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1. 发明专利

JP2006163419A System and method utilizing electro-optic modulator 有权
标题翻译：利用电光调制器的系统和方法
公开(公告)号：JP2006163419A
公开(公告)日：2006-06-22
申请号：JP2005354000
申请日：2005-12-07
申请人： Asml Holding Nv , エーエスエムエルホールディングナームローゼフェンノートシャップASML Holding N.V.
发明人： TSACOYEANES JAMES G , GOVIL PRADEEP K
IPC分类号： G02F1/03 , H01L21/027
CPC分类号： G03F7/70291 , G03F7/70191 , G03F7/70308
摘要： PROBLEM TO BE SOLVED: To provide a system and method utilizing a dynamic optical system that is adjustable, possibly automatically adjustable in response to measured or detected characteristics of an illumination beam and/or patterned illumination beam, which system and method do not affect throughput during correction and/or disturb other optical characteristics. SOLUTION: The system includes: an illumination system for producing a beam of radiation; a patterning device for patterning the beam of radiation; a projection system for projecting the patterned beam onto a target point of an object at an image plane; a feedback system for detecting at least a part of the projected patterned beam falling on the image plane and generating a control signal based on the detection; a dynamically adjustable optical element; and a generator for generating an electric field to be applied on the optical element based on the control signal. The electric field applied on the optical element changes the index of refraction in at least one direction in the optical element. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种利用可调节的动态光学系统的系统和方法，该动态光学系统可以响应于照明光束和/或图案化照明光束的测量或检测特性自动调节，该系统和方法不影响校正期间的吞吐量和/或干扰其他光学特性。解决方案：该系统包括：用于产生辐射束的照明系统; 用于图案化辐射束的图案形成装置; 投影系统，用于将图案化的光束投影到图像平面上的物体的目标点上; 用于检测落在图像平面上的投影图案化波束的至少一部分的反馈系统，并且基于该检测产生控制信号; 动态可调光学元件; 以及用于基于控制信号产生要施加在光学元件上的电场的发生器。施加在光学元件上的电场在光学元件中沿至少一个方向改变折射率。版权所有（C）2006，JPO＆NCIPI

2. 发明专利

JP2006126838A System and method for utilizing electrooptic modulator 有权
标题翻译：利用电化学调节剂的系统和方法
公开(公告)号：JP2006126838A
公开(公告)日：2006-05-18
申请号：JP2005310111
申请日：2005-10-25
申请人： Asml Holding Nv , エーエスエムエルホールディングナームローゼフェンノートシャップASML Holding N.V.
发明人： TSACOYEANES JAMES G , GOVIL PRADEEP K
IPC分类号： G02F1/03
CPC分类号： G02F1/3551 , G02F1/0018 , G03F7/70141 , G03F7/70258
摘要： PROBLEM TO BE SOLVED: To provide a system and method utilizing an electrooptic modulator capable of transmitting a radiation beam at a desired wavelength with little or not absorption or attenuation or with the attenuation within a desired permissible range. SOLUTION: The system and method have an optical element and an electrical field generator. The electrical field generator generates an electrical field to be applied to the optical element and an index of refraction is changed in at least one direction within the optical element by the applied electrical field. The optical element is formed to exhibit characteristics, such that all the beams of radiation having wavelength above 155 nanometers are transmitted through the optical element. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种使用电光调制器的系统和方法，该电光调制器能够以很少或不吸收或衰减或衰减在期望的允许范围内以期望的波长传输辐射束。解决方案：该系统和方法具有光学元件和电场发生器。电场发生器产生要施加到光学元件的电场，并且通过施加的电场在光学元件内的至少一个方向上改变折射率。光学元件被形成为具有如下特征，使得具有155纳米以上的波长的所有辐射束通过光学元件透射。版权所有（C）2006，JPO＆NCIPI

