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1. 发明专利

JP2012173501A Resist protective film composition for immersion exposure and method for forming resist pattern 审中-公开
标题翻译：用于浸渍曝光的耐腐蚀膜组合物和形成耐蚀图案的方法
公开(公告)号：JP2012173501A
公开(公告)日：2012-09-10
申请号：JP2011035115
申请日：2011-02-21
申请人： Asahi Glass Co Ltd , 旭硝子株式会社
发明人： SHIROTA NAOKO , YOKOKOJI OSAMU
IPC分类号： G03F7/11 , C08F32/08 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a resist protective film, with which water can sufficiently follow a relatively moving projection lens and an immersion exposure process can be stably carried out.SOLUTION: A resist protective film composition for immersion exposure is provided, comprising a first polymer having at least one kind of repeating unit selected from a repeating unit (A3) formed by polymerization of a compound expressed by formula (a3) described below, a repeating unit (A4) formed by polymerization of a compound expressed by formula (a4) described below, and a repeating unit (A5) formed by polymerization of a compound expressed by formula (a5) described below. The compounds expressed by (a3): CF=CFO(CF)C(CF)OH, (a4): CF=CFO(CF)C(O)O(CH)C(CF)OH, and (a5): CF=CFO(CF)C(O)OCH(CH)CHC(CF)OH.
摘要翻译：要解决的问题：为了提供抗蚀剂保护膜，水可以充分地跟随相对移动的投影透镜，并且可以稳定地进行浸没曝光处理。提供了一种用于浸渍曝光的抗蚀保护膜组合物，其包含具有至少一种重复单元的第一聚合物，所述重复单元选自由下述式（a3）表示的化合物聚合形成的重复单元（A3），由下述式（a4）表示的化合物的聚合形成的重复单元（A4）和通过下述式（a5）表示的化合物的聚合形成的重复单元（A5）。由（a3）表示的化合物：CF 2 = CFO（CF 2 ） 3 < / SB> C（CF 3 ） 2 OH，（a4）：CF 2 < / SB> = CFO（CF 2 ） 3（C）O（CH 2 ） 3 C（CF 3 ） 2 < 和（a5）：CF 2 = CFO（CF 2 ） 3 C（O）OCH（CH 3 ）CH 2 （CF 3 ） 2 OH。版权所有（C）2012，JPO＆INPIT

2. 发明专利

JP2008076631A Resist material and resist pattern forming method 审中-公开
标题翻译：耐材料和电阻图案形成方法
公开(公告)号：JP2008076631A
公开(公告)日：2008-04-03
申请号：JP2006254277
申请日：2006-09-20
申请人： Asahi Glass Co Ltd , 旭硝子株式会社
发明人： TAKEBE YOKO , SHIROTA NAOKO , YOKOKOJI OSAMU
IPC分类号： G03F7/039 , C08F216/12 , C08F220/22 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a resist material used for an immersion lithography process in which an immersion liquid is a non-aqueous liquid medium, and to provide a resist pattern forming method.
SOLUTION: The resist material used for the immersion lithography process in which the immersion liquid is the non-aqueous liquid medium and having alkali solubility increased by the action of an acid contains a polymeric fluorine-containing compound (F) and has a backward angle to decalin of ≥30°. In the resist pattern forming method by the immersion lithography process, a step of forming a resist film on a substrate by applying a resist forming composition containing the resist material on the substrate, an immersion lithography step and a development step are carried out in this order, whereby a resist pattern is formed on the substrate.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于浸没式光刻工艺的抗蚀剂材料，其中浸液是非水液体介质，并提供抗蚀剂图案形成方法。溶液：用于浸渍光刻工艺的抗蚀剂材料，其中浸渍液体是非水液体介质并且具有通过酸的作用增加碱溶解度的抗蚀剂材料含有聚合的含氟化合物（F），并且具有后退角度至十分之三十度。在通过浸渍光刻工艺的抗蚀剂图案形成方法中，通过将包含抗蚀剂材料的抗蚀剂形成组合物涂覆在基板上，浸渍光刻步骤和显影步骤，以此顺序进行在基板上形成抗蚀剂膜的步骤由此在基板上形成抗蚀剂图案。版权所有（C）2008，JPO＆INPIT

