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1. 发明专利

JP2012134486A Lithographic apparatus and device manufacturing method 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：JP2012134486A
公开(公告)日：2012-07-12
申请号：JP2011272986
申请日：2011-12-14
申请人： Asml Netherlands Bv , Carl Zeiss Smt Gmbh , エーエスエムエルネザーランズビー.ブイ. , カール・ツァイス・エスエムティー・ゲーエムベーハー
发明人： VAN DER WIJST MARC WILHELMUS MARIA , BUTLER HANS , LOOPSTRA ERIK ROELOF , BERNHARD GEUPPERT , OUDE NIJHUIS MARCO HENDRIKUS HERMANUS , RODOLFO GUGLIELMI RABE , KWAN YIM BUN PATRICK , DICK ANTONIUS HENDRIKUS LARO
IPC分类号： H01L21/027
CPC分类号： G03F7/70141 , F16F15/022 , F16F15/08 , G03F7/708 , G03F7/709
摘要： PROBLEM TO BE SOLVED: To improve mechanical insulation between elements of a projection system.SOLUTION: A lithographic apparatus having means for reducing the extent to which vibrations propagate between a first element of a projection system and a second element of the projection system, and a device manufacturing method are disclosed. The method includes the use of a plurality of elastic members in series as a part of a vibration insulation system, a plurality of insulation frames for separately supporting first and second projection system frames, and corrected connection positions for the interaction between the first and second projection system frames and the insulation frame(s).
摘要翻译：要解决的问题：改善投影系统的元件之间的机械绝缘。解决方案：具有用于减小振动在投影系统的第一元件和投影系统的第二元件之间传播的程度的装置以及装置制造方法的光刻设备。该方法包括使用串联的多个弹性部件作为隔振系统的一部分，多个用于分别支撑第一和第二投影系统框架的绝缘框架以及用于第一和第二突起之间的相互作用的校正连接位置系统框架和绝缘框架。版权所有（C）2012，JPO＆INPIT

2. 发明专利

JP2017083911A リソグラフィ装置有权
公开(公告)号：JP2017083911A
公开(公告)日：2017-05-18
申请号：JP2017021802
申请日：2017-02-09
申请人：エーエスエムエルネザーランズビー.ブイ. , Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： BUTLER HANS
IPC分类号： G03F7/20 , H01L21/68
CPC分类号： G03F7/70191 , G03F7/70516 , G03F7/70725 , G03F7/70758 , G03F7/70775 , G03F7/70783 , G03F7/70825
摘要：【課題】可動支持体によって支持される交換可能なオブジェクトの位置決めの精度を増加させる。【解決手段】リソグラフィ装置は、オブジェクトに対して移動自在に配置された可動構造、可動構造に対して移動自在に配置されるパターニングデバイスホルダ、オブジェクトに対して可動構造を移動させるアクチュエータ、及び、可動構造に対してパターニングデバイスホルダを移動させるウルトラショートストロークアクチュエータを有するパターニングデバイス支持体と、基板を保持する基板支持体と、パターン付放射ビームを基板のターゲット部分上に投影する投影システムと、基準オブジェクトに対する基板の所望の位置と実際の位置との差である基板位置の誤差を測定する位置測定システムと、基板位置の誤差に少なくとも部分的に基づいてアクチュエータとウルトラショートストロークアクチュエータとを移動させるコントローラと、を備える。【選択図】図6

3. 发明专利

JP2014170957A Lithographic apparatus comprising substrate table 有权
标题翻译：包含基板的平面设备
公开(公告)号：JP2014170957A
公开(公告)日：2014-09-18
申请号：JP2014093766
申请日：2014-04-30
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： BUTLER HANS , JAN VAN EIJK , HOL SVEN ANTOINE JOHANN , JOHANNES PETRUS MARTINUS BERNARDUS , YAN-SHAN HUANG
IPC分类号： H01L21/027 , G03F7/20 , H01L21/68
CPC分类号： G03F7/70783 , G03F7/70758
摘要： PROBLEM TO BE SOLVED: To provide a lithographic apparatus that enables accurate focus positioning of a substrate.SOLUTION: A lithographic apparatus includes: an illumination system configured to adjust a radiation beam; and a support medium constructed to support a patterning device capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The lithographic apparatus further includes: a substrate table constructed to hold a substrate; a positioner constructed to position the substrate table; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; a substrate surface actuator arranged to engage a part of a surface of the substrate facing the projection system; and a position controller configured to control a position of the substrate table and arranged to drive the positioner and the substrate surface actuator.
摘要翻译：要解决的问题：提供能够准确地对基板进行聚焦定位的光刻设备。解决方案：光刻设备包括：照明系统，被配置为调节辐射束; 以及支撑介质，其构造成支撑能够在其横截面中赋予辐射束图案以形成图案化的辐射束的图案形成装置。所述光刻设备还包括：衬底台，其构造成保持衬底; 定位器，其被构造成定位所述衬底台; 投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上; 衬底表面致动器，被布置成接合面向所述投影系统的所述衬底的表面的一部分; 以及位置控制器，被配置为控制所述基板台的位置并被布置成驱动所述定位器和所述基板表面致动器。

