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1. 发明专利

JP2012074745A Lithographic apparatus and device manufacturing method 审中-公开
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：JP2012074745A
公开(公告)日：2012-04-12
申请号：JP2012006051
申请日：2012-01-16
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： JANSEN HANS , PATRICK ALOYSIUS JACOBS TINEMUNS , VAN DER TOORN JAN-GERARD CORNELIS
IPC分类号： H01L21/027
CPC分类号： G03F7/70341
摘要： PROBLEM TO BE SOLVED: To provide a device and a method for reducing contamination of an immersion liquid in a lithographic apparatus when a closing surface is used to confine liquid in a liquid supply system.SOLUTION: To avoid or reduce particulate contamination caused by the closing surface colliding with the liquid supply system. The closing surface is maintained at a prescribed distance away from the liquid supply system such that there is no collision between the closing surface and the liquid supply system, but the liquid is nonetheless confined.
摘要翻译：要解决的问题：提供一种用于在封闭表面用于将液体限制在液体供应系统中时减少光刻设备中的浸没液体污染的装置和方法。
解决方案：避免或减少由与液体供应系统碰撞的关闭表面引起的颗粒物污染。闭合表面保持在离液体供应系统规定距离处，使得闭合表面和液体供应系统之间不存在碰撞，但液体仍被限制。版权所有（C）2012，JPO＆INPIT

2. 发明专利

JP2010219545A Lithographic apparatus, and device manufacturing method 有权
标题翻译： LITHOGRAPHIC设备和设备制造方法
公开(公告)号：JP2010219545A
公开(公告)日：2010-09-30
申请号：JP2010111091
申请日：2010-05-13
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： VAN DER TOORN JAN-GERARD CORNELIS , CHRISTIAAN ALEXANDER HOOGENDAM
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70341
摘要： PROBLEM TO BE SOLVED: To eliminate necessity of removing liquid between a substrate and a projection system while removing the substrate (and supplying a new substrate). SOLUTION: An actuated sealing plate 20 is used as one part of the boundary of a space containing the liquid in the lithographic apparatus without spoiling sealing which restrains liquid, for example, instead of the substrate, substrate table or both of them in order that the element of projection system for a liquid immersion lithographic apparatus maintains a status that the element of projection system for the liquid immersion lithographic apparatus is immersed in the liquid without agitating the liquid 11 existing between the substrate and the optical element by exchanging a plate for sealing the substrate during removing the substrate W (and during supplying a new substrate) and in order to facilitate the removal of the substrate during exposing another substrate. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：为了消除基板（并提供新的基板）而在基板和投影系统之间除去液体的必要性。解决方案：致动的密封板20用作在光刻设备中容纳液体的空间的边界的一部分，而不会破坏例如代替基板，基板台或它们两者的液体的密封为了液浸式光刻设备的投影系统的元件保持将液浸式光刻设备的投影系统的元件浸没在液体中而不会通过更换板材而搅拌存在于基板和光学元件之间的液体11的状态用于在移除衬底W期间（和在提供新衬底期间）中密封衬底，并且为了在露出另一个衬底期间便于去除衬底。版权所有（C）2010，JPO＆INPIT

3. 发明专利

JP2010157766A Lithographic apparatus 有权
标题翻译： LITHOGRAPHIC设备
公开(公告)号：JP2010157766A
公开(公告)日：2010-07-15
申请号：JP2010078262
申请日：2010-03-30
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： STREEFKERK BOB , JOHANNES JACOBUS MATHEUS BASELMANS , COX HENRIKUS HERMAN MARIE , ANTONIUS THEODORUS ANNA MARIA DERKSEN , SJOERD NICOLAAS LAMBERTUS DONDERS , CHRISTIAAN ALEXANDER HOOGENDAM , JOERI LOF , LOOPSTRA ERIK ROELOF , JEROEN JOHANNES SOPHIA MARIA MERTENS , VAN DER MEULEN FRITS , MULKENS JOHANNES CATHARINUS HUBERTUS , GERARDUS PETRUS MATTHIJS VAN NUNEN , SIMON KLAUS , SLAGHEKKE BERNARDUS ANTONIUS , STRAAIJER ALEXANDER , VAN DER TOORN JAN-GERARD CORNELIS , HOUKES MARTIJN
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70341 , G03F7/70425 , G03F7/70525 , G03F7/709
摘要： PROBLEM TO BE SOLVED: To provide a lithographic apparatus for reducing a remaining liquid on a surface of a substrate after exposure by a projection system. SOLUTION: In this lithographic apparatus, a localized area of the substrate surface under a projection system PL is immersed in liquid. The height of a liquid supply system 310 above the surface of the substrate W can be varied using actuators 314. A control system uses feedforward or feedback control with input of the surface height of the substrate W to maintain the liquid supply system 310 at a predetermined height above the surface of the substrate W. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于在通过投影系统曝光之后还原衬底表面上的剩余液体的光刻设备。解决方案：在该光刻设备中，将投影系统PL下面的衬底表面的局部区域浸入液体中。可以使用致动器314来改变基板W表面上方的液体供应系统310的高度。控制系统使用前馈或反馈控制，输入基板W的表面高度，以将液体供应系统310保持在预定的高度高于基板W的表面。版权所有（C）2010，JPO＆INPIT

