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1. 发明专利

JP2013131745A Lithographic apparatus with deformation sensor 有权
标题翻译：具有变形传感器的平面设备
公开(公告)号：JP2013131745A
公开(公告)日：2013-07-04
申请号：JP2012257929
申请日：2012-11-26
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： JOHANNES HENDRIKUS MARIA SPRUIT , CATHARINA MARIA BEERENS RUUD ANTONIUS , RICHARD HENRICUS ADRIANUS VAN LIESHOUT , CRISTIAN DAN
IPC分类号： H01L21/027 , G01B11/16
CPC分类号： G03F7/70783 , G03B27/522 , G03F7/7085
摘要： PROBLEM TO BE SOLVED: To provide a lithographic apparatus with an improved deformation sensor that allows measurement of a deformation of a part of the lithographic apparatus with sufficient accuracy.SOLUTION: There is disclosed a lithographic apparatus comprising a member susceptible to deformation and a deformation sensor for measuring a deformation of said member. The deformation sensor comprises: a first birefringence sensing element arranged to be subjected to stress dependent on the deformation of said member; a light system configured to transmit polarized light through the first birefringence sensing element, where said polarized light has a first polarization state prior to being transmitted through the first birefringence sensing element; a detector for detecting a second polarization state of the polarized light after being transmitted through the first birefringence sensing element; and a calculation unit to determine the deformation of said member on the basis of the first and second polarization states.
摘要翻译：要解决的问题：为光刻设备提供改进的变形传感器，其允许以足够的精度测量光刻设备的一部分的变形。解决方案：公开了一种光刻设备，其包括易于变形的部件和变形传感器用于测量所述构件的变形。变形传感器包括：第一双折射感测元件，被布置成受到取决于所述构件的变形的应力; 光系统，被配置为透射通过所述第一双折射感测元件的偏振光，其中所述偏振光在透射通过所述第一双折射感测元件之前具有第一偏振态; 检测器，用于在透射通过第一双折射检测元件之后检测偏振光的第二偏振状态; 以及计算单元，用于基于第一和第二极化状态来确定所述构件的变形。

2. 发明专利

JP2013084933A Lithographic apparatus and device manufacturing method 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：JP2013084933A
公开(公告)日：2013-05-09
申请号：JP2012206549
申请日：2012-09-20
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： JOHANNES HENDRIKUS MARIA SPRUIT , CATHARINA MARIA BEERENS RUUD ANTONIUS
IPC分类号： H01L21/027 , G01B11/16 , G03F7/20
CPC分类号： G03F7/7085 , G03F7/70575
摘要： PROBLEM TO BE SOLVED: To provide an improved measurement system in a lithographic apparatus.SOLUTION: A lithographic apparatus includes a support configured to support a patterning device capable of adding a pattern to a cross-section of a radiation beam to form a patterned radiation beam; a substrate table configured to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; and a measurement system which has a measurement radiation system to provide a measurement radiation beam, at least two reflectors to reflect a portion of the measurement beam between the reflectors, and a detector to detect a wavelength of at least a portion of the measurement beam transmitted through one of the reflectors.
摘要翻译：要解决的问题：在光刻设备中提供改进的测量系统。解决方案：光刻设备包括：支撑件，其构造成支撑能够将图案添加到辐射束的横截面以形成图案化辐射束的图案形成装置; 被配置为保持基板的基板台; 投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上; 以及测量系统，其具有测量辐射系统以提供测量辐射束，至少两个反射器，用于反射所述反射器之间的所述测量光束的一部分;以及检测器，用于检测所发射的所述测量光束的至少一部分的波长通过其中一个反射器。版权所有（C）2013，JPO＆INPIT

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