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1. 发明专利

JP2011249854A Lithographic device and method for manufacturing device 有权
标题翻译：光刻设备和制造设备的方法
公开(公告)号：JP2011249854A
公开(公告)日：2011-12-08
申请号：JP2011192774
申请日：2011-09-05
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： ALEKSEY YURIEVICH KOLENSNYCHENKO , JOHANNES JACOBS MATEUS BASELMANS , SECHELT NICHOLAS LAMBELDUS DONDERS , CHRISTIANE ALEXANDER HOGENDAM , JANSEN HANS , JEROEN JOHANNES SOPHIA MARIA MERTENS , JOHANNES CATHARINUS HUBERTUS MULKENS , FELIX GOTTFRIED PETER PETERS , BOB STREEFKERK , FRANCISCUS JOHANNES HERMAN MARIA TEUNISSEN , HELMAR VAN SANTEN
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70341 , G03F7/70733 , G03F7/70866 , G03F7/70908
摘要： PROBLEM TO BE SOLVED: To provide a substrate table of an immersion liquid lithographic apparatus configured to prevent contamination caused by immersion liquid.SOLUTION: A substrate table WT includes a drainage ditch, or a barrier 40 surrounding an outer peripheral edge of a substrate W, and a barrier 100 surrounding other objects 20, such as sensors, positioned on a flat surface which is substantially the same plane as the upper surface of the substrate W. The barriers 40, 100 can collect any liquid which is spilt from a liquid supply system during exposing the substrate W to reduce the risk of contamination of delicate components of a lithographic projection apparatus.
摘要翻译：要解决的问题：提供一种浸没液体光刻设备的基板台，其被配置为防止浸没液体引起的污染。解决方案：衬底台WT包括排水沟或围绕衬底W的外围边缘的阻挡层40以及围绕位于平坦表面上的其它物体20（例如传感器）的势垒100，该平面基本上是与衬底W的上表面相同的平面。阻挡层40,100可以收集在暴露衬底W期间从液体供应系统溢出的任何液体，以降低光刻投影设备的微妙部件污染的风险。版权所有（C）2012，JPO＆INPIT

2. 发明专利

SG174692A1 ILLUMINATION SYSTEM AND LITHOGRAPHIC APPARATUS 未知
公开(公告)号：SG174692A1
公开(公告)日：2011-10-28
申请号：SG2011017605
申请日：2011-03-10
申请人： ASML NETHERLANDS BV , ZEISS CARL SMT AG
发明人： HEINE MELLE MULDER , STEVEN GEORGE HANSEN , JOHANNES CATHARINUS HUBERTUS MULKENS , MARKUS DEGUENTHER
摘要： An illumination syste comprising a polarization member which comprises first and second polarization mod ers each connected to an actuator configured to move a respective polarization mo er into at least partial intersection with a radiation beam such that the polarization mod ier applies a modified polarization to at least part of the radiation beam, and an array of i dividually controllable reflective elements which is positioned to receive the radiation am after it has passed the polarization member, the illumination system further compn ng a controller capable of controlling the actuators such that the first and second olarization modifiers intersect with different portions of the radiation beam.[Figure 1]An illumination system comprising a polarization member which comprises first and second polarization modifiers each connected to an actuator configured to move a respective polarization modifier into at least partial intersection with a radiation beam such that the polarization modifier applies a modified polarization to at least part of the radiation beam, and an array of individually controllable reflective elements which is positioned to receive the radiation beam after it has passed the polarization member, the illumination system further comprising a controller capable of controlling the actuators such that the first and second polarization modifiers intersect with different portions of the radiation beam.[Figure 1]

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