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1. 发明申请

US20090034150A1 SUBSTRATE HOLDING SYSTEM AND EXPOSURE APPARATUS USING THE SAME 失效
标题翻译：基板保持系统和曝光装置
公开(公告)号：US20090034150A1
公开(公告)日：2009-02-05
申请号：US12244874
申请日：2008-10-03
申请人： Atsushi Ito , Keiji Emoto
发明人： Atsushi Ito , Keiji Emoto
IPC分类号： H01L21/683
CPC分类号： H01L21/683 , G03F7/707 , G03F7/70708 , G03F7/70783 , H01L21/6831 , H01L21/6838
摘要： A substrate holding system including a substrate attracting device, an exhausting device, and a control device to operate the exhausting device so that a pressure around the substrate and a pressure at an interval between the substrate and the substrate attracting device are lowered to a first pressure and that only the pressure at the interval is subsequently lowered to a second pressure, which is lower than the first pressure.
摘要翻译：一种基板保持系统，包括基板吸引装置，排气装置和控制装置，以操作排气装置，使得基板周围的压力和基板和基板吸引装置之间的间隔处的压力降低到第一压力并且只有间隔处的压力随后降低到低于第一压力的第二压力。

2. 发明授权

US07292426B2 Substrate holding system and exposure apparatus using the same 有权
标题翻译：基板保持系统和使用其的曝光装置
公开(公告)号：US07292426B2
公开(公告)日：2007-11-06
申请号：US10952732
申请日：2004-09-30
申请人： Atsushi Ito , Keiji Emoto
发明人： Atsushi Ito , Keiji Emoto
IPC分类号： H01T23/00
CPC分类号： H01L21/683 , G03F7/707 , G03F7/70708 , G03F7/70783 , H01L21/6831 , H01L21/6838
摘要： A substrate holding system having a chuck for vacuum attraction and electrostatic attraction of a substrate. The system includes a ring-like rim for carrying a substrate thereon, a plurality of first protrusions disposed inside the rim, for carrying the substrate thereon, and a plurality of second protrusions disposed inside the rim, for carrying the substrate thereon. A substrate carrying surface area of at least one first protrusion is smaller than a substrate carrying surface area of at least one second protrusion and a smallest interval between the first protrusions is smaller than a smallest interval between the second protrusions. Also included are an exhaust system for exhausting a clearance between the chuck and the substrate, an electrode for electrostatic attraction, a power supplying system for supplying power to the electrode, a measuring system for measuring a pressure in the clearance, and a control system for controlling the power supply.
摘要翻译：一种基板保持系统，具有用于基板的真空吸引和静电吸引的卡盘。该系统包括用于在其上承载基板的环状边缘，设置在边缘内部的多个第一突起，用于在其上承载基板，以及设置在边缘内的多个第二突起，用于在其上承载基板。至少一个第一突起的承载表面积的基板小于至少一个第二突起的承载表面积的基板，并且第一突起之间的最小间隔小于第二突起之间的最小间隔。还包括用于排出卡盘和基板之间的间隙的排气系统，用于静电吸引的电极，用于向电极供电的供电系统，用于测量间隙中的压力的测量系统，以及用于控制电源。

3. 发明授权

US07733625B2 Substrate holding system and exposure apparatus using the same 失效
标题翻译：基板保持系统和使用其的曝光装置
公开(公告)号：US07733625B2
公开(公告)日：2010-06-08
申请号：US12244874
申请日：2008-10-03
申请人： Atsushi Ito , Keiji Emoto
发明人： Atsushi Ito , Keiji Emoto
IPC分类号： H01T23/00
CPC分类号： H01L21/683 , G03F7/707 , G03F7/70708 , G03F7/70783 , H01L21/6831 , H01L21/6838
摘要： A substrate holding system including a substrate attracting device, an exhausting device, and a control device to operate the exhausting device so that a pressure around the substrate and a pressure at an interval between the substrate and the substrate attracting device are lowered to a first pressure and that only the pressure at the interval is subsequently lowered to a second pressure, which is lower than the first pressure.
摘要翻译：一种基板保持系统，包括基板吸引装置，排气装置和控制装置，以操作排气装置，使得基板周围的压力和基板和基板吸引装置之间的间隔处的压力降低到第一压力并且只有间隔处的压力随后降低到低于第一压力的第二压力。