3. 发明专利

JP2008172256A Adjustable slit device and method of varying line width 审中-公开
标题翻译：可调节滑动装置和变化线宽度的方法
公开(公告)号：JP2008172256A
公开(公告)日：2008-07-24
申请号：JP2008015415
申请日：2008-01-25
申请人： Asml Holding Nv , エーエスエムエルホールディングエヌ.ブイ.
发明人： MCCULLOUGH ANDREW W , GOVIL PRADEEP K
IPC分类号： G02B26/02 , H01L21/027 , G03F7/20
CPC分类号： G03F7/70066 , G03F7/70358 , G03F7/70558
摘要： PROBLEM TO BE SOLVED: To increase the uniformity of a rectangular illumination field in lithography. SOLUTION: In an apparatus that enhances the uniformity of illumination field in a scanning lithography, by adjusting a rectangular illumination field or slit, a plurality of blades are combined to form an edge movable in a length direction of the illumination field, and these blades are fixed by a pivot pin or connected to a flexible link. The link is connected to a push rod by the pivot pin, and by independently adjusting the push rod, the blade is inserted in the inside and taken out of the rectangular illumination field. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：增加光刻中矩形照明场的均匀性。解决方案：在通过调整矩形照明场或狭缝来增强扫描光刻中的照明场的均匀性的装置中，多个叶片组合形成沿照明场的长度方向移动的边缘，并且这些叶片通过枢轴销固定或连接到柔性连杆。连杆通过枢轴销连接到推杆上，并且通过独立地调节推杆，将叶片插入到内部并从矩形照明区域中取出。版权所有（C）2008，JPO＆INPIT

4. 发明专利

JP2005078079A Spatial light modulator and its manufacturing method 审中-公开
标题翻译：空调光调制器及其制造方法
公开(公告)号：JP2005078079A
公开(公告)日：2005-03-24
申请号：JP2004245786
申请日：2004-08-25
申请人： Asml Holding Nv , エーエスエムエルホールディングナームローゼフェンノートシャップ
发明人： GOVIL PRADEEP K , TSACOYEANES JAMES G
IPC分类号： B81B3/00 , B81C1/00 , G02B26/08
CPC分类号： G02B26/0858 , Y10S359/90
摘要： PROBLEM TO BE SOLVED: To provide a SLM capable of using in an environment requiring a very high resolution, and to provide its manufacturing method.
SOLUTION: This light modulator has a reflecting device array, an integrated circuit actuator connected with the substrate, and a first and second electrode arrays, and the integrated circuit actuator has actuator element arrays. The first and the second electrode arrays are connected to the opposite walls of their actuator elements, respectively.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供能够在需要非常高分辨率的环境中使用的SLM并提供其制造方法。解决方案：该光调制器具有反射器件阵列，与衬底连接的集成电路致动器，以及第一和第二电极阵列，并且集成电路致动器具有致动器元件阵列。第一和第二电极阵列分别连接到其致动器元件的相对的壁。版权所有（C）2005，JPO＆NCIPI

5. 发明专利

JP2005049874A Deformable optical system, deformable optical device and wave front aberration correcting method 有权
标题翻译：可变光学系统，可变光学器件和波前法校正方法
公开(公告)号：JP2005049874A
公开(公告)日：2005-02-24
申请号：JP2004219135
申请日：2004-07-27
申请人： Asml Holding Nv , エーエスエムエルホールディングナームローゼフェンノートシャップ
发明人： GOVIL PRADEEP K , GUZMAN ANDREW J
IPC分类号： G02B5/10 , G02B5/08 , G02B26/08 , H01L21/027
CPC分类号： G02B26/0825 , G02B26/0841 , Y10S359/90
摘要： PROBLEM TO BE SOLVED: To provide a deformable optical system, a deformable optical device and a wave front aberration correcting method by which the comparatively high-order term of wave front aberration in an optical system can be corrected.
SOLUTION: The deformable optical system has a reflection device having a 1st reflection surface and a 2nd reflection surface, an integrated circuit actuator having a movable extension part extended from a supporting surface and coupled with the 2nd surface, an electrode individually coupled with one corresponding extension part of the above extension part, and a controller coupled with the electrode. By constituting the controller, the extension part is controlled through the electrode.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：解决的问题：提供一种可变形光学系统，可变形光学装置和波前像差校正方法，通过该方法可以校正光学系统中相对高阶的波前像差。解决方案：可变形光学系统具有具有第一反射表面和第二反射表面的反射装置，集成电路致动器，具有从支撑表面延伸并与第二表面耦合的可移动延伸部分，电极单独地与上述延伸部分的一个对应的延伸部分，以及与电极耦合的控制器。通过构成控制器，通过电极来控制延伸部分。版权所有（C）2005，JPO＆NCIPI