4. 发明专利

JP2012114485A Lithographic device and device manufacturing method 有权
公开(公告)号：JP2012114485A
公开(公告)日：2012-06-14
申请号：JP2012066781
申请日：2012-03-23
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： JOERI LOF , BUTLER HANS , DONDERS SJOERD NICOLAAS LAMBERTUS , ALEXEI KOLESNE TCHENKO , LOOPSTRA ERIK ROELOF , MEIJER HENDRICUS JOHANNES MARIA , MULKENS JOHANNES CATHARINUS HUBERTUS , RITSEMA ROELOF AEILKO SIEBRAND , VAN SCHAIK FRANK , SENGERS TIMOTHEUS FRANCISCUS , KLAUS SIMON , DE SMIT JOANNES THEODOOR , ALEXANDER STOLE YALE , STREEFKERK BOB , ERIK THEODORUS MARIA BIJLAART , CHRISTIAAN ALEXANDER HOOGENDAM , HELMAR VAN SANTEN , VAN DE KERKHOF MARCUS ADRIANUS , KROON MARK , DEN BOEF ARIE JEFFREY , OTTENS JOOST JEROEN , JEROEN JOHANNES SOPHIA MARIA MERTENS
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70141 , G03F7/70341 , G03F7/7085 , G03F7/70883
摘要： PROBLEM TO BE SOLVED: To provide an immersion-type lithography projection device with improved functionality.SOLUTION: An immersion-type lithography projection device comprises: a radiation systems Ex, IL which are provided with a radiation source LA and supply projection beams PB of radiation; a first object table (mask table) MT connected to first positioning means for correctly positioning a mask with respect to a member PL; a second object table (substrate table) WT connected to second positioning means for correctly positioning a substrate with respect to the member PL; and a projection system PL for forming an image of a radiated part of the mask MA on a target part C of a substrate W.

5. 发明专利

JP2012054601A Lithographic projection apparatus 审中-公开
标题翻译： LITHOGRAPHIC投影设备
公开(公告)号：JP2012054601A
公开(公告)日：2012-03-15
申请号：JP2011243513
申请日：2011-11-07
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： JOERI LOF , BUTLER HANS , DONDERS SJOERD NICOLAAS LAMBERTUS , ALEXEI KOLESNE TCHENKO , LOOPSTRA ERIK ROELOF , MEIJER HENDRICUS JOHANNES MARIA , MULKENS JOHANNES CATHARINUS HUBERTUS , RITSEMA ROELOF AEILKO SIEBRAND , VAN SCHAIK FRANK , SENGERS TIMOTHEUS FRANCISCUS , KLAUS SIMON , DE SMIT JOANNES THEODOOR , ALEXANDER STOLE YALE , STREEFKERK BOB , ERIK THEODORUS MARIA BIJLAART , CHRISTIAAN ALEXANDER HOOGENDAM , HELMAR VAN SANTEN , VAN DE KERKHOF MARCUS ADRIANUS , KROON MARK , DEN BOEF ARIE JEFFREY , OTTENS JOOST JEROEN , JEROEN JOHANNES SOPHIA MARIA MERTENS
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70141 , G03F7/70341 , G03F7/7085 , G03F7/70883
摘要： PROBLEM TO BE SOLVED: To provide an immersion-type lithographic projection apparatus with improved functionality.SOLUTION: The immersion-type lithographic projection apparatus comprises: a radiation system Ex which is provided with a radiation source LA and supplies a radiation projection beam PB; an illumination system IL; a first object table (mask table) MT connected to first positioning means for accurately positioning a mask to a member PL; a second object table (substrate table) WT connected to second positioning means for accurately positioning the substrate to the member PL; and a projection system PL for imaging an irradiated part of a mask MA on a target part C of a substrate W. This apparatus also includes at least one sensor that is disposed so as to be illuminated with a radiation projection beam that has passed through an immersion liquid.
摘要翻译：要解决的问题：提供具有改进的功能的浸没式光刻投影设备。浸渍式光刻投影装置包括：放射线系统Ex，其设置有辐射源LA并提供辐射投射光束PB; 照明系统IL; 连接到第一定位装置的第一目标表（掩模台）MT，用于将掩模精确地定位到构件PL; 连接到第二定位装置的第二对象台（衬底台）WT，用于将衬底精确地定位到构件PL; 以及投影系统PL，用于对基板W的目标部分C上的掩模MA的照射部分进行成像。该装置还包括至少一个传感器，其布置成被辐射投影光束照射，浸液版权所有（C）2012，JPO＆INPIT