4. 发明授权

US07508646B2 Substrate holding technique 失效
标题翻译：基材保持技术
公开(公告)号：US07508646B2
公开(公告)日：2009-03-24
申请号：US10879074
申请日：2004-06-30
申请人： Keiji Emoto , Atsushi Ito
发明人： Keiji Emoto , Atsushi Ito
IPC分类号： H01T23/00
CPC分类号： G03F7/70708 , G03F7/707 , H01L21/6831
摘要： A stage system includes a fine-motion stage on which a substrate holding member for holding a substrate is mounted, a rough-motion stage on which the fine-motion stage is mounted, a stage for supporting and moving a substrate, and a probe configured to measure a potential of the substrate without contact thereto, the probe being supported by the rough-motion stage so as to be opposed to one of a bottom face and a side face of the substrate.
摘要翻译：舞台系统包括微动平台，其上安装有用于保持衬底的衬底保持构件，安装有微动平台的粗略运动台，用于支撑和移动衬底的台架以及配置在其上的探头为了测量不与其接触的基板的电位，探针由粗略运动级支撑，以与基板的底面和侧面中的一个相对。

5. 发明授权

US07466531B2 Substrate holding system and exposure apparatus using the same 失效
标题翻译：基板保持系统和使用其的曝光装置
公开(公告)号：US07466531B2
公开(公告)日：2008-12-16
申请号：US11770979
申请日：2007-06-29
申请人： Atsushi Ito , Keiji Emoto
发明人： Atsushi Ito , Keiji Emoto
IPC分类号： H01T23/001
CPC分类号： H01L21/683 , G03F7/707 , G03F7/70708 , G03F7/70783 , H01L21/6831 , H01L21/6838
摘要： A substrate holding system for holding a substrate based on vacuum attraction and electrostatic attraction including a rim configured to support the substrate, a protrusion for the electrostatic attraction, configured to support the substrate inside the rim, and a protrusion for the vacuum attraction, configured to support the substrate inside the rim. A substrate supporting surface area of the protrusion of the electrostatic attraction is larger than a substrate supporting surface area of the protrusion for the vacuum attraction.
摘要翻译：一种用于基于真空吸引和静电吸引保持基板的基板保持系统，包括构造成支撑基板的边缘，用于静电吸引的突起，被配置为将基板支撑在边缘内，以及用于真空吸引的突起，支撑轮辋内的基底。静电吸引突起的基板支撑表面积大于用于真空吸引的突起的基板支撑表面积。

6. 发明申请

US20050016685A1 Substrate holding technique 失效
标题翻译：基材保持技术
公开(公告)号：US20050016685A1
公开(公告)日：2005-01-27
申请号：US10879074
申请日：2004-06-30
申请人： Keiji Emoto , Atsushi Ito
发明人： Keiji Emoto , Atsushi Ito
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027 , H01L21/683 , H01L21/306 , G03B27/58 , G03B27/62
CPC分类号： G03F7/70708 , G03F7/707 , H01L21/6831
摘要： Disclosed is a stage system that includes a stage for supporting and moving a substrate, and a probe for measuring a potential of a substrate without contact thereto, the probe being supported by the stage so as to be opposed to one of a bottom face and a side face of the substrate. Also disclosed is a stage system that includes a substrate holding member for holding a substrate, the substrate holding member having a protrusion and a first electrode, the first electrode being provided inside the substrate holding member and adjacent said protrusion, a terminal for adjusting a potential of said first electrode, and a stage for supporting and moving the substrate holding member through the terminal. Further, a substrate holding system is disclosed, that includes a plurality of protrusions to be supported by a stage, and a plurality of first electrodes disposed adjacent the plurality of protrusions, respectively, and for electrostatically attracting the stage.
摘要翻译：公开了一种舞台系统，其包括用于支撑和移动衬底的台，以及用于测量衬底的电位而不与其接触的探针，所述探针由所述台支撑以与底面和基板的侧面。还公开了一种舞台系统，其包括用于保持衬底的衬底保持构件，所述衬底保持构件具有突起和第一电极，所述第一电极设置在衬底保持构件内部并且邻近所述突起，用于调节电位的端子的第一电极，以及用于通过端子支撑和移动衬底保持构件的台。此外，公开了一种基板保持系统，其包括由台架支撑的多个突起和分别邻近多个突起设置并用于静电吸引台的多个第一电极。

7. 发明授权

US07660098B2 Substrate holding system and exposure apparatus using the same 失效
标题翻译：基板保持系统和使用其的曝光装置
公开(公告)号：US07660098B2
公开(公告)日：2010-02-09
申请号：US12334697
申请日：2008-12-15
申请人： Atsushi Ito , Keiji Emoto
发明人： Atsushi Ito , Keiji Emoto
IPC分类号： H01T23/00
CPC分类号： H01L21/683 , G03F7/707 , G03F7/70708 , G03F7/70783 , H01L21/6831 , H01L21/6838
摘要： A substrate holding system for holding a substrate based on vacuum attraction and electrostatic attraction including a rim configured to support the substrate, a protrusion for the electrostatic attraction, configured to support the substrate inside the rim, and a protrusion for the vacuum attraction, configured to support the substrate inside the rim. A substrate supporting surface area of the protrusion of the electrostatic attraction is larger than a substrate supporting surface area of the protrusion for the vacuum attraction.
摘要翻译：一种用于基于真空吸引和静电吸引保持基板的基板保持系统，包括构造成支撑基板的边缘，用于静电吸引的突起，被配置为将基板支撑在边缘内，以及用于真空吸引的突起，支撑轮辋内的基底。静电吸引突起的基板支撑表面积大于用于真空吸引的突起的基板支撑表面积。

