3
    • 2012-07-05
    • PCT/SI2011000032
    • 2011-06-09
    • BRINOX D O OTESLIC DUSAN
    • TESLIC DUSAN
    • B01J2/16
    • B01J2/16
    • The subject of the invention is a new construction of a processing chamber with a gas distribution panel intended for use in improved processing devices for the treatment of solid particles in a fluidised layer and refers to a construction solution to the essential element of the device for drying, granulation and coating, i. e. a processing chamber with a gas distribution panel, which improves the quality of these processes. The invention describes a construction of a processing chamber with a distribution panel (4), a constituent part of which is connected with a lifting mechanism. This mechanism allows lifting of the upper assembly (7) in relation to the bottom assembly (11) of the distribution panel (4) and thus increases the vertical distance between the upper assembly (7) and the bottom assembly (11) of the distribution panel (4). This contributes to easier washing of the chamber and also gravitation linked emptying of the product from the chamber through the distribution panel is rendered possible.
    • 本发明的主题是一种具有气体分配板的处理室的新结构,其用于处理流化层中的固体颗粒的改进的处理装置,并且是指用于干燥装置的基本元件的构造溶液 ,造粒和包衣,i。 即 具有气体分配面板的处理室,其改善了这些工艺的质量。 本发明描述了具有分配面板(4)的处理室的结构,其配置部分与提升机构连接。 该机构允许上部组件(7)相对于分配面板(4)的底部组件(11)提升,从而增加了上部组件(7)和分配器的底部组件(11)之间的垂直距离 面板(4)。 这有助于更容易地洗涤室,并且还可以通过分配面板将产物从室通过分配面板连接排空。
    • 4. 发明申请
    • DEVICE FOR COATING PARTICLES VIA AN AIRFLOW VORTEX GENERATION
    • 用于通过气流VORTEX生成来涂覆颗粒的装置
    • WO2010107401A3
    • 2011-04-07
    • PCT/SI2010000013
    • 2010-03-15
    • BRINOX D O OTESLIC DUSAN
    • TESLIC DUSAN
    • B01J2/00B01J2/16
    • B01J2/006B01J2/16
    • The subject of invention is an enhanced processing apparatus for particle coating using a new airflow vortex generator (4), which enables achieving flow characteristics of the gas vortex flow within the areas inside the separation cylinder (5) and between the separation cylinder (5) and the perforated flow distribution plate (3), leading to an improved uniformity and quality of the coating application, with a higher material and thermal efficiency during the coating process, where the particles move upward in a circular path in the spraying and drying area inside a vertical pipe of the separation cylinder (5), positioned above the gas distribution plate (3), and downward in the second drying and particle retention area outside the separation cylinder (5).?
    • 本发明的主题是使用新的气流涡流发生器(4)进行颗粒涂布的增强处理装置,其能够实现分离圆筒(5)内部和分离圆筒(5)之间的区域内的气体涡流的流动特性, 和穿孔流通分配板(3),导致涂层应用的均匀性和质量得到改善,在涂覆过程中具有更高的材料和热效率,其中颗粒在内部的喷涂和干燥区域的圆形路径中向上移动 位于气体分配板(3)上方的分离缸(5)的垂直管,并且在分离缸(5)外部的第二干燥和颗粒保持区域中向下。