6. 发明专利

JP2008052296A Spatial light modulator and method of making spatial light modulator 有权
标题翻译：空间光调制器及制造空间光调制器的方法
公开(公告)号：JP2008052296A
公开(公告)日：2008-03-06
申请号：JP2007272463
申请日：2007-10-19
申请人： Asml Holding Nv , エーエスエムエルホールディングエヌ.ブイ.
发明人： GOVIL PRADEEP K , TSACOYEANES JAMES G
IPC分类号： G02F1/01 , B81B3/00 , B81C1/00 , G02B26/08 , G02F1/03
CPC分类号： G02B26/0858 , Y10S359/90
摘要： PROBLEM TO BE SOLVED: To provide a spatial light modulator (SLM) that can be used in an environment requiring extremely high resolution and to provide a method of making the same. SOLUTION: A spatial light modulator (SLM) includes a reflective device array, an integrated circuit actuator coupled to a substrate, and a first electrode array and a second electrode array. The integrated circuit actuator includes actuator elements. The first electrode array and the second electrode array are coupled to opposite walls of each of the actuator elements. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供可以在需要极高分辨率的环境中使用并提供其制造方法的空间光调制器（SLM）。解决方案：空间光调制器（SLM）包括反射器件阵列，耦合到衬底的集成电路致动器以及第一电极阵列和第二电极阵列。集成电路致动器包括致动器元件。第一电极阵列和第二电极阵列耦合到每个致动器元件的相对壁。版权所有（C）2008，JPO＆INPIT

7. 发明专利

JP2006324660A DEVICE AND METHOD UTILIZING ILLUMINATION-BEAM ADJUSTING MEANS 审中-公开
公开(公告)号：JP2006324660A
公开(公告)日：2006-11-30
申请号：JP2006129419
申请日：2006-05-08
申请人： ASML HOLDING NV
发明人： GOVIL PRADEEP K
IPC分类号： H01L21/027 , G02B26/02 , G02B27/09 , G03F7/20
摘要： PROBLEM TO BE SOLVED: To provide a dynamic optical system adjustable on the basis of actually measured or detected characteristics, in view of the fact that variations due to aging and a plurality of characteristics of an illumination-source output cannot be compensated, at the same time, in a patterning generation system that uses a static optical system, in which redesigning of the optical system is required according to the applications. SOLUTION: The system 100 illuminates an optical component 104, having a channel passing a fluid therethrough with a radiation beam 103 radiated by an illumination source. A pressure controller 108 and/or a concentration controller 112 adjusts the pressure and/or concentration of the fluid, which a fluid supply 106 supplies to the channel to change the characteristics of the radiation beam that passes through the optical component. A detector 120 detects the optical characteristics of the beam after passage through the optical component 104 and sends a signal corresponding to the detection result to each controller etc. The beam characteristics, to be corrected, may be the uniformity of the illumination intensity, ellipse properties, or telecentric properties. COPYRIGHT: (C)2007,JPO&INPIT

8. 发明专利

JP2010158156A Linear motor magnetic shield apparatus 有权
标题翻译：线性电机磁屏蔽装置
公开(公告)号：JP2010158156A
公开(公告)日：2010-07-15
申请号：JP2009283553
申请日：2009-12-15
申请人： Asml Holding Nv , エーエスエムエルホールディングエヌ.ブイ.
发明人： MANKALA KALYAN KUMAR , WIENER ROBERTO B , GOVIL PRADEEP K , NELSON ANDREW
IPC分类号： H02K41/03 , H01L21/027 , H02K41/02
CPC分类号： H02K41/03 , G03F7/70758 , G03F7/70941 , H02K11/01 , H02K2201/18
摘要： PROBLEM TO BE SOLVED: To provide a linear motor that can keep the advantages of accurate positioning and rapid acceleration that are necessary for satisfying the requirements for the latest semiconductor lithography, while minimizing the influence of a leakage magnetic flux.
SOLUTION: A magnetic shield 560a-560d having non-magnetic gaps provides reduced magnetic cross-talk for a linear motor array in an accurate positioning system. Redirecting of the leakage magnetic flux limits the cross-talk and associated adverse effects. Such a preferred magnetic circuit path for the leakage is affixed to a moving magnet system of a linear motor 500. The preferred embodiment of the flux leakage path is realized, by providing a ferromagnetic shield 560a-560d, separated by a non-magnetic gap between permanent magnets 520a-520d and back irons 540a and 540b. In another embodiment, the ferromagnetic shield separation 560a-560d includes diamagnetic materials.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种可以保持精确定位和快速加速的优点的线性电动机，其是满足最新半导体光刻要求所必需的，同时最小化泄漏磁通量的影响。解决方案：具有非磁隙的磁屏蔽560a-560d为精确定位系统中的线性电动机阵列提供减小的磁串扰。泄漏磁通的重定向限制了串扰和相关的不利影响。用于泄漏的这种优选的磁路路径被固定到线性电动机500的移动磁体系统。磁通泄漏路径的优选实施例通过提供铁磁屏蔽560a-560d来实现，铁磁屏蔽560a-560d由永久磁铁520a-520d和后铁540a和540b。在另一个实施例中，铁磁屏蔽分离560a-560d包括抗磁性材料。版权所有（C）2010，JPO＆INPIT

