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1. 发明专利

JP2014150289A Lithographic apparatus 有权
标题翻译： LITHOGRAPHIC设备
公开(公告)号：JP2014150289A
公开(公告)日：2014-08-21
申请号：JP2014101124
申请日：2014-05-15
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： NICOLAAS TEN KATE , JOOST JEROEN OTTENS , KNARREN BASTIAAN ANDREAS WILHELMUS HUBERTUS , ROBERT YAN VOGT , NINO GIOVANNI FRANCISCO , REMIE MARINUS JAN , JOHANNES HENRICUS WILHELMUS JACOBS , LAURENT THIBAUD SIMON MATTHEW , KUNEN JOHANN GERTRUDIX CORNELIS
IPC分类号： H01L21/027 , H01L21/683
CPC分类号： G03F7/70875 , G03F7/7085
摘要： PROBLEM TO BE SOLVED: To provide an apparatus in which the occurrence of thermal expansion/contraction effects is reduced, and more specifically, provide a system configured to reduce thermal expansion/contraction effects in an immersion system which uses a supply system which provides immersion fluid to a localized area of a substrate and/or substrate table.SOLUTION: The lithographic apparatus comprises a substrate table configured to support a substrate on a substrate supporting area and to support a heater and/or temperature sensor on a surface adjacent to the substrate supporting area.
摘要翻译：要解决的问题：提供一种减少热膨胀/收缩效果的发生的装置，更具体地说，提供一种系统，其被配置为降低使用提供浸液的供给系统的浸没系统中的热膨胀/收缩效果到基板和/或基板台的局部区域。解决方案：光刻设备包括：基板台，其配置成将基板支撑在基板支撑区域上，并且在与基板支撑相邻的表面上支撑加热器和/或温度传感器区。

2. 发明专利

JP2011258948A Displacement device, lithographic apparatus and positioning method 有权
标题翻译：位移设备，平面设备和定位方法
公开(公告)号：JP2011258948A
公开(公告)日：2011-12-22
申请号：JP2011121865
申请日：2011-05-31
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： JOHANNES HUBERTUS ANTONIUS VAN DE RIIDT , JOOST JEROEN OTTENS , MARCUS MARTINUS PETRUS ADRIANUS VERMEULEN , ERIK JOHANNES ANTONIUS MANDERS
IPC分类号： H01L21/027
CPC分类号： G03F7/70758 , H02K41/03
摘要： PROBLEM TO BE SOLVED: To provide a displacement device having a coil block unit structure in which the center of force can coincide with the center of gravity.SOLUTION: The present invention relates to a displacement device with a first and a second part which are displaceable relative to one another, the first part being provided with a system of magnets, the second part being provided with a set of coil block units including: the set of coil block units comprise at least three first coil block units having current conductors oriented substantially parallel to a second direction, at least two second coil block units having current conductors oriented parallel to a first direction. The displacement device includes a controller configured to control a position of the second part relative to the first part, and when the second part mainly moves in the second direction the controller levitates the second part from the first part in a third direction by using first coil block units only.
摘要翻译：要解决的问题：提供一种具有线圈块单元结构的位移装置，其中的中心能够与重心重合。解决方案：本发明涉及具有第一和第二部分的位移装置，其可相对于彼此移位，第一部分设置有磁体系统，第二部分设置有一组线圈块单元包括：所述一组线圈块单元包括至少三个第一线圈块单元，其具有基本上平行于第二方向定向的电流导体，至少两个第二线圈块单元，其具有平行于第一方向定向的电流导体。位移装置包括：控制器，被配置为控制第二部分相对于第一部分的位置，并且当第二部分主要沿第二方向移动时，控制器通过使用第一线圈从第一部分沿第三方向悬浮第二部分块单位。版权所有（C）2012，JPO＆INPIT

3. 发明专利

SG174691A1 LITHOGRAPHIC APPARATUS AND METHOD 未知
公开(公告)号：SG174691A1
公开(公告)日：2011-10-28
申请号：SG2011017159
申请日：2011-03-09
申请人： ASML NETHERLANDS BV
发明人： NICOLAAS TEN KATE , JOOST JEROEN OTTENS , BASTIAAN ANDREAS WILHELMUS HUBERTUS KNARREN , ROBBERT JAN VOOGD , GIOVANNI FRANCISCO NINO , MARINUS JAN REMIE , JACOBS JOHANNES HENRICUS WILHELMUS , LAURENT THIBAULT SIMON MATHIEU , KUNNEN JOHAN GERTRUDIS CORNELIS
摘要： Lithographic Apparatus and MethodA lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.[Fig. 9]

4. 发明专利

SG116555A1 Lithographic apparatus and device manufacturing method. 未知
公开(公告)号：SG116555A1
公开(公告)日：2005-11-28
申请号：SG200404063
申请日：2004-06-08
申请人： ASML NETHERLANDS BV
发明人： JOERI LOF , HANS BUTLER , SJOERD NICOLAAS LAMBERTUS DOND , ALEKSEY KOLESNYCHENKO , ERIK ROELOF LOOPSTRA , HENDRICUS JOHANNES MARIA MEIJE , JOHANNES CATHARINUS HUBERTUS M , ROELOF AEILKO SIEBRAND RITSEMA , FRANK VAN SCHAIK , TIMOTHEUS FRANCISCUS SENGERS , KLAUS SIMON , JOANNES THEODOOR DE SMIT , ALEXANDER STRAAIJER , BOB STREEFKERK , ERIK THEODORUS MARIA BIJLAART , CHRISTIAAN ALEXANDER HOOGENDAM , HELMAR VAN SANTEN , MARCUS ADRIANUS KERKHOF , MARK KROON , ARIE JEFFREY DEN BOEF , JOOST JEROEN OTTENS , JEROEN JOHANNES SOPHIA MARIA M
IPC分类号： G03F7/20 , H01L21/027
摘要： A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.

5. 发明专利

SG118285A1 Lithographic apparatus device manufacturing methodand device manufactured thereby 未知
公开(公告)号：SG118285A1
公开(公告)日：2006-01-27
申请号：SG200404074
申请日：2004-06-30
申请人： ASML NETHERLANDS BV
发明人： JOOST JEROEN OTTENS , TJARKO ADRIAAN RUDOLF VAN EMPE , KOEN JACOBUS JOHANNES MARIA ZA
IPC分类号： H01L21/027 , G03F7/20
摘要： A lithographic projection apparatus comprising: a radiation system (Ex,IL) for providing a projection beam (PB) of radiation; a support structure (MT) for supporting patterning means (MA), the patterning means serving to pattern the projection beam according to a desired pattern; a substrate holder (1) comprising a plurality of protrusions (2) defining a protrusion configuration for providing a substantially flat plane of support for supporting a substantially flat substrate (W), the substrate holder comprising at least one clamping electrode (8) for generating an electric field, for clamping a substrate against the substrate holder by said electric field; the substrate holder further comprising a peripheral supporting edge (3) arranged to contact a substrate; and a projection system (PL) for projecting the patterned beam onto a target portion of the substrate. According to the invention, the said at least one electrode extends beyond said peripheral supporting edge.

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