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1. 发明授权

US06183885B2 Fitting-type connection terminal 失效
标题翻译：接头式连接端子
公开(公告)号：US06183885B2
公开(公告)日：2001-02-06
申请号：US09061179
申请日：1998-04-17
申请人： Atsushi Nakamura , Jun Shioya , Atsuhiko Fujii , Nobuaki Isono , Yasuhiro Shintani , Masahiro Kawaguchi
发明人： Atsushi Nakamura , Jun Shioya , Atsuhiko Fujii , Nobuaki Isono , Yasuhiro Shintani , Masahiro Kawaguchi
IPC分类号： H01R1303
CPC分类号： H01R13/03 , Y10S428/929 , Y10T428/12715 , Y10T428/12722
摘要： There is disclosed a fitting-type connection terminal in which an insertion force for a terminal can be reduced while maintaining a stable contact resistance. If the thickness of a tin film on one of male and female terminals is 0.1 &mgr;m to 0.3 &mgr;m while the thickness of a tin film on the other terminal is not less than 0.1 &mgr;m, the hardness of the terminal is increasingly influenced by the hardness of a base material (of copper or copper alloy) with the decrease of the thickness of the tin film, so that the apparent hardness of the terminal increases. As a result, the adhesion of the tin film is suppressed, and the terminal insertion force can be reduced at least by more than 10% as compared with a reference value (1.0 &mgr;m for each of the male and female terminals). Particularly if the thickness of the tin film on the male terminal 10 is 0.1 &mgr;m while the thickness of the tin film on the female terminal 20 is 0.3 &mgr;m to 1.0 &mgr;m, the insertion force can be reduced by more than 30%.
摘要翻译：公开了一种装配型连接端子，其中可以在保持稳定的接触电阻的同时减小端子的插入力。如果阳端子和母端子之间的锡膜的厚度为0.1μm至0.3μm，而另一端子上的锡膜的厚度不小于0.1μm，则端子的硬度越来越受硬度的影响铜或铜合金的基体材料，随着锡膜厚度的减小，端子的表观硬度增加。结果，抑制了锡膜的粘合，并且与基准值（每个阳，阴端子为1.0μm）相比，端子插入力可以至少降低10％以上。特别是如果阳端子10上的锡膜的厚度为0.1μm，而母端子20上的锡膜的厚度为0.3μm〜1.0μm，则插入力可以降低30％以上。

2. 发明授权

US09348226B2 Radiation-sensitive resin composition 有权
公开(公告)号：US09348226B2
公开(公告)日：2016-05-24
申请号：US10541032
申请日：2003-12-24
申请人： Isao Nishimura , Kouichi Fujiwara , Eiichi Kobayashi , Tsutomu Shimokawa , Atsushi Nakamura , Eiji Yoneda , Yong Wang
发明人： Isao Nishimura , Kouichi Fujiwara , Eiichi Kobayashi , Tsutomu Shimokawa , Atsushi Nakamura , Eiji Yoneda , Yong Wang
IPC分类号： G03F7/039 , G03F7/004 , G03F7/20
CPC分类号： G03F7/039 , G03F7/0046 , G03F7/0397 , G03F7/2006
摘要： A radiation-sensitive resin composition comprising an acid-labile group-containing resin obtained by living radical polymerization having a specific structure which is insoluble or scarcely soluble in alkali, but becomes alkali soluble by the action of an acid, and a photoacid generator, wherein the ratio of weight average molecular weight to number average molecular weight (weight average molecular weight/number average molecular weight) of the acid-labile group-containing resin is smaller than 1.5.

3. 发明授权

US08759419B2 Water-based ink for ink-jet recording and cartridge 有权
标题翻译：用于喷墨记录和墨盒的水性墨
公开(公告)号：US08759419B2
公开(公告)日：2014-06-24
申请号：US13599581
申请日：2012-08-30
申请人： Satoshi Okuda , Junichiro Sugimoto , Tatsunosuke Hoshi , Atsushi Nakamura , Mitsunori Maeda
发明人： Satoshi Okuda , Junichiro Sugimoto , Tatsunosuke Hoshi , Atsushi Nakamura , Mitsunori Maeda
IPC分类号： C09D11/00 , C08K3/00 , C08F8/30
CPC分类号： C09D11/38 , C09D11/324
摘要： A water-based ink for ink-jet recording includes a self-dispersible pigment modified by phosphate group; water; a water-soluble organic solvent; at least one of a cationic polymer and basic amino acid; and at least one selected from the group consisting of boric acids, a chelate agent, a reducing sugar and a sugar alcohol.
摘要翻译：用于喷墨记录的水性油墨包括由磷酸酯基改性的自分散颜料; 水; 水溶性有机溶剂; 阳离子聚合物和碱性氨基酸中的至少一种; 和选自硼酸，螯合剂，还原糖和糖醇中的至少一种。

