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1. 发明专利

JP2010183113A Lithographic apparatus, and method of manufacturing the same 有权
标题翻译：平版印刷设备及其制造方法
公开(公告)号：JP2010183113A
公开(公告)日：2010-08-19
申请号：JP2010116482
申请日：2010-05-20
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： STREEFKERK BOB , BASELMANS JOHANNES JACOBUS MATHEUS , BRULS RICHARD JOSEPH , DIERICHS MARCLE MATHIJS T M , DONDERS SJOERD NICOLAAS LAMBERTUS , CHRISTIAAN ALEXANDER HOOGENDAM , JANSEN HANS , LOOPSTRA ERIK ROELOF , JEROEN JOHANNES SOPHIA MARIA MERTENS , MULKENS JOHANNES CATHARINUS HUBERTUS , SENGERS TIMOTHEUS FRANCISCUS , RONALD WALTER JIIN SEVERYNS , SERGEI SHULEPOV , BOOM HERMAN
IPC分类号： H01L21/027 , B05D3/12 , G03F7/20
CPC分类号： G03F7/70341 , G03F7/2041 , G03F7/70908 , G03F7/70958
摘要： PROBLEM TO BE SOLVED: To provide an immersion lithographic projection apparatus.
SOLUTION: The immersion lithographic projection apparatus is disclosed in which an immersion liquid is sealed between a final element of a projection system and a substrate. Use of both hydrophobic and hydrophilic layers on various elements of the apparatus is disclosed. The use of the layers helps to prevent formation of bubbles in the immersion liquid and reduce residue on the elements after being immersed in the liquid.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供浸没式光刻投影装置。解决方案：浸没式光刻投影装置被公开，其中浸没液被密封在投影系统的最终元件和基底之间。公开了在设备的各种元件上使用疏水层和亲水层两者。使用这些层有助于防止在浸没液中形成气泡，并且在浸入液体中之后减少元件上的残留物。版权所有（C）2010，JPO＆INPIT

2. 发明专利

JP2010187027A Reflective loop system producing incoherent radiation 有权
标题翻译：反射环系统产生不可避免的辐射
公开(公告)号：JP2010187027A
公开(公告)日：2010-08-26
申请号：JP2010118202
申请日：2010-05-24
申请人： Asml Netherlands Bv , Dainippon Screen Mfg Co Ltd , エーエスエムエルネザーランズビー.ブイ. , 大日本スクリーン製造株式会社
发明人： BASELMANS JOHANNES JACOBUS MATHEUS , UEYAMA KENJI
IPC分类号： H01L21/027 , G02B5/00 , G02B17/06 , G02B19/00 , G03F7/20
CPC分类号： G03F7/70583 , G02B27/48
摘要： PROBLEM TO BE SOLVED: To provide a system and a method for producing incoherent radiation having uniform illuminance. SOLUTION: The system and method are used to form incoherent beams from a coherent beam. The system includes a source of radiation and a reflective loop system. The source of radiation produces a coherent or partially coherent beam. The reflective loop system receives the partially coherent beam and reflects the partially coherent beam through a loop, or alternatively a plurality of non-overlapping loops, to form an incoherent beam. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于产生具有均匀照度的不相干辐射的系统和方法。解决方案：系统和方法用于从相干光束形成非相干光束。该系统包括辐射源和反射回路系统。辐射源产生相干或部分相干的光束。反射回路系统接收部分相干光束，并通过环路反射部分相干光束，或者替代地，多个非重叠环路，以形成非相干光束。版权所有（C）2010，JPO＆INPIT

3. 发明专利

JP2010147469A Lithography device and device manufacturing method 有权
标题翻译： LITHOGRAPHY DEVICE AND DEVICE MANUFACTURING METHOD
公开(公告)号：JP2010147469A
公开(公告)日：2010-07-01
申请号：JP2009281086
申请日：2009-12-11
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： BASELMANS JOHANNES JACOBUS MATHEUS , JASPER JOHANNES CHRISTIAAN MARIA
IPC分类号： H01L21/027 , G01M11/02 , G03F7/20
CPC分类号： G03F7/705 , G03F7/70591 , G03F7/706 , G03F7/70891
摘要： PROBLEM TO BE SOLVED: To measure characteristics of a projection system before and after a period for heating (exposure) and cooling so as to provide data for correcting a model for lens heating in a method of lithography.
SOLUTION: The model for lens heating has a part for modeling an influence of cooling on the characteristics and a part for modeling an influence of heating on the characteristics.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：为了测量在加热（曝光）和冷却期间之前和之后的投影系统的特性，以提供用于校正用于光刻方法的透镜加热模型的数据。
解决方案：透镜加热模型有一部分用于建模冷却对特性的影响，以及一部分，用于模拟加热对特性的影响。版权所有（C）2010，JPO＆INPIT

