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1. 发明专利

JP2010045356A Lithographic apparatus and method 有权
标题翻译： LITHOGRAPHIC设备和方法
公开(公告)号：JP2010045356A
公开(公告)日：2010-02-25
申请号：JP2009183971
申请日：2009-08-07
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： ONVLEE JOHANNES , MARCEL MATHIJS THEODORE MARIE DIERICHS
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70391 , G03F7/70116
摘要： PROBLEM TO BE SOLVED: To control radiation features by a lithographic method and system. SOLUTION: A radiation beam from radiation received from a radiation source is provided by using a lighting system. The radiation source includes an array of elements which are individually controllable, and the individually controllable elements can emit radiation. A support structure supports a patterning device. The patterning device provides a pattern to the radiation beam. A substrate table holds a substrate. A projection system projects the radiation beam with a pattern to a target of the substrate. A radiation peak intensity detection device detects a peak of the intensity of one or a plurality of emission spectrums out of the individually controllable elements of the radiation source. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：通过光刻方法和系统来控制辐射特征。解决方案：通过使用照明系统提供从辐射源接收的辐射的辐射束。辐射源包括单独可控的元件阵列，并且单独的可控元件可以发射辐射。支撑结构支撑图案形成装置。图案形成装置向辐射束提供图案。衬底台保持衬底。投影系统将具有图案的辐射束投影到基板的目标。辐射峰值强度检测装置从辐射源的独立可控元件中检测一个或多个发射光谱的强度的峰值。版权所有（C）2010，JPO＆INPIT

2. 发明专利

JP2011254092A Lithographic projection apparatus and lithographic projection method 审中-公开
标题翻译： LITHOGRAPHIC投影设备和LITHOGRAPHIC投影方法
公开(公告)号：JP2011254092A
公开(公告)日：2011-12-15
申请号：JP2011163844
申请日：2011-07-27
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： MARCEL MATHIJS THEODORE MARIE DIERICHS , SECHELT NICHOLAS LAMBELDUS DONDERS , JOHANNES HENRICUS WILHELMUS JACOBS , JANSEN HANS , ERIK ROELOF LOOPSTRA , JEROEN JOHANNES SOPHIA MARIA MERTENS , MARCO COELHO STAUFEN , BOB STREEFKERK , MARTINUS CORNELIS MARIA VERHAGEN , LAYLA SOINTIS GULDA
IPC分类号： H01L21/027 , B01D61/02 , B01D61/24 , C02F1/04 , C02F1/28 , C02F1/32 , C02F1/42 , C02F1/44 , G03F7/20
CPC分类号： G03F7/70866 , B01D19/0031 , B01D61/025 , B01D61/24 , C02F1/04 , C02F1/20 , C02F1/28 , C02F1/283 , C02F1/32 , C02F1/42 , C02F1/441 , C02F2103/40 , G03F7/2041 , G03F7/70341
摘要： PROBLEM TO BE SOLVED: To provide a lithographic apparatus in which a liquid supply system maintains a liquid in a space between a final element of a projection system and a substrate by using a liquid confinement system.SOLUTION: A liquid supply system 100 may further include a de-mineralizing unit 130, a distillation unit 120 and a UV radiation source to purify an immersion liquid. A chemical may be added to the immersion liquid to inhibit lives from growing and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of lives may be reduced.
摘要翻译：要解决的问题：提供一种光刻设备，其中液体供应系统通过使用液体限制系统在投影系统的最终元件和基板之间的空间中保持液体。解决方案：液体供应系统100还可以包括去矿化单元130，蒸馏单元120和UV辐射源以净化浸没液体。可以向浸入液体中加入化学物质以抑制生命的生长，并且液体供应系统的组分可以由对可见光不透明的材料制成，从而可以减少生命的增长。版权所有（C）2012，JPO＆INPIT

3. 发明专利

JP2011109097A Homogenizer 有权
标题翻译：均质
公开(公告)号：JP2011109097A
公开(公告)日：2011-06-02
申请号：JP2010253323
申请日：2010-11-12
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： CLAESSENS BERT JAN , MARCEL MATHIJS THEODORE MARIE DIERICHS , GODFRIED HERMAN PHILIP
IPC分类号： H01L21/027 , G02B3/00 , G02B19/00
CPC分类号： G03B27/54 , G02B27/0905 , G02B27/0961 , G03F7/70075
摘要： PROBLEM TO BE SOLVED: To provide a homogenizer in which any risk of being damaged is obviated or mitigated. SOLUTION: A two-stage homogenizer includes a first homogenizer stage and a second homogenizer stage. The first homogenizer stage includes a pair of microlens arrays and associated focusing optics. The second homogenizer stage includes a second pair of microlens arrays and associated focusing optics. The second homogenizer stage is positioned to receive radiation provided from the first homogenizer stage. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供一种均衡器，其中任何损坏的风险被消除或减轻。解决方案：两级均化器包括第一均化器级和第二均化器级。第一均化器级包括一对微透镜阵列和相关联的聚焦光学器件。第二均化器级包括第二对微透镜阵列和相关联的聚焦光学器件。定位第二均化器级以接收从第一均化器级提供的辐射。版权所有（C）2011，JPO＆INPIT

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