4. 发明专利

JP2012178561A Lithography apparatus and stage system 有权
标题翻译：平面设备和舞台系统
公开(公告)号：JP2012178561A
公开(公告)日：2012-09-13
申请号：JP2012032609
申请日：2012-02-17
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： VAN DER TOORN JAN-GERARD CORNELIS , BAGGEN MARCEL KOENRAAD MARIE , STEFAN GEERTE KRUIJSWIJK , STARREVELD JEROEN PIETER , MARC CONSTANT JOHANNES BAGGEN , MICHAEL JOHANNES PHELVOLDELDONK
IPC分类号： H01L21/027 , G05D3/12 , H01L21/68
CPC分类号： G03F7/70716 , G03F7/709
摘要： PROBLEM TO BE SOLVED: To provide accurate short stroke positioning.SOLUTION: A stage system comprises an object table which holds an object, a short stroke actuator element which moves the object table over a first moving range, a long stroke actuator element which moves the short stroke actuator element over a second moving range wider than the first moving range. The stage system further comprises a pneumatic compensation device including a sensor which measures an amount representing an air disturbance force on the short stroke actuator element, an actuator which provides a compensation force at least partially compensating for air disturbance, and a controller. The sensor is connected to a controller input of the controller, and the actuator is connected to a controller output of the controller. The controller drives the actuator in response to a signal received from the sensor.
摘要翻译：要解决的问题：提供准确的短行程定位。解决方案：舞台系统包括保持物体的物体台，在第一移动范围上移动物体台的短行程致动器元件，在第二移动范围内移动短行程致动器元件的长行程致动器元件比第一移动范围宽。舞台系统还包括气动补偿装置，其包括测量表示短行程致动器元件上的空气扰动力的量的传感器，提供至少部分地补偿空气干扰的补偿力的致动器和控制器。传感器连接到控制器的控制器输入，执行器连接到控制器的控制器输出。控制器响应于从传感器接收到的信号驱动致动器。版权所有（C）2012，JPO＆INPIT

5. 发明专利

JP2011071545A Lithographic apparatus, and device manufacturing method 有权
标题翻译： LITHOGRAPHIC设备和设备制造方法
公开(公告)号：JP2011071545A
公开(公告)日：2011-04-07
申请号：JP2010275375
申请日：2010-12-10
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： JANSEN HANS , CORNELISSEN SEBASTIAAN MARIA J , LAMBERTUS DONDERS SJOERD NICOLAAS , GRAAF ROELOF FREDERICK DE , CHRISTIAAN ALEXANDER HOOGENDAM , JACOBS HERNES , ANTONIUS LEENDERS MARTINUS H , MERTENS JEROEN JOHANNES SOPHIA MARIA , STREEFKERK BOB , VAN DER TOORN JAN-GERARD CORNELIS , SMITS PETER , JANSSEN FRANCISCUS JOHANNES J , RIEPEN MICHEL
IPC分类号： H01L21/027
CPC分类号： G03F7/70341 , G03F7/707
摘要： PROBLEM TO BE SOLVED: To provide a liquid immersion lithographic apparatus that prevents an adverse effect on pattern image quality due to existence of bubbles in immersion liquid.
SOLUTION: The liquid immersion lithographic exposure apparatus minimizes or prevents generation of bubbles in the immersion liquid by reducing a size or a volume of a gap between an object and the top of a substrate table and/or preparing a cover plate covering the gap. Additionally, an actuator for laterally moving the object in a hole in order to reduce the gap between an edge of the object and a side of the hole of the support table when the object and the table are in contact with the liquid, may be prepared.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供一种液浸光刻设备，其防止由于浸没液体中的气泡的存在而对图案图像质量的不利影响。解决方案：液浸式光刻曝光装置通过减小物体与基板台顶部之间的间隙的尺寸或体积，和/或制备覆盖该基板台的盖板来最小化或防止在浸液中产生气泡间隙。此外，可以准备用于在物体和台面与液体接触的同时横向移动物体在孔中的致动器，以便减小物体的边缘与支撑台的孔的一侧之间的间隙。版权所有（C）2011，JPO＆INPIT