4. 发明专利

JP2013187539A Lithographic method and apparatus 有权
标题翻译：光刻方法和装置
公开(公告)号：JP2013187539A
公开(公告)日：2013-09-19
申请号：JP2013025770
申请日：2013-02-13
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： BASELMANS JOHANNES JACOBUS MATHEUS , JASPER JOHANNES CHRISTIAAN MARIA
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/705 , G03F7/70058 , G03F7/70141 , G03F7/706 , G03F7/70891
摘要： PROBLEM TO BE SOLVED: To provide, for example, a lithographic method which provides an improved throughput or availability compared with known lithographic methods.SOLUTION: Provided is a method of patterning substrates using a lithographic apparatus. The method comprises: providing a beam of radiation using an illumination system; using a patterning device to provide the radiation beam with a pattern in its cross-section; and using a projection system to project the patterned radiation beam onto target portions of a substrate lot. The method further comprises: performing radiation beam aberration measurement after projecting the patterned radiation beam onto a subset of the substrate lot; adjusting the projection system using results of the radiation beam aberration measurement; and then projecting the patterned radiation beam onto a further subset of the substrate lot.
摘要翻译：要解决的问题：提供例如与已知平版印刷方法相比提供改善的生产量或可用性的光刻方法。提供了一种使用光刻设备对基板进行图案化的方法。该方法包括：使用照明系统提供辐射束; 使用图案形成装置在其横截面上提供具有图案的辐射束; 以及使用投影系统将图案化的辐射束投影到衬底批的目标部分上。该方法还包括：在将图案化的辐射束投影到衬底批次的子集之后执行辐射束像差测量; 使用辐射束像差测量结果调整投影系统; 然后将图案化的辐射束投影到衬底批的另一个子集上。

5. 发明专利

JP2013048258A Lithographic apparatus and device manufacturing method utilizing data filtering 有权
标题翻译：利用数据过滤的平面设备和设备制造方法
公开(公告)号：JP2013048258A
公开(公告)日：2013-03-07
申请号：JP2012220149
申请日：2012-10-02
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： TINNEMANS PATRICIUS ALOYSIUS J , BASELMANS JOHANNES JACOBUS MATHEUS
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70191 , G03F7/70291 , G03F7/70433 , G03F7/70508
摘要： PROBLEM TO BE SOLVED: To provide an apparatus and a method, for executing maskless lithography more effectively.SOLUTION: The apparatus comprise a projection system, a pattern forming device, a low-pass filter, and a data manipulation device. The projection system projects a beam of radiation onto a substrate as an array of sub-beams of the radiation. The pattern forming device modulates the sub-beams of the radiation to substantially generate a requested dose pattern on the substrate. The low-pass filter executes calculation of pattern data derived from the requested dose pattern, thereby forming a frequency-clipped target dose pattern mainly including only spatial frequency components below a selected threshold frequency. The data manipulation device generates a control signal including spot exposure intensities to be generated by the patterning device, on the basis of a direct algebraic least-squares fit of the spot exposure intensities to the frequency-clipped target dose pattern.
摘要翻译：要解决的问题：提供一种更有效地执行无掩模光刻的装置和方法。解决方案：该装置包括投影系统，图案形成装置，低通滤波器和数据操作装置。投影系统将辐射束投射到衬底上作为辐射的子束的阵列。图案形成装置调制辐射的子光束，以基本上在衬底上产生所要求的剂量图案。低通滤波器执行从所请求的剂量图案导出的图案数据的计算，从而形成主要仅包括低于选定阈值频率的空间频率分量的限幅目标剂量图案。数据处理装置基于斑点曝光强度与限幅目标剂量图案的直接代数最小二乘拟合，生成包括由图案形成装置产生的点曝光强度的控制信号。版权所有（C）2013，JPO＆INPIT

