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    • 3. 发明专利
    • Fluorine-containing compound, fluorine-containing cyclic polymer and method for producing the same
    • 含氟化合物,含氟聚合物循环聚合物及其生产方法
    • JP2006016571A
    • 2006-01-19
    • JP2004198172
    • 2004-07-05
    • Asahi Glass Co Ltd旭硝子株式会社
    • TAKEBE YOKOEDA MASATAKAYOKOKOJI OSAMU
    • C08F14/18
    • PROBLEM TO BE SOLVED: To obtain a fluorine-containing polymer that has high concentration of a functional group and sufficient properties of the functional group and causes no lowering in Tg.
      SOLUTION: The fluorine-containing polymer has a monomer unit obtained by subjecting a fluorine-containing diene represented by formula (1): CF
      2 =CFCH
      2 -CHQ-R
      2 (Q is a (CH
      2 )
      n (CF
      3 )
      2 OR
      1 (n is 0 or 1; R
      1 is hydrogen, a ≤20C alkyl group, a ≤15C alkoxycarbonyl group or a CH
      2 R
      3 (R
      3 is a ≤15C alkoxycarbonyl group)); R
      2 is a cyclic unsaturated hydrocarbon group or an alkyl group in which at least one hydrogen atom is substituted with a cyclic unsaturated hydrocarbon; in R
      2 , a part of carbon atoms in the cyclic unsaturated hydrocarbon group may be substituted with a hetero atom or a carbonyl group, a part of hydrogen atoms in the cyclic unsaturated hydrocarbon group may be substituted with a fluorine atom, an alkyl group or a fluoroalkyl group) to cyclic polymerization.
      COPYRIGHT: (C)2006,JPO&NCIPI
    • 要解决的问题:为了获得具有高浓度官能团和足够的官能团特性并且不降低Tg的含氟聚合物。 解决方案:含氟聚合物具有通过使由式(1)表示的含氟二烯烃:CF 2 SBR 2 = CFCH 2 SBI 2 获得的单体单元 R 2 (Q为(CH 2 n (CF 3 (n为0或1; R 1为氢,≤20C烷基,≤15C烷氧基羰基或CH 2 (R SP 3是一个≤15C烷氧基羰基)); R 2 SP 2是环状不饱和烃基或烷基 其中至少一个氢原子被环状不饱和烃取代;在R 2 SP 2中,环状不饱和烃基中的一部分碳原子可以被杂原子或羰基取代,部分 的环状不饱和烃基中的氢原子可以被氟原子,烷基或氟代烷基取代)进行环状聚合。 版权所有(C)2006,JPO&NCIPI
    • 4. 发明专利
    • Fluoropolymer and resist composition
    • 氟聚合物和耐腐蚀组合物
    • JP2005298707A
    • 2005-10-27
    • JP2004118534
    • 2004-04-14
    • Asahi Glass Co Ltd旭硝子株式会社
    • TAKEBE YOKOEDA MASATAKAYOKOKOJI OSAMU
    • G03F7/033C08F14/18C08F18/20C08F214/18C08F222/18C08F236/20G03F7/039H01L21/027
    • C08F214/18C08F14/18C08F222/18C08F2/06
    • PROBLEM TO BE SOLVED: To provide a photolithographic resist composition using an ultraviolet radiation of ≤250 nm and a polymer for the composition.
      SOLUTION: The fluoropolymer (A) has a unit derived from cyclization polymerization of at least one fluorine-containing diene chosen from a fluorine-containing diene of formula (1): CF
      2 =CFCF
      2 -C(CF
      3 )(OR
      1 )-CH
      2 CH=CH
      2 and a fluorine-containing diene of formula (2):CF
      2 =CFCH
      2 -CH((CH
      2 )
      n C(CF
      3 )
      2 (OR
      1 ))-CH
      2 CH=CH
      2 and a unit derived from cyclization polymerization of a fluorine-containing diene of formula (3): CF
      2 =CFCH
      2 -CH(COOR
      2 )-CH
      2 CH=CH
      2 (wherein R
      1 is a hydrogen atom, a blocked group or the like; R
      2 is a hydrocarbon group; and n is 0 or 1). The resist composition contains the fluoropolymer (A).
