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    • 3. 发明申请
    • VACUUM EVAPORATION SOURCE APPARATUS AND VACUUM EVAPORATION EQUIPMENT
    • 真空蒸发源设备和真空蒸发设备
    • US20170067144A1
    • 2017-03-09
    • US15098154
    • 2016-04-13
    • BOE TECHNOLOGY GROUP CO., LTD.
    • Ronggang SHANGGUANWenbin JIAXinxin WANGXinwei GAO
    • C23C14/24
    • C23C14/243
    • A vacuum evaporation source apparatus is provided. The vacuum evaporation system includes an evaporation crucible, a first cover plate and a second cover plate. The first cover plate and the second cover plate are disposed at an outlet of the evaporation crucible. A plurality of first holes are disposed in the first cover plate penetrating its thickness direction and are evenly distributed and second via holes corresponding to the first via holes one to one are disposed in the second cover plate. The second cover plate is overlapped on the first cover plate with its position adjustable relative to the first cover plate along an extension direction of the first cover plate, and the overlapping area of each corresponding first via hole and second via hole is the same as the overlapping area of each pair of corresponding first via hole and second via hole. The second cover plate moves relative to the first cover plate and adjustment of the overlapping area of each pair of corresponding first via hole and second via hole is realized.
    • 提供真空蒸发源装置。 真空蒸发系统包括蒸发坩埚,第一盖板和第二盖板。 第一盖板和第二盖板设置在蒸发坩埚的出口处。 多个第一孔布置在贯穿其厚度方向的第一盖板中并且均匀分布,并且与第一通孔相对应的第二通孔一一布置在第二盖板中。 第二盖板重叠在第一盖板上,其位置可相对于第一盖板沿着第一盖板的延伸方向可调,并且每个对应的第一通孔和第二通孔的重叠区域与 每对相应的第一通孔和第二通孔的重叠区域。 第二盖板相对于第一盖板移动,并且实现了每对相应的第一通孔和第二通孔的重叠区域的调整。