6. 发明专利

JP2010171455A Lithography apparatus, and method of manufacturing device 有权
标题翻译：光刻设备及其制造方法
公开(公告)号：JP2010171455A
公开(公告)日：2010-08-05
申请号：JP2010096638
申请日：2010-04-20
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： JANSEN HANS , CORNELISSEN SEBASTIAAN MARIA J , LAMBERTUS DONDERS SJOERD NICOLAAS , GRAAF ROELOF FREDERICK DE , CHRISTIAAN ALEXANDER HOOGENDAM , JACOBS HERNES , ANTONIUS LEENDERS MARTINUS H , MERTENS JEROEN JOHANNES SOPHIA MARIA , STREEFKERK BOB , VAN DER TOORN JAN-GERARD CORNELIS , SMITS PETER , JANSSEN FRANCISCUS JOHANNES J , RIEPEN MICHEL
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70341 , G03F7/707
摘要： PROBLEM TO BE SOLVED: To prevent the presence of air bubbles in an immersion liquid to cause an adverse effect on the quality of a pattern image in an immersion lithography apparatus. SOLUTION: In the immersion lithography apparatus, the formation of air bubbles in the immersion liquid can be minimized or prevented by reducing the size of a gap or a gap region between an object and a substrate table and/or providing a cover plate covering the gap. The immersion lithography apparatus may further include an actuator which laterally moves the object in a hole of the support table to reduce a gap between an end of the object and a side of the hole when the object is in contact with a liquid. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：为了防止浸没液体中的气泡的存在对浸没式光刻设备中的图案图像的质量产生不利影响。解决方案：在浸没式光刻设备中，通过减小物体和基板台之间的间隙或间隙区域的尺寸和/或提供盖板，可以使浸没液中的气泡形成最小化或防止弥补差距。浸没式光刻设备还可以包括致动器，该致动器在物体与液体接触时横向移动物体在支撑台的孔中，以减小物体的端部与孔的一侧之间的间隙。版权所有（C）2010，JPO＆INPIT

7. 发明专利

JP2010050478A Lithographic apparatus, and device manufacturing method 有权
标题翻译： LITHOGRAPHIC设备和设备制造方法
公开(公告)号：JP2010050478A
公开(公告)日：2010-03-04
申请号：JP2009243837
申请日：2009-10-22
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： STREEFKERK BOB , LAMBERTUS DONDERS SJOERD NICOLAAS , GRAAF ROELOF FREDERICK DE , CHRISTIAAN ALEXANDER HOOGENDAM , JANSEN HANS , MARTINUS HENDRIKUS ANTONIUS LEENDERS , LIEBREGTS PAULUS MARTINUS MARIA , MERTENS JEROEN JOHANNES SOPHIA MARIA , VAN DER TOORN JAN-GERARD CORNELIS , RIEPEN MICHEL
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/2041 , G03F7/3085 , G03F7/70058 , G03F7/70341 , G03F7/70825 , G03F7/70875 , G03F7/70916 , G03F2007/2067 , H01L21/0274 , H01L21/67098
摘要： PROBLEM TO BE SOLVED: To reduce generation of bubbles in an immersion liquid and evaporation of the liquid. SOLUTION: An immersion lithographic apparatus includes a liquid containment structure 12 provided for at least partially defining a space 10 structured to contain a liquid between a projection system PL and a substrate W. A sectional area of the space 10 in a plane parallel to the substrate W is minimized to reduce a traverse of a rim of the substrate W whose image is to be formed (which sometimes brings a content of bubbles in the immersion liquid). The theoretically minimum size is that of a target part TP whose image is to be formed by the projection system PL. In addition, in one embodiment, a shape of a final element of the projection system PL is modified to have a size and/or a shape similar to the target part TP on a cross section parallel to the substrate W. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：减少浸没液体中气泡的产生和液体的蒸发。浸没式光刻设备包括液体容纳结构12，其设置用于至少部分地限定被构造成在投影系统PL和衬底W之间容纳液体的空间10.平面中的空间10的截面积平行使基板W最小化，以减少要形成图像的基板W的边缘（其有时在浸渍液体中引起气泡的含量）的横越。理论上的最小尺寸是由投影系统PL形成其图像的目标部分TP的尺寸。此外，在一个实施例中，投影系统PL的最终元件的形状被修改为具有与平行于基板W的横截面上的目标部件TP类似的尺寸和/或形状。版权所有：（C）2010，JPO＆INPIT