9. 发明专利

JP2010093263A System utilizing electrooptic modulator 有权
标题翻译：系统利用电动调制器
公开(公告)号：JP2010093263A
公开(公告)日：2010-04-22
申请号：JP2009234218
申请日：2009-10-08
申请人： Asml Holding Nv , エーエスエムエルホールディングエヌ.ブイ.
发明人： TSACOYEANES JAMES G , GOVIL PRADEEP K
IPC分类号： H01L21/027 , G02F1/03 , G02F1/29
CPC分类号： G03F7/70291 , G03F7/70191 , G03F7/70308
摘要： PROBLEM TO BE SOLVED: To provide a system and a method utilizing a dynamic optical system which is adjustable, possibly automatically adjustable in response to measured or detected characteristics of an illumination beam and/or patterned beam, wherein the system and method do not affect throughput during correction and/or do not disturb other optical characteristics. SOLUTION: The system includes: an illumination system 802 for forming a radiation beam; a patterning device 804 for patterning the radiation beam; a projection system 808 for projecting a patterned beam onto a target point of an object at an image plane; a feedback system 818 for detecting at least a part of the patterned beam projected on the image plane and forming a control signal according to the detection; an optical element which can be dynamically controlled; and a generator for generating an electric field to be applied to the optical element according to the control signal, wherein the electric field applied to the optical element changes a refractive index in at least one direction in the optical element. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种使用可调节的动态光学系统的系统和方法，其可以响应于照明光束和/或图案光束的测量或检测特性而可自动调节，其中系统和方法做不影响校正期间的吞吐量和/或不干扰其他光学特性。解决方案：该系统包括：用于形成辐射束的照明系统802; 用于图案化辐射束的图案形成装置804; 投影系统808，用于将图案化的光束投影到图像平面上的物体的目标点上; 用于检测投影在图像平面上的图案化束的至少一部分并根据检测形成控制信号的反馈系统818; 可以动态控制的光学元件; 以及用于根据控制信号产生要施加到光学元件的电场的发生器，其中施加到光学元件的电场在光学元件中改变至少一个方向上的折射率。版权所有（C）2010，JPO＆INPIT

10. 发明专利

JP2010041916A Cooling of actuator coils 有权
标题翻译：执行器线圈的冷却
公开(公告)号：JP2010041916A
公开(公告)日：2010-02-18
申请号：JP2009172881
申请日：2009-07-24
申请人： Asml Holding Nv , エーエスエムエルホールディングエヌ.ブイ.
发明人： WIENER ROBERTO B , GOVIL PRADEEP K , BROWN MICHAEL EMERSON
IPC分类号： H02K3/24 , H01L21/027 , H02K9/22
CPC分类号： G03B27/52 , G03F7/70758
摘要： PROBLEM TO BE SOLVED: To effectively discharge heat from an inner layer of an actuator coil.
SOLUTION: A heat transfer element disposed near an actuator coil is used to effectively discharge heat from an inner layer of an actuator coil to the outside of the actuator coil. According to an embodiment, a heat transfer apparatus of an actuator coil includes one or a plurality of heat-transfer elements, disposed near one or a plurality of layers or one or a plurality of windings of the actuator coil, and a cooling surface disposed near the heat transfer element and the actuator coil. In the configuration, the heat transfer apparatus transfers heat from the inner layer of the actuator coil to the cooling surface and further transfers the heat to an area located outside of the actuator coil.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：有效地从致动器线圈的内层排出热量。解决方案：设置在致动器线圈附近的传热元件用于有效地将热量从致动器线圈的内层排出到致动器线圈的外部。根据实施例，致动器线圈的传热装置包括设置在致动器线圈的一个或多个层或一个或多个绕组附近的一个或多个热传递元件，以及设置在致动器线圈附近的冷却表面传热元件和致动器线圈。在该结构中，传热装置将热量从致动器线圈的内层传递到冷却面，并进一步将热量传递到位于致动器线圈外侧的区域。版权所有（C）2010，JPO＆INPIT

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