4. 发明授权

US08652399B2 Sputtering target for producing metallic glass membrane and manufacturing method thereof 有权
标题翻译：制造金属玻璃膜的溅射靶及其制造方法
公开(公告)号：US08652399B2
公开(公告)日：2014-02-18
申请号：US12854683
申请日：2010-08-11
申请人： Atsushi Nakamura , Masataka Yahagi , Akihisa Inoue , Hisamichi Kimura , Shin-ichi Yamaura
发明人： Atsushi Nakamura , Masataka Yahagi , Akihisa Inoue , Hisamichi Kimura , Shin-ichi Yamaura
IPC分类号： C22C1/04
CPC分类号： C23C14/3414 , B01D67/0072 , B01D71/022 , B01D2325/04 , B22F2998/10 , B22F2999/00 , C01B3/503 , C01B3/505 , C22C5/04 , C22C9/00 , C22C16/00 , C22C19/03 , C22C19/07 , C22C45/001 , C22C45/003 , C22C45/02 , C22C45/04 , C22C45/10 , B22F9/082 , B22F3/10 , B22F2201/11
摘要： A sputtering target for producing a metallic glass membrane characterized in comprising a structure obtained by sintering atomized powder having a composition of a ternary compound system or greater with at least one or more metal elements selected from Pd, Zr, Fe, Co, Cu and Ni as its main component (component of greatest atomic %), and being an average grain size of 50 μm or less. The prepared metallic glass membrane can be used as a substitute for conventional high-cost bulk metallic glass obtained by quenching of molten metal. This sputtering target for producing the metallic glass membrane is also free from problems such as defects in the metallic glass membrane and unevenness of composition, has a uniform structure, can be produced efficiently and at low cost, and does not generate many nodules or particles. Further provided is a method for manufacturing such a sputtering target for forming the metallic glass membrane.
摘要翻译：一种用于制造金属玻璃膜的溅射靶，其特征在于包括通过将选自Pd，Zr，Fe，Co，Cu和Ni中的至少一种或多种金属元素烧结成具有三元化合物体系以上的组成的雾化粉末而获得的结构作为其主要成分（原子％最大的成分），平均粒径为50μm以下。制备的金属玻璃膜可用作通过熔融金属淬火获得的常规高成本大块金属玻璃的替代物。用于制造金属玻璃膜的溅射靶也没有诸如金属玻璃膜的缺陷和组成不均匀等问题，具有均匀的结构，可有效且低成本地生产，并且不产生许多结节或颗粒。进一步提供一种用于制造用于形成金属玻璃膜的溅射靶的方法。

5. 发明授权

US08610105B2 Semiconductor electroluminescent device with a multiple-quantum well layer formed therein 有权
标题翻译：其中形成有多量子阱层的半导体场致发光器件
公开(公告)号：US08610105B2
公开(公告)日：2013-12-17
申请号：US12614859
申请日：2009-11-09
申请人： Toshihiko Fukamachi , Takashi Shiota , Takeshi Kitatani , Nozomu Yasuhara , Atsushi Nakamura , Mitsuhiro Sawada
发明人： Toshihiko Fukamachi , Takashi Shiota , Takeshi Kitatani , Nozomu Yasuhara , Atsushi Nakamura , Mitsuhiro Sawada
IPC分类号： H01L33/00
CPC分类号： H01S5/3434 , B82Y20/00 , H01L33/06 , H01L33/30 , H01S5/3403 , H01S5/3407
摘要： Provided is a semiconductor electroluminescent device with an InGaAlAs-based well layer having tensile strain, or a semiconductor electroluminescent device with an InGaAsP-based well layer having tensile strain and with an InGaAlAs-based barrier layer which is high-performance and highly reliable in a wide temperature range. In a multiple-quantum well layer of the semiconductor electroluminescent device, a magnitude of interface strain at an interface between the well layer and the barrier layer is smaller than a magnitude of critical interface strain determined by a layer thickness value which is larger one of a thickness of the well layer and a thickness of the barrier layer.
摘要翻译：提供了具有拉伸应变的具有InGaAlAs的阱层的半导体场致发光器件，或具有拉伸应变的InGaAsP基阱层和具有InGaAlAs基阻挡层的半导体场致发光器件，其在高温下具有高可靠性宽温度范围在半导体电致发光器件的多量子阱层中，阱层和势垒层之间的界面处的界面应变的大小小于由层厚度值确定的临界界面应变的大小，该层厚度值是阱层的厚度和阻挡层的厚度。