3. 发明专利

JP2007302821A Fluorine-containing copolymer, method for producing the same and resist composition containing the same 审中-公开
标题翻译：含氟聚合物，其制造方法和含有该共聚物的耐腐蚀组合物
公开(公告)号：JP2007302821A
公开(公告)日：2007-11-22
申请号：JP2006134019
申请日：2006-05-12
申请人： Asahi Glass Co Ltd , 旭硝子株式会社
发明人： SHIROTA NAOKO , SASAKI TAKASHI , YOKOKOJI OSAMU
IPC分类号： C08F220/12 , C08F236/20 , G03F7/039 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To obtain a fluorine-containing polymer that has high functional group concentration, provides sufficient functional group properties and has high transparency in a wide wavelength range, to provide a method for producing the same and to obtain a resist composition containing the fluorine-containing polymer. SOLUTION: The fluorine-containing copolymer has a unit derived from a monomer unit obtained by cyclic polymerization of a fluorine-containing monomer represented by formula CF 2 =CFCF 2 C(CF 3 )(OR 7 )-(CH 2 ) n CR 5 =CHR 6 [R 5 and R 6 are each independently a hydrogen atom, a fluorine atom or a ≤12C alkyl group; R 7 is a group to be replaced with a halogen atom by an acid and is a ≤20C alkyl group, a ≤15C alkylcarbonyl group, a ≤15C alkoxycarbonyl group or a CH 2 R 8 (R 8 is a ≤15C alkoxycarbonyl group)]. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题为了获得具有高官能团浓度的含氟聚合物，提供足够的官能团性质并且在宽波长范围内具有高透明度，以提供其制备方法并获得抗蚀剂含有含氟聚合物的组合物。解决方案：含氟共聚物具有衍生自由式CF 2 SBR 2 = CFCF 2 SBB 2表示的含氟单体通过环状聚合获得的单体单元的单元， C（CF 3 ）（OR 7 ） - （CH 2 ）名词 CR 5 = CHR 6 [R SP 5]和R 6 SP 6各自独立地为氢原子，氟原子或≤12C烷基; R 7 是被酸取代为卤素原子的基团，为≤20C烷基，≤15C烷基羰基，≤15C烷氧基羰基或CH

4. 发明专利

JP2009203247A Fluorine-containing polymer solution composition 审中-公开
标题翻译：含氟聚合物溶液组合物
公开(公告)号：JP2009203247A
公开(公告)日：2009-09-10
申请号：JP2007039816
申请日：2007-02-20
申请人： Asahi Glass Co Ltd , 旭硝子株式会社
发明人： SHIROTA NAOKO , WANG SHU-ZHONG , YOKOKOJI OSAMU
IPC分类号： C08L33/16 , C08F20/22 , C08K5/02 , C08K5/06
CPC分类号： C09D133/16 , C08F220/22
摘要： PROBLEM TO BE SOLVED: To provide a fluorine-containing polymer solution composition. SOLUTION: The fluorine-containing polymer solution composition comprises a fluorine-containing polymer (F) containing a repeating unit (A) having a fluorine-containing alicyclic hydrocarbon group in a side chain, and a fluorine-containing organic solvent (S). For example, the repeating unit (A) has a group (G) which is an n-valent group (provided that n represents an integer of 1-4) obtained by removing one hydrogen atom from a cyclic saturated hydrocarbon compound selected from the group consisting of compounds represented by formula (1), formula (2), formula (3), formula (4) and formed (5) and substituting ≥50% of the remaining hydrogen atoms with fluorine atoms. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供含氟聚合物溶液组合物。解决方案：含氟聚合物溶液组合物包含在侧链含有含氟脂肪族烃基的重复单元（A）的含氟聚合物（F）和含氟有机溶剂（S ）。例如，重复单元（A）具有通过从选自以下的环状饱和烃化合物中除去一个氢原子而得到的作为n价基团（n表示1〜4的整数）的基团（G）由式（1），式（2），式（3），式（4）表示的化合物形成（5），用氟原子代替≥50％的剩余氢原子。版权所有（C）2009，JPO＆INPIT