6. 发明专利

JP2011018925A Lithographic apparatus, and device manufacturing method 有权
标题翻译： LITHOGRAPHIC设备和设备制造方法
公开(公告)号：JP2011018925A
公开(公告)日：2011-01-27
申请号：JP2010198845
申请日：2010-09-06
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： BASELMANS JOHANNES JACOBUS MATHEUS , DONDERS SJOERD NICOLAAS LAMBERTUS , CHRISTIAAN ALEXANDER HOOGENDAM , MERTENS JEROEN JOHANNES SOPHIA MARIA , MULKENS JOHANNES CATHARINUS HUBERTUS , STREEFKERK BOB
IPC分类号： H01L21/027 , G03F9/02
CPC分类号： G03F9/7023 , G03F7/70341 , G03F7/70883
摘要： PROBLEM TO BE SOLVED: To provide a method for correcting an exposure parameter of an immersion lithographic apparatus, and to provide a device and/or a computer program product.SOLUTION: In this method, an exposure parameter is measured using measuring beams 22, 24 projected through a liquid between the projection system PL and a substrate table of the immersion lithographic apparatus, and offset is determined based on a change of a physical property influencing measurement made using the measuring beams to at least partly correct the measured exposure parameter. Also, the height of an optical element connected to liquid between the projection system and the substrate table in the immersion lithographic apparatus is measured.
摘要翻译：要解决的问题：提供一种用于校正浸没式光刻设备的曝光参数的方法，并提供设备和/或计算机程序产品。解决方案：在该方法中，使用测量光束22,24测量曝光参数通过投影系统PL和浸没式光刻设备的衬底台之间的液体投影，并且基于影响使用测量光束进行的测量的物理属性的变化来确定偏移，以至少部分地校正测量的曝光参数。此外，测量在浸没式光刻设备中连接到投影系统和基板台之间的液体的光学元件的高度。

7. 发明专利

JP2010183099A Lithographic apparatus, and method of manufacturing device 有权
标题翻译：光刻设备及其制造方法
公开(公告)号：JP2010183099A
公开(公告)日：2010-08-19
申请号：JP2010088441
申请日：2010-04-07
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： STREEFKERK BOB , BASELMANS JOHANNES JACOBUS MATHEUS , DONDERS SJOERD NICOLAAS LAMBERTUS , CHRISTIAAN ALEXANDER HOOGENDAM , MERTENS JEROEN JOHANNES SOPHIA MARIA , MULKENS JOHANNES CATHARINUS HUBERTUS
IPC分类号： H01L21/027
CPC分类号： G03F7/70341 , G03F7/70866 , G03F9/7026 , G03F9/7034
摘要： PROBLEM TO BE SOLVED: To prevent or reduce generation of residual liquid, for example, on a substrate and/or substrate table after exposure of the substrate, in an immersion lithographic apparatus. SOLUTION: In immersion lithography, after the exposure of the substrate is completed, a detector is used to detect the residual liquid that remains on the substrate and/or substrate table. When the residual liquid is detected, an alarm signal may be generated to instruct an operator to take measures of manual correction. When an automatic drying system is started or a drying process is already executed alternatively, the apparatus is restarted. An error code flag may be added to instruct a track unit on execution of an additional drying step such as spin drying before sintering after exposure or other processes which are likely to be affected by liquid. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：待解决的问题：在浸没式光刻设备中，为了防止或减少残留液体的产生，例如在基板和/或基板台上暴露之后。解决方案：在浸没式光刻中，在完成基板曝光之后，使用检测器来检测残留在基板和/或基板台上的残留液体。当检测到残留液体时，可能产生报警信号以指示操作者采取手动校正措施。当自动干燥系统启动或干燥处理已经交替执行时，装置重启。可以添加错误代码标志来指示轨道单元执行额外的干燥步骤，例如在暴露之后的烧结之前的旋转干燥或可能受液体影响的其它过程。版权所有（C）2010，JPO＆INPIT