8. 发明申请

US20090103232A1 Substrate Holding System and Exposure Apparatus Using the Same 失效
标题翻译：基板保持系统及使用其的曝光装置
公开(公告)号：US20090103232A1
公开(公告)日：2009-04-23
申请号：US12334697
申请日：2008-12-15
申请人： Atsushi Ito , Keiji Emoto
发明人： Atsushi Ito , Keiji Emoto
IPC分类号： H01L21/683
CPC分类号： H01L21/683 , G03F7/707 , G03F7/70708 , G03F7/70783 , H01L21/6831 , H01L21/6838
摘要： A substrate holding system for holding a substrate based on vacuum attraction and electrostatic attraction including a rim configured to support the substrate, a protrusion for the electrostatic attraction, configured to support the substrate inside the rim, and a protrusion for the vacuum attraction, configured to support the substrate inside the rim. A substrate supporting surface area of the protrusion of the electrostatic attraction is larger than a substrate supporting surface area of the protrusion for the vacuum attraction.
摘要翻译：一种用于基于真空吸引和静电吸引保持基板的基板保持系统，包括构造成支撑基板的边缘，用于静电吸引的突起，被配置为将基板支撑在边缘内，以及用于真空吸引的突起，被配置为支撑轮辋内的基底。静电吸引突起的基板支撑表面积大于用于真空吸引的突起的基板支撑表面积。

9. 发明申请

US20070247780A1 SUBSTRATE HOLDING SYSTEM AND EXPOSURE APPARATUS USING THE SAME 失效
标题翻译：基板保持系统和曝光装置
公开(公告)号：US20070247780A1
公开(公告)日：2007-10-25
申请号：US11770979
申请日：2007-06-29
申请人： Atsushi ITO , Keiji Emoto
发明人： Atsushi ITO , Keiji Emoto
IPC分类号： H01L21/683
CPC分类号： H01L21/683 , G03F7/707 , G03F7/70708 , G03F7/70783 , H01L21/6831 , H01L21/6838
摘要： A substrate holding system for holding a substrate based on vacuum attraction and electrostatic attraction including a rim configured to support the substrate, a protrusion for the electrostatic attraction, configured to support the substrate inside the rim, and a protrusion for the vacuum attraction, configured to support the substrate inside the rim. A substrate supporting surface area of the protrusion of the electrostatic attraction is larger than a substrate supporting surface area of the protrusion for the vacuum attraction.
摘要翻译：一种用于基于真空吸引和静电吸引保持基板的基板保持系统，包括构造成支撑基板的边缘，用于静电吸引的突起，被配置为将基板支撑在边缘内，以及用于真空吸引的突起，支撑轮辋内的基底。静电吸引突起的基板支撑表面积大于用于真空吸引的突起的基板支撑表面积。

10. 发明申请

US20050152088A1 Substrate holding system and exposure apparatus using the same 有权
标题翻译：基板保持系统和使用其的曝光装置
公开(公告)号：US20050152088A1
公开(公告)日：2005-07-14
申请号：US10952732
申请日：2004-09-30
申请人： Atsushi Ito , Keiji Emoto
发明人： Atsushi Ito , Keiji Emoto
IPC分类号： B23Q3/08 , G03F7/20 , H01L21/027 , H01L21/683 , H02N13/00 , H01H1/00
CPC分类号： H01L21/683 , G03F7/707 , G03F7/70708 , G03F7/70783 , H01L21/6831 , H01L21/6838
摘要： Disclosed is a unique and improved substrate holding technique in accordance with an aspect of which there is provided a substrate holding system having a chuck for vacuum attraction and electrostatic attraction of a substrate, and including a ring-like rim for carrying a substrate thereon, a plurality of first protrusions disposed inside the rim, for carrying the substrate thereon, and a plurality of second protrusions disposed inside the rim, for carrying the substrate thereon, wherein a substrate carrying surface area of at least one first protrusion is smaller than a substrate carrying surface area of at least one second protrusion and wherein a smallest interval of the first protrusions is smaller than a smallest interval of the second protrusions.
摘要翻译：公开了一种独特和改进的基板保持技术，根据其一个方面，提供了一种基板保持系统，其具有用于基板的真空吸引和静电吸引的卡盘，并且包括用于在其上承载基板的环形边缘，设置在边缘内的多个第一突起，用于在其上承载基板，以及设置在边缘内的多个第二突起，用于在其上承载基板，其中承载至少一个第一突起的表面积的基板小于承载至少一个第二突起的表面积，并且其中所述第一突起的最小间隔小于所述第二突起的最小间隔。

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