5. 发明专利

JP2008201909A Fluorine surface modifier 审中-公开
标题翻译：氟表面改性剂
公开(公告)号：JP2008201909A
公开(公告)日：2008-09-04
申请号：JP2007039814
申请日：2007-02-20
申请人： Asahi Glass Co Ltd , 旭硝子株式会社
发明人： TAKEBE YOKO , SHIROTA NAOKO , WATANABE KUNIO , YOKOKOJI OSAMU
IPC分类号： C08F220/22 , C08F220/28 , C09K3/18
摘要： PROBLEM TO BE SOLVED: To provide a fluorine surface modifier which is excellent in static water repellency and dynamic water repellency.
SOLUTION: The fluorine surface modifier comprises a fluorine-containing compound (F) having a fluorine-containing cyclic saturated hydrocarbon group which forms a film showing a water contact angle of ≥80° and a water sliding angle of ≤20°. For example, the fluorine-containing compound is a fluorine-containing polymer (F) having a group (G) which has a valency of n (provided that n is an integer of 1-4) and is obtained by removing n hydrogen atoms from a cyclic saturated hydrocarbon compound chosen from the group consisting of compound (1), compound (2), compound (3), compound (4) and compound (5). Here, at least 50% of the remaining hydrogen atoms in the cyclic saturated hydrocarbon compound are replaced by fluorine atoms.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供静电斥水性和动态拒水性优异的氟表面改性剂。解决方案：氟表面改性剂包括具有含氟环状饱和烃基的含氟化合物（F），其形成水接触角为≥80°，水滑动角为≤20°的膜。例如，含氟化合物是具有化合价n（假定n为1-4的整数）的基团（G）的含氟聚合物（F），通过从n 选自化合物（1），化合物（2），化合物（3），化合物（4）和化合物（5）的环状饱和烃化合物。这里，环状饱和烃化合物中剩余的氢原子的至少50％被氟原子代替。版权所有（C）2008，JPO＆INPIT

6. 发明专利

JP2008076632A Resist protective film material and resist pattern forming method 审中-公开
标题翻译：耐蚀膜材料和电阻图案形成方法
公开(公告)号：JP2008076632A
公开(公告)日：2008-04-03
申请号：JP2006254278
申请日：2006-09-20
申请人： Asahi Glass Co Ltd , 旭硝子株式会社
发明人： TAKEBE YOKO , SHIROTA NAOKO , YOKOKOJI OSAMU
IPC分类号： G03F7/11 , C08F220/22 , C08F236/20 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a resist protective film used for an immersion lithography process in which an immersion liquid is a non-aqueous liquid medium, and to provide a resist pattern forming method. SOLUTION: An alkali-soluble resist protective film material for the resist protective film used for the immersion lithography process in which the immersion liquid is the non-aqueous liquid medium contains a polymeric fluorine-containing compound (F) and has a backward angle to decalin of ≥40°. In the resist pattern forming method by the immersion lithography process, a step of forming a resist film on a substrate by applying a photosensitive resist on the substrate, a step of forming a resist protective film on the resist film by applying a resist protective film forming composition containing the resist protective film material on the resist film, an immersion lithography step and a development step are carried out in this order, whereby a resist pattern is formed on the substrate. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于浸没式光刻工艺的抗蚀剂保护膜，其中浸液是非水液体介质，并提供抗蚀剂图案形成方法。解决方案：用于浸没式光刻工艺中的浸渍液体是非水液体介质的抗蚀保护膜的碱溶性抗蚀剂保护膜材料含有聚合含氟化合物（F），并且具有向后与十氢化萘的角度≥40°。在通过浸渍光刻工艺的抗蚀剂图案形成方法中，通过在基板上施加光敏抗蚀剂在基板上形成抗蚀剂膜的步骤，通过施加抗蚀剂保护膜形成在抗蚀剂膜上形成抗蚀剂保护膜的步骤在抗蚀剂膜上含有抗蚀剂保护膜材料的组合物，浸渍光刻步骤和显影步骤依次进行，从而在基材上形成抗蚀剂图案。版权所有（C）2008，JPO＆INPIT