      COPYRIGHT: (C)2006,JPO&NCIPI
    • 要解决的问题:提供使用≤250nm的紫外线辐射的光刻抗蚀剂组合物和用于该组合物的聚合物。 解决方案:含氟聚合物(A)具有衍生自选自式(1)的含氟二烯的至少一种含氟二烯烃的环化聚合的单元:CF 2 SBB = CFCF < SB> 2 -C(CF 3 )(OR 1 ) - CH 2 CH = CH 2 和式(2)的含氟二烯:CF 2 SBB = CFCH SB 2 -CH((CH 2 SB 2)SB ñ C(CF 3 2 (OR 1 )) - CH 2 CH = CH &lt; SB&gt; 2&gt;和由式(3)表示的含氟二烯的环化聚合衍生的单元:CF 2 SB = CHCH 2 CH 2其中R 1是氢原子,被封端的基团或 类似物; R 2是烃基; n是0或1)。 抗蚀剂组合物含有含氟聚合物(A)。 版权所有(C)2006,JPO&NCIPI
    • 6. 发明专利
    • Fluorine-containing polymer, method for producing the same and resist protective coat composition
    • 含氟聚合物,其制备方法和耐腐蚀保护膜组合物
    • JP2006160988A
    • 2006-06-22
    • JP2004358088
    • 2004-12-10
    • Asahi Glass Co Ltd旭硝子株式会社
    • YOKOKOJI OSAMUKAWAGUCHI YASUHIDEEDA MASATAKATAKEBE YOKOSASAKI TAKASHI
    • C08F36/20
    • PROBLEM TO BE SOLVED: To provide a fluorine-containing polymer having high transparency in a wide wave length range; to provide a method for producing the polymer; and to provide a resist protective coat composition having excellent transparency to far ultraviolet rays and vacuum ultraviolet rays, and high effects for suppressing a PED effect (Postexposure Delay effect), soluble in an alkali developing liquid to enable the coat to be removed by a developing step in a current resist process, and capable of protecting a resist membrane from an immersion solvent even in an immersion lithography step. SOLUTION: The fluorine-containing polymer has a monomer unit obtained by subjecting a fluorine-containing diene represented by formula (1): CF 2 =CFCF 2 C(CF 3 )(OR 1 )-(CH 2 ) n CR 2 =CHR 3 (1) (wherein, R 1 is a ≤20C organic group having at least one substituent selected from the group consisting of a carboxy group, a sulfo group and a sulfonylfluoride group; R 2 and R 3 are each independently a hydrogen atom or a ≤12C alkyl group; and n is an integer of 0-2) to cyclic polymerization. COPYRIGHT: (C)2006,JPO&NCIPI
    • 要解决的问题:提供在宽波长范围内具有高透明度的含氟聚合物; 以提供聚合物的制造方法; 并且提供对远紫外线和真空紫外线具有优异透明性的抗蚀剂保护涂层组合物,以及用于抑制PED效应(曝光后延迟效应)的高效果,其可溶于碱性显影液体中,以使涂层能够通过显影 并且即使在浸没式光刻步骤中也能够将抗蚀剂膜从浸渍溶剂中保护。 解决方案:含氟聚合物具有通过使由式(1)表示的含氟二烯烃:CF 2 SBR 2 = CFCF 2 SBC 2(C) CF 3 )(OR 1 ) - (CH 2 名词 CR 2 =(CHR)3(1)(1)(其中,R SP 1是具有至少一个取代基的≤20C有机基团,该取代基选自羧基,磺基和 磺酰氟基团; R 2 SP 3和R 3 SP 3各自独立地为氢原子或≤12C烷基,n为0-2的整数)进行环状聚合。 版权所有(C)2006,JPO&NCIPI
    • 7. 发明专利
    • Fluorine-containing compound, fluoropolymer and its preparation method
    • 含氟化合物,氟聚合物及其制备方法
    • JP2005239785A
    • 2005-09-08
    • JP2004048428
    • 2004-02-24
    • Asahi Glass Co Ltd旭硝子株式会社
    • TAKEBE YOKOEDA MASATAKAYOKOKOJI OSAMU
    • G03F7/039C07F7/08C08F36/20
