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JP2007059904A Method of removing deposit on optical element, method of protecting optical element, method of manufacturing device, apparatus including optical element, and lithographic apparatus 有权
标题翻译：在光学元件上移除沉积物的方法，保护光学元件的方法，制造装置的方法，包括光学元件的装置和光刻装置
公开(公告)号：JP2007059904A
公开(公告)日：2007-03-08
申请号：JP2006223728
申请日：2006-08-21
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： VAN HERPEN MAARTEN MARINUS JOH , SPEE CAROLUS IDA MARIA ANTONIU , KLUNDER DERK JAN WILFRED , VAN MOL ANTONIUS MARIA BERNARD
IPC分类号： H01L21/027
CPC分类号： G03F7/70925
摘要： PROBLEM TO BE SOLVED: To provide a method of removing a deposit on an optical element, a method of protecting an optical element, a method of manufacturing a device, an apparatus including an optical element, and a lithographic apparatus. SOLUTION: A method of removing a deposit on an optical element comprises: a step of providing an H 2 -containing gas and one or more additional compounds selected from the group of hydrocarbon compounds and silane compounds to at least part of an apparatus; a step of producing hydrogen radicals from H 2 of the H 2 -containing gas; and a step of bringing the optical element together with the deposit into contact with at least part of the hydrogen radicals so as to remove at least part of the deposit. A method of protecting an optical element of an apparatus including the optical element comprises: a step of providing a cap layer to the optical element by a deposition process; and a step of removing at least part of the cap layer from the optical element in the removal process described above during or after use of the apparatus. The methods can be applied to a lithographic apparatus. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种去除光学元件上的沉积物的方法，保护光学元件的方法，制造器件的方法，包括光学元件的设备和光刻设备。解决方案：一种去除光学元件上的沉积物的方法包括：提供含H 2 的气体和一种或多种选自烃化合物和硅烷化合物的其它化合物的步骤至少部分装置; 从含有H 2 SBR的气体的H 2 SB 2产生氢自由基的步骤; 以及使光学元件与沉积物一起与至少部分氢自由基接触以便去除沉积物的至少一部分的步骤。一种保护包括光学元件的设备的光学元件的方法包括：通过沉积工艺向光学元件提供盖层的步骤; 以及在使用该装置期间或之后在上述去除方法中从光学元件中去除至少一部分盖层的步骤。该方法可以应用于光刻设备。版权所有（C）2007，JPO＆INPIT

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