6. 发明专利

JP2011211173A Lithographic apparatus and method for measuring position 有权
标题翻译：平面设备和测量位置的方法
公开(公告)号：JP2011211173A
公开(公告)日：2011-10-20
申请号：JP2011039324
申请日：2011-02-25
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： BUTLER HANS , VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS
IPC分类号： H01L21/027 , G01B9/02 , G01B11/00 , H01L21/68
CPC分类号： G01B11/14 , G03B27/58
摘要： PROBLEM TO BE SOLVED: To provide an improved lithographic apparatus of which positional accuracy performance is advanced.SOLUTION: The lithographic apparatus includes: a support being moveable relative to a reference structure in a direction; a first position measurement system configured to provide a first measurement signal in a first frequency range, the first measurement signal representative of a position of the support relative to the reference structure in the direction; a second position measurement system configured to provide a second measurement signal in a second frequency range, the second measurement signal representative of the position of the support relative to the reference structure in the direction; and a processor configured to (a) filter the first measurement signal so as to attenuate a signal component having a frequency in the second frequency range, (b) filter the second measurement signal so as to attenuate a signal component having a frequency in the first frequency range, and (c) combine the filtered first measurement signal and the filtered second measurement signal into a combined measurement signal representative of the position of the support relative to the reference structure in the direction.
摘要翻译：要解决的问题：提供一种位置精度性能提高的改进的光刻设备。解决方案：光刻设备包括：支撑件可相对于参考结构在一个方向上移动; 第一位置测量系统，被配置为在第一频率范围内提供第一测量信号，所述第一测量信号表示所述支撑件相对于所述参考结构在所述方向上的位置; 第二位置测量系统，被配置为在第二频率范围内提供第二测量信号，所述第二测量信号表示所述支撑件相对于所述参考结构在所述方向上的位置; 以及处理器，其被配置为（a）对所述第一测量信号进行滤波，以便衰减具有在所述第二频率范围内的频率的信号分量，（b）滤除所述第二测量信号，以便衰减具有所述第一频率的信号分量频率范围，以及（c）将滤波的第一测量信号和滤波的第二测量信号组合成表示支撑件相对于参考结构在该方向上的位置的组合测量信号。

7. 发明专利

JP2011135077A Imprint lithographic apparatus, and imprint lithographic method 有权
标题翻译： IMPRINT LITHOGRAPHIC APPARATUS和IMPRINT LITHOGRAPHIC方法
公开(公告)号：JP2011135077A
公开(公告)日：2011-07-07
申请号：JP2010282942
申请日：2010-12-20
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： BUTLER HANS , JOHANNES PETRUS MARTINUS BERNARDUS VERMEULEN , VAN DER WIJST MARC WILHELMUS MARIA , STARREVELD JEROEN PIETER , DE HOON CORNELIUS ADRIANUS LAMBERTUS , DEBIESME FRANCOIS XAVIER
IPC分类号： H01L21/027 , H01L21/683
CPC分类号： G03F7/0002 , B29C2043/025 , B82Y10/00 , B82Y40/00 , F16F9/535 , F16F15/002 , F16F15/0275 , F16F15/03
摘要： PROBLEM TO BE SOLVED: To provide a vibration isolation system for an imprint lithographic apparatus, capable of improving a throughput of an imprint lithographic apparatus.
SOLUTION: An imprint lithographic apparatus 100 includes an actuator 130 displacing an imprint template holder 110 relative to a substrate holder 120. A support structure 140 of the imprint template holder 110 and/or the substrate holder 120 is attached to a vibration isolation system 150 attached to a base 160. The vibration isolation system 150 isolates vibration of the support structure 140 relative to the base 160. A control unit controlling the actuator 130 in an imprint process controls an adjusting member of the vibration isolation system 150, and adjusts a dynamic characteristic of the vibration isolation system 150 during at least part of the imprint process to reduce a displacement of the support structure 140 relative to the base 160, the displacement being caused by a force acting the support structure 140.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够提高压印光刻设备的生产量的压印光刻设备的隔振系统。压印光刻设备100包括致动器130，其相对于衬底保持器120移动压印模板保持器110.压印模板保持器110和/或衬底保持器120的支撑结构140附接到振动隔离系统150附接到基座160.隔振系统150隔离支撑结构140相对于基座160的振动。在压印过程中控制致动器130的控制单元控制隔振系统150的调节构件，并调节在压印过程的至少一部分期间防振系统150的动态特性，以减小支撑结构140相对于基座160的位移，该位移是由作用于支撑结构140的力引起的。版权所有：（C）2011，JPO＆INPIT