    • PROBLEM TO BE SOLVED: To provide a fluoropolymer which has a hydroxyl group and shows a high transparency at a wide wavelength range, especially at a wavelength of ≤200 nm. SOLUTION: A fluorine-containing diene of formula (1): CF 2 =CFCH 2 CH(C(CF 3 ) 2 OH)CH 2 CR 1 =CHR 2 (wherein R 1 and R 2 are each independently a hydrogen atom, an alkyl group having ≤10 carbon atoms or a cyclic aliphatic hydrocarbon group, provided that at least one of them is a cyclic aliphatic hydrocarbon group) is provided. The fluoropolymer has a monomer unit derived from cyclic polymerization of the fluorine-containing diene. A preparation method of the fluoropolymer is also provided. COPYRIGHT: (C)2005,JPO&NCIPI
    • 要解决的问题:提供具有羟基并在宽波长范围内显示高透明度的氟聚合物,特别是在≤200nm的波长下。 解决方案:式(1)的含氟二烯:CF 2 SBB = CFCH 2 SBB CH 2(C(CF 3 SB 3) SB> 2 OH)CH CR 1 = CHR 2其中R 1 和R lt; SP&gt; 2&lt; SP&gt;各自独立地为氢原子,碳原子数为10以上的烷基或环状脂族烃基,条件是其中至少一个为环状脂族烃基)。 含氟聚合物具有衍生自含氟二烯的环状聚合的单体单元。 还提供了含氟聚合物的制备方法。 版权所有(C)2005,JPO&NCIPI
    • 8. 发明专利
    • Fluorocopolymer, method of producing the same, and resist composition containing the same
    • 氟聚合物,其制造方法和含有它们的耐热组合物
    • JP2005097531A
    • 2005-04-14
    • JP2004131485
    • 2004-04-27
    • Asahi Glass Co Ltd旭硝子株式会社
    • TAKEBE YOKOEDA MASATAKAYOKOKOJI OSAMU
    • G03F7/039C08F220/10C08F236/20G03F7/004H01L21/027
    • C08F236/20G03F7/0046G03F7/0395G03F7/0397
    • PROBLEM TO BE SOLVED: To provide a fluorocopolymer which has functional groups and high transparency in a wide wavelength region, and a resist composition comprising the fluoropolymer.
      SOLUTION: The fluorocopolymer has units derived from a monomer unit obtained by cyclopolymerization of a fluorinated diene represented by formula (1) and units derived from another monomer unit obtained by cyclopolymerization or units derived from a monomer unit obtained by polymerization of an acrylic monomer. The resist composition contains the fluorocopolymer as a base polymer. The formula(1) is CF
      2 =CFCH
      2 CH(CH
      2 C(CF
      3 )
      2 (OR
      1 ))CH
      2 CH=CH
      2 . In the formula, R
      1 is a hydrogen atom, a 20C or lower alkyl group optionally having an etheric oxygen atom, a 6C or lower alkoxycarbonyl group, or CH
      2 R
      2 (where R
      2 is a 6C or lower alkoxycarbonyl group).
      COPYRIGHT: (C)2005,JPO&NCIPI
    • 要解决的问题:提供在宽波长区域具有官能团和高透明度的含氟共聚物和包含含氟聚合物的抗蚀剂组合物。 解决方案:含氟共聚物具有衍生自通过式(1)表示的氟化二烯的环化聚合获得的单体单元的单元和由通过环化聚合获得的另一单体单元衍生的单元或衍生自通过丙烯酸聚合获得的单体单元的单元 单体。 抗蚀剂组合物含有作为基础聚合物的含氟共聚物。 式(1)为CF 2 SB SB = CH 2 CH 2 CH 3(SB <3)SB > 2 (OR 1 ))CH 2 CH = CH 2 。 在该式中,R SP 1是氢原子,任选具有醚性氧原子的20C或低级烷基,6C或低级烷氧基羰基或CH 2 SP> 2 (其中R 2 是6C或低级烷氧基羰基)。 版权所有(C)2005,JPO&NCIPI