7. 发明专利

JP2008008974A Resist composition for liquid immersion exposure and resist pattern forming method 审中-公开
标题翻译：用于液体暴露暴露和抗蚀图案形成方法的耐腐蚀组合物
公开(公告)号：JP2008008974A
公开(公告)日：2008-01-17
申请号：JP2006176879
申请日：2006-06-27
申请人： Asahi Glass Co Ltd , 旭硝子株式会社
发明人： SHIROTA NAOKO , TAKEBE YOKO , KANEKO ISAMU , YOKOKOJI OSAMU
IPC分类号： G03F7/039 , C08F36/20 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a resist composition for liquid immersion exposure and a resist pattern forming method. SOLUTION: The resist composition for liquid immersion exposure contains a polymer (A) containing a repeating unit (A) formed by polymerization of CF 2 =CF-CH 2 CHRCH 2 -CH=CH 2 (wherein R represents a 1-12C alkyl group or a 1-12C fluoroalkyl group) or the like in an amount of ≥10 mol% based on all repeating units and a polymer (B) the alkali solubility of which increases by the action of an acid, wherein the polymer (A) is contained in an amount of 0.1-30 mass% based on the polymer (B). The resist pattern forming method adopts liquid immersion lithography using the resist composition for liquid immersion exposure. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于液浸曝光的抗蚀剂组合物和抗蚀剂图案形成方法。解决方案：用于液浸曝光的抗蚀剂组合物含有含有通过聚合形成的重复单元（A）的聚合物（A），其通过CF 2 CH 2 = CHRCH <2> -CH = CH 2 （其中R表示1-12C烷基或1-12C氟代烷基）等，其量≥10mol％基于所有重复单元和其碱溶解度由酸的作用增加的聚合物（B），其中基于聚合物（B），聚合物（A）的含量为0.1-30质量％。抗蚀剂图案形成方法采用液浸式光刻法，使用抗蚀剂组合物进行浸液曝光。版权所有（C）2008，JPO＆INPIT

8. 发明专利

JP2004172285A Method for exposure processing using short wavelength laser light and method for storing pellicle for short wavelength exposure 审中-公开
公开(公告)号：JP2004172285A
公开(公告)日：2004-06-17
申请号：JP2002335294
申请日：2002-11-19
申请人： Asahi Glass Co Ltd , Semiconductor Leading Edge Technologies Inc , 旭硝子株式会社 , 株式会社半導体先端テクノロジーズ
发明人： MATSUKURA IKUO , SHIROTA NAOKO , SASAKI HIRONAO , TOKAWA IWAO
IPC分类号： G03F1/62 , G03F1/66 , G03F7/20 , H01L21/027 , G03F1/14
摘要： PROBLEM TO BE SOLVED: To provide a method for exposure processing with less deterioration of a pellicle film in exposure processing using a light having a wavelength of 100-200 nm and to provide a method for storing the pellicle. SOLUTION: The method for exposure processing includes a step of exposing in a gas atmosphere containing an inert gas made of a helium having a ≥99.5 vol% purity and/or a neon having a ≥99.5 vol% purity and an oxygen gas having a ≥99.5 vol% purity, when exposure processing is performed through the pellicle having a pellicle film and a frame in a photolithographic step using a light having a wavelength of 100-200 nm for the exposure. The method for storing the pellicle includes a step of storing the pellicle in a gas atmosphere containing a helium having a ≥99.5 vol% purity and/or a neon having a ≥99.5 vol% purity. COPYRIGHT: (C)2004,JPO