8. 发明专利

JP2011135076A Active mount, lithographic apparatus comprising such active mount, and method for tuning such active mount 有权
标题翻译：主动安装，包含此类活动安装的平铺设备，以及用于调整此类活动安装的方法
公开(公告)号：JP2011135076A
公开(公告)日：2011-07-07
申请号：JP2010282941
申请日：2010-12-20
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： BUTLER HANS , MEIJERS PIETER JOHANNES GERTRUDIS , SCHELLENS HENDRIKUS JOHANNES
IPC分类号： H01L21/027 , H01L21/68
CPC分类号： G03F7/70833 , F16F15/005 , G03F7/70825 , H01L41/0825
摘要： PROBLEM TO BE SOLVED: To suppress the occurrence of vibrations or other disturbances which may act on a projection system of a lithographic apparatus (also referred to as a projection lens) by movements of a substrate stage, a patterning device stage (for example, a mask stage), a cooling device etc.
SOLUTION: A projection system is mounted on a reference structure of a lithographic apparatus by an active lens mount. The active lens mount has a top part with a top surface 27 and a bottom part with a bottom surface 28. The top and bottom parts are interconnected by elastic structures 50 at both sides. Furthermore, the top and bottom parts are interconnected by a piezoelectric actuator-sensor combined body shown as 30, 40. By using a suitable electric signal, a required force acting between the top and bottom parts via the piezoelectric elements 30, 40 can be extracted.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：为了通过衬底台的移动来抑制可能作用在光刻设备（也称为投影透镜）的投影系统上的振动或其它干扰的发生，图案形成装置台（用于例如掩模台），冷却装置等。解决方案：通过有源透镜安装件将投影系统安装在光刻设备的参考结构上。主动透镜支架具有顶部，顶部表面27和底部具有底部表面28.顶部和底部通过两侧的弹性结构50相互连接。此外，顶部和底部通过示出为30,40的压电致动器 - 传感器组合体互连。通过使用合适的电信号，可以提取通过压电元件30,40在顶部和底部之间作用的所需的力。版权所有（C）2011，JPO＆INPIT

9. 发明专利

JP2010267963A Lithographic apparatus and improvement of alignment in device manufacturing method 审中-公开
标题翻译：设备制造方法的平面设备和对准改进
公开(公告)号：JP2010267963A
公开(公告)日：2010-11-25
申请号：JP2010108166
申请日：2010-05-10
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： BUTLER HANS
IPC分类号： H01L21/027
CPC分类号： G03B27/32 , G03F9/70 , G03F9/7096
摘要： PROBLEM TO BE SOLVED: To accurately align a projected image and a substrate. SOLUTION: When the substrate is scanned relative to the image in the lithographic apparatus, a scanning mechanism has coarse accuracy compared with precise patterns of the image to be exposed onto the substrate. In order to ensure that the image and the substrate are aligned at some point in time, an oscillation is imparted to a substrate table or a device that aligns the image, such as a mask table. An oscillation frequency is chosen corresponding to the maximum value of an alignment error. The frequency of a radiation pulse is adjusted so as to most accurately align the image and the substrate. The timing of the radiation pulse of the image may be adjusted so as to achieve accurate alignment when the oscillation is not imparted. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：准确地对准投影图像和基板。解决方案：当相对于光刻设备中的图像扫描基板时，扫描机构与要暴露于基板上的图像的精确图案相比具有粗略的精度。为了确保图像和基板在某个时间点对准，向基板台或对准图像的装置（例如掩模台）施加振荡。选择对应于对准误差的最大值的振荡频率。调整辐射脉冲的频率，以最准确地对准图像和基板。可以调整图像的辐射脉冲的定时，以便在不施加振荡时实现准确的对准。版权所有（C）2011，JPO＆INPIT

10. 发明专利

JP2009130354A Combination of structure and active attenuation system, and lithography apparatus 有权
标题翻译：结构和主动衰减系统的组合，以及平面设备
公开(公告)号：JP2009130354A
公开(公告)日：2009-06-11
申请号：JP2008290446
申请日：2008-11-13
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： BUTLER HANS , VAN DER WIJST MARC WILHELMUS M , DE PEE JOOST , DE HOON CORNELIUS ADRIANUS LAM , BOSCHKER STIJN
IPC分类号： H01L21/027 , F16F15/02 , G03F7/20
CPC分类号： G03F7/709 , F16F15/002
摘要： PROBLEM TO BE SOLVED: To provide a combination of a structure of which attenuation performance in an active attenuation system is improved, and the active attenuation system. SOLUTION: The active attenuation system for attenuating vibration in at least one portion of the structure includes: a device for obtaining the amount of position of the structure; and an actuator for applying force to the structure depending on an obtained amount of position. In this case, the device calculates the amount of position of the structure based on an actuator signal. COPYRIGHT: (C)2009,JPO&INPIT

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