8. 发明专利

JP2012134561A Lithographic apparatus and method of manufacturing device 有权
标题翻译：光刻设备及其制造方法
公开(公告)号：JP2012134561A
公开(公告)日：2012-07-12
申请号：JP2012084835
申请日：2012-04-03
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： STREEFKERK BOB , JOHANNES JACOBUS MATHEUS BASELMANS , COX HENRIKUS HERMAN MARIE , ANTONIUS THEODORUS ANNA MARIA DERKSEN , SJOERD NICOLAAS LAMBERTUS DONDERS , CHRISTIAAN ALEXANDER HOOGENDAM , JOERI LOF , ERIK ROELOF LOOPSTRA , JEROEN JOHANNES SOPHIA MARIA MERTENS , VAN DER MEULEN FRITS , MULKENS JOHANNES CATHARINUS HUBERTUS , GERARDUS PETRUS MATTHIJS VAN NUNEN , KLAUS SIMON , SLAGHEKKE BERNARDUS ANTONIUS , ALEXANDER STOLE YALE , VAN DER TOORN JAN-GERARD CORNELIS , HOUKES MARTIJN
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70341 , G03F7/70425 , G03F7/70525 , G03F7/709
摘要： PROBLEM TO BE SOLVED: To provide a lithographic apparatus for reducing residual liquid left on a surface of a substrate, after exposure by a projection system.SOLUTION: In a lithographic apparatus, a localized area of a surface of a substrate under a projection system PL is immersed in liquid. Height of a liquid supply system 310 above a surface of a substrate W can be varied by using actuators 314. A control system maintains the liquid supply system 310 at predetermined height above the surface of the substrate W, by using feedforward control or feedback control with input of the surface height of the substrate W.
摘要翻译：要解决的问题：提供一种用于减少残留在基板表面上的残留液体的光刻设备，在通过投影系统曝光之后。解决方案：在光刻设备中，将投影系统PL下的基板的表面的局部区域浸入液体中。可以通过使用致动器314来改变基板W的表面上方的液体供应系统310的高度。控制系统通过使用前馈控制或反馈控制将液体供应系统310保持在基板W的表面上方的预定高度输入基板W的表面高度。版权所有（C）2012，JPO＆INPIT

9. 发明专利

JP2010245569A Lithographic apparatus, and device manufacturing method 有权
标题翻译： LITHOGRAPHIC设备和设备制造方法
公开(公告)号：JP2010245569A
公开(公告)日：2010-10-28
申请号：JP2010164859
申请日：2010-07-22
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： JANSEN HANS , CORNELISSEN SEBASTIAAN MARIA J , LAMBERTUS DONDERS SJOERD NICOLAAS , GRAAF ROELOF FREDERICK DE , CHRISTIAAN ALEXANDER HOOGENDAM , JACOBS HERNES , ANTONIUS LEENDERS MARTINUS H , MERTENS JEROEN JOHANNES SOPHIA MARIA , STREEFKERK BOB , VAN DER TOORN JAN-GERARD CORNELIS , SMITS PETER , JANSSEN FRANCISCUS JOHANNES J , RIEPEN MICHEL
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70341 , G03F7/707
摘要： PROBLEM TO BE SOLVED: To provide a liquid immersion lithographic apparatus which reduces bubbles in an immersion liquid to prevent an adverse effect on pattern image quality. SOLUTION: The liquid immersion lithographic apparatus is provided to minimize bubbles generated or to prevent bubbles from being generated in the immersion liquid by reducing sizes or volumes of gaps between a target object and a substrate support table, and their upper structures, in the liquid immersion lithographic apparatus, and/or preparing a cover plate covering the gaps. The liquid immersion lithographic apparatus may further include an actuator which laterally moves the target object in a hole of the substrate support table to reduce a gap between a peripheral end of the target object and an inner side of the hole when the target object is in contact with the immersion liquid. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供一种减少浸没液体中的气泡以防止对图案图像质量的不利影响的液浸光刻设备。解决方案：提供液浸式光刻设备，以最小化产生的气泡或通过减少目标物体和基底支撑台及其上部结构之间的间隙的尺寸或体积来防止在浸没液体中产生气泡，液浸光刻设备，和/或制备覆盖间隙的盖板。液浸式光刻设备还可以包括致动器，该致动器在目标物体接触时使目标物体在基板支撑台的孔中横向移动，以减小目标物体的外周端与孔的内侧之间的间隙与浸没液体。版权所有（C）2011，JPO＆INPIT

10. 发明专利

DE602007011160D1 Lithographische Vorrichtung und Methode zur Herstellung einer Vorrichtung 未知
公开(公告)号：DE602007011160D1
公开(公告)日：2011-01-27
申请号：DE602007011160
申请日：2007-07-24
申请人： ASML NETHERLANDS BV
发明人： BUTLER HANS , HOUKES MARTIJN , VAN DER TOORN JAN-GERARD CORNELIS , SIMONS WILHELMUS FRANCISCUS JOHANNES
IPC分类号： G03F7/20

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