6. 发明授权

US08597867B2 Lactone copolymer and radiation-sensitive resin composition 有权
公开(公告)号：US08597867B2
公开(公告)日：2013-12-03
申请号：US11579646
申请日：2005-05-02
申请人： Hiromitsu Nakashima , Tomohiro Utaka , Takashi Chiba , Eiji Yoneda , Atsushi Nakamura
发明人： Hiromitsu Nakashima , Tomohiro Utaka , Takashi Chiba , Eiji Yoneda , Atsushi Nakamura
IPC分类号： G03F7/00 , G03F7/004 , G03F7/028
CPC分类号： C08F220/28 , C08F220/18 , G03F7/0046 , G03F7/0392 , G03F7/0397
摘要： A radiation-sensitive resin composition excelling in basic properties as a resist such as sensitivity, resolution, and the like, having a wide depth of focus (DOF) to both a line-and-space pattern and an isolated space pattern, and exhibiting a minimal line width change due to fluctuation of a bake temperature, and having a small line width limit in which the line pattern destroying phenomenon does not occur, and a lactone-containing copolymer useful as a resin component of the composition are provided.The lactone-containing copolymer is represented by a copolymer of the following compounds (1-1), (2-1), and (3-1). The radiation-sensitive resin composition comprises (a) the lactone-containing copolymer and (b) a photoacid generator.

7. 发明申请

US20130279146A1 PSEUDO-SUNLIGHT IRRADIATION APPARATUS 审中-公开
公开(公告)号：US20130279146A1
公开(公告)日：2013-10-24
申请号：US13824506
申请日：2011-03-16
申请人： Atsushi Nakamura
发明人： Atsushi Nakamura
IPC分类号： G02B7/00 , F21V9/02 , G02B6/26 , F21V8/00
CPC分类号： G02B7/00 , F21S8/006 , F21V9/02 , F21Y2101/00 , G01N17/00 , G01N17/004 , G02B6/0001 , G02B6/26 , H02S50/00 , H02S50/10
摘要： A light guide member of the pseudo-sunlight irradiation apparatus is formed of eight light guide plates WG1′-WG8′ arrayed in one direction. A light diffusing part formed of a plurality of dot-like protrusions 701, 702 is formed on a surface opposite to an irradiating surface of each of the light guide plates WG1′-WG8′. A dot diameter of the dot-like protrusions 701 of the light guide plates WG1′, WG8′ positioned at ends in the one direction orthogonal to the light guide direction of the light guide plates WG1′-WG8′ is made larger than a dot diameter of the dot-like protrusions 702 of the light guide plates WG2′-WG7′ positioned at central portions other than the ends in the one direction.
摘要翻译：伪阳光照射装置的导光构件由沿一个方向排列的八个导光板WG1'-WG8'形成。在与每个导光板WG1'-WG8'的照射表面相对的表面上形成由多个点状突起701,702形成的光漫射部。使位于与导光板WG1'-WG8'的导光方向正交的一个方向上的端部的导光板WG1'，WG8'的点状突起701的点直径大于点直径的导光板WG2'-WG7'的点状突起702位于除了一个方向上的端部之外的中心部分。

8. 发明申请

US20130053495A1 Water-Based Ink for Ink-Jet Recording and Cartridge 有权
标题翻译：喷墨记录和墨盒的水性墨水
公开(公告)号：US20130053495A1
公开(公告)日：2013-02-28
申请号：US13599581
申请日：2012-08-30
申请人： Satoshi Okuda , Junichiro Sugimoto , Tatsunosuke Hoshi , Atsushi Nakamura , Mitsunori Maeda
发明人： Satoshi Okuda , Junichiro Sugimoto , Tatsunosuke Hoshi , Atsushi Nakamura , Mitsunori Maeda
IPC分类号： C09D11/10 , C08K3/32 , C08K3/38 , C08K13/02
CPC分类号： C09D11/38 , C09D11/324
摘要： A water-based ink for ink-jet recording includes a self-dispersible pigment modified by phosphate group; water; a water-soluble organic solvent; at least one of a cationic polymer and basic amino acid; and at least one selected from the group consisting of boric acids, a chelate agent, a reducing sugar and a sugar alcohol.
摘要翻译：用于喷墨记录的水性油墨包括由磷酸酯基改性的自分散颜料; 水; 水溶性有机溶剂; 阳离子聚合物和碱性氨基酸中的至少一种; 和选自硼酸，螯合剂，还原糖和糖醇中的至少一种。