9. 发明专利

JP2004085713A Pellicle 审中-公开
标题翻译：薄皮
公开(公告)号：JP2004085713A
公开(公告)日：2004-03-18
申请号：JP2002243867
申请日：2002-08-23
申请人： Asahi Glass Co Ltd , 旭硝子株式会社
发明人： MATSUKURA IKUO , SHIROTA NAOKO , TSUSHIMA NANA , YAMAMOTO KIYOSHI , KAKITA REIKO
IPC分类号： B32B3/02 , B32B27/00 , B44F1/00 , G02B1/04 , G02F1/13 , G03F1/62 , H01L21/027 , G03F1/14
CPC分类号： G03F1/62 , Y10T428/161 , Y10T428/3154
摘要： PROBLEM TO BE SOLVED: To provide a pellicle which uses a fluorine-containing polymer having high transmittance for light with 100 to 200 nm wavelength and high durability as a film material or an adhesive material. SOLUTION: The pellicle is used for exposure to light with 100 to 200 nm wavelength. The pellicle film or the adhesive (adhesive for bonding the pellicle film and a frame) comprises a fluorine-containing polymer (A). The fluorine-containing polymer (A) is a substantially linear fluorine-containing polymer featuring that: the main chain has an aliphatic cyclic structure and consists of a continuous chain of carbon atoms; the carbon atoms in the main chain are composed of carbon atoms coupled with hydrogen atoms and carbon atoms having no hydrogen atom coupled; and in the measurement of high resolution proton nuclear magnetic resonance spectrum, the number of hydrogen atoms based on the signal appearing in a magnetic field region over 2.8 ppm is ≤6 mol% with respect to the whole hydrogen atoms. COPYRIGHT: (C)2004,JPO
摘要翻译：要解决的问题：提供一种使用具有高透射率的含氟聚合物的防护薄膜组件，其具有100至200nm波长的光和作为薄膜材料或粘合材料的高耐久性。
解决方案：防护薄膜组件用于暴露于100至200nm波长的光。防护薄膜或粘合剂（用于粘合防护薄膜和框架的粘合剂）包含含氟聚合物（A）。含氟聚合物（A）是基本上为直链的含氟聚合物，其特征在于：主链具有脂族环状结构并由连续的碳原子链组成; 主链中的碳原子由与氢原子和不具有氢原子的碳原子偶联的碳原子组成; 并且在高分辨率质子核磁共振谱的测量中，基于在2.8ppm以上的磁场区域中出现的信号的氢原子数相对于整个氢原子为≤6mol％。版权所有（C）2004，JPO

10. 发明专利

JP2004055701A Method for exposure 审中-公开
公开(公告)号：JP2004055701A
公开(公告)日：2004-02-19
申请号：JP2002209029
申请日：2002-07-18
申请人： Asahi Glass Co Ltd , 旭硝子株式会社
发明人： TSUSHIMA NANA , MATSUKURA IKUO , SHIROTA NAOKO
IPC分类号： G03F1/62 , G03F7/20 , H01L21/027 , G03F1/14
摘要： PROBLEM TO BE SOLVED: To provide a method for exposing, in which the deterioration of a pellicle film is small in an exposure treatment using ultraviolet rays having a wavelength of 200 nm or shorter.
SOLUTION: When the pellicle, having the pellicle film and a frame, is exposed in a photolithographic process using the ultraviolet rays having the wavelength of 200 nm or shorter, the exposure is made in an atmosphere of a mixed gas containing an inert gas component, having a purity of 99.5% or more and a fluorinated hydrocarbon gas component having 3 or fewer carbons in purity of 99.5% or higher.
COPYRIGHT: (C)2004,JPO

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