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    • 1. 发明申请
    • SEAMLESS ROLL-TO-ROLL NANO-IMPRINTING
    • 无缝滚动到滚子纳米压印
    • WO2017032758A1
    • 2017-03-02
    • PCT/EP2016/069853
    • 2016-08-23
    • BASF SE
    • STUCK, AlexanderVON MUEHLENEN, AdrianHAFNER, AndreasNOERENBERG, Ralf
    • G03F7/00G03F7/24
    • G03F7/0002G03F7/24
    • A seamless shim for roll-to-roll or roll-to-plate nanoimprint lithography may be obtained by (a) providing a relief master, which is a nanostructured surface comprising a specific area with a pattern, which does not contain any optically detectable seam, (b) providing a cylindrical substrate whose outer surface is smaller than the specific surface area on the relief master, (c) applying a radiation curable coating on the nanostructured surface and/or the cylindrical substrate to a wet film thickness ranging from 50 nm to 1.8 micrometer, preferably up to 1.0 micrometer, (d) transferring the pattern of the specific surface area on the relief master to the cylindrical substrate by applying electromagnetic radiation or heat to the curable coating in the contact area between the nanostructured surface of the relief master and the cylindrical substrate's surface, characterized in that the contact area is moved over a length, which exceeds the cylindrical substrate's circumference, and the dosage of electromagnetic radiation applied at one contact does not effect full cure of the coating. The shim thus obtained allows for the cost efficient preparation of large scaled nanopatterned substrates, e.g. transparent films, without visually detectable defects.
    • 用于卷对卷或辊对板的纳米压印光刻的无缝垫片可以通过以下方式获得:(a)提供浮雕主体,其是包含具有图案的特定区域的纳米结构表面,其不包含任何光学可检测的接缝 ,(b)提供外表面小于浮雕主体上的比表面积的圆柱形基底,(c)在纳米结构表面和/或圆柱形基底上施加可辐射固化涂层至50nm的湿膜厚度 (d)通过在浮雕的纳米结构表面之间的接触区域中施加电磁辐射或加热到可固化涂层,将浮雕主体上的比表面积的图案转移到圆柱形基底上, 主体和圆柱形基板的表面,其特征在于,接触区域移动超过圆柱形基板周长的长度,并且该 在一个接触处施加的电磁辐射的鼠尾草不能完全固化涂层。 这样获得的垫片可以成本有效地制备大规模纳米图案化基底,例如 透明膜,没有视觉上可检测的缺陷。