9. 发明授权

US08335143B2 Method for inspecting optical information recording medium, inspection apparatus, optical information recording medium and recording method 有权
标题翻译：检查光信息记录介质的方法，检查装置，光信息记录介质和记录方法
公开(公告)号：US08335143B2
公开(公告)日：2012-12-18
申请号：US13204384
申请日：2011-08-05
申请人： Atsushi Nakamura , Kenji Fujiune , Yasumori Hino
发明人： Atsushi Nakamura , Kenji Fujiune , Yasumori Hino
IPC分类号： G11B7/00
CPC分类号： G11B20/10009 , G11B20/10046 , G11B20/1816 , G11B2220/218 , G11B2220/2541
摘要： A method for inspecting an optical information storage medium includes the steps of: irradiating the storage medium with a laser beam and rotating the medium by a constant linear velocity control technique by reference to the radial location at which the laser beam forms a spot on the medium; changing the rotational velocities according to the radial location on the medium between at least two linear velocities that include a first linear velocity Lv1 and a second linear velocity Lv2 higher than the first linear velocity Lv1; generating a focus error signal and/or a tracking error signal based on the light reflected from the medium; performing a focus control and/or a tracking control on the laser beam that irradiates the medium based on the focus and/or tracking error signal(s); and passing the branched outputs of control loops for the focus and/or tracking error signal(s) through predetermined types of frequency band-elimination filters for the focus and/or tracking error signal(s) to obtain residual errors of the focus and/or tracking error signal(s) and comparing the residual errors to predetermined reference values.
摘要翻译：一种用于检查光学信息存储介质的方法包括以下步骤：通过参考激光束在介质上形成点的径向位置，通过恒定的线速度控制技术照射存储介质和激光介质 ; 根据包括第一线速度Lv1和高于第一线速度Lv1的第二线速度Lv2的至少两个线性速度，根据介质上的径向位置改变旋转速度; 基于从介质反射的光产生聚焦误差信号和/或跟踪误差信号; 对基于焦点和/或跟踪误差信号照射介质的激光束进行聚焦控制和/或跟踪控制; 以及通过用于焦点和/或跟踪误差信号的预定类型的频带滤波器使用于聚焦和/或跟踪误差信号的控制回路的分支输出通过，以获得焦点和/ 或跟踪误差信号，并将剩余误差与预定参考值进行比较。

10. 发明申请

US20120287599A1 LIGHT IRRADIATION APPARATUS, PSEUDO-SUNLIGHT IRRADIATION APPARATUS AND SOLAR PANEL INSPECTION APPARATUS 审中-公开
标题翻译：光照射装置，阳光照射装置和太阳能面板检查装置
公开(公告)号：US20120287599A1
公开(公告)日：2012-11-15
申请号：US13392031
申请日：2011-08-29
申请人： Atsushi Nakamura
发明人： Atsushi Nakamura
IPC分类号： F21V9/02
CPC分类号： F21S8/006 , H02S50/10
摘要： Precise, uniform illuminance is obtained for an irradiation surface without adjustment time of illuminance of the irradiation surface being time-intensive, even for an expansive area. At least one light source (xenon light source 2 or halogen light source 7, or the like) and an optical filter (air mass filter 5, 10, or the like) functioning as an optical element are matched with a respective light guiding member 14 or 14A. Since an irradiation region of the light guiding member 14 or 14A for surface irradiation is directly matched with a respective part of the irradiation surface (small irradiation surface) of an irradiation subject, illuminance on part of the irradiation surface (small irradiation surface) of the irradiation subject can be adjusted with precision by changing the amount of light entering the inside of the light guiding member 14 or 14A for surface irradiation.
摘要翻译：对于照射面而言，即使对于膨胀区域，即使照射面的照度的调整时间也是时间密集的，也获得了精确均匀的照度。用作光学元件的至少一个光源（氙光源2或卤素光源7等）和滤光器（空气质量过滤器5,10等）与各自的导光部件14 或14A。由于用于表面照射的导光构件14或14A的照射区域与照射对象的照射面（小照射面）的各部分直接匹配，所以照射面的一部分（小照射面）的照度可以通过改变进入用于表面照射的导光构件14或14A的内部的光量来精确地调节照射对象。

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