8. 发明专利

JP2013225673A Lithographic method and apparatus 有权
标题翻译：光刻方法和装置
公开(公告)号：JP2013225673A
公开(公告)日：2013-10-31
申请号：JP2013077786
申请日：2013-04-03
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： BASELMANS JOHANNES JACOBUS MATHEUS
IPC分类号： H01L21/027 , G02B19/00 , G03F7/20
CPC分类号： G01J1/42 , G03F7/70591 , G03F7/7085 , G03F7/70941
摘要： PROBLEM TO BE SOLVED: To provide a method and apparatus for determining apodization properties of a projection system in a lithographic apparatus.SOLUTION: The method comprises allowing light from a given point in an illumination field to pass through the projection system along at least three different optical paths, and then determining the difference in the intensity of light received in a projection field from the two different optical paths, and calculating apodization properties of the projection system from the intensity difference. It is not necessary to know the intensity distribution in the illumination field. To provide the different optical paths, a pinhole reticle provided with wedges of different orientations is used.
摘要翻译：要解决的问题：提供一种用于确定光刻设备中的投影系统的变迹特性的方法和装置。解决方案：该方法包括允许来自照明场中的给定点的光沿着至少三种不同的方式通过投影系统光路，然后确定来自两个不同光路的投影场中接收的光的强度差，以及从强度差计算投影系统的变迹特性。不需要知道照明场中的强度分布。为了提供不同的光路，使用设置有不同取向的楔的针孔掩模版。

9. 发明专利

JP2012151513A Lithographic apparatus and method of manufacturing device 有权
标题翻译：光刻设备及其制造方法
公开(公告)号：JP2012151513A
公开(公告)日：2012-08-09
申请号：JP2012111485
申请日：2012-05-15
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： LOOPSTRA ERIK ROELOF , DIERICHS MARCLE MATHIJS T M , JASPER JOHANNES CHRISTIAN MARIA , MEIJER HENDRICUS JOHANNE MARIA , MICKAN UWE , MULKENS JOHANNES CATHARINUS HUBERTUS , LIPSON MATTHEW , UITTERDIJK TAMMO , BASELMANS JOHANNES JACOBUS MATHEUS
IPC分类号： H01L21/027 , G02B21/00 , G02B21/26 , G03F7/20
CPC分类号： G03F7/70866 , G03F7/7015 , G03F7/70341 , Y10S430/162
摘要： PROBLEM TO BE SOLVED: To provide a lithographic apparatus and a method of manufacturing a device.SOLUTION: A lithographic projection apparatus for using with immersion liquid placed between a final element of a projection system and a substrate W is disclosed. A plurality of methods for protecting the projection system, a substrate table, and components of a liquid constraint system are disclosed. These methods include: a step of applying a protective coating on the final element 20 of the projection system; and a step of providing sacrificial bodies to an upstream side of the components. A two-component final optical element of CaFis also disclosed.

10. 发明专利

JP2011095755A Lithographic apparatus, method, and computer program product for generating mask pattern, and method of manufacturing device using the same 有权
标题翻译：用于生成掩模图案的平版印刷设备，方法和计算机程序产品，以及使用其制造设备的方法
公开(公告)号：JP2011095755A
公开(公告)日：2011-05-12
申请号：JP2010248143
申请日：2010-11-05
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： BASELMANS JOHANNES JACOBUS MATHEUS , KAREL DIEDERICK VAN DER MAST , KARS ZEGER TROOST
IPC分类号： G03F1/08
CPC分类号： G03F7/70283 , G03F1/36 , G03F7/70291 , G03F7/70441
摘要： PROBLEM TO BE SOLVED: To provide an improved method that brings about an optical proximity effect correction features to lithography. SOLUTION: Grayscale optical proximity effect correction device features are added to a mask pattern by convoluting the device features with a two-dimensional correction kernel or two one-dimensional correction kernels to generate grayscale OPC features (S11). The resulting pattern may be used in a projection lithography apparatus having a programmable patterning means that is adapted to generate three or more intensity levels. An iterative process (S15) of simulating an aerial image that would be produced by the pattern (S12), comparing the simulation to the desired pattern (S14), and adjusting the OPC features may be used to generate an optimum pattern for projection. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供一种将光学邻近效应校正特征引入光刻的改进方法。解决方案：通过使用二维校正核或两个一维校正内核卷积器件特征来将灰度光学邻近效应校正器件特征添加到掩模图案中，以产生灰度OPC特征（S11）。所得到的图案可以用在具有适于产生三个或更多个强度水平的可编程图案形成装置的投影光刻设备中。可以使用模拟由图案产生的空间图像（S12），将模拟与期望图案进行比较（S14）和调整OPC特征的迭代处理（S15）来生成用于投影的最佳图案。版权所有（C）2011，JPO＆INPIT

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