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    • 6. 发明申请
    • A SYSTEM AND METHOD FOR PERFORMING ANALYSIS OF MATERIALS IN A NON-VACUUM ENVIRONMENT USING AN ELECTRON MICROSCOPE
    • 使用电子显微镜对非真空环境中的材料进行分析的系统和方法
    • WO2013183057A1
    • 2013-12-12
    • PCT/IL2013/050489
    • 2013-06-05
    • B-NANO LTD.
    • SHACHAL, DovDE PICCIOTTO, Rafi
    • G01N21/47
    • G01N23/2252G01N2223/309
    • A method for performing analysis of materials when present in a non- vacuum environment using an electron microscope, the method including generating first and second characteristic spectrum for a material by directing an electron beam from the electron microscope onto the material in respective first and second non-vacuum environments, in which respective first and second amounts of scattering of the electron beam takes place, collecting respective first and second X-rays emitted from the material and performing spectral analysis on the first and second X-rays, comparing the first and second characteristic spectra and noting peaks whose intensity increases with increased scattering, generating a scattering-compensated characteristic spectrum for the material from at least one of the first and second characteristic spectra by eliminating at least one peak whose intensity increases with increased scattering.
    • 一种当使用电子显微镜存在于非真空环境中时进行材料分析的方法,该方法包括通过将电子束从电子显微镜引导到相应的第一和第二非离子表面上的材料上来产生材料的第一和第二特征谱 真空环境,其中发生电子束的相应的第一和第二量的散射,收集从材料发射的相应的第一和第二X射线,并对第一和第二X射线进行光谱分析,比较第一和第二X射线 特征光谱和注意峰,其强度随着散射的增加而增加,通过消除其强度随着增加的散射而增加的至少一个峰,从而从第一和第二特征光谱中的至少一个产生材料的